| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/06/2008 | US20080274428 Coating hydrophilic support with hydrophibic thermoplastic resin; photopolymerization using photoinitiator; exposure; heating; development; applying gum to remove unexposed material |
| 11/06/2008 | US20080274427 Method of Making a Lithographic Printing Plate |
| 11/06/2008 | US20080274426 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography |
| 11/06/2008 | US20080274423 Optical information recording medium and method of recording information |
| 11/06/2008 | US20080274422 Preparation process of chemically amplified resist composition |
| 11/06/2008 | US20080274417 Variable Mask Field Exposure |
| 11/06/2008 | US20080271912 Printed circuit board and manufacturing method thereof |
| 11/06/2008 | US20080271752 Cleaning method, particle removing method, cleaning apparatus, and cleaning liquid |
| 11/06/2008 | US20080271627 Lithographic printing press and method for on-press imaging laser sensitive lithographic plate |
| 11/06/2008 | DE102007019831A1 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Illumination device of a microlithography projection exposure apparatus |
| 11/06/2008 | DE102006004230B4 Verfahren zur Herstellung einer Maske für die lithografische Projektion eines Musters auf ein Substrat A method of making a mask for the lithographic projection of a pattern on a substrate |
| 11/05/2008 | EP1988426A1 Measurement method, measurement apparatus, exposure apparatus, and device fabrication method |
| 11/05/2008 | EP1987399A2 Merging a mask and a printing plate |
| 11/05/2008 | EP1987398A2 Exposure system |
| 11/05/2008 | EP1987397A1 Writing apparatuses and methods |
| 11/05/2008 | EP1987396A1 Uv-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer |
| 11/05/2008 | EP1987390A1 Method of aligning an optical system |
| 11/05/2008 | EP1913448A4 Photoresist stripper composition for semiconductor manufacturing |
| 11/05/2008 | EP1771753A4 Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth |
| 11/05/2008 | EP1759245B1 Modified metal mold for use in imprinting processes |
| 11/05/2008 | EP1743406B1 Graphic-arts laser imaging with reduced-length laser cavities and improved performance |
| 11/05/2008 | EP1452917B1 Positive resist composition and method of forming resist pattern from the same |
| 11/05/2008 | EP1393546B1 A socket contact and feed-through device |
| 11/05/2008 | CN101300529A Thinner composition for removing photoresist |
| 11/05/2008 | CN101300528A Pattern exposure method and pattern exposure apparatus |
| 11/05/2008 | CN101300527A Antimony-free photocurable resin composition and three dimensional article |
| 11/05/2008 | CN101300317A Water castable - water strippable top coats for 193 nm immersion lithography |
| 11/05/2008 | CN101300289A Silsesquioxane-titania hybrid polymers |
| 11/05/2008 | CN101299134A Lithographic apparatus and method |
| 11/05/2008 | CN101299133A Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
| 11/05/2008 | CN101299132A Aligning mark used for photolithography equipment aligning system and its use method |
| 11/05/2008 | CN101299131A Preparation of chemical reinforced type resist |
| 11/05/2008 | CN101299130A Substrate for holograph recording medium and holograph recording medium |
| 11/05/2008 | CN100430829C Method of forming optical images |
| 11/05/2008 | CN100430828C Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern |
| 11/05/2008 | CN100430809C Liquid crystal display device and its manufacturing method |
| 11/05/2008 | CN100430759C Method for producing color filter sheet |
| 11/05/2008 | CN100430432C Silicon-containing polymer, process for rpoducing the same, heat-resistant resin composition, and heat-resistant film |
| 11/05/2008 | CN100430400C Cyclic-aliphatic epoxy compound containing pheneylethylene cinnamyl or maleimide functional group |
| 11/05/2008 | CN100430385C Improvement in the storage stability of photoinitiators |
| 11/04/2008 | US7447559 Apparatus and method of forming a photoresist pattern, and repair nozzle |
| 11/04/2008 | US7446952 Catadioptric projection objective |
| 11/04/2008 | US7446873 Reflective alignment grating |
| 11/04/2008 | US7446858 Exposure method and apparatus, and method for fabricating device |
| 11/04/2008 | US7446857 Image forming method and apparatus |
| 11/04/2008 | US7446852 Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project |
| 11/04/2008 | US7446851 Exposure apparatus and device manufacturing method |
| 11/04/2008 | US7446324 Methods utilizing scanning probe microscope tips and products thereof or produced thereby |
| 11/04/2008 | US7446155 Cross-linked networks containing nanoscopic reinforcing domains |
| 11/04/2008 | US7446057 Fabrication method |
| 11/04/2008 | US7445883 Custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided; patterning the polarized beam of radiation; projecting the patterned beam of radiation onto a target portion of the wafer |
| 11/04/2008 | US7445882 Image recording material |
| 11/04/2008 | US7445880 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| 11/04/2008 | US7445873 Writing with light beam; focusing light beams; masking; scanning |
| 11/04/2008 | CA2328819C Iodonium salts as latent acid donors |
| 10/30/2008 | WO2008131377A1 Near infrared dyes |
| 10/30/2008 | WO2008131032A1 Methods of forming a stamp, methods of patterning a substrate, and a stamp and a patterning system for same |
| 10/30/2008 | WO2008130847A1 Extensions of self-assembled structures to increased dimensions via a 'bootstrap' self-templating method |
| 10/30/2008 | WO2008130594A1 Diffractive optical element for euv lithography |
| 10/30/2008 | WO2008130231A1 Lithographic apparatus and device manufacturing method |
| 10/30/2008 | WO2008130044A1 Projection optical system, exposure apparatus, and device manufacturing method |
