| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/15/2008 | CN101288028A Photopolymerizable silicone materials forming semipermeable membranes for sensor applications |
| 10/15/2008 | CN101288027A Low activation energy dissolution modification agents for photoresist applications |
| 10/15/2008 | CN101287767A Ic插座装置 Ic socket device |
| 10/15/2008 | CN101287603A Method for making a lithographic printing plate precursor |
| 10/15/2008 | CN101286017A Thick film photoresist cleaning agent |
| 10/15/2008 | CN101286016A Low etching photoresist cleaning agent |
| 10/15/2008 | CN101286015A Developing method for improving critical dimension uniformity |
| 10/15/2008 | CN101286014A Developing process improving method |
| 10/15/2008 | CN101286013A Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method |
| 10/15/2008 | CN101286012A Projection exposure apparatus |
| 10/15/2008 | CN101286011A Photolithography equipment detecting device, method and preparation method |
| 10/15/2008 | CN101286010A Aligning system for photolithography equipment and its alignment method and photolithography equipment |
| 10/15/2008 | CN101286009A Phase-shifting mask and method of fabricating same |
| 10/15/2008 | CN101286008A Mask layout measurement method |
| 10/15/2008 | CN101286007A Manufacturing method of mask blank and manufacturing method of photomask |
| 10/15/2008 | CN101286006A Radiation curable developing polyurethane and radiation curable developing light resistance composition |
| 10/15/2008 | CN101286005A Local micro photolithography film possessing oxide mask |
| 10/15/2008 | CN101286004A Inorganic heat resistance film for photoetching technique |
| 10/15/2008 | CN101286003A Drum die structure and method of manufacture |
| 10/15/2008 | CN101286002A Method for producing elementary moulded board for generating gaze screen mask |
| 10/15/2008 | CN101286001A Focusing evaluation method |
| 10/15/2008 | CN101285965A Process of producing substrate for liquid crystal display device |
| 10/15/2008 | CN101285959A Color filter substrate for liquid crystal display and method of fabricating the same |
| 10/15/2008 | CN101285911A Mask-free method and structure for light sensitive material patterning by using optical fiber |
| 10/15/2008 | CN101285083A Process for preparing patterned cellulosic by micro-fluidic chip |
| 10/15/2008 | CN101284643A Method for fabricating a structure for a microelectromechanical systems (MEMS) device |
| 10/15/2008 | CN100426942C Method for making circuit substrate |
| 10/15/2008 | CN100426483C Substrate conveyer, substrate conveying method and coating, developing apparatus |
| 10/15/2008 | CN100426472C Etching resistant film, process for producing the same, surface cured resist pattern, process for producing the same, semiconductor device and process for producing the same |
| 10/15/2008 | CN100426462C Pattern formation method |
| 10/15/2008 | CN100426461C Method of measuring focus deviation in pattern exposure and pattern exposure method |
| 10/15/2008 | CN100426460C Pattern formation method |
| 10/15/2008 | CN100426141C Electro-optic device, substrate for electro-optic device and method for manufacturing the same, photomask, and electronic device |
| 10/15/2008 | CN100426140C Silicon-containing compositions for spin-on arc/hardmask materials |
| 10/15/2008 | CN100426015C Colour optical filter separating wall and producing method thereof, colour filter and producing method thereof |
| 10/15/2008 | CN100426013C Color filter substrate and method of fabricating the same |
| 10/15/2008 | CN100425637C Poly-imide precursor, its preparing process and resin composition using same |
| 10/15/2008 | CN100425630C Filming copolymer resin containing silicon coupler and its organic antiflecting coating |
| 10/15/2008 | CN100425420C Method of producing resin molded product |
| 10/14/2008 | US7436540 Image recorder having more than one recording head and image recording system containing the image recorder |
| 10/14/2008 | US7436521 Optical measuring apparatus and operating method for imaging error correction in an optical imaging system |
| 10/14/2008 | US7436490 Exposure apparatus using blaze type diffraction grating to diffract EUV light and device manufacturing method using the exposure apparatus |
| 10/14/2008 | US7436489 Device for testing an exposure apparatus |
| 10/14/2008 | US7436487 Exposure apparatus and method for producing device |
| 10/14/2008 | US7436486 Exposure apparatus and device manufacturing method |
| 10/14/2008 | US7435959 Microstructured pattern inspection method |
| 10/14/2008 | US7435763 Solid freeform compositions, methods of application thereof, and systems for use thereof |
| 10/14/2008 | US7435682 Method of manufacturing semiconductor device |
| 10/14/2008 | US7435609 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 10/14/2008 | US7435537 photoresist; lithography; low refractive index |
| 10/14/2008 | US7435536 Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, interconnects in the periphery of the integrated circuit; forming contacts between pitch multiplied and non-pitch multiplied features |
| 10/14/2008 | US7435535 Method for forming patterned insulating elements and methods for making electron source and image display device |
| 10/14/2008 | US7435534 Method for manufacturing semiconductor device |
| 10/14/2008 | US7435533 Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases |
