Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2008
11/19/2008EP1849041B1 Lithographic method
11/19/2008EP1801145B1 Process for producing cured product of photosensitive resin
11/19/2008EP1720714B1 Lightweight offset plates, preparation and use thereof
11/19/2008EP1421032B1 Compositions comprising rigid-rod polymers and carbon nanotubes and process for making the same
11/19/2008EP1393114B1 Correction of birefringence in cubic crystalline projection lenses and optical systems
11/19/2008EP1159650B1 Flat bed platesetter system
11/19/2008EP1042791B1 Improved techniques for etching with a photoresist mask
11/19/2008EP0995148B1 Method for producing active or passive components on a polymer basis for integrated optical devices
11/19/2008CN101310223A Photoactive compounds
11/19/2008CN101310222A Photosensitive composition, phososensitive film, permanent pattern, and method for formation of the permanent pattern
11/19/2008CN101308791A Manufacturing method for semiconductor device rear part through hole
11/19/2008CN101308335A Method for removing photoresist layer and manufacture method of semiconductor element using the method
11/19/2008CN101308334A High erosion-resistant glue developing solution and method for making same
11/19/2008CN101308333A Imaging device in a projection exposure machine
11/19/2008CN101308332A Method and its system for controlling photolithography exposure dosage
11/19/2008CN101308331A Two time graph exposure method utilizing developing filler material
11/19/2008CN101308330A Two time graph exposure method utilizing developing filler material
11/19/2008CN101308329A Coating compositions
11/19/2008CN101308328A Chemically amplified positive resist composition
11/19/2008CN101308327A Radiation-sensed resin composition, layer insulation film, microlens and forming method thereof
11/19/2008CN101308326A Sensitized material, light resistance material and semiconductor assembly manufacture method
11/19/2008CN101308325A Manufacturing method of mask blank and manufacturing method of photomask
11/19/2008CN101308230A Isolator silicon based three-dimensional wedge-shaped spot-size converter and method for making same
11/19/2008CN101308219A Method for constructing anti-reflection microstructure using single layer nanometer particle as etching blocking layer
11/19/2008CN101307116A Ultraviolet cured resin, method for preparing same and composition containing the resin
11/19/2008CN101306995A Double naphthyl alcohol derivates and uses thereof
11/19/2008CN100435358C Adjustment of masks by re-flow
11/19/2008CN100435355C Gate electrode and manufacturing method thereof
11/19/2008CN100435285C A method for preparing the nano-electrode with the negative electronic erosion-resisting agent
11/19/2008CN100435212C Method of manufacturing a magnetic head
11/19/2008CN100435026C Developer-soluble metal alkoxide coatings for microelectronic applications
11/19/2008CN100435009C Liquid crystal display panel and fabricating method thereof
11/19/2008CN100434961C Lighting optical device
11/19/2008CN100434952C Self-aligning doping process suitable for step structure
11/19/2008CN100434947C Color filter substrate and method of fabricating the same
11/19/2008CN100434946C High diffraction efficient binary phase scattering grating and its manufacturing method
11/18/2008US7453643 Blazed diffractive optical element and projection objective for a microlithographic projection exposure apparatus
11/18/2008US7453641 Structures and methods for reducing aberration in optical systems
11/18/2008US7453583 Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty
11/18/2008US7453570 Mark position measuring method and apparatus
11/18/2008US7453560 Method of evaluating optical element
11/18/2008US7453550 Exposure apparatus, exposure method, and method for producing device
11/18/2008US7453071 Contamination barrier and lithographic apparatus comprising same
11/18/2008US7452921 for use in radiation curing; printing inks or varnishes; 4-Piperazinoacetophenone
11/18/2008US7452660 Method for resist strip in presence of low K dielectric material and apparatus for performing the same
11/18/2008US7452659 nanofabricated system enables monitoring of the addition or removal of molecular species or proteins from a junction by monitoring the electronic properties of the junction; to utilize films of a single molecule in thickness for patterning a surface
11/18/2008US7452657 comprising one of a tannin and a derivative thereof, a crosslinking agent and a polymer; formation of a fine, highly-detailed resist pattern; nanoedge roughness can be suppressed
11/18/2008US7452656 Selectively electroplated antenna comprising a directly electroplateable resin (DER); use e.g. with radio frequency id tags (RFID)
11/18/2008US7452655 high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces
11/18/2008US7452639 Photomask with photoresist test patterns and pattern inspection method
11/18/2008US7452638 Negative-working radiation-sensitive compositions and imageable materials
11/18/2008US7452574 Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
11/18/2008CA2375512C Oil soluble metal-containing compounds, compositions and methods
