Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2008
10/09/2008US20080248418 Reacting fluoroalcohol-substituted (meth)acrylate ester with fluorinated epoxide compound; catalytic block polymerization; photoresists
10/09/2008US20080248417 Resin containing units derived from 2-alkyl-2-adamantyl acrylate, 2-alkyl-2-adamantyl methacrylate, 2-alkyl-2-adamantyl alpha -chloroacrylate or 2-alkyl-2-adamantyl alpha -trifluoromethylacrylate, and unit derived from hydroxystyrene
10/09/2008US20080248412 Supervisory etch cd control
10/09/2008US20080248409 Photoresists; extreme ultraviolet region and absorber layer for exposure light; semiconductors
10/09/2008US20080248402 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording
10/09/2008US20080248401 Transferring hologram with stable quality including on-demand information by using thermal transfer sheet where hologram is laminated; direction of heating by heat source of minute area unit and direction of recorded information for enhancing optical effects of hologram or diffraction grating coincide
10/09/2008US20080248331 Coating composition
10/09/2008US20080248267 Building Up Diffractive Optics by Structured Glass Coating
10/09/2008US20080248264 Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same
10/09/2008US20080247632 Method for Mask Inspection for Mask Design and Mask Production
10/09/2008US20080247035 Catadioptric imaging system employing immersion liquid for use in broad band microscopy
10/09/2008US20080247029 Micro-electro-mechanical system micro mirror
10/09/2008US20080246940 Illumination system for illuminating a pattering device and method for manufacturing an illumination system
10/09/2008US20080246939 Exposure apparatus and original
10/09/2008US20080246933 Exposure Method And Apparatus, And Device Production Method
10/09/2008US20080246932 Exposure apparatus, device manufacturing method and exposure method
10/09/2008US20080245975 Electrically Programmable Reticle and System
10/09/2008DE102008017623A1 Verfahren und Vorrichtung zum Abbilden einer programmierbaren Maske auf einem Substrat Method and apparatus for imaging a mask on a substrate programmable
10/09/2008DE102008011134A1 Method for adapting imaging characteristics, involves determining polarization distribution which is presented in predetermined level of illumination equipment of projection lighting device
10/09/2008DE102008000968A1 Optisches Korrekturelement und Verfahren zur Korrektur von temperaturinduzierten Abbildungsfehlern in optischen Systemen, Projektionsobjektiv und Projektionsbelichtungsanlage für die Halbleiterlithographie Correcting optical element and method for correcting temperature-induced aberrations in optical systems, projection lens and projection exposure apparatus for semiconductor lithography
10/09/2008DE102007016659A1 Infusionspumpe, Kanalplatte für eine Infusionspumpe und Verfahren zu ihrer Herstellung Infusion pump channel plate for an infusion pump and method for their preparation
10/09/2008DE102004053587B4 Flüssigkristalldisplay-Tafel und Verfahren zu deren Herstellung Liquid crystal display panel and process for their preparation
10/09/2008CA2681201A1 Photoactivable nitrogen bases
10/09/2008CA2671289A1 Fabrication of microstructures and nanostructures using etching resist
10/08/2008EP1978546A1 Exposure apparatus, exposure method, and device production method
10/08/2008EP1978409A1 Lithographic apparatus and device manufacturing method
10/08/2008EP1978408A1 Negative resist composition and pattern forming method using the same
10/08/2008EP1978407A1 Method for obtaining a transparent conductive film
10/08/2008EP1978406A1 A method of preparing a substrate having a layer or pattern of metal on it
10/08/2008EP1976900A1 Epoxy formulations for use in lithography techniques
10/08/2008EP1588220B1 Method for treating imaging materials
10/08/2008EP1470447B1 Photolithographic critical dimension control using reticle measurements
10/08/2008EP1417530A4 Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
10/08/2008EP1389177B1 Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and their use
10/08/2008EP1352904B1 (meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
10/08/2008EP1270636B1 Photocurable composition, process for producing photocurable composition, photocurable pressure-sensitive adhesive sheet, process for producing photocurable pressure-sensitive adhesive sheet, and method of bonding
10/08/2008EP1218986B1 Narrow band laser with fine wavelength control
10/08/2008CN201130296Y Automatic display-stabilization machine
10/08/2008CN101283492A Method and apparatus for driving semiconductor lasers, and method and apparatus for deriving drive current patterns for semiconductor lasers
10/08/2008CN101283314A Dynamic uv-exposure and thermal development of relief image printing elements
10/08/2008CN101283313A Method for preparing surface concaves and convexes
10/08/2008CN101283312A Digital exposure apparatus
10/08/2008CN101283311A 辐射敏感组合物和可成像材料 The radiation-sensitive compositions and imageable materials
10/08/2008CN101283015A Imide-urethane resin, photosensitive resin composition containing the same, and cured object obtained therefrom
10/08/2008CN101283005A Composition curable with actinic energy ray
10/08/2008CN101281860A Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
