Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2008
10/23/2008WO2008126606A1 Method for producing photosensitive resin plate or relief printing plate having recessed and projected pattern, and plate surface treating liquid used in the production method
10/23/2008WO2008126570A1 Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method
10/23/2008WO2008126526A1 Photosensitive resin composition and layered product
10/23/2008WO2008126455A1 Photosensitive resin composition, photosensitive film, method for forming pattern by using the photosensitive film, and printed board
10/23/2008WO2008125692A1 Triangulating design data and encoding design intent for microlithographic printing
10/23/2008WO2008125199A1 Aromatic urethane acrylates having a high refractive index
10/23/2008WO2008125003A1 Low etch cleaning composition for removing resist
10/23/2008WO2008125002A1 Cleaning composition for removing thick film resist
10/23/2008WO2008102259A3 Antireflective coating composition based on a silicon polymer
10/23/2008WO2008100718A3 Substrate heating method and apparatus
10/23/2008WO2005121903A3 System and method for improvement of alignment and overlay for microlithography
10/23/2008US20080261847 for removing low-k dielectric material, etch stop material, and/or metal stack material from rejected microelectronic device; hydrofluoric acid; pollution control, environment friendly
10/23/2008US20080261846 Comprise organic solvent, unneutralized inorganic phosphorus containing acid, and water; inhibit metal corrosion; short cleaning times and relatively low temperatures
10/23/2008US20080261160 Radiating plurality of banks with ultraviolet beams obliquely incident on top surfaces of substrate such that a wettability of the ink on top is lower than that of side surfaces; applying ink into the spaces; curing; photolithography; thermal bubble ink-jet printing or piezoelectrical device
10/23/2008US20080261159 Electrophoretic Display Device
10/23/2008US20080261158 Method of manufacturing printed circuit board
10/23/2008US20080261156 Buffer pattern formed on object layer in cell region, a hard mask layer remains on the object layer in the peripheral region; buffer layer is removed forming a cell hard mask pattern; minute pattern formed; minimization of variations or edge line roughness due to photolithography
10/23/2008US20080261155 Metallic Air-Bridges
10/23/2008US20080261154 Coating hydrophilic support with thermoplastic resin; photopolymerization using photoinitiator; exposure, heating, development; applying gum to remove unexposed material
10/23/2008US20080261153 Exposing imagewise a lithographic printing plate precursor comprising a support and an image-recording layer containing a binder polymer to cure an exposed area; anddevelopment; dispersion stability; scum removal; durability
10/23/2008US20080261152 possible to form a spiral pattern in which a shallow groove and a deep groove are connected as one groove only by drawing one spiral pattern during one process of the second electron beam irradiation process; reduce the etching time
10/23/2008US20080261151 Thermally Reactive Infrared Absorption Polymers and Their Use in a Heat Sensitive Lithographic Printing Plate
10/23/2008US20080261150 Stable formation of high precision fine patterns utilizing positive resist whose solubility increases in positive developer and decreases in negative developer upon irradiation
10/23/2008US20080261148 Having light transmissivity with respect to ultraviolet ray and durability for repeated use
10/23/2008US20080261147 Photoactive Compounds
10/23/2008US20080261146 Lithographic Printing Plate Precursor
10/23/2008US20080261128 Mask for semiconductor (integrated circuits) manufacture composed of a layer with a grain interface or a a material interface that provides enhanced etch selectivity, especially a tunable, etch resistant anti-reflective coating material and increased resistance to semiconductor manufacturing processes
10/23/2008US20080261127 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
10/23/2008US20080261125 Resist pattern and reflow technology
10/23/2008US20080261119 Large-Size Glass Substrate For Photomask and Making Method, Computer-Readable Recording Medium, and Mother Glass Exposure Method
10/23/2008US20080261028 Ablatable elements for making flexographic printing plates
10/23/2008US20080260235 System And Method Of Providing Mask Defect Printability Analysis
10/23/2008US20080259417 Holographic Recording Media
10/23/2008US20080259306 Apparatus and a method for illuminating a light-sensitive medium
10/23/2008US20080259228 Apparatus and a method for illuminating a light-sensitive medium
10/23/2008US20080258616 Electroluminescent element
10/23/2008US20080258365 Vibration Damper for Isolator
10/23/2008US20080258077 Superresolution in microlithography and fluorescence microscopy
10/23/2008US20080257873 Method for Producing Two-Dimensional Periodic Structures in a Polymeric Medium
10/23/2008DE112006003495T5 Maskenrohling und Maske Mask blank and mask
10/23/2008DE10329141B4 Faltungsgeometrien für EUV-Beleuchtungssysteme Folding geometries for EUV illumination systems
10/23/2008DE102008014832A1 Projektionsbelichtungsanlage für die Mikrolithographie Projection exposure system for microlithography
10/23/2008DE102008001216A1 Projektionsobjektiv für die Mikrolithographie Projection objective for microlithography
