Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2008
11/27/2008WO2008143337A1 Monolithic, non-contact six degree-of-freedom stage apparatus
11/27/2008WO2008143327A1 Kinematic chucks for reticles and other planar bodies
11/27/2008WO2008143302A1 Composition for forming resist lower layer film
11/27/2008WO2008143301A1 Method for pattern formation and resin composition for use in the method
11/27/2008WO2008143266A1 Exposure apparatus and exposing method
11/27/2008WO2008143095A1 Photosensitive resin and process for producing microlens
11/27/2008WO2008142435A1 Method of operating a lithography tool
11/27/2008WO2008142145A1 Illumination non-uniformity quantification method and apparatus
11/27/2008WO2008142126A1 Illumination configurator in mask aligners
11/27/2008WO2008141776A1 A laser beam conditioning system comprising multiple optical paths allowing for dose control
11/27/2008WO2008113605A3 Method for improving the imaging properties of an optical system and such an optical system
11/27/2008WO2008108643A3 Removal of deposition on an element of a lithographic apparatus
11/27/2008WO2008091014A3 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
11/27/2008WO2008081416A3 Stripper for coating layer
11/27/2008US20080294367 Method for Measuring the Position of a Mark in a Deflector System
11/27/2008US20080293169 Lithography evaluating method, semiconductor device manufacturing method and program medium
11/27/2008US20080292995 Antireflective Coating Composition Comprising Fused Aromatic Rings
11/27/2008US20080292994 Transfer method, transfer apparatus, and method of manufacturing organic light emitting element
11/27/2008US20080292993 Photo-cationic polymerizable epoxy resin composition, liquid discharge head, and manufacturing method thereof
11/27/2008US20080292992 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern
11/27/2008US20080292990 Electronic device manufacture
11/27/2008US20080292989 Positive working photosensitive composition and pattern forming method using the same
11/27/2008US20080292988 Sulfonium containing acid generators
11/27/2008US20080292986 Inkjet printhead and method of manufacturing the same
11/27/2008US20080292977 Manufacturing method of semiconductor integrated circuit device
11/27/2008US20080292976 Pattern forming method, pattern formed thereby, mold, processing apparatus, and processing method
11/27/2008US20080292535 small refractive index differences and few small angle grain boundaries have a bi-directional scattering distribution function value (BSDF) of less than 1.5*10-6 or 5*10-7.
11/27/2008US20080291561 Light coloring system
11/27/2008US20080291421 Exposure apparatus, exposure method, and device fabrication method
11/27/2008US20080291419 Projection objective for immersion lithography
11/27/2008US20080291410 Exposure apparatus and method for manufacturing device
11/27/2008US20080291409 Immersion exposure technique
11/27/2008US20080290797 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same
11/27/2008US20080290084 Method of Forming a Flexible Heating Element
11/27/2008DE102008001800A1 Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement Projection lens produced for microlithography, microlithography projection exposure apparatus having such a projection lens, microlithographic manufacturing method for Devices as well as this process component
11/27/2008DE102007024122A1 Belichtungskonfigurator in Maskalignern Exposure configurator Maskalignern
11/27/2008DE102007022895A1 Vorrichtung zum Übertragen von in einer Maske vorgesehenen Strukturen auf ein Substrat An apparatus for transmitting provided in a mask structures onto a substrate
11/27/2008DE102004063610B4 Verfahren zur Entfernung eines Fotofarblacks A method for removing a photo resist color
11/26/2008EP1995769A1 Exposure method and exposure apparatus, stage unit, and device manufacturing method
11/26/2008EP1995768A1 Exposure apparatus, maintenance method, exposure method and device manufacturing method
11/26/2008EP1995767A1 Projection optical system, aligner and method for fabricating semiconductor device
11/26/2008EP1995636A1 Composition for forming lower layer film and pattern forming method
11/26/2008EP1995635A1 Negative-type photosensitive fluorinated aromatic resin composition
11/26/2008EP1995634A2 Lithography for fabricating adherent microstructure
11/26/2008EP1994549A2 Active spectral control of duv light source
11/26/2008EP1994447A1 Lithography system and projection method
11/26/2008EP1994446A1 Slm lithography: printing to below k1=.30 without previous opc processing
11/26/2008EP1994134A1 Stabilized, non-aqueous cleaning compositions for microelectronics substrates
11/26/2008EP1993850A2 Methods and means relating to photopolymer printing plates
11/26/2008EP1993816A1 Method for producing defect-free light guiding elements of great widths, production device and diffractive light guiding element
11/26/2008EP1993781A1 Manufacturing method of memory element, laser irradiation apparatus, and laser irradiation method
11/26/2008EP1844366B1 Illumination optical apparatus and optical apparatus
11/26/2008EP1058697B1 Polymeric films having controlled viscosity response to temperature and shear
11/26/2008CN201156532Y Storage apparatus for storing semi-conductor component
11/26/2008CN201156161Y Light shield clip
11/26/2008CN201156160Y Lithographic apparatus implementing masking plate substrate by LCD plate
11/26/2008CN201156159Y Light shielding kit and positioning fiece
11/26/2008CN101313385A Washing liquid for photolithography, and method for washing exposure device using the same
11/26/2008CN101313368A Glass paste, method for producing display by using same, and display
11/26/2008CN101313252A Developer solution and process for use
11/26/2008CN101313251A Apparatus for recycling alkane immersion liquids and methods of employment
11/26/2008CN101313250A Combined stepper and deposition tool
11/26/2008CN101313249A Photosensitive transfer material, partition wall and method for forming same, optical device and method for producing same, and display
11/26/2008CN101313248A Method of making a lithographic printing plate
11/26/2008CN101313247A Radiation-sensitive resin composition
11/26/2008CN101313246A Radiation-sensitive resin composition
11/26/2008CN101313245A Photopolymer printing form with reduced processing time
11/26/2008CN101312794A Process for removing material from substrates
11/26/2008CN101312180A Superposed marker and method for forming same as well as uses
11/26/2008CN101312120A Manufacturing method of semiconductor integrated circuit device
11/26/2008CN101311834A Knife jet apparatus capable of providing uniform fluid water-curtain to substrate
11/26/2008CN101311833A Photo-etching machine illumination homogeneity compensator preparation method
11/26/2008CN101311832A Manufacturing method of substrate with coating film, color filter, manufacturing method thereof and display device
11/26/2008CN101311831A Auxiliary device for concave spherical surface device rotary coating photoresist
11/26/2008CN101311830A Square substrate rotary gelatizing device
11/26/2008CN101311829A Radiation- induced resin composition, spacer, protection film and forming method thereof
11/26/2008CN101311828A Viscous microstructure preparation method
11/26/2008CN101311827A Manufacture method of press mould and light guide using the press mould
11/26/2008CN101311826A Automobile instrument scale disc backlight homogeneity adjustment technological process
11/26/2008CN101311792A Display substrate and its manufacture method and display device possessing the display substrate
11/26/2008CN101310990A Automobile instrument light dial bound edge typography method
11/26/2008CN100437904C Method of manufacturing substrate having resist film
11/26/2008CN100437903C Photomask, pattern formation method using photomask and mask data creation method
11/26/2008CN100437895C Structure inspection method, pattern formation method, process condition determination and method for producing semiconductor device
11/26/2008CN100437894C Method of heating a substrate in a variable temperature process using a fixed temperature chuck
11/26/2008CN100437882C 电子束曝光系统 Electron beam exposure system
11/26/2008CN100437407C Abbe error correction system and method
11/26/2008CN100437366C Image recorder and image recording method
11/26/2008CN100437361C Method for making ultraviolet solidified nano impression formboard
11/26/2008CN100437360C Pellicle frame and pellicle for photolithography using the same
11/26/2008CN100437359C Anti-stripping photolithography method for integrated circuit
11/26/2008CN100437358C Exposure apparatus and device manufacturing method
11/26/2008CN100437357C Exposure apparatus extendible corresponding to substrate for printed circuitboard
11/26/2008CN100437356C Method and system for immersion lithography
11/26/2008CN100437355C Photoetching projector and device manufacturing method
11/26/2008CN100437354C Bathochromic mono-and bis-acylphosphine oxides and sulfides and their use as photoinitiators
11/26/2008CN100437353C Preparation method of nano mould in nano-seal technology
11/26/2008CN100437263C Linking base plate rotating method
11/26/2008CN100437259C Display device manufacturing method
11/26/2008CN100437155C Resin layer surface micro structure mould-band rolling wheel shaping method and optical film
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