10/08/2008CN101281379A Method for removing photoresist as well as method for reworking of photoetching technology
10/08/2008CN101281378A Nanometer photolithography aligning system
10/08/2008CN101281377A Lithographic apparatus and device manufacturing method
10/08/2008CN101281376A Gantry type light shield cleaning device
10/08/2008CN101281375A Method for removing micro-air blister / particulate in liquid, liquid supplier and uses thereof
10/08/2008CN101281374A Method for testing whether etching solution is valid or not
10/08/2008CN101281373A Apparatus for automatically cleaning carrying platform
10/08/2008CN101281372A Coater and method of coating a process solution on a substrate using the same
10/08/2008CN101281371A Photosensitive paste composition and method for forming plasma display battier wall using the same
10/08/2008CN101281370A Light-sensitive polymer composition with low surface stickiness and application thereof
10/08/2008CN101281369A Photoresist composition and method for forming photoresist pattern using the same
10/08/2008CN101281368A Black solder resist compound and cured product thereof
10/08/2008CN101281367A Solder resist compound and cured product thereof
10/08/2008CN101281366A Light-sensitive polymer composition not easy to change color and application thereof
10/08/2008CN101281365A Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same
10/08/2008CN101281364A Colorful optical filter, liquid crystal display panel, LCD device and manufacturing method thereof
10/08/2008CN101281361A A photomask with sub-resolution assist feature and manufature method thereof
10/08/2008CN101281360A Method for manufacturing mask
10/08/2008CN100424981C Motor controller
10/08/2008CN100424822C Method for improving surface roughness of processed film of substrate and apparatus for processing substrate
10/08/2008CN100424815C Substrate processing apparatus and substrate processing method
10/08/2008CN100424806C Original edition for color display tube shadow mask printing
10/08/2008CN100424586C Pattern formation method and device, electric sensitive element and colour filter producing method
10/08/2008CN100424574C Liquid crystal display device and method of manufacturing the same
10/08/2008CN100424570C System and method for manufacturing press die for printing LCD oriented film
10/08/2008CN100424557C Liquid crystal device, method of manufacturing liquid crystal device, and electronic apparatus
10/08/2008CN100424532C Optical dry-films and methods of forming optical devices with dry films
10/07/2008US7434196 Renesting interaction map into design for efficient long range calculations
10/07/2008US7433040 Apparatus and methods for detecting overlay errors using scatterometry
10/07/2008US7433019 Exposure apparatus and device manufacturing method
10/07/2008US7433015 Lithographic apparatus and device manufacturing method
10/07/2008US7432701 Adjusting device and arrangement for adjusting a wafer
10/07/2008US7432634 Remote center compliant flexure device
10/07/2008US7432214 Compositions for dissolution of low-k dielectric film, and methods of use
10/07/2008US7432042 Immersion lithography process and mask layer structure applied in the same
10/07/2008US7432041 Method and systems to print contact hole patterns
10/07/2008US7432040 Manufacturing method of thick film member pattern
10/07/2008US7432039 Method for simultaneous patterning of features with nanometer scales gaps
10/07/2008US7432038 Dielectric line and production method therefor
10/07/2008US7432037 Curable resin composition and flexographic plate material using the same
10/07/2008US7432036 Non-resonant two-photon absorbing material, non-resonant two-photon emitting material, and method for inducing absorption or generating emission of non-resonant two photons by using the material
10/07/2008US7432035 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
10/07/2008US7432034 Acid generator; alkali-soluble resin; two crosslinking agents, one a phenolic compound containing hydroxy-, alkoxy- or acyloxy- methyl groups and the other containing oxymethyl-substituted nitrogen groups, e.g., amino resins
10/07/2008US7432027 Dual-layer protected transient document
10/07/2008US7432024 For semiconductors, microelectronic and microelectromechanical devices, and microfluidic and photonic devices; eliminating image distorting charging effects during electron beam patterning of the template and charging effects during scanning electron microscope inspection
10/07/2008US7432023 Method for producing a pellicle for lithography
10/07/2008US7432021 a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies
10/07/2008US7431858 For microstructuring electronic components, which yields high resolutions ( <== 200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods; semiconductors
10/07/2008US7431584 Heat processing apparatus and heat processing method
10/07/2008CA2359385C Photo definable polyimide film used as an embossing surface
10/02/2008WO2008118341A1 Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material
10/02/2008WO2008118340A2 Method to form a pattern of functional material on a substrate including the treatment of a surface of a stamp
10/02/2008WO2008118313A1 Random phase mask for light pipe homogenizer
10/02/2008WO2008118009A1 Contamination prevention system, lithographic apparatus, radiation source and device manufacturing method
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