| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/17/2008 | CN100444009C Method for forming array substrate |
| 12/17/2008 | CN100444007C Manufacturing method of film transistor matrix substrate |
| 12/17/2008 | CN100443950C Beam homogenizing device, laser radiating device and method for making semiconductor device |
| 12/17/2008 | CN100443932C Color filter sheet structure and its producing method |
| 12/17/2008 | CN100443545C Light crosslinking resin and its synthesis method |
| 12/16/2008 | US7467072 Simulation of objects in imaging using edge domain decomposition |
| 12/16/2008 | US7466531 Substrate holding system and exposure apparatus using the same |
| 12/16/2008 | US7466413 Marker structure, mask pattern, alignment method and lithographic method and apparatus |
| 12/16/2008 | US7466397 Safety mechanism for a lithographic patterning device |
| 12/16/2008 | US7466393 Immersion exposure technique |
| 12/16/2008 | US7466392 Exposure apparatus, exposure method, and method for producing device |
| 12/16/2008 | US7465837 Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions |
| 12/16/2008 | US7465673 Method and apparatus for bilayer photoresist dry development |
| 12/16/2008 | US7465667 Liquid perfluoropentane and perfluorohexane transparent to ultraviolet radiation; minimized oxygen and water content; optical couplers, cements, elements, or inspection media for semiconductor wafers and immersion photolithography |
| 12/16/2008 | US7465532 Image transfer process for thin film component definition |
| 12/16/2008 | US7465531 Polymer for forming anti-reflective coating layer |
| 12/16/2008 | US7465530 Inorganic resist material and nano-fabrication method by utilizing the same |
| 12/16/2008 | US7465529 Radiation sensitive material and method for forming pattern |
| 12/16/2008 | US7465528 Resin having a repeating unit having a diamantane structure that can decompose under action of an acid to increase solubility in an alkali developer; photo-acid generator, especially sulfonium salts of fluorinated sulfonic acids |
| 12/16/2008 | US7465527 Sulfonium or iodinium photo-acid generator; second photo-acid generator containing a sulfonium or a bis(trichloromethyl)triazine group; resin of a polarity changeable type in which some polar groups are protected by norbornane or adamantane group that can be eliminated by an acid; transistor |
| 12/11/2008 | WO2008151185A1 Methods for performing model-based lithography guided layout design |
| 12/11/2008 | WO2008151107A2 High-resolution flexural stage for in-plane position and out-of-plane pitch/roll alignment |
| 12/11/2008 | WO2008150691A1 Patterned photoacid etching and articles therefrom |
| 12/11/2008 | WO2008150499A1 Template having a silicon nitride, silicon carbide, or silicon oxynitride film |
| 12/11/2008 | WO2008150441A1 Imageable elements and methods of use in negative working lithographic printing plates |
| 12/11/2008 | WO2008150422A1 Optical modulator with beam-pointing correction |
| 12/11/2008 | WO2008150167A1 Extreme ultra-violet lithographic apparatus and device manufacturing method |
| 12/11/2008 | WO2008150058A1 Hardmask composition having antireflective properties and method of patterning material on substrate using the same |
| 12/11/2008 | WO2008149989A1 Patterning method |
| 12/11/2008 | WO2008149988A1 Patterning method |
| 12/11/2008 | WO2008149987A1 Patterning method |
| 12/11/2008 | WO2008149966A1 Positive radiation-sensitive resin composition |
| 12/11/2008 | WO2008149947A1 Positive photosensitive resin composition and method of forming cured film therefrom |
| 12/11/2008 | WO2008149913A1 Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method |
| 12/11/2008 | WO2008149885A1 Process for producing liquid photosensitive resin relief printing plate and apparatus therefor |
| 12/11/2008 | WO2008149853A1 Environment control apparatus, stage apparatus, exposure apparatus, and device production method |
| 12/11/2008 | WO2008149776A1 Method for producing substrate with partition wall and pixel formed thereon |
| 12/11/2008 | WO2008149756A1 Exposure method, method of manufacturing plate for flat panel display, and exposure apparatus |
| 12/11/2008 | WO2008149730A1 Positive photosensitive resin composition and polyhydroxyamide resin |
| 12/11/2008 | WO2008149701A1 Radiation-sensitive resin composition |
| 12/11/2008 | WO2008149662A1 Curable composition for color filter, method for producing curable composition for color filter, colored curable resin composition, method for forming colored pattern, colored pattern, method for producing color filter, color filter, and liquid crystal display device |
| 12/11/2008 | WO2008149625A1 Photosensitive adhesive composition, film-like adhesive, adhesive sheet, method for forming adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device and method for manufacturing semiconductor device |
| 12/11/2008 | WO2008149178A1 Catoptric illumination system for microlithography tool |
| 12/11/2008 | WO2008148909A1 System for lithography by laser interference |
| 12/11/2008 | WO2008148411A1 A method and an apparatus for producing microchips |
| 12/11/2008 | US20080306180 Polyamide Acid Resin Containing Unsaturated Group, Photosensitive Resin Composition Using Same, and Cured Product Thereof |
| 12/11/2008 | US20080305970 Analysis Device with an Array of Focusing Microstructures |
| 12/11/2008 | US20080305443 Pattern forming method using relacs process |
| 12/11/2008 | US20080305441 Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same |
| 12/11/2008 | US20080305440 Apparatus for fabricating nanoscale patterns in light curable compositions using an electric field |
| 12/11/2008 | US20080305439 Manufacturing method of optical waveguide |
| 12/11/2008 | US20080305438 Method for fabricating polymer ridged waveguides by using tilted immersion lithography |
