Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2008
11/26/2008CN100437150C Micro mirror and method of manufacturing the same
11/26/2008CN100436394C White solid photoinitiator in the form of powder and preparation thereof
11/25/2008USRE40586 Reduced striae extreme ultra violet elements
11/25/2008US7457736 Automated creation of metrology recipes
11/25/2008US7457059 Adjustment arrangement of an optical element
11/25/2008US7457043 Projection exposure system
11/25/2008US7457042 Projection optical system, exposure apparatus, and exposure method
11/25/2008US7457034 High NA system for multiple mode imaging
11/25/2008US7456975 Methods and systems for interferometric analysis of surfaces and related applications
11/25/2008US7456930 Environmental system including vacuum scavenge for an immersion lithography apparatus
11/25/2008US7456527 Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method
11/25/2008US7456489 Wafer with optical control modules in IC fields
11/25/2008US7456408 Illumination system particularly for microlithography
11/25/2008US7456237 Colorant-containing curable composition, color filter and method of producing the same
11/25/2008US7456230 Cationically photocurable epoxy resin compositions
11/25/2008US7456140 Stripping formulation for photoresists containing ammonium difluoride or ammonium fluoride, a sulfone or sulfoxide solvent and a basic amine
11/25/2008US7456103 Etch-resistant film, forming method thereof, surface-modified resist pattern, forming method thereof, semiconductor device and manufacturing method thereof
11/25/2008US7456031 Exposure device, exposure method, and semiconductor device manufacturing method
11/25/2008US7455957 Blazed holographic grating, method for producing the same and replica grating
11/25/2008US7455956 Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, interconnects in the periphery of the integrated circuit; forming contacts between pitch multiplied and non-pitch multiplied features
11/25/2008US7455955 Planarization method for multi-layer lithography processing
11/25/2008US7455954 Lithographic printing plate precursor and polymerizable composition
11/25/2008US7455953 Positive working heat-sensitive lithographic printing plate precursor
11/25/2008US7455952 Fluorocopolymer; insoluble in water, dissolvable in alkaline aqueous solution, and immiscible with the photoresist layer is amenable to immersion lithography over a wider range in that when it is used as a resist protective coating, the coating can be simultaneously stripped during development
11/25/2008US7455950 Resist material and pattern formation method using the same
11/25/2008US7455949 Polymer for heat-sensitive lithographic printing plate precursor
11/25/2008US7455948 Polyimide, unsaturated polymerizable compound, photoinitiator; crosslinkable to form addition-condensation copolymer or polyetherimide copolymer; no imidation of polymer through high-temperature heat treatment; alkaline development; polyimide film having excellent heat resistance, strength, elongation
11/25/2008US7455887 Actinic ray curable ink-jet ink composition, image formation method employing the same, and ink-jet recording apparatus
11/25/2008US7455880 Optical element fabrication method, optical element, exposure apparatus, device fabrication method
11/25/2008US7455789 Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern
11/25/2008US7455788 Nanoscale electric lithography
11/25/2008CA2276588C New o-acyloxime photoinitiators
11/20/2008WO2008141064A1 Methods and systems for detecting defects in a reticle design pattern
11/20/2008WO2008141048A1 Compact nanofabrication apparatus
11/20/2008WO2008140846A1 High etch resistant underlayer compositions for multilayer lithographic processes
11/20/2008WO2008140727A1 Substrate transport apparatus
11/20/2008WO2008140726A1 Negative-working imageable elements and methods of use
11/20/2008WO2008140180A2 In-line virtual-masking method for maskless lithography
11/20/2008WO2008140119A1 Method for pattern formation
11/20/2008WO2008140083A1 Photoresist developing solution
11/20/2008WO2008140076A1 Photoresist remover composition
11/20/2008WO2008140027A1 Movable body apparatus and exposure apparatus
11/20/2008WO2008140017A1 Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
11/20/2008WO2008140016A1 Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
11/20/2008WO2008139913A1 Exposure method and flat plate for exposure
11/20/2008WO2008139720A1 Resin composition, dry film, and fabrications of the same
11/20/2008WO2008139643A1 Exposure method and exposure apparatus
11/20/2008WO2008138966A1 A method for making a lithographic printing plate precursor
11/20/2008WO2008138942A1 A gum solution for developing and gumming a photopolymer printing plate.
