| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/12/2008 | CN101304076A Method for processing cathode insulated column of organic luminous display device |
| 11/12/2008 | CN101304003A Single slice integration technique for diffraction microlens array and ultraviolet focal plane array |
| 11/12/2008 | CN101303970A Photolithography process including a chemical rinse |
| 11/12/2008 | CN101303968A Substrate processing apparatus |
| 11/12/2008 | CN101303538A Exposure apparatus |
| 11/12/2008 | CN101303537A Process for wafer backside polymer removal and wafer front side photoresist removal |
| 11/12/2008 | CN101303536A Exposure apparatus and device producing method |
| 11/12/2008 | CN101303535A Lithographic apparatus and sensor calibration method |
| 11/12/2008 | CN101303534A Aligning mark structure for aligning system of photolithography equipment |
| 11/12/2008 | CN101303533A Aligning system, aligning method for photolithography equipment and enhancement type aligning mark |
| 11/12/2008 | CN101303532A Six-freedom degree precision positioning platform capable of switching station |
| 11/12/2008 | CN101303531A A wafer chuck and a method of forming a wafer chuck |
| 11/12/2008 | CN101303530A Preparation exhaust device for slit coating machine |
| 11/12/2008 | CN101303529A High viscosity coating liquid coating device of slit coating machine and coating method thereof |
| 11/12/2008 | CN101303528A Photocuring resin composition, dry film, and print circuit board |
| 11/12/2008 | CN101303527A Photocuring resin composition, dry film, curing product and print circuit board |
| 11/12/2008 | CN101303526A Phenolic polymers and photoresists comprising same |
| 11/12/2008 | CN101303525A Double-pattern exposure process |
| 11/12/2008 | CN101303524A Full forbidden region three-dimensional photon crystal stamp molding method and full forbidden region three-dimensional photon crystal structure |
| 11/12/2008 | CN101303523A Method for manufacturing thin film pattern layer and ultraviolet light source apparatus |
| 11/12/2008 | CN101303522A Colored filter with spacer, liquid crystal display device and method for making the same |
| 11/12/2008 | CN101303455A Beam divider irrelevant to sub-wave length grating vitreous body inner polarization and preparation method thereof |
| 11/12/2008 | CN101302354A Preparation of pigment particle agglutination dispersion, resin composition and color filter |
| 11/12/2008 | CN101301828A Cloth chromatography thermoprint method |
| 11/12/2008 | CN101301644A Liquid material supply device, bubble discharge device and liquid material supply method |
| 11/12/2008 | CN101301599A Optical cleaning device |
| 11/12/2008 | CN100433254C Pattern forming process |
| 11/12/2008 | CN100433253C Exposure apparatus, exposure method, and method for producing device |
| 11/12/2008 | CN100433252C Apparatus for and method of processing substrate subjected to exposure process |
| 11/12/2008 | CN100433078C Tin printing hidden antifake mark and producing method |
| 11/12/2008 | CN100432841C Immersion photolithographic method and instrument with megasonic rinse |
| 11/12/2008 | CN100432840C Optical adjacent correction for mask pattern during photoetching process |
| 11/12/2008 | CN100432839C Photoresist composite and image forming method using the same |
| 11/12/2008 | CN100432838C Photoresist polymer and photoresist composition containing the same |
| 11/12/2008 | CN100432837C Thiopene-containing photo acid generators for photolithography |
| 11/12/2008 | CN100432813C TFT LCD structure and producing method |
| 11/12/2008 | CN100432812C Pixel structure of liquid crystal display of thin film transistor, and fabricating method |
| 11/12/2008 | CN100432811C Pixel structure of TFT-LCD device and its manufacturing method |
| 11/12/2008 | CN100432809C Gray mask and method for manufacturing gray mask |
| 11/12/2008 | CN100432806C Array substrate of liquid crystal display and fabrication method thereof |
| 11/12/2008 | CN100432122C Novel surface-active polysiloxane photoinitiators |
| 11/11/2008 | US7451429 Computer automated method for optimizing an integrated circuit pattern in a layout verification process |
| 11/11/2008 | US7451068 Method and apparatus for generating an OPC segmentation based on modeled intensity gradients |
| 11/11/2008 | US7450748 Mask inspection process accounting for mask writer proximity correction |
| 11/11/2008 | US7450312 Optical projection lens system |
| 11/11/2008 | US7450301 Reflective projection lens for EUV-photolithography |
| 11/11/2008 | US7450249 Position sensor |
| 11/11/2008 | US7450232 Generic interface for an optical metrology system |
| 11/11/2008 | US7450219 Reticle-carrying container |
| 11/11/2008 | US7450216 Immersion exposure technique |
| 11/11/2008 | US7450215 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| 11/11/2008 | US7450191 Method and apparatus for fabricating flat panel display |
| 11/11/2008 | US7449704 EUV light source |
| 11/11/2008 | US7449689 Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method |
| 11/11/2008 | US7449573 acid generators which generates a sulfonic acid having one or more SO3H groups and one or more SO2 bonds upon irradiation with an actinic ray or a radiation |
| 11/11/2008 | US7449408 Method for manufacturing semiconductor device |
| 11/11/2008 | US7449349 Processing schedule creating method, coating and developing apparatus, pattern forming apparatus and processing system |
| 11/11/2008 | US7449284 applying a photomasking layer on the surfaces of substrates, then illuminating using electromagnetic radiation from a light source a layer of photoresists, aligning a pattern on a reticle and exposing a portion of the layer of photomask to form a second alignment mark on the substrate |
