Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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12/04/2008 | US20080299503 Material for Forming Resist Protection Films and Method for Resist Pattern Formation with the Same |
12/04/2008 | US20080299502 Coating and developing apparatus, operating method for same, and storage medium for the method |
12/04/2008 | US20080299500 Exposure apparatus and device manufacturing method |
12/04/2008 | US20080299499 Exposure method, method of manufacturing plate for flat panel display, and exposure apparatus |
12/04/2008 | US20080299497 high efficiency for which the three-dimensional shape of ink flow passageways is optimized and the discharge efficiency is improved; polymethylisoproenyl ketone as first and second type photosensitive resins; hydroxy-4-methoxybenzophenone/2-/ light absorber |
12/04/2008 | US20080299496 Manufacturing Apparatus and Manufacturing Method of Light-Emitting Device |
12/04/2008 | US20080299493 Substrate processing apparatus and method of manufacturing device |
12/04/2008 | US20080299492 Exposure method and electronic device manufacturing method |
12/04/2008 | US20080299491 Highly alkaline developer composition and methods of use |
12/04/2008 | US20080299485 Reducing surface tension using a polymer containing perfluorobutanesulfonamide in repeating units such N-methyl-perfluorobutanesulfonylethyl acrylate, which is lower cost and less bioaccumulative than corresponding perfluorooctyl surfactants |
12/04/2008 | US20080299467 Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold |
12/04/2008 | US20080299464 Lengthy volume hologram layer transfer foil, method of producing volume hologram laminate using the same and volume hologram laminate |
12/04/2008 | US20080298552 Method and Device for Generating in Particular Euv Radiation And/or Soft X-Ray Radiation |
12/04/2008 | US20080298542 Image Producing Methods and Image Producing Devices |
12/04/2008 | US20080297758 Lithographic support structure |
12/04/2008 | US20080297755 Focusing-device for the radiation from a light source |
12/04/2008 | US20080297751 Exposure method, exposure apparatus, and method for producing device |
12/04/2008 | US20080297747 Lithographic Apparatus and Device Manufacturing Method |
12/04/2008 | US20080297746 Exposure method, exposure apparatus, and method for producing device |
12/04/2008 | US20080297745 Projection objective for immersion lithography |
12/04/2008 | US20080296767 Composition for cleaning semiconductor device |
12/04/2008 | DE102008000558A1 Method for adjusting optical element in objective, particularly objective for microlithography, involves determining actual imaging property of objective or optical element in objective |
12/04/2008 | DE102007025340A1 Immersionslithograpieprozess unter Anwendung einer variablen Abtastgeschwindigkeit Immersionslithograpieprozess using a variable scan speed |
12/04/2008 | DE102007024653A1 Stempel für das Mikrokontaktdrucken und Verfahren zu seiner Herstellung Stamps for microcontact printing and method for its manufacture |
12/04/2008 | DE102004011850B4 Schleuderbeschichtungsvorrichtung und -verfahren Spin coating apparatus and method |
12/03/2008 | EP1998361A1 Adjusting method, substrate treating method, substrate treating device, exposure device, inspection device, measurement inspection system, treating device, computer system, program, and information recording medium |
12/03/2008 | EP1998223A2 Projection lens for lithography |
12/03/2008 | EP1998222A2 Coating compositions |
12/03/2008 | EP1997627A1 Image forming device, in particular for printing litographic plates |
12/03/2008 | EP1997626A1 Image forming apparatus with interchangeable drum, in particular for printing litographic plates |
12/03/2008 | EP1927031B1 Method for forming a removable edge extension element |
12/03/2008 | EP1815295B1 Array of spatial light modulators and method of production of a spatial light modulator device |
12/03/2008 | EP1250630B1 Photolithography system with mountable and removable sensor |
12/03/2008 | CN201159832Y Non-mask write through photo-etching machine with ultrahigh strength LED light source |
12/03/2008 | CN201159831Y Direct-writing photo-etching machine with LED light source |
12/03/2008 | CN101317133A Lithographic method for maskless pattern transfer onto a photosensitive substrate |
12/03/2008 | CN101317132A Process for producing organic EL, color filter and diaphragm |
12/03/2008 | CN101317108A Method for manufacture of color filter, color filter, and display device |
12/03/2008 | CN101316726A Product with concave-convex pattern on its surface and method of forming the concave-convex pattern |
12/03/2008 | CN101316721A Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate |
12/03/2008 | CN101316720A Lithographic printing plate material and printing method |
12/03/2008 | CN101315873A Methods for manufacturing a structure on or in a substrate, imaging layer for generating sublithographic structures, method for inverting a sublithographic pattern, device obtainable by manufacturing |
12/03/2008 | CN101315524A Substrate carrying device |
12/03/2008 | CN101315523A Ploting device |
12/03/2008 | CN101315522A Photosensitive composition, photosensitive film, and printed circuit board |
12/03/2008 | CN101315521A Light-sensitive resin composition |
12/03/2008 | CN101315520A PCB ink composition, its production method, application and printed wiring board |
12/03/2008 | CN101315519A Anti-leakage type photoresist bottle |
