| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 12/10/2008 | EP1576040A4 Patterned polymeric structures, particularly microstructures, and methods for making same |
| 12/10/2008 | EP1555572B1 Photosensitive resin printing plate original, process for producing the same and process for producing resin relief printing plate therewith |
| 12/10/2008 | CN101322078A Radiation system and lithographic apparatus |
| 12/10/2008 | CN101322077A Local control of heat flow to more accurately regulate machine temperatures |
| 12/10/2008 | CN101322076A Method of making a lithographic printing plate |
| 12/10/2008 | CN101322075A Method of making a lithographic printing plate |
| 12/10/2008 | CN101322074A Silicon-containing resist underlying layer film forming composition for formation of photocrosslinking cured resist underlying layer film |
| 12/10/2008 | CN101322073A Positive photosensitive resin composition, and semiconductor device and display using same |
| 12/10/2008 | CN101321727A 肟酯光敏引发剂 Oxime ester photoinitiator |
| 12/10/2008 | CN101321632A Imageable members with improved chemical resistance |
| 12/10/2008 | CN101320683A Method of reworking a semiconductor substrate and method of forming a pattern of a semiconductor device |
| 12/10/2008 | CN101320225A Deionized water nozzle device and its spraying and brushing method |
| 12/10/2008 | CN101320224A Halogen-free amorphous carbon mask etch having high selectivity to photoresist |
| 12/10/2008 | CN101320223A Photoetching apparatus, control method and calibration method |
| 12/10/2008 | CN101320222A Stepping type non-mask digital exposure device based on digital micro-lens array |
| 12/10/2008 | CN101320221A Systems and methods for insitu lens cleaning in immersion lithography |
| 12/10/2008 | CN101320220A Exposure ploting device |
| 12/10/2008 | CN101320219A Field measurement method and device for optical aberration of imaging optical system |
| 12/10/2008 | CN101320218A Three scanning type silicon slice focusing and leveling measurement apparatus, system and method |
| 12/10/2008 | CN101320217A Self-centering device |
| 12/10/2008 | CN101320216A Reshaping structure of micro-photoetching illumination iris |
| 12/10/2008 | CN101320215A Photo-etching mark on semiconductor material and its production method |
| 12/10/2008 | CN101320214A Method and device for monitoring change of light blockage coating weight |
| 12/10/2008 | CN101320213A Light sensitive resin composition and flexible printed circuit board produced with the same |
| 12/10/2008 | CN101320212A Photo-cured heat-cured resin composition and printed circuit board produced with the same |
| 12/10/2008 | CN101320211A Mold with micro-structure mould core and manufacturing method thereof |
| 12/10/2008 | CN101320210A A method of preparing a substrate having a layer or pattern of metal on it |
| 12/10/2008 | CN101320209A Production method of surface conducting polymer graphic pattern |
| 12/10/2008 | CN101320208A Reflection holography thin film and preparation method thereof |
| 12/10/2008 | CN101320207A Method for preparing optical grating by holography-ion beam etching |
| 12/10/2008 | CN101320206A Overlapping mark and uses thereof |
| 12/10/2008 | CN101320205A Method for producing outer casing of electronic product |
| 12/10/2008 | CN101320203A Mold |
| 12/10/2008 | CN101320175A Silicon based LCD device with colorful array of pixels, and production method thereof |
| 12/10/2008 | CN101320136A Polarization conversion element, lighting optical device, exposure system, and exposure method |
| 12/10/2008 | CN101320122A Projection optical system |
| 12/10/2008 | CN101320104A Optical element, method for producing same, replica substrate configured to form optical element, and method for producing replica substrate |
| 12/10/2008 | CN101319314A Thin-layer metal membrane material and method of producing the same |
| 12/10/2008 | CN101318768A Titania-doped quartz glass for nanoimprint molds |
| 12/10/2008 | CN101318444A False proof film and preparation method thereof |
| 12/10/2008 | CN100442539C A method of forming a metal pattern and a method of fabricating tft array panel by using the same |
| 12/10/2008 | CN100442470C Inline connection setting method and device and substrate processing devices and substrate processing system |
| 12/10/2008 | CN100442469C Method to detect photoresist residue on a semiconductor device |
| 12/10/2008 | CN100442437C Substrate processing methodq |
| 12/10/2008 | CN100442436C Method for forming pattern and method for manufacturing semiconductor device |
| 12/10/2008 | CN100442435C Electron beam writing equipment and electron beam writing method |
| 12/10/2008 | CN100442144C Differential critical dimension and overlay metrology device and measurement method |
| 12/10/2008 | CN100442108C Aluminum cemical mechanical polishing eat-back for liquid crystal device on silicon |
| 12/10/2008 | CN100441318C Coating film drying method, coating film forming method, and coating film forming apparatus |
| 12/09/2008 | US7463423 Lithography projection objective, and a method for correcting image defects of the same |
| 12/09/2008 | US7463402 Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography |
| 12/09/2008 | US7463352 Method and apparatus for article inspection including speckle reduction |
| 12/09/2008 | US7463336 Device manufacturing method and apparatus with applied electric field |
| 12/09/2008 | US7463333 Multi-exposure lithography system providing increased overlay accuracy |