11/18/2008CA2317031C Process for coating a solution onto a substrate
11/13/2008WO2008137922A1 Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer
11/13/2008WO2008136873A1 Determining a process model that models the impact of car/peb on the resist profile
11/13/2008WO2008136666A2 Image sensor for lithography
11/13/2008WO2008136499A1 Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same
11/13/2008WO2008136372A1 Photoresist base material and photoresist composition containing the same
11/13/2008WO2008135810A2 Method and apparatus for designing an integrated circuit
11/13/2008WO2008135320A1 Oxygen inhibition of a curable material during structuring of substrates
11/13/2008WO2008117308A3 Novel diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof
11/13/2008WO2008091279A3 Etching and hole arrays
11/13/2008WO2008071363B1 Hybrid cationic curable coatings
11/13/2008WO2008053418A3 Relief layer and imprint method for making the same
11/13/2008WO2007115105B1 Method for making an improved thin film solar cell interconnect using etch and deposition processes
11/13/2008US20080280803 Aqueous solution of sulfuric acid, hydrogen peroxide, H2SiF6, HBF4; clean residual polymers from aluminium or aluminium-containing surfaces, during the production of semiconductor elements
11/13/2008US20080280452 Method for stripping photoresist
11/13/2008US20080280381 Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key
11/13/2008US20080280235 Polar organic solvent, di or polyamine, corrosion inhibitor of 8-hydroxyquinoline, benzotriazoles, catechol, monosaccharides, mannitol, sorbitol, arabitol, xylitol, erythritol, alkane diols
11/13/2008US20080280232 Method of forming pattern of semiconductor device
11/13/2008US20080280231 A bushing portion of the BDA-plate with aspect ratio (height/width) less than 1, A length of the BDA-plate is shorter than 75 mu m; photolithographically patterned BDA micro rotary motor for micro-electromechanical systems
11/13/2008US20080280228 Photosensitive Planographic Printing Plate
11/13/2008US20080280227 Exposing printing plates using light emitting diodes
11/13/2008US20080280217 Patterning A Single Integrated Circuit Layer Using Multiple Masks And Multiple Masking Layers
11/13/2008US20080280110 Method of activating a silicon surface for subsequent patterning of molecules onto said surface
11/13/2008US20080280099 Silicon Substrates with Thermal Oxide Windows for Transmission Electron Microscopy
11/13/2008US20080279443 Mask inspection process accounting for mask writer proximity correction
11/13/2008US20080279442 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
11/13/2008US20080278813 Ultraviolet Polarization Beam Splitter with Minimum Apodization
11/13/2008US20080278703 Immersion exposure apparatus and method of manufacturing a semiconductor device
11/13/2008US20080278699 Method For Distortion Correction In A Microlithographic Projection Exposure Apparatus
11/13/2008US20080278696 Lithographic apparatus
11/13/2008US20080278068 Method of Patterning a Thin Film
11/13/2008US20080277276 Photopolymerizable Silicone Materials Forming Semipermeable Membranes for Sensor Applications
11/13/2008US20080276813 Method and Apparatus for Printing a Patterned Layer on a Flatsubstate with a Flat-Type-Bed
11/13/2008DE102008013567A1 Lighting device for microlithographic projection exposure system, has optical element adjusting polarization conditions of radiations, where conditions are different from each other and radiations are deflected in different directions
11/13/2008DE102008001497A1 Optical subsystem i.e. projection lens, for projection illumination system for semiconductor lithography, has set of optical elements, where two optical elements are arranged in different places in subsystem and are moveable together
11/13/2008DE102007022109A1 Vorrichtung zum Erzeugen eines Reflexionshologramms hoher Auflösung Apparatus for producing a reflection hologram high resolution
11/13/2008DE102007021823A1 Messsystem mit verbesserter Auflösung für Strukturen auf einem Substrat für die Halbleiterherstellung und Verwendung von Blenden bei einem Messsystem Measuring system with improved resolution for structures on a substrate for semiconductor production and use of screens in a measuring system
11/12/2008EP1989594A2 Heat treatment of multilayer imageable elements
11/12/2008EP1989593A2 Antireflective coating material
11/12/2008EP1989592A2 Curable compositions for providing a cured composition with enhanced water resistance
11/12/2008EP1989061A1 Method for producing lithographic printing plate
11/12/2008EP1778759B1 Photosensitive dielectric resin compositions and their uses
11/12/2008CN101305324A Method of making a lithographic printing plate
11/12/2008CN101305323A Methods and systems for pattern generation based on multiple forms of design data
11/12/2008CN101305322A Method of making a lithographic printing plate
11/12/2008CN101305321A Developable undercoating composition for thick photoresist layers
11/12/2008CN101305206A Vibration isolation system and method
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