Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2008
12/18/2008WO2008152058A1 Ultrasonic sensor
12/18/2008WO2008151915A1 Process for preparing a polymeric relief structure
12/18/2008WO2008151848A1 Lithographic apparatus and method
12/18/2008WO2008081996A3 Pigment-dispersed composition, curable composition, color filter and production method thereof
12/18/2008WO2008029315A3 Method of cleaning a surface region covered with contaminant or undesirable material
12/18/2008US20080312400 Composition for forming resist underlayer film, and resist underlayer film
12/18/2008US20080311531 Method and apparatus for generating periodic patterns by step-and-align interference lithography
12/18/2008US20080311529 Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatterns
12/18/2008US20080311528 Methods of Patterning Photoresist, and Methods of Forming Semiconductor Constructions
12/18/2008US20080311527 Method of forming protection layer on photoresist pattern and method of forming fine pattern using the same
12/18/2008US20080311526 Method for a multiple exposure, microlithography projection exposure installation and a projection system
12/18/2008US20080311525 Method of Making a Photopolymer Printing Plate
12/18/2008US20080311524 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor
12/18/2008US20080311523 Material for Formation of Resist Protection Film and Method of Forming Resist Pattern Therewith
12/18/2008US20080311522 Comprising base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon irradiation
12/18/2008US20080311520 On-press developable negative-working imageable elements and methods of use
12/18/2008US20080311515 Positive resist composition and method of forming resist pattern
12/18/2008US20080311514 Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
12/18/2008US20080311513 Photosensitive metal nanoparticle and method of forming conductive pattern using the same
12/18/2008US20080311512 Photosensitive resin composition and method for pattern forming
12/18/2008US20080311511 Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming
12/18/2008US20080311510 Lithographic printing plate support and presensitized plate
12/18/2008US20080311509 Photopolymer Printing Plate Precursor
12/18/2008US20080311508 Process of making a semiconductor device using multiple antireflective materials
12/18/2008US20080311507 Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same
12/18/2008US20080311506 Graded topcoat materials for immersion lithography
12/18/2008US20080311488 Color Photoresist with Gold Nanoparticles and Color Filters Made Thereby
12/18/2008US20080311486 Photomask manufacturing method and semiconductor device manufacturing method
12/18/2008US20080311485 Photomasks Used to Fabricate Integrated Circuitry, Finished-Construction Binary Photomasks Used to Fabricate Integrated Circuitry, Methods of Forming Photomasks, and Methods of Photolithographically Patterning Substrates
12/18/2008US20080311483 Radiation-Crosslinking And Thermally Crosslinking PU Systems-Based On Poly(epsilon-Caprolactone) Polyester Polyols
12/18/2008US20080311434 Metallic Supporting Grid for Thin Electrolyte Membrane in Solid Oxide Fuel Cells
12/18/2008US20080311359 free of laser irradiation defect; thin film layer of antimony doped tin oxide or mixed oxides of tin and iridium; thin film layer is irradiated with an excimer laser light or a YAG laser light
12/18/2008US20080309950 Calibrating A Lithographic Apparatus
12/18/2008US20080309905 Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus
12/18/2008US20080309902 detection of nucleic acid derived from mutant oncogenes or other tumor-associated DNA; detection, identification, or monitoring of the existence, progression or clinical status of neoplasia in humans or other animals that contain a mutation that is associated with the neoplasm
12/18/2008US20080309896 Exposure method, exposure apparatus, and method for producing device
12/18/2008US20080309894 Microlithographic projection exposure apparatus and measuring device for a projection lens
12/18/2008DE102007027200A1 Projektionsbelichtungsanlage für die Mikrolithographie Projection exposure system for microlithography
12/17/2008EP2003684A1 Exposure apparatus, exposure method and device manufacturing method
12/17/2008EP2003683A1 Exposure apparatus and device manufacturing method
12/17/2008EP2003682A1 Exposure apparatus and device production method
12/17/2008EP2003681A1 Measuring device and method, processing device and method, pattern forming device and method, exposing device and method, and device fabricating method
12/17/2008EP2003680A1 Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method
12/17/2008EP2003520A2 Photosensitive composition, optical recording medium and method for manufacturing same, optical recording method, and optical recording apparatus