| 12/09/2008 | US7463173 Charged particle beam apparatus, abnormality detecting method for DA converter unit, charged particle beam writing method, and mask |
| 12/09/2008 | US7462842 Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements |
| 12/09/2008 | US7462814 Methods and systems for lithography process control |
| 12/09/2008 | US7462653 Photocurable and thermosetting composition for ink jet system and printed circuit boards made by use thereof |
| 12/09/2008 | US7462650 Trifunctional photoinitiators |
| 12/09/2008 | US7462548 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 12/09/2008 | US7462514 Semiconductor device and method for manufacturing the same, liquid crystal television, and EL television |
| 12/09/2008 | US7462471 polymeric matrix formed of a biodegradable, biocompatible, synthetic, amorphous polymer or semi-crystalline polymer having specific crystallinity, porosity and pore size; suitable for attachment and proliferation of dissociated cells |
| 12/09/2008 | US7462443 Labeling substrates such as optical disks; mixture of color forming; magnetic radiation absorber and stabilizer |
| 12/09/2008 | US7462442 Biocompatible microchip and a method for producing the same |
| 12/09/2008 | US7462441 Planographic printing plate material and printing method |
| 12/09/2008 | US7462440 comprising hydrophilic supports and laser-sensitive photopolymerizing layer containing polymers having ether, ester and amide groups in its side chains |
| 12/09/2008 | US7462439 Pentapolymer of tert-butyl acrylate, (meth)acrylic acid, alkyl (meth)acrylate, maleic anhydride, and N-perfluoroalkylsulfonyloxynorbornene-2,3-dicarboximide; immersion lithography; prevents the multiple interference of light inside a photoresist during formation |
| 12/09/2008 | US7462438 Resist material and pattern formation method using the same |
| 12/09/2008 | US7462437 Presensitized lithographic plate comprising support and hydrophilic image-recording layer |
| 12/09/2008 | US7462436 dissolution promoter(s) of given formula such as 1,1-bis(4-hydroxyphenyl)cyclohexane and an alkali-soluble novolak containing hydroxyalkyl ether units that can be substituted with 1,2-naphthoquinonediazidesulfonyl groups; excellent resolution and good suppression of crack generation during plating |
| 12/04/2008 | WO2008147175A1 Lithographic apparatus and device manufacturing method |
| 12/04/2008 | WO2008147063A1 Photosensitive paste composition for fabricating the plasma display panel electrode, plasma display panel electrode and plasma display panel thereby |
| 12/04/2008 | WO2008146946A2 Exposure method and apparatus, and method for producing device |
| 12/04/2008 | WO2008146936A1 Photosensitive adhesive resin composition, adhesive film and light-receiving device |
| 12/04/2008 | WO2008146933A1 Exposure method and electronic device manufacturing method |
| 12/04/2008 | WO2008146877A1 Vibration control equipment, control method of vibration control equipment, and exposure device |
| 12/04/2008 | WO2008146869A2 Pattern forming method, pattern or mold formed thereby |
| 12/04/2008 | WO2008146855A1 Photosensitive composition, partition wall, and black matrix |
| 12/04/2008 | WO2008146819A1 Exposure apparatus, device manufacturing method, cleaning device, cleaning method and exposure method |
| 12/04/2008 | WO2008146723A1 Resin composition, resin spacer film, and semiconductor device |
| 12/04/2008 | WO2008146685A1 Reactive urethane compound having ether bond, curable composition and cured product |
| 12/04/2008 | WO2008146655A1 Optical element holding apparatus, lens barrel, exposure apparatus and device manufacturing method |
| 12/04/2008 | WO2008146626A1 Composition for antireflection film formation and method for resist pattern formation using the composition |
| 12/04/2008 | WO2008146625A1 Composition for antireflection film formation and method for resist pattern formation using the composition |
| 12/04/2008 | WO2008146584A1 Process for producing high-concentration ozone water, apparatus therefor, method of substrate surface treatment and apparatus therefor |
| 12/04/2008 | WO2008145762A1 Image forming apparatus, in particular for printing plates |
| 12/04/2008 | WO2008145568A1 Illumination system with at least one acoustooptical mirror |
| 12/04/2008 | WO2008145530A1 A lithographic printing plate precursor |
| 12/04/2008 | WO2008145529A1 A lithographic printing plate precursor |
| 12/04/2008 | WO2008145528A1 A lithographic printing plate precursor |
| 12/04/2008 | WO2008145296A1 Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component manufactured with said method |
| 12/04/2008 | WO2008145295A1 Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component manufactured with said method |
| 12/04/2008 | WO2008145268A1 Die for micro-contact printing and method for the production thereof |
| 12/04/2008 | WO2008145210A1 Method and apparatus for determining the relative overlay shift of stacked layers |
| 12/04/2008 | WO2008144923A1 Nc-si/sio2 coatings and direct lithographic patterning thereof |
| 12/04/2008 | WO2008127036A3 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin |
| 12/04/2008 | WO2008108253A3 Exposing method, exposure apparatus, device fabricating method, and substrate for immersion exposure |
| 12/04/2008 | WO2008089990A3 Method for operating an immersion lithography apparatus |
| 12/04/2008 | WO2008077048A3 Substrate processing apparatus and method |
| 12/04/2008 | WO2008060876A3 Solvent-assisted embossing of flexographic printing plates |