12/03/2008 | CN101315518A Photomask testing method, photomask manufacture method, electronic component manufacture method, testing mask and testing mask set |
12/03/2008 | CN101315517A Mask plate of image element groove section and thin-film transistor using the same |
12/03/2008 | CN101315514A Mask plate and matching method of photo-etching machine nesting precision using mask plate |
12/03/2008 | CN101315501A Method for improving medium layer defect between micro-reflection mirrors and producing silicon based LCD |
12/03/2008 | CN101315497A Liquid crystal display panel and method for producing the same |
12/03/2008 | CN101315483A Color membrane substrates and manufacturing method thereof |
12/03/2008 | CN101315478A Method for improving percent of pass of liquid crystal box |
12/03/2008 | CN101314159A Substrate washing method and device |
12/03/2008 | CN100440434C Semiconductor manufacture method |
12/03/2008 | CN100440432C 光学元件和曝光装置 The optical element and an exposure apparatus |
12/03/2008 | CN100440431C Immersion liquid for immersion exposure process and resist pattern forming method using such immersion liquid |
12/03/2008 | CN100440430C Method for producing alternating phase-shift mask |
12/03/2008 | CN100440349C Method for producing stamper used for producing optical disc and optical disc producing method |
12/03/2008 | CN100440041C Method for forming image through reaction development |
12/03/2008 | CN100440040C Non-diazo naphthaquinone type positive map PS plate photosensitive composition and positive map thermosensitive CTP plate image forming composition |
12/03/2008 | CN100440039C Mask stand for ultraviolet exposure |
12/03/2008 | CN100440017C Liquid crystal display and fabricating method thereof |
12/03/2008 | CN100440016C Liquid crystal display device and fabricating method thereof |
12/03/2008 | CN100440014C Array substrate for LCD and fabrication method thereof |
12/03/2008 | CN100439992C Liquid crystal display device and fabrication method thereof |
12/03/2008 | CN100439965C Projection optical system and exposure apparatus with the same |
12/03/2008 | CN100439946C Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern |
12/03/2008 | CN100439855C A method for measuring the position of a mark in a deflector system |
12/03/2008 | CN100439358C Thioxanthone derivatives, and their use as cationic photoinitiators |
12/02/2008 | US7460981 Methods and systems for determining a presence of macro and micro defects on a specimen |
12/02/2008 | US7460251 Dimension monitoring method and system |
12/02/2008 | US7460212 Collector configured of mirror shells |
12/02/2008 | US7460207 Exposure apparatus and method for producing device |
12/02/2008 | US7460206 Projection objective for immersion lithography |
12/02/2008 | US7459710 Lithographic apparatus, method for calibrating and device manufacturing method |
12/02/2008 | US7459709 Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method |
12/02/2008 | US7459708 Extreme UV radiation source device and method for eliminating debris which forms within the device |
12/02/2008 | US7459690 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
12/02/2008 | US7459669 Sensor and lithographic apparatus |
12/02/2008 | US7459614 Method for generating an artificially patterned substrate for stimulating the crystallation of a biomolecule thereon and method for stimulating the crystallization of biomolecules |
12/02/2008 | US7459338 Substrate, conductive substrate, fine structure substrate, organic field effect transistor and manufacturing method thereof |
12/02/2008 | US7459337 Method of fabricating bottom gate type organic thin film transistor |
12/02/2008 | US7459275 Sequencing of surface immobilized polymers utilizing microfluorescence detection |
12/02/2008 | US7459267 Sacrificial compositions and methods of fabricating a structure using sacrificial compositions |
12/02/2008 | US7459265 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
12/02/2008 | US7459264 Forming a resist film on a substrate, mounting the substrate and the photo mask on the exposure tool, the substrate having the resist film formed thereon, transferring mask pattern formed on photo mask onto resist film; heating the resist film having the latent image formed thereon, developing |
12/02/2008 | US7459262 Low dielectric materials,useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture |
12/02/2008 | US7459261 Excellent resist pattern after development in the liquid immersion lithography; high resolution, high sensitivity and high resolution to high energy beam; has reduced line edge roughness, and comprises a polymeric acid generator which has insolubility in water, thermal stability, preservation stability |
12/02/2008 | US7459260 Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method |
12/02/2008 | US7459241 Rotary apertured interferometric lithography (RAIL) |
12/02/2008 | US7459106 a mixture of chromogens having a two-photon or multi-photon absorptiion, and photoacid generators, that can be patterned by photochemistry |
12/02/2008 | US7458320 Polymer for heat-sensitive lithographic printing plate precursor |
12/02/2008 | CA2424110C Process for recovering onium hydroxides from solutions containing onium compounds |
12/02/2008 | CA2356832C Radiation curable water based cationic inks and coatings |
11/27/2008 | WO2008144199A1 Direct to metal sintering of 17-4ph steel |
11/27/2008 | WO2008143424A1 Vaccum suction frame for ultraviolet rays exposure apparatus |
11/27/2008 | WO2008143357A1 Exposure apparatus and liquid immersion system |