Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2008
10/30/2008DE19928742B4 Neue O-Acyloxim-Photostarter New O-acyloxime photoinitiator
10/30/2008DE102008000551A1 Verfahren zum Reinigen einer EUV-Lithographievorrichtung, Verfahren zur Messung der Restgasatmosphäre bzw. der Kontamination sowie EUV-Lithographievorrichtung A method for cleaning an EUV lithography apparatus, method for measuring the residual gas atmosphere or the contamination and EUV lithography apparatus
10/30/2008DE102007019570A1 Contacting arrangement for optical system and mirror arrangement, has component with surface and contacting material has electrically non-conducting medium, in which multiple particles are embedded
10/30/2008DE102007010223A1 Verfahren zur Bestimmung geometrischer Parameter eines Wafers und Verwendung des Verfahren bei der optischen Inspektion von Wafern A method for determining geometric parameters of a wafer and use of the method for the optical inspection of wafers
10/29/2008EP1986224A1 Exposure apparatus, exposing method, and device manufacturing method
10/29/2008EP1986223A1 Exposure apparatus, exposing method, and device manufacturing method
10/29/2008EP1986222A1 Exposure apparatus, exposing method, and device manufacturing method
10/29/2008EP1986221A1 Exposure method, exposure apparatus, photomask and photomask manufacturing method
10/29/2008EP1986213A2 Composition for forming electrodes and plasma display panel manufactured with the same
10/29/2008EP1986051A2 Lithographic apparatus and device manufacturing method
10/29/2008EP1986050A1 Device for printing and/or embossing substrates
10/29/2008EP1985616A1 Adamantane derivative, resin composition containing same, and optoelectronic member and sealing agent for electronic circuit using those
10/29/2008EP1984862A2 Plasmon tomography
10/29/2008EP1984789A1 Illumination system for microlithographic projection exposure apparatus comprising an illumination system of this type
10/29/2008EP1984788A1 Optical integrator for an illumination system of a microlithographic projection exposure apparatus
10/29/2008EP1984787A1 Illumination system for a microlithographic projection exposure apparatus
10/29/2008EP1984786A2 Radiation-sensitive compositions and imageable materials
10/29/2008EP1984457A2 Blue colour filters with enhanced contrast
10/29/2008EP1718474A4 Combined ablation and exposure system and method
10/29/2008EP1694506B1 Method and apparatus for printing a patterned layer on a flat substrate with a flat-type-bed
10/29/2008EP1633823B1 Process for etching a metal or alloy surface
10/29/2008EP1611485A4 Environmental system including vaccum scavange for an immersion lithography apparatus
10/29/2008EP1435022B1 Aqueous developable photoimageable thick film compositions with photospeed enhancer
10/29/2008EP1360712B9 Post chemical-mechanical planarization (cmp) cleaning composition
10/29/2008EP1304340B1 Resins for resists and chemically amplifiable resist compositions
10/29/2008EP1078506B1 Laser pattern generator
10/29/2008CN201141984Y Laser holography image and text molding device
10/29/2008CN201141983Y Molding device for producing identical-edition holography molding film
10/29/2008CN201141770Y Double-frequency laser interfere signal receiver with automatically adjustable high-speed gain
10/29/2008CN101297244A 光刻系统和投影方法 Projection lithography system and method
10/29/2008CN101297243A Microlithography projection objective
10/29/2008CN101297242A Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board
10/29/2008CN101297223A Substrate with septum for use in ink jet color filter, method for manufacture of the substrate, color filter provided with the substrate, method for manufacture of the color filter, and liquid crystal
10/29/2008CN101296999A Siloxane resin composition and method for producing same
10/29/2008CN101296952A Anti-reflective coatings
10/29/2008CN101295614A Composition for forming electrodes and plasma display panel manufactured with the same
10/29/2008CN101295553A X ray holography diffraction grating beam divider
10/29/2008CN101295145A Hydrogen ashing enhanced with water vapor and diluent gas
10/29/2008CN101295144A Photoresist stripping liquid
10/29/2008CN101295143A Photoresist leftover cleaning agent
10/29/2008CN101295142A Printed circuit board and manufacturing method thereof
10/29/2008CN101295141A Exposure device
10/29/2008CN101295140A Catadioptric projection optical system, projection aligner, and exposure method
10/29/2008CN101295139A Method for exposing photo-sensitive sam film and method for manufacturing semiconductor device
10/29/2008CN101295138A Photomask haze reduction via ventilation
10/29/2008CN101295137A Hologram recording material, process for producing the same and hologram recording medium
10/29/2008CN101295136A Light-sensitive polymer composition
10/29/2008CN101295135A Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