| 12/11/2008 | US20080305435 Method of making lithographic printing plate substrate and imageable elements |
| 12/11/2008 | US20080305434 Developing Apparatus and Developing Method |
| 12/11/2008 | US20080305432 Positive resist composition and pattern-forming method |
| 12/11/2008 | US20080305431 Pretreatment compositions |
| 12/11/2008 | US20080305430 Photo-sensitive compound and photoresist composition including the same |
| 12/11/2008 | US20080305429 Resist composition and pattern forming method using the resist composition |
| 12/11/2008 | US20080305428 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer |
| 12/11/2008 | US20080305427 Lithographic Printing Plate |
| 12/11/2008 | US20080305412 Near-field exposure mask and near-field exposure method |
| 12/11/2008 | US20080305411 Photomask blank, resist pattern forming process, and photomask preparation process |
| 12/11/2008 | US20080305409 Lithographic mask and method for printing features using the mask |
| 12/11/2008 | US20080305407 film comprising carrier sheet having transparent layer comprising fluoroelastomer, intermediate layer of poly(vinyl alcohol), barrier layer of poly(cyanoacrylate) and infrared radiation absorbing dye, imageable layer comprising dye and UV-absorbing colorant dispersed in polyurethane binder, and overcoat |
| 12/11/2008 | US20080305406 Photomask Blank, Photomask Manufacturing Method and Semiconductor Device Manufacturing Method |
| 12/11/2008 | US20080305405 Optical recording composition, holographic recording medium, and method of recording and reproducing information |
| 12/11/2008 | US20080305404 Hologram Recording Material |
| 12/11/2008 | US20080305197 Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning |
| 12/11/2008 | US20080304767 Image Processing Method, Image Processor, Drawing System, and Program |
| 12/11/2008 | US20080304064 Alignment apparatus, control method thereof, exposure apparatus, and method of manufacutring semiconductor device by exposure apparatus controlled by the same control method |
| 12/11/2008 | US20080304033 Projection objective for a microlithographic projection exposure apparatus |
| 12/11/2008 | US20080304032 Microlitographic projection exposure apparatus and immersion liquid therefore |
| 12/11/2008 | US20080303869 Ink jet print head and manufacturing method thereof |
| 12/11/2008 | US20080303354 Coil support unit, motor and exposure apparatus using the same, and device manufacturing method |
| 12/11/2008 | US20080303160 Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning |
| 12/11/2008 | US20080302559 Flexible and elastic dielectric integrated circuit |
| 12/11/2008 | DE19942484B4 Verfahren zum Anzeigen, Prüfen und Abwandeln von Mustern für eine Belichtung A method for displaying, testing and modifying patterns for exposure |
| 12/11/2008 | DE102008002024A1 Optisches Element, Projektionsobjektiv und Projektionsbelichtungsanlage damit Optical element, projection lens and projection exposure system so |
| 12/11/2008 | DE102008001761A1 Projection lens for microlithographic projection illumination system for forming mask on light sensitive layer, has two compensation units arranged on different position along optical axis, where refractive lens are provided between units |
| 12/11/2008 | DE102007025846A1 Beleuchtungssystem mit wenigstens einem akustooptischen Spiegel Lighting system with at least one acousto-optic mirror |
| 12/11/2008 | DE102007025600A1 Interferenzfilter und Verfahren zu dessen Herstellung Interference filter and process for its preparation |
| 12/11/2008 | DE102007024843A1 Verfahren zum Erzeugen von Strukturen in einem Resistmaterial und Elektronenstrahlbelichtungsanlagen A method for producing patterns in a resist material, and electron beam exposure systems |
| 12/11/2008 | DE102004030961B4 Verfahren zum Bestimmen einer Matrix von Transmissionskreuzkoeffizienten bei einer optischen Näherungskorrektur von Maskenlayouts A method for determining a matrix of the transmission cross coefficient in an optical proximity correction mask layout |
| 12/10/2008 | EP2001042A2 Lighting optical system, exposure system, and device production method |
| 12/10/2008 | EP2001040A2 Machine for removing surfaces of semiconductors and particularly surfaces with integrated circuits |
| 12/10/2008 | EP2000854A2 Substrate processing apparatus and method of manufacturing device |
| 12/10/2008 | EP2000853A2 Photo-sensitive compound and photoresist composition including the same |
| 12/10/2008 | EP2000852A1 Halogenated anti-reflective coatings |
| 12/10/2008 | EP2000851A1 Photomask blank, resist pattern forming process, and photomask preparation process |
| 12/10/2008 | EP2000840A2 Projection optical system, exposure apparatus and device manufacturing method |
| 12/10/2008 | EP1999945A1 Internal-drum imagesetter |
| 12/10/2008 | EP1999779A1 Device and method for coating a micro- and/or nano-structured structural substrate and coated structural substrate |
| 12/10/2008 | EP1999515A2 Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process |
| 12/10/2008 | EP1999514A1 Photosensitive resist composition for color filters for use in electronic paper display devices |
| 12/10/2008 | EP1999513A1 Method of forming nanopattern and substrate having pattern formed using the method |
| 12/10/2008 | EP1955111A4 Photopolymer printing form with reduced processing time |
| 12/10/2008 | EP1928929A4 Curable compositions containing dithiane monomers |
| 12/10/2008 | EP1891662A4 Imprinting apparatus for forming pattern at uniform contact by additional constant pressure |
| 12/10/2008 | EP1849042B1 Process for the production of lithographic printing plates |
| 12/10/2008 | EP1677147B1 Block copolymer composition for photosensitive flexographic plate |