| 10/14/2008 | US7435532 Lithographic printing plate precursor |
| 10/14/2008 | US7435531 Image forming material |
| 10/14/2008 | US7435530 Positive type resist composition and resist pattern formation method using same |
| 10/14/2008 | US7435529 Photosensitive composition and image recording method using the same |
| 10/14/2008 | US7435527 Mixture of acid generator and resin insoluble in alkaline developer and another acid decomposable compound |
| 10/14/2008 | US7435526 A sulfonic acid derivative capable of generating specific sulfonic acid upon irradiation with an actinic ray and radiation; a styrenic copolymer capable of decomposing under the action of an acid to increase the solubility in an alkali developer |
| 10/14/2008 | US7435525 Positive photosensitive resin composition, method for forming pattern, and electronic part |
| 10/14/2008 | US7435524 Permanent, removable tissue markings |
| 10/14/2008 | US7435516 comprises photo-initiator, photosensitive polymerizable monomers or oligomers selected from the groups consisting of double-bond compounds, compounds having epoxy functional group; photosensitive material can surround liquid crystal display cell and separate from assisting substrates |
| 10/14/2008 | US7435515 Free from deterioration of the pattern-forming body itself because no photocatalyst is contained in the produced pattern-forming body; color filter or microlens |
| 10/14/2008 | US7435513 Reducing phase conflicts in complex designs |
| 10/14/2008 | US7435512 Using a photomask that can prevent critical dimension biases of pattern images of different pattern densities while forming a circuit pattern |
| 10/14/2008 | US7435468 Multi-layer structure and method of drawing microscopic structure therein, optical disc master and method of fabricating the same using the multi-layer structure, and optical disc manufactured using the optical disc master |
| 10/14/2008 | US7435074 Method for fabricating dual damascence structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascence patterning |
| 10/14/2008 | US7435021 Automatic development method of photosensitive lithographic printing plate and automatic development device thereof |
| 10/14/2008 | US7434511 Image recording apparatus including a plurality of notch forming sections |
| 10/14/2008 | US7434485 Sensor device for non-intrusive diagnosis of a semiconductor processing system |
| 10/09/2008 | WO2008121952A1 Methods for stripping material for wafer reclamation |
| 10/09/2008 | WO2008121137A2 Fabrication of microstructures and nanostructures using etching resist |
| 10/09/2008 | WO2008120989A1 Illumination system for illuminating a patterning device and method for manufacturing an illumination system |
| 10/09/2008 | WO2008120785A1 Exposure apparatus and exposure method |
| 10/09/2008 | WO2008120743A1 Resist composition, resist protective film composition, and method for forming resist pattern |
| 10/09/2008 | WO2008120491A1 Photocurable resin composition, dry film, cured product, and printed wiring board |
| 10/09/2008 | WO2008120468A1 Photosensitive resin composition for flexographic printing |
| 10/09/2008 | WO2008120391A1 Multi-column electron beam exposure device and multi-column electron beam exposure method |
| 10/09/2008 | WO2008119794A1 Optical system, in particular illumination device or projection objective of a microlithographic projection exposure apparatus |
| 10/09/2008 | WO2008119688A1 Photoactivable nitrogen bases |
| 10/09/2008 | WO2008119478A1 Radiation source and method for generating electromagnetic radiation |
| 10/09/2008 | WO2008119386A1 Support for a component of an optical device |
| 10/09/2008 | WO2008092653A3 Illumination system of a microlithographic projection exposure apparatus |
| 10/09/2008 | WO2008076391A3 Dry adhesives and methods for making dry adhesives |
| 10/09/2008 | WO2008076390A3 Dry adhesives and methods for making dry adhesives |
| 10/09/2008 | WO2008045545A3 Deformation-based contact lithography systems, apparatus and methods |
| 10/09/2008 | US20080249270 Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product |
| 10/09/2008 | US20080248432 Near-field exposure method |
| 10/09/2008 | US20080248431 Pattern forming method used in semiconductor device manufacturing and method of manufacturing semiconductor device |
| 10/09/2008 | US20080248430 Oxidation, reduction; sputtering; vapor deposition; electroless plating; photoresists; photomasks |
| 10/09/2008 | US20080248428 Method for Producing Flexographic Printing Forms by Thermal Development |
| 10/09/2008 | US20080248426 Antihalation compositions |
| 10/09/2008 | US20080248425 Positive resist composition and pattern-forming method |
| 10/09/2008 | US20080248424 Light sensitive elements comprising substrates having coatings comprising photoinitiators or sensitizers, biuret structural and phosphazene oligomers, having improved photosensitivity, storage stability and wear resistance; photolithography |
| 10/09/2008 | US20080248423 Chemically amplified resist composition |
| 10/09/2008 | US20080248422 Resist composition, method of forming resist pattern, compound and acid generator |
| 10/09/2008 | US20080248421 Positive resist composition and pattern forming method |
| 10/09/2008 | US20080248420 Adjust solubility of alkali developer by action of acid; acid generator; irradiating with actinic radiation |
| 10/09/2008 | US20080248419 Decomposable under actinic radiation |