| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/22/2008 | CN100428027C Radiation sensitive resin composition for forming partition, its forming method and liquid crystal display device |
| 10/22/2008 | CN100428018C Color filter substrate for liquid crystal display device and method for manufacturing the same |
| 10/22/2008 | CN100428014C Substrate for a display apparatus, display device, colour filter substrate and liquid crystal display device and producing method thereof |
| 10/22/2008 | CN100428010C Fabricating method of flexible display |
| 10/22/2008 | CN100427994C Optical element, optical system, laser device, exposure device, mask testing device and high polymer crystal processing device |
| 10/22/2008 | CN100427977C Light shielding film for display device, its manufacturing method, and composite for forming the film |
| 10/22/2008 | CN100427881C High seeparation sharpness gasometer-type approach sensor |
| 10/22/2008 | CN100427530C Photo-sensitive polyimide, and its preparing method |
| 10/22/2008 | CN100427519C Resin for resist, positive resist composition, and method of forming resist pattern |
| 10/22/2008 | CN100427461C Polymerisable benzophenone photoinitiator and its preparing method |
| 10/22/2008 | CN100427321C System for thermal development of flexographic printing plates |
| 10/22/2008 | CN100427222C Method for making microcapacitor type ultrasonic transducer by using impression technique |
| 10/21/2008 | US7440182 Multilayer mirror, method for manufacturing the same, and exposure equipment |
| 10/21/2008 | US7440105 Continuously varying offset mark and methods of determining overlay |
| 10/21/2008 | US7440104 Exposure system, test mask for monitoring polarization, and method for monitoring polarization |
| 10/21/2008 | US7440083 Printing a mask with maximum possible process window through adjustment of the source distribution |
| 10/21/2008 | US7440082 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model |
| 10/21/2008 | US7439531 Alignment systems and methods for lithographic systems |
| 10/21/2008 | US7439525 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 10/21/2008 | US7439302 terpolymer of 2-vinylnaphthalene, 5-hydroxy-1 -naphthalenyl methacrylate and hydroxyethyl methacrylate; high etch resistance, improved optical properties; planarizing underlayer in a multilayer lithographic process |
| 10/21/2008 | US7439196 Method for manufacturing pattern formed structure |
| 10/21/2008 | US7439068 Plasma monitoring method, plasma processing method, method of manufacturing semiconductor device, and plasma processing system |
| 10/21/2008 | US7439010 Resist pattern excellent in oxygen plasma resistance, resolution, storage stability; efficient manufacture of magnetic heads, semiconductor devices, and other electronics; polysilicate modified with phenolic-containing silanol compound |
| 10/21/2008 | US7439006 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
| 10/21/2008 | US7439005 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern |
| 10/21/2008 | US7438998 Wiring pattern (mask layout) in the form of a line including angled portions with a local difference in line width is divided into rectangular patterns each having a large area and node portions interconnecting the rectangular patterns; high correction accuracy |
| 10/21/2008 | US7438995 Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet |
| 10/21/2008 | US7438950 Forming a region in which a graft polymer, that directly bonds to a surface of a base material that includes a polyimide is generated in a pattern shape; imparting electroless plating catalyst or a precursor thereof and electroless plating so as to form a metallic film in the pattern shape |
| 10/21/2008 | US7438838 Polymeric optical waveguide-forming master plate, method for producing polymer optical waveguide, and aperture changeable polymeric optical waveguide |
| 10/21/2008 | US7438763 Coating apparatus and method having a slide bead coater and liquid drop applicator |
| 10/21/2008 | US7438547 Optical recording medium and master disc for manufacturing optical recording medium |
| 10/16/2008 | WO2008123601A2 Pigment-dispersed composition, curable composition, and color filter and production method thereof |
| 10/16/2008 | WO2008123583A1 Photosensitive polyamic acid ester composition |
| 10/16/2008 | WO2008123563A1 Positive photosensitive resin composition and cured film forming method using the same |
| 10/16/2008 | WO2008123560A1 Positive resist composition and pattern forming method |
| 10/16/2008 | WO2008123541A1 Positive resist composition and pattern forming method |
| 10/16/2008 | WO2008123535A2 Exposure method, exposure apparatus and device manufacturing method |
| 10/16/2008 | WO2008123507A1 Positive photosensitive resin composition, cured film thereof, and display element |
| 10/16/2008 | WO2008123340A1 Light-shielding resin composition for color filter, and color filter |
| 10/16/2008 | WO2008123332A1 Holding apparatus, exposure apparatus, exposure method, and device manufacturing method |
| 10/16/2008 | WO2008123303A1 Composition for fluorine-containing volume hologram optical information recording material and fluorine-containing volume hologram optical information recording medium using the same |
| 10/16/2008 | WO2008123294A1 Composition for color filter and color filter |
| 10/16/2008 | WO2008123233A1 Radiation-sensitive resin composition, active matrix substrate and method for producing the same |
| 10/16/2008 | WO2008123224A1 Photosensitive resin composition |
| 10/16/2008 | WO2008123210A1 Photosensitive resin composition |
| 10/16/2008 | WO2008123053A1 Positive photosensitive resin composition |
| 10/16/2008 | WO2008123049A1 Method for film formation, resin composition for use in the method, structure having insulating film, process for producing the structure, and electronic component |
| 10/16/2008 | WO2008122884A2 A composition for coating over a photoresist pattern comprising a lactem |
| 10/16/2008 | WO2008122626A2 Optical element module with imaging error and position correction |
