Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2014
08/05/2014US8797505 Exposure apparatus and device manufacturing method
08/05/2014US8797504 Lithographic apparatus and device manufacturing method
08/05/2014US8797503 Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure
08/05/2014US8797502 Exposure apparatus, exposure method, and method for producing device with electricity removal device by adding additive to liquid
08/05/2014US8797501 Exposure apparatus and device manufacturing method
08/05/2014US8797500 Immersion lithography fluid control system changing flow velocity of gas outlets based on motion of a surface
08/05/2014US8796393 Production method of polyhydroxyimide and positive photosensitive resin composition containing polyhydroxyimide obtained by the production method
08/05/2014US8796349 Photosensitive resin composition for microlenses
08/05/2014US8796053 Photolithographic LED fabrication using phase-shift mask
08/05/2014US8795955 Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process
08/05/2014US8795954 Resist pattern-forming method, and radiation-sensitive resin composition
08/05/2014US8795953 Pattern forming method and method for producing device
08/05/2014US8795952 Line pattern collapse mitigation through gap-fill material application
08/05/2014US8795951 Material for forming resist sensitization film and production method of semiconductor device
08/05/2014US8795950 Method of improving print performance in flexographic printing plates
08/05/2014US8795949 Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device
08/05/2014US8795948 Resist composition, method of forming resist pattern and polymeric compound
08/05/2014US8795947 Resist composition and method of forming resist pattern
08/05/2014US8795946 Polymerizable ester compound, polymer, resist composition, and patterning process
08/05/2014US8795945 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
08/05/2014US8795944 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition
08/05/2014US8795943 Negative photoresist composition and patterning method for device
08/05/2014US8795942 Positive resist composition and patterning process
08/05/2014US8795932 Method of fabricating a polarized color filter
08/05/2014US8795774 Hardmask
08/05/2014US8795556 Self-aligned permanent on-chip interconnect structure formed by pitch splitting
08/05/2014CA2763951C A polymer washout solvent, and the use thereof for developing a flexographic printing plate
07/2014
07/31/2014WO2014116547A1 Surface nanofabrication methods using self-assembled polymer nanomasks
07/31/2014WO2014116544A1 Surface nanoreplication using polymer nanomasks
07/31/2014WO2014114900A2 Processing waste washout liquid
07/31/2014WO2014114494A1 Optical system of a microlithographic projection exposure apparatus
07/31/2014WO2014114436A1 Polarization measurement system for a projection exposure apparatus
07/31/2014WO2014114405A2 Projection system, mirror and radiation source for a lithographic apparatus
07/31/2014WO2014114395A1 Electrostatic clamp
07/31/2014WO2014114382A1 Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and euv lithography apparatus
07/31/2014US20140213498 Photoresist removal
07/31/2014US20140212819 Lithographic patterning process and resists to use therein
07/31/2014US20140212818 Method for forming graphene pattern
07/31/2014US20140212816 Photolithographic methods
07/31/2014US20140212814 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic device
07/31/2014US20140212813 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
07/31/2014US20140212812 Fluorine-based resins and photosensitive resin composition comprising the same
07/31/2014US20140212811 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
07/31/2014US20140212810 Negative resist composition and patterning process
07/31/2014US20140212809 Photosensitive resin composition and method of forming pattern using the same
07/31/2014US20140212808 Patterning process and resist composition
07/31/2014US20140212797 Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, manufacturing method of semiconductor device, semiconductor device and production method of resin
07/31/2014US20140212796 Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device
07/31/2014US20140212680 High resolution, solvent resistant, thin elastomeric printing plates
07/31/2014US20140211189 Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method
07/31/2014US20140211188 Microlithographic projection exposure apparatus
07/31/2014US20140211187 Optical module for guiding a radiation beam
07/31/2014US20140211186 Fast illumination simulator based on a calibrated flexible point- spread function
07/31/2014US20140211185 Inspection Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Inspection Method
07/31/2014US20140211184 Radiation Source
07/31/2014US20140211183 Projection optical system, exposure apparatus, and exposure method
07/31/2014US20140211182 Projection optical system, exposure apparatus, and exposure method
07/31/2014US20140211181 Optical element
07/31/2014US20140211180 Projection optical system, exposure apparatus, and exposure method
07/31/2014US20140211179 Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
07/31/2014US20140211178 Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
07/31/2014US20140211177 Exposure apparatus and device manufacturing method
07/31/2014US20140211176 Exposure apparatus and device manufacturing method
07/31/2014US20140211175 Enhancing resolution in lithographic processes using high refractive index fluids
07/31/2014US20140211174 Illumination optical assembly, exposure device, and device manufacturing method
07/31/2014US20140210057 Method of applying photoresist to a semiconductor substrate
07/31/2014US20140210034 Near-infrared absorbing film compositions
07/31/2014US20140209818 Lithography apparatus, lithography method, and method of manufacturing article
07/31/2014DE102013215718A1 Temperaturkontrolle für Lager von optischen Elementen in Projektionsbelichtungsanlagen Temperature control for storage of optical elements in projection exposure apparatus
07/31/2014DE102013213855A1 Vibrationsreduktion in Kühlsystemen Vibration reduction in cooling systems
07/31/2014DE102013212363A1 Facettenspiegel, insbesondere für die EUV-Projektionslithografie Facet mirror, especially for EUV projection lithography
07/31/2014DE102013201193A1 Verfahren zum Bestimmen der Phasenlage und/oder der Dicke einer Kontaminationsschicht an einem optischen Element und EUV-Lithographievorrichtung A method for determining the phase position and / or the thickness of a contamination layer on an optical element and EUV lithography apparatus
07/30/2014EP2759881A1 Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition
07/30/2014EP2759880A1 Optical recording head and image formation device
07/30/2014EP2759879A1 Components of three-dimensional imaging systems
07/30/2014EP2759742A1 Device for rotating a toothed wheel and motorized turntable
07/30/2014EP2758981A1 Method and apparatus for predicting a growth rate of deposited contaminants
07/30/2014EP2758834A1 Negative-working lithographic printing plate precursors
07/30/2014CN203745796U 简易光固化面曝光成像装置 Simple light-cured surface exposure imaging device
07/30/2014CN203745795U 一种光刻机的掩膜版降温装置 A lithographic mask machine cooling device
07/30/2014CN203745794U 一种匀胶机的光刻胶回收系统 Photoresist recovery system of a spin coater
07/30/2014CN203745793U 一种铬版感光胶烘烤架 Chromium version sensitive adhesive baking rack
07/30/2014CN203736950U 一种药液箱及光刻胶剥离设备 One kind of tank and photoresist stripping equipment
07/30/2014CN103959924A 纳米级冷却的纳米等离子体激元装置 Nanoplasmonic cooling apparatus nanoscale
07/30/2014CN103959172A 从衬底中去除物质的方法 Removing material from the substrate in a method
07/30/2014CN103959171A 光刻设备及器件制造方法 A lithographic apparatus and device manufacturing method
07/30/2014CN103959170A 用于硬掩模组合物的单体、包括单体的硬掩模组合物以及使用硬掩模组合物的图案形成方法 Monomers for use in the hard mask composition comprising a monomer composition of the hard mask pattern and the use of a hard mask composition forming method
07/30/2014CN103959169A 版膜形成用部件 Version of the film-forming component
07/30/2014CN103959168A 负型感光性硅氧烷组合物 The negative photosensitive composition of the silicone
07/30/2014CN103959167A 光敏树脂组合物 The photosensitive resin composition of the
07/30/2014CN103959166A 纳米结构冲头、用于无端压印纳米结构的压印辊、装置和方法 Nanostructures punch platen roller, an endless imprinting apparatus and method for nanostructures
07/30/2014CN103959109A 滤色器用着色组合物及滤色器 The coloring composition for color filter and a color filter
07/30/2014CN103958455A 环状化合物、其制造方法、辐射敏感组合物及抗蚀图案形成方法 Cyclic compounds, manufacturing method, the radiation-sensitive composition and resist pattern-forming method
07/30/2014CN103958379A 基板处理装置及基板处理方法 Substrate processing apparatus and substrate processing method
07/30/2014CN103958214A 平版印刷版用版面保护液组合物和使用其的平版印刷版的处理方法 Lithographic forum protective solution composition and use of its lithographic printing plate processing method
07/30/2014CN103955123A 一种离子注入后晶片的湿法去胶液及光刻胶去除方法 An ion-implanted wafer wet glue and to resist removal method
07/30/2014CN103955122A 一种彩色滤光片用显影液 A color filter with a developer
07/30/2014CN103955121A 一种用于彩色滤光片的显影液 A developer for a color filter
07/30/2014CN103955120A 一种半导体集成电路用显影液 A semiconductor integrated circuit with the developer
07/30/2014CN103955119A 一种用于半导体集成电路中的显影液 A semiconductor integrated circuit for developer
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