| 11/11/2008 | US7449282 Fluorescent brightening agent containing a distryrylbenzene structure; a hexaarylbiimidazole activator; a monomer; and a polyurethane resin binder from a diol having a carboxyl group, a diol compound having a logP value of less than 0, and a diol compound having a logP value of 0 or more; stability |
| 11/11/2008 | US7449281 Photosensitive resin composition for black matrix |
| 11/11/2008 | US7449280 Photoimageable coating composition and composite article thereof |
| 11/11/2008 | US7449277 Positive resist compositions and patterning process |
| 11/11/2008 | US7449276 Positive photoresist composition and method for forming resist pattern |
| 11/11/2008 | US7449264 Optical path includes an image plane, a reflective reticle mask that causes different shifts in locations at the image plane of best focus of features having different sizes or pitches, and a reflective surface including a spherical aberration to compensate for the shifts in the locations of best focus |
| 11/11/2008 | US7449230 Topography; forming a thin, conformal layer on substrate surface, removing layer from bottomwalls so as to yield holes, trenches; gate layers, dopes, dielectric patterning, damascene processes, packaging, electrodeposition, chemical vapor deposition, sputtering |
| 11/11/2008 | US7448763 Optical subassembly and projection objective in semiconductor lithography |
| 11/06/2008 | WO2008134498A1 Embossing |
| 11/06/2008 | WO2008133312A1 Photosensitive composition, partition wall, black matrix, and method for producing color filter |
| 11/06/2008 | WO2008133311A1 Resist protective film composition for immersion lithography |
| 11/06/2008 | WO2008133300A1 Polyimide precursor, polyimide, and coating solution for under layer film for image formation |
| 11/06/2008 | WO2008133270A1 Radiation-sensitive resin composition |
| 11/06/2008 | WO2008133254A1 Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror |
| 11/06/2008 | WO2008133234A1 Optical element holding device, lens barrel, exposure device, and device manufacturing method |
| 11/06/2008 | WO2008133191A1 Multilayer-film reflective mirror and euv optical exposure apparatus comprising same |
| 11/06/2008 | WO2008133151A1 Method for production of phthalocyanine pigment nanoparticle dispersion; method for production of ink-jet ink for color filter comprising the dispersion; colored photosensitive resin composition, photosensitive transcription material and color filter each comprising the dispersion; and liquid crystal display device and ccd |
| 11/06/2008 | WO2008133105A1 Gravure plate with cushion property and process for producing the same |
| 11/06/2008 | WO2008133080A1 Color filter, liquid crystal display device and hardening composition to be used in the production of the same |
| 11/06/2008 | WO2008133055A1 Method for production of photosensitive resin plate having concave-convex shape or letterpress printing plate, and printing surface treatment solution for use in the method |
| 11/06/2008 | WO2008133011A1 Color filter, method for manufacturing the color filter, and display device |
| 11/06/2008 | WO2008132966A1 Compound, acid generator, resist composition, and method for forming resist pattern |
| 11/06/2008 | WO2008132960A1 Novel polyimide precursor composition and use thereof |
| 11/06/2008 | WO2008132914A1 Polyimide composition and flexible wiring board |
| 11/06/2008 | WO2008132868A1 Multilayer-film reflective mirror and euv optical exposure apparatus comprising same |
| 11/06/2008 | WO2008132843A1 Photosensitive resin composition, dry film, and processed work made with the same |
| 11/06/2008 | WO2008132842A1 Photosensitive resin composition, dry film, and processed product using the dry film |
| 11/06/2008 | WO2008132799A1 Measuring method, exposure method, and device fabricating method |
| 11/06/2008 | WO2008132596A2 Element for defocusing tm mode for lithography |
| 11/06/2008 | WO2008132529A1 Imaging features with a plurality of scans |
| 11/06/2008 | WO2008132528A1 Registering patterns of features by adjusting the pitch of image swaths |
| 11/06/2008 | WO2008131930A1 Mirror matrix for a microlithographic projection exposure apparatus |
| 11/06/2008 | WO2008131928A1 Illumination system for illuminating a mask in a microlithographic exposure apparatus |
| 11/06/2008 | WO2006066100A3 Method and apparatus for laser dicing |
| 11/06/2008 | US20080276216 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 11/06/2008 | US20080275154 prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure |
| 11/06/2008 | US20080274869 Quartz Glass Blank and Method for Producing Said Blank |
| 11/06/2008 | US20080274433 Removal development solution using water based cleaniong solution; then surfactant; rotation; controlling times |
| 11/06/2008 | US20080274432 Heat curable; mixture of hydrolytic condensation of a silicon compound using acid catalyst; second compound is hydrolytic condensation of a silicon compound in presence of basic catalyst; hydroxide or organic acid salt of Group 1a metal; organic acid; alcohol containing ether groups and solvent |
| 11/06/2008 | US20080274431 Photolithography; miniaturized semiconductors; mixing a resin and crosslinking agent in a solvent |
| 11/06/2008 | US20080274430 mixture of protective coating and utraviolet radiation blocking agent; insoluble in ester-like solvent after irradiation; shield for electronic device |
| 11/06/2008 | US20080274429 Plate includes on substrate a photosensitive layer developable with ink or a fountain solution; hardening upon exposure to radiation; white light stability; forming visible images; increase hydrophobic of substrate |