Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2008
12/04/2008US20080299503 Material for Forming Resist Protection Films and Method for Resist Pattern Formation with the Same
12/04/2008US20080299502 Coating and developing apparatus, operating method for same, and storage medium for the method
12/04/2008US20080299500 Exposure apparatus and device manufacturing method
12/04/2008US20080299499 Exposure method, method of manufacturing plate for flat panel display, and exposure apparatus
12/04/2008US20080299497 high efficiency for which the three-dimensional shape of ink flow passageways is optimized and the discharge efficiency is improved; polymethylisoproenyl ketone as first and second type photosensitive resins; hydroxy-4-methoxybenzophenone/2-/ light absorber
12/04/2008US20080299496 Manufacturing Apparatus and Manufacturing Method of Light-Emitting Device
12/04/2008US20080299493 Substrate processing apparatus and method of manufacturing device
12/04/2008US20080299492 Exposure method and electronic device manufacturing method
12/04/2008US20080299491 Highly alkaline developer composition and methods of use
12/04/2008US20080299485 Reducing surface tension using a polymer containing perfluorobutanesulfonamide in repeating units such N-methyl-perfluorobutanesulfonylethyl acrylate, which is lower cost and less bioaccumulative than corresponding perfluorooctyl surfactants
12/04/2008US20080299467 Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold
12/04/2008US20080299464 Lengthy volume hologram layer transfer foil, method of producing volume hologram laminate using the same and volume hologram laminate
12/04/2008US20080298552 Method and Device for Generating in Particular Euv Radiation And/or Soft X-Ray Radiation
12/04/2008US20080298542 Image Producing Methods and Image Producing Devices
12/04/2008US20080297758 Lithographic support structure
12/04/2008US20080297755 Focusing-device for the radiation from a light source
12/04/2008US20080297751 Exposure method, exposure apparatus, and method for producing device
12/04/2008US20080297747 Lithographic Apparatus and Device Manufacturing Method
12/04/2008US20080297746 Exposure method, exposure apparatus, and method for producing device
12/04/2008US20080297745 Projection objective for immersion lithography
12/04/2008US20080296767 Composition for cleaning semiconductor device
12/04/2008DE102008000558A1 Method for adjusting optical element in objective, particularly objective for microlithography, involves determining actual imaging property of objective or optical element in objective
12/04/2008DE102007025340A1 Immersionslithograpieprozess unter Anwendung einer variablen Abtastgeschwindigkeit Immersionslithograpieprozess using a variable scan speed
12/04/2008DE102007024653A1 Stempel für das Mikrokontaktdrucken und Verfahren zu seiner Herstellung Stamps for microcontact printing and method for its manufacture
12/04/2008DE102004011850B4 Schleuderbeschichtungsvorrichtung und -verfahren Spin coating apparatus and method
12/03/2008EP1998361A1 Adjusting method, substrate treating method, substrate treating device, exposure device, inspection device, measurement inspection system, treating device, computer system, program, and information recording medium
12/03/2008EP1998223A2 Projection lens for lithography
12/03/2008EP1998222A2 Coating compositions
12/03/2008EP1997627A1 Image forming device, in particular for printing litographic plates
12/03/2008EP1997626A1 Image forming apparatus with interchangeable drum, in particular for printing litographic plates
12/03/2008EP1927031B1 Method for forming a removable edge extension element
12/03/2008EP1815295B1 Array of spatial light modulators and method of production of a spatial light modulator device
12/03/2008EP1250630B1 Photolithography system with mountable and removable sensor
12/03/2008CN201159832Y Non-mask write through photo-etching machine with ultrahigh strength LED light source
12/03/2008CN201159831Y Direct-writing photo-etching machine with LED light source
12/03/2008CN101317133A Lithographic method for maskless pattern transfer onto a photosensitive substrate
12/03/2008CN101317132A Process for producing organic EL, color filter and diaphragm
12/03/2008CN101317108A Method for manufacture of color filter, color filter, and display device
12/03/2008CN101316726A Product with concave-convex pattern on its surface and method of forming the concave-convex pattern
12/03/2008CN101316721A Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate
12/03/2008CN101316720A Lithographic printing plate material and printing method
12/03/2008CN101315873A Methods for manufacturing a structure on or in a substrate, imaging layer for generating sublithographic structures, method for inverting a sublithographic pattern, device obtainable by manufacturing
12/03/2008CN101315524A Substrate carrying device
12/03/2008CN101315523A Ploting device
12/03/2008CN101315522A Photosensitive composition, photosensitive film, and printed circuit board
12/03/2008CN101315521A Light-sensitive resin composition
12/03/2008CN101315520A PCB ink composition, its production method, application and printed wiring board
12/03/2008CN101315519A Anti-leakage type photoresist bottle