| 10/30/2008 | WO2008129986A1 Colored resin composition, color filter, liquid crystal display device, and organic el display |
| 10/30/2008 | WO2008129982A1 Substrate processing method and system, and device manufacturing method |
| 10/30/2008 | WO2008129981A1 Photosensitive lithographic printing plate material |
| 10/30/2008 | WO2008129965A1 Colored composition and color filter therefrom |
| 10/30/2008 | WO2008129964A1 Method for pattern formation, and resist composition, developing solution and rinsing liquid for use in the method for pattern formation |
| 10/30/2008 | WO2008129776A1 Exposure apparatus and device manufacturing method |
| 10/30/2008 | WO2008129762A1 Moving body apparatus, apparatus for forming pattern, method of forming pattern, method of producing device, method of producing moving body apparatus, and method of driving moving body |
| 10/30/2008 | WO2008128419A1 Cleaning composition for removing residues from plasma etch |
| 10/30/2008 | WO2008101676A3 Catadioptric projection objective |
| 10/30/2008 | WO2008095695A3 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus |
| 10/30/2008 | WO2008075952A3 Reducing fast ions in a plasma radiation source having a second activation source |
| 10/30/2008 | US20080269506 Chemical amplification type resist composition |
| 10/30/2008 | US20080269096 Formulations for Cleaning Ion-Implanted Photoresist Layers from Microelectronic Devices |
| 10/30/2008 | US20080268383 Semiconductor wafer production; improving throughput utilizing two processing blocks; easily created substrate carrying computer program |
| 10/30/2008 | US20080268382 Black pigment containing a mixed oxide of Co/Mn/Cu; Co/Mn/Cu/O; Co/Mn/Cu/O; Co/Mn/Ni/O; Co/Cu/Fe/O; Co/Mn/Cu/Ni/O; Co/Ni/ Fe/Mn/O; spinel structure; suppressed in color degradation at high temperatures, and thus enables to form a pattern having excellent color and degree of blackness after sintering |
| 10/30/2008 | US20080268381 Pattern forming method performing multiple exposure so that total amount of exposure exceeds threshold |
| 10/30/2008 | US20080268380 capable of reflecting an electromagnetic wave in an extreme ultraviolet region, arranged along an optical axis of the electromagnetic wave, and at least two of the mirrors have reflecting wavelength characteristics being different from each other, in a wavelengh region other than extreem uv region |
| 10/30/2008 | US20080268379 a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator |
| 10/30/2008 | US20080268377 dropping polymerization of monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA) in presence of dimethyl-2,2'-azobis(2-methylpropionate) initiator, solvent extraction, redissolving, desolventing |
| 10/30/2008 | US20080268376 Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound |
| 10/30/2008 | US20080268375 copolymer of 2-methyl-2-adamantyl methacrylate, gamma -butyrolactone methacrylate, norbornane lactone methacrylate, 3-hydroxy-1-adamantyl acrylate, upon action by an acid, increases alkali solubility; an acid generating agent e.g. 4-methylphenyldiphenylsulfonium nonafluorobutanesulfonate generates acid |
| 10/30/2008 | US20080268374 Methyl methacrylate-styrene-benzyl methacrylate-methacrylic acid copolymer binder, a photopolymerizable compound such as an adduct of hexamethylene diisocyanate and tetraethylene oxide monomethacrylate; N-methylacridone photosensitizer, 2,2-bis(o-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole initiator |
| 10/30/2008 | US20080268372 Lithographic printing plate precursor |
| 10/30/2008 | US20080268371 Polyester, polyurethane, polyether, polyamide, polyurea formed by a monomer containing two imine groups in the back bone and two end groups containing OH, NR2H, COOH, COCL, COOR, NCO and NCS group polymerized with other monomers; a photolatent or heat latent catalyst such as onium compounds, triazines |
| 10/30/2008 | US20080268370 Using resin which becomes soluble in alkaline developer under action of an acid and sulfonium acid generator; lithography; improved resolution; reduce edge roughness of pattern |
| 10/30/2008 | US20080268369 Organic Film Composition and Method for Forming Resist Pattern |
| 10/30/2008 | US20080268354 Colored photopolymerizable composition, color filter using the same and method of producing color filter |
| 10/30/2008 | US20080268352 Obtaining a flatness of a surfaces of a substrate when a mask pattern is formed; forming a conductive film on the another surface of the substrate; removing the conductive film selectively to form openings in the conductive film based on the flatness |
| 10/30/2008 | US20080268349 Metal oxide of Silicon and Zirconium, coordinated to an aromatic carboxylic acid and a photopolymerizable compound; high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low dimensional change; green and blue laser |
| 10/30/2008 | US20080268210 Manufacturing method of electronic component |
| 10/30/2008 | US20080266538 Lithographic processing cell, lithographic apparatus, track and device manufacturing method |
| 10/30/2008 | US20080266533 Exposure Apparatus, Exposure Method, and Method for Producing Device |
| 10/30/2008 | US20080266532 Coater/developer, coating/developing method, and storage medium |
| 10/30/2008 | US20080266502 Method of producing uv stable liquid crystal alignment |
| 10/30/2008 | US20080265772 Composition for forming electrodes and plasma display panel manufactured with the same |
| 10/30/2008 | US20080265415 Nonlithographic Method to Produce Self-Aligned Mask, Articles Produced by Same and Compositions for Same |
| 10/30/2008 | US20080265382 Nonlithographic Method to Produce Self-Aligned Mask, Articles Produced by Same and Compositions for Same |
| 10/30/2008 | US20080265319 Method of providing enhanced breakdown by diluted doping profiles in high-voltage transistors |
| 10/30/2008 | US20080265159 Sample surface inspection apparatus and method |