12/17/2008EP2003509A2 Pattern forming method
12/17/2008EP2003507A1 Scanning exposure apparatus, micro device manufacturing method, mask, projection optical apparatus and mask manufacturing method
12/17/2008EP2003506A2 Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device
12/17/2008EP2003505A2 Method of forming patterns
12/17/2008EP2003504A2 Method of forming patterns
12/17/2008EP2003503A1 Inkless printing paper and method
12/17/2008EP2003502A1 Inkless printing paper and method
12/17/2008EP2003501A1 Inkless reimageable printing paper and method
12/17/2008EP2003500A2 Optical recording composition, holographic recording medium, and method of recording and reproducing information
12/17/2008EP2003478A2 Projection optical system, aligner, and method for fabricating device
12/17/2008EP2003148A2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
12/17/2008EP2003098A1 Titania-doped quartz glass for nanoimprint molds
12/17/2008EP2002309A1 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
12/17/2008EP2002308A1 Dynamic compensation system for maskless lithography
12/17/2008EP2002307A1 Method for in-situ aberration measurement of optical imaging system in lithographic tools
12/17/2008EP2002306A1 Flexographic printing plate assembly
12/17/2008EP2002301A1 Reflecting optical element with eccentric optical passageway
12/17/2008EP2001988A2 Improved alkaline solutions for post cmp cleaning processes
12/17/2008EP2001602A2 Lithography imprinting system
12/17/2008EP1953763A4 Scanning nanojet microscope and the operation method thereof
12/17/2008EP1917340B1 Method for removing ionic contaminants from the surface of a workpiece
12/17/2008EP1875469B1 Device for directing radiation to a layer, apparatus with such device and method using such apparatus
12/17/2008EP1843884A4 Chucking system for nano-manufacturing
12/17/2008EP1597287A4 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof
12/17/2008EP1579272A4 Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems
12/17/2008EP1495312A4 Sample surface inspection apparatus and method
12/17/2008EP1407322B1 Laser marking method
12/17/2008EP1110124B1 Method of making optical replicas by stamping in photoresist and replicas formed thereby
12/17/2008CN201166781Y In situ detection system for image difference of photo-etching machine projection objective
12/17/2008CN201166780Y Mask protection equipment
12/17/2008CN201166779Y Insertion edition type laser molding roller
12/17/2008CN201166778Y Double-roller multi-warm areas online molding device
12/17/2008CN101326465A Analysis device with an array of focusing microstructures
12/17/2008CN101325149A Device, system and method for manufacturing semiconductor
12/17/2008CN101324760A Depicting system, depicting apparatus and depicting method
12/17/2008CN101324759A Optical head and optical etching apparatus
12/17/2008CN101324758A Monitoring system and monitoring method of photoetching machine
12/17/2008CN101324757A Etching method of spacing phase locking electron scanning beam
12/17/2008CN101324756A Method for improving prepared thin film thickness in rotary coating method
12/17/2008CN101324755A Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof
12/17/2008CN101324754A Photosensitive black composition and color filter
12/17/2008CN101324753A Radiation sensibility composition for forming staining layer, color filter and color liquid crystal display element
12/17/2008CN101324752A Method for preparing polymer LCD photosensitive material capable of recording reflection holography
12/17/2008CN101324751A Multiple tools using a single data processing unit
12/17/2008CN101324750A Light mask for liquid crystal display device and method for making colour filter using the same
12/17/2008CN101323952A Preparing technological process of high vacuum vapor deposition dielectric membrane transfer material
12/17/2008CN101323708A Colorant, color filter, LCD device, composition and preparation
12/17/2008CN100444316C Semiconductor manufacturing apparatus and pattern formation method
12/17/2008CN100444315C Exposure apparatus and method for producing device
12/17/2008CN100444306C Polymer anti-reflective coatings deposited by plasma enhanced chemical vapor deposition
12/17/2008CN100444027C Method for making reverse ladder structure by using architecture-complementary micro-patterning technique
12/17/2008CN100444026C Method and apparatus for immersion lithography
12/17/2008CN100444025C Photoetching glue correcting method
12/17/2008CN100444024C Method of forming uniform features using photoresist
12/17/2008CN100444023C Accurate magnetic suspension worktable for photo etching under extra ultraviolet
12/17/2008CN100444012C Pixel structure of liquid crystal display of thin film transistor, and fabricating method