| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/24/2008 | EP2006740A1 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product |
| 12/24/2008 | EP2006739A2 Catadioptric projection objective |
| 12/24/2008 | EP2006738A2 Lithographic printing plate precursor and lithographic printing method |
| 12/24/2008 | EP2006737A2 Photosensitive resin composition for flexographic printing |
| 12/24/2008 | EP2006310A2 Polymer compound and production method thereof, pigment dispersing agent, pigment dispersion composition, photocurable composition, and color filter and production method thereof |
| 12/24/2008 | EP2005253A1 Illumination optical apparatus, projection exposure apparatus, and device manufacturing method |
| 12/24/2008 | EP2005252A1 Device for collecting flux of electromagnetic radiation in the extreme ultraviolet |
| 12/24/2008 | EP2005251A2 Device and method for microstructuring a storage medium and storage medium