| 10/16/2008 | WO2008122419A1 Method and device for imaging a programmable mask on a substrate |
| 10/16/2008 | WO2008122410A2 Optical correction element and method for the correction of temperature-induced imaging aberrations in optical systems, projection objective and projection exposure apparatus for semiconductor lithography |
| 10/16/2008 | WO2008122335A2 Apparatus for measurement of substrates |
| 10/16/2008 | WO2008122313A1 Optical element module with imaging error and position correction |
| 10/16/2008 | WO2008079008A3 Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method |
| 10/16/2008 | WO2008072962A3 Radiation system and lithographic apparatus |
| 10/16/2008 | WO2008049926A3 Method and device for replacing objective parts |
| 10/16/2008 | WO2008036823A3 Uric acid additive for cleaning formulations |
| 10/16/2008 | US20080255003 Contacting substrate with solution of polymerizable monomers; patterned heating using scannabnle laser; generating pattern; analysis device |
| 10/16/2008 | US20080254634 Containing two binder resins produced by reacting m-cresol and p-cresol with salicylic aldehyde for first and with formaldehyde for second; heat resistance, pattern adhesion |
| 10/16/2008 | US20080254626 Processing apparatus |
| 10/16/2008 | US20080254564 Method for manufacturing solid-state image sensor and solid-state image sensor |
| 10/16/2008 | US20080254394 Variations in wettability; optically forming pattern; photocatalyst action upon pattern-wisw exposure;color filters, lenses, printing plates |
| 10/16/2008 | US20080254391 Method of Making a Lithographic Printing Plate |
| 10/16/2008 | US20080254390 Support with hydrophilic surface; photopolymerizable layer including photoinitiator; exposure; heating; applying gum solution to remove unexposed areas |
| 10/16/2008 | US20080254389 Coating hydrophilic support with image recording layer containing hydrophobic thermoplastic resin and pigments; exposure; coalescing; development; applying gum solution to remove unexposed areas |
| 10/16/2008 | US20080254388 Fluorinated polymer, negative photosensitive resin composition and partition walls |
| 10/16/2008 | US20080254386 Mixture of a blocked acrylic ester resin which becomes soluble in alkaline developer under action of an acid and sulfonium salt acid generator |
| 10/16/2008 | US20080254385 Photosensitive Resin for Flexographic Printing Plate |
| 10/16/2008 | US20080254384 Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes |
| 10/16/2008 | US20080254375 High refractive index change; flexibility; high sensitivity; low scattering; weatherproofing; durability; metal oxide matrix;photopolymerizable compound; blue, green lasers |
| 10/16/2008 | US20080254374 Mixture of diisocyanate, polyol, titanocene photoinitiator, acrylate monomer and amidine compound |
| 10/16/2008 | US20080254371 Method For Producing an Image on a Material Sensitive to a Used Radiation, Method For Obtaining a Binary Hologram (Variants) and Methods For Producing an Image by Using Said Hologram |
| 10/16/2008 | US20080253792 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 10/16/2008 | US20080252987 Projection Objective For Microlithography |
| 10/16/2008 | US20080252888 Apparatus for polarization-specific examination, optical imaging system, and calibration method |
| 10/16/2008 | US20080252876 System for Measuring the Image Quality of an Optical Imaging System |
| 10/16/2008 | US20080252869 Exposure apparatus and device fabrication method using the same |
| 10/16/2008 | US20080252865 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device |
| 10/16/2008 | US20080252864 Immersion exposure technique |
| 10/16/2008 | US20080252689 Liquid discharge head and method for manufacturing the same |
| 10/16/2008 | US20080251393 Comprising system of electrodes operating inside reaction chamber intended to contain system of reagents in solution, system of electrodes comprising at least one working nanoelectrode series, one counter electrode and one reference electrode; for detection of biological molecules |
| 10/16/2008 | DE19845444B4 Aufbau und Herstellungsverfahren für Elektroden für eine Hochdruckentladungslampe Construction and production process for electrode for a high pressure discharge lamp |
| 10/16/2008 | DE19502113B4 Verfahren zur Herstellung eines Resistmusters A process for producing a resist pattern |
| 10/16/2008 | DE102007017649A1 Verfahren zum Bestimmen der Fokuslage von mindestens zwei Kanten von Strukturen auf einem Substrat A method for determining the focal position of at least two edges of structures on a substrate |
| 10/15/2008 | EP1981066A1 Optical member holding apparatus, method for adjusting position of optical member, and exposure apparatus |
| 10/15/2008 | EP1980911A2 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method |
| 10/15/2008 | EP1980910A1 Photosensitive composition, display member, and process for producing the same |
| 10/15/2008 | EP1980892A1 Microscope apparatus |
| 10/15/2008 | EP1980890A1 Cata-dioptric imaging system, exposure device, and device manufacturing method |
| 10/15/2008 | EP1980565A1 Oil soluble radiation curable metal-containing compounds and compositions |
| 10/15/2008 | EP1660925A4 Apparatus and method for providing fluid for immersion lithography |
| 10/15/2008 | EP1611482A4 Run-off path to collect liquid for an immersion lithography apparatus |
| 10/15/2008 | EP1532219B1 Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming |
| 10/15/2008 | CN201134423Y Load moving container and bearing structure applicable to the same |
| 10/15/2008 | CN201134422Y Circular airflow structure of load moving container |
| 10/15/2008 | CN201134421Y Structure of photo masked inflating cabinet |
| 10/15/2008 | CN201134420Y System for keeping light shield clean |
| 10/15/2008 | CN201134009Y Workpiece station balancing positioning apparatus |
| 10/15/2008 | CN101288154A Transfer product, transfer product fabricating method, and transfer product arrangement position identifying method |
| 10/15/2008 | CN101288029A Top antireflective coating composition with low refractive index at 193 nm radiation wavelength |