12/03/2008CN101315518A Photomask testing method, photomask manufacture method, electronic component manufacture method, testing mask and testing mask set
12/03/2008CN101315517A Mask plate of image element groove section and thin-film transistor using the same
12/03/2008CN101315514A Mask plate and matching method of photo-etching machine nesting precision using mask plate
12/03/2008CN101315501A Method for improving medium layer defect between micro-reflection mirrors and producing silicon based LCD
12/03/2008CN101315497A Liquid crystal display panel and method for producing the same
12/03/2008CN101315483A Color membrane substrates and manufacturing method thereof
12/03/2008CN101315478A Method for improving percent of pass of liquid crystal box
12/03/2008CN101314159A Substrate washing method and device
12/03/2008CN100440434C Semiconductor manufacture method
12/03/2008CN100440432C 光学元件和曝光装置 The optical element and an exposure apparatus
12/03/2008CN100440431C Immersion liquid for immersion exposure process and resist pattern forming method using such immersion liquid
12/03/2008CN100440430C Method for producing alternating phase-shift mask
12/03/2008CN100440349C Method for producing stamper used for producing optical disc and optical disc producing method
12/03/2008CN100440041C Method for forming image through reaction development
12/03/2008CN100440040C Non-diazo naphthaquinone type positive map PS plate photosensitive composition and positive map thermosensitive CTP plate image forming composition
12/03/2008CN100440039C Mask stand for ultraviolet exposure
12/03/2008CN100440017C Liquid crystal display and fabricating method thereof
12/03/2008CN100440016C Liquid crystal display device and fabricating method thereof
12/03/2008CN100440014C Array substrate for LCD and fabrication method thereof
12/03/2008CN100439992C Liquid crystal display device and fabrication method thereof
12/03/2008CN100439965C Projection optical system and exposure apparatus with the same
12/03/2008CN100439946C Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern
12/03/2008CN100439855C A method for measuring the position of a mark in a deflector system
12/03/2008CN100439358C Thioxanthone derivatives, and their use as cationic photoinitiators
12/02/2008US7460981 Methods and systems for determining a presence of macro and micro defects on a specimen
12/02/2008US7460251 Dimension monitoring method and system
12/02/2008US7460212 Collector configured of mirror shells
12/02/2008US7460207 Exposure apparatus and method for producing device
12/02/2008US7460206 Projection objective for immersion lithography
12/02/2008US7459710 Lithographic apparatus, method for calibrating and device manufacturing method
12/02/2008US7459709 Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method
12/02/2008US7459708 Extreme UV radiation source device and method for eliminating debris which forms within the device
12/02/2008US7459690 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/02/2008US7459669 Sensor and lithographic apparatus
12/02/2008US7459614 Method for generating an artificially patterned substrate for stimulating the crystallation of a biomolecule thereon and method for stimulating the crystallization of biomolecules
12/02/2008US7459338 Substrate, conductive substrate, fine structure substrate, organic field effect transistor and manufacturing method thereof
12/02/2008US7459337 Method of fabricating bottom gate type organic thin film transistor
12/02/2008US7459275 Sequencing of surface immobilized polymers utilizing microfluorescence detection
12/02/2008US7459267 Sacrificial compositions and methods of fabricating a structure using sacrificial compositions
12/02/2008US7459265 Pattern forming method, semiconductor device manufacturing method and exposure mask set
12/02/2008US7459264 Forming a resist film on a substrate, mounting the substrate and the photo mask on the exposure tool, the substrate having the resist film formed thereon, transferring mask pattern formed on photo mask onto resist film; heating the resist film having the latent image formed thereon, developing
12/02/2008US7459262 Low dielectric materials,useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture
12/02/2008US7459261 Excellent resist pattern after development in the liquid immersion lithography; high resolution, high sensitivity and high resolution to high energy beam; has reduced line edge roughness, and comprises a polymeric acid generator which has insolubility in water, thermal stability, preservation stability
12/02/2008US7459260 Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method
12/02/2008US7459241 Rotary apertured interferometric lithography (RAIL)
12/02/2008US7459106 a mixture of chromogens having a two-photon or multi-photon absorptiion, and photoacid generators, that can be patterned by photochemistry
12/02/2008US7458320 Polymer for heat-sensitive lithographic printing plate precursor
12/02/2008CA2424110C Process for recovering onium hydroxides from solutions containing onium compounds
12/02/2008CA2356832C Radiation curable water based cationic inks and coatings
11/2008
11/27/2008WO2008144199A1 Direct to metal sintering of 17-4ph steel
11/27/2008WO2008143424A1 Vaccum suction frame for ultraviolet rays exposure apparatus
11/27/2008WO2008143357A1 Exposure apparatus and liquid immersion system