11/20/2008WO2008138733A1 Oxime ester photoinitiators
11/20/2008WO2008138724A1 Oxime ester photoinitiators
11/20/2008WO2008138560A1 Projection lens and projection lighting system for microlithography
11/20/2008WO2008138361A1 Mold for generating nanostructures, and mold holder unit
11/20/2008WO2008101656A8 Method for producing facet mirrors and projection exposure apparatus
11/20/2008WO2008097736A3 Methods using block copolymer self-assembly for sub-lithographic patterning
11/20/2008WO2008096263A3 Photoresist composition
11/20/2008WO2008068617A3 Photoactive compounds
11/20/2008US20080287333 Non-Aqueous Microelectronic Cleaning Compositions Containing Fructose
11/20/2008US20080286702 Transparent support, yellow-, cyan-, and magenta-color-forming photosensitive silver halide emulsion layers, and layer containing coupler; cinematography
11/20/2008US20080286700 High resolution patterning of surface energy utiliizing high resolution monomolecular resist for fabrication of patterned media masters
11/20/2008US20080286697 forming a photoresist film on a first side of a wafer having first and second sides, cleaning second side of the wafer while photoresist film on first side, exposing photoresist film on wafer first side to radiation after cleaning wafer second side
11/20/2008US20080286696 a multilayer printed wiring board having two or more conductor layers, with a portion of an outer layer base material removed and a flexible inner layer base material serving as a lead pattern portion
11/20/2008US20080286695 Method of Making a Lithographic Printing Plate
11/20/2008US20080286694 Method to obtain a positive-working thermal lithographic printing master
11/20/2008US20080286693 Sulfonate derivatives and the use thereof as latent acids
11/20/2008US20080286692 Photosensitve Laminate
11/20/2008US20080286691 a polymeric photoresist containing a chemically amplified addition copolymer comperising vinylphenol, methacrylic or acrylic ester having an alicyclic ring, a vinylstyrene with aromatic ester groups; and acid generator preferably diazomethane compound having sulfonyl groups; a sulfonium or iodonium comp.
11/20/2008US20080286690 9,9-bis{4-(3-mercaptobutyloyloxyethoxy)phenyl}fluorene; high sensitivity, excellent development latitude; etching resists, solder resists, color filter resists which form patterns in photolithography and alkaline development; black matrix resist for a color filter containing photopolymerization initiator
11/20/2008US20080286688 Photosensitive Resin Composition and Cured Product Thereof
11/20/2008US20080286687 Chemically amplified resist material, topcoat film material and pattern formation method using the same
11/20/2008US20080286685 Planographic printing plate precursor and printing method using the same
11/20/2008US20080286684 Coating material for photoresist pattern and method of forming fine pattern using the same
11/20/2008US20080286665 Color filter and method for producing the same
11/20/2008US20080286664 Full Phase Shifting Mask In Damascene Process
11/20/2008US20080286661 Photomask, Photomask Fabrication Method, Pattern Formation Method Using the Photomask and Mask Data Creation Method
11/20/2008US20080286486 Carbonate Containing Energy-Curable Compositions
11/20/2008US20080286476 Method of manufacturing lithographic printing plate
11/20/2008US20080286450 hazardous waste reduction in stereolithography; nonhazardous: photosensitizer 4-benzoyl-4-methyldiphenyl sulfide, photoacid diffusion inhibitor, an oxetane, and boron containing cationic photoinitiator; antimony-free
11/20/2008US20080285018 Device and method for range-resolved determination of scattered light, and an illumination mask
11/20/2008US20080285001 Lithography aperture lenses, illumination systems, and methods
11/20/2008US20080284989 Developing method and developing unit
11/20/2008US20080283892 Cylinder-Type Capacitor and Storage Device, and Method(s) for Fabricating the Same
11/20/2008US20080283796 Compositions for Dissolution of Low-K Dielectric Films, and Methods of Use
11/20/2008DE19823932B4 Verfahren zur Herstellung einer Struktur von Farbfilterschichtsystem-Bereichen A method for manufacturing a structure of the color filter layer system ranges
11/20/2008DE10345238B4 Justiermarke zur Ausrichtung eines Halbleiterwafers in einem Belichtungsgerät und deren Verwendung Alignment mark for aligning a semiconductor wafer in an exposure apparatus and their use
11/20/2008DE102008023765A1 Temperature-dependent single-waved imaging defect correcting method for use during manufacturing of e.g. micro-structured element, involves shifting correction element perpendicular to local optical axis of correction element
11/20/2008DE102008001719A1 Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie Projection lens and projection exposure system for microlithography
11/20/2008DE102008001264A1 Lithographie-Blendenlinsen, Beleuchtungssysteme und Verfahren Lithography aperture lenses, lighting systems and procedures
11/20/2008DE102004022961B4 Verfahren zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift Method for producing a three-dimensional object with resolution enhancement using pixel shift
11/20/2008CA2684931A1 Oxime ester photoinitiators
11/20/2008CA2681443A1 Compact nanofabrication apparatus
11/19/2008EP1993121A1 Exposure apparatus and device manufacturing method
11/19/2008EP1993120A1 Exposure method and apparatus, and device manufacturing method
11/19/2008EP1992991A2 System for laser beam expansion without expanding spatial coherence
11/19/2008EP1992990A1 Treated substratum with hydrophilic region and water-repellent region and process for producing the same
11/19/2008EP1992989A1 Lithographic printing plate precursor
11/19/2008EP1992650A1 Tertiary alcohol derivative, polymer compound and photoresist composition
11/19/2008EP1991910A1 Adamantane based molecular glass photoresists for sub-200 nm lithography
11/19/2008EP1991418A1 Method for making a lithographic printing plate
11/19/2008EP1907192B1 Rapid-prototyping method and use in the method of a radiation-hardenable composition
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