10/23/2008DE102007018140A1 Verfahren und System zur reproduzierbaren Positionierung eines Zielobjektes in das Wirkvolumen einer Laserstrahlung Method and system for reproducible positioning of a target object in the effective volume of laser radiation
10/23/2008DE102004055449B4 Verfahren und Vorrichtung zum thermischen Behandeln von Substraten Method and apparatus for thermal treatment of substrates
10/23/2008DE102004017031B4 Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben Of the same optical component of quartz glass, methods of making the component and using
10/23/2008DE10027984B4 Fotolithografiesystem mit einer Frequenzbereichsfiltermaske Photolithography system with a frequency domain filter mask
10/23/2008CA2683882A1 Aromatic urethane acrylates having a high refractive index
10/22/2008EP1983555A1 Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus and device manufacturing method
10/22/2008EP1983552A1 Semiconductor production system
10/22/2008EP1983551A1 Semiconductor production system
10/22/2008EP1983371A1 Stage apparatus, exposure apparatus, and device manufacturing method
10/22/2008EP1983362A1 Catadioptric imaging system, exposure device, and device manufacturing method
10/22/2008EP1983017A1 Curable composition containing thiol compound
10/22/2008EP1982824A2 Device and method for creating a three dimensional object using mask illumination
10/22/2008EP1982233A2 Method and device for the correction of imaging defects
10/22/2008EP1982232A2 Printing plate
10/22/2008EP1982217A1 Production of cavities that can be filled with a fluid material in an optical microtechnological component
10/22/2008EP1611486A4 Environmental system including a transport region for an immersion lithography apparatus
10/22/2008EP1487888B1 Polymerisable composition
10/22/2008EP1410436B1 Parallel, individually addressable probes for nanolithography
10/22/2008CN201138424Y Aligning mark mechanism for wafer aligning of projecting lens conversion
10/22/2008CN101292197A Etch features with reduced line edge roughness
10/22/2008CN101292196A Photosensitive resin composition and color filter
10/22/2008CN101292195A Imprint apparatus, imprint method, and mold for imprint
10/22/2008CN101291989A Fine particle-containing composition, ink for forming colored film for display, light-blocking film for display, light-blocking material, substrate with light-blocking film, color filter, liquid cryst
10/22/2008CN101291969A Polymer and compositions
10/22/2008CN101291763A Method for producing metal particle dispersion, metal particle dispersion, and colored composition, photosensitive transfer material, substrate with light-blocking image, color filter and liquid cryst
10/22/2008CN101290482A Cleaning fluid for cleaning plasma etching residue
10/22/2008CN101290481A Etching process for controlling characteristic size shrinkage
10/22/2008CN101290480A Developing solution composition
10/22/2008CN101290479A Angle decomposition scatter and detection method
10/22/2008CN101290478A Balance mass movement device based on five-rod device and its control method
10/22/2008CN101290477A Balancing damping station
10/22/2008CN101290476A Six freedom degree jiggle station
10/22/2008CN101290475A Method for improving characteristic line breadth homogeneity
10/22/2008CN101290474A Light shield maintenance process
10/22/2008CN101290473A Photosensitive resin composition and method of making the same
10/22/2008CN101290472A Green light resistance and colorful filtering substrate using same
10/22/2008CN101290471A Photoresist combination and laminating body
10/22/2008CN101290470A Base board for hologram recording medium and hologram recording medium
10/22/2008CN101290468A Mask preparation method
10/22/2008CN101290446A TFT-LCD array substrate and method of manufacture
10/22/2008CN101290420A Liquid crystal display panel and method for fabricating the same
10/22/2008CN101290416A Contact window
10/22/2008CN101290395A Minisize multifunctional optical devices and method for making same
10/22/2008CN101290371A Sub-wavelength grate structure polarizing film and its manufacture method
10/22/2008CN101290363A Method for controlling growing multiple layer film for making multiple-level micro-reflector
10/22/2008CN101290362A Silicon wet method corrosion for manufacturing multiple stage micro-reflector
10/22/2008CN101290361A Method for manufacturing multiple stage micro-reflector by double film alternating corrosion
10/22/2008CN100428527C Mask and its mfg. method, electroluminescent apparatus and its mfg. method, and electronic apparatus
10/22/2008CN100428420C Dry method photoresist removing technology used after Z3 MS etching
10/22/2008CN100428057C Air float support base for regulating air diaphragm two-way rigidity
10/22/2008CN100428056C Photosensitive lithographic printing plate forebody and its processing method
10/22/2008CN100428055C Photolithographic process, photomask and manufacturing thereof
10/22/2008CN100428038C Liquid crystal display device and method for fabricating the same
10/22/2008CN100428037C Liquid crystal display device and fabricating method thereof
10/22/2008CN100428036C Liquid crystal display device and method for fabricating the same
10/22/2008CN100428035C Liquid crystal display device and method of manufacturing the same
10/22/2008CN100428032C Liquid crystal display device and method for fabricating the same and display device
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