10/29/2008CN101295134A Colored photopolymerizable composition, color filter using the same and method of producing color filter
10/29/2008CN101295133A Light transmissive stamper, production method thereof, and production method of multilayer optical recording medium
10/29/2008CN101295132A Method of forming a thin film pattern and method of fabricating a liquid crystal display device
10/29/2008CN101295131A Method for producing nano-structure on insulated underlay
10/29/2008CN101295089A Substrate processing apparatus
10/29/2008CN101293425A Process for manufacturing fine-narrow ink supply groove suitable for ink jet head chip
10/29/2008CN101293239A Coating method and pattern forming method
10/29/2008CN100429758C Substrate alignment apparatus, substrate processing apparatus, and substrate transfer apparatus
10/29/2008CN100429749C Neutral particle beam lithography
10/29/2008CN100429748C Exposure apparatus and method for producing device
10/29/2008CN100429700C Mask forming method and information recording medium manufacturing method
10/29/2008CN100429579C Manufacturing method for photoetching device and component, substrate fixer
10/29/2008CN100429569C Semi permeable type liquid crystal display, and producing method
10/29/2008CN100429568C Printing apparatus and fabricating method thereof
10/29/2008CN100429563C Film forming method,distributing pattern forming method,semiconductor device mfg method
10/29/2008CN100429299C Cleaning liquid composition after chemical and mechanical grinding
10/28/2008US7444616 Method for error reduction in lithography
10/28/2008US7443948 Illumination system particularly for microlithography
10/28/2008US7443511 Integrated plane mirror and differential plane mirror interferometer system
10/28/2008US7443487 Exposure apparatus
10/28/2008US7443482 Liquid jet and recovery system for immersion lithography
10/28/2008US7442959 Semiconductor device having identification number, manufacturing method thereof and electronic device
10/28/2008US7442951 Reticle for use in rapid determination of average intrafield scanning distortion having transmissivity of a complementary alignment attribute being different than the transmissivity of at least one alignment attribute
10/28/2008US7442908 Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate
10/28/2008US7442754 Molecular imprinting of small particles, and production of small particles from solid state reactants
10/28/2008US7442675 Mixture of quaternary ammonium hydroxide, water soluble solvent, water, corrosion resistant compound and potassium hydroxide; removal photoresist films, metal residues
10/28/2008US7442493 Lithographic printing method
10/28/2008US7442492 comprising supports, photosensitive layer having infrared absorbing dye, polymerization initiatiators, polymerizable compounds and binder polymers, and protective layers
10/28/2008US7442491 continuously cast flat-rolled aluminum alloy blank which can achieve a lithographic printing plate having a uniform electrolytically roughened surface and excellent press life
10/28/2008US7442489 Photoresist composition and method of forming a photoresist pattern using the same
10/28/2008US7442488 Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode
10/28/2008US7442487 Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
10/28/2008US7442486 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
10/28/2008US7442485 Lithographic process involving on press development
10/28/2008US7442477 Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted
10/28/2008US7442474 Reticle for determining rotational error
10/28/2008US7442336 Capillary imprinting technique
10/28/2008US7442330 Method and apparatus of manufacturing reflector
10/28/2008US7442316 Microcontact printing method using imprinted nanostructure and nanostructure thereof
10/28/2008US7442028 Molding apparatus and molding method
10/23/2008WO2008127930A1 Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article
10/23/2008WO2008127785A1 Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride
10/23/2008WO2008127549A1 Negative-working imageable elements and methods of use
10/23/2008WO2008127036A2 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
10/23/2008WO2008126926A1 Exposure method and electronic device manufacturing method
10/23/2008WO2008126925A1 Exposure apparatus, exposure method, and electronic device manufacturing method
10/23/2008WO2008126921A1 Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin
10/23/2008WO2008126818A1 Photosensitive resin composition
10/23/2008WO2008126804A1 Composition for forming under-resist film
10/23/2008WO2008126722A1 Positive photosensitive composition
10/23/2008WO2008126680A1 Photosensitive resin composition, process for producing resist pattern, layered product, and device
10/23/2008WO2008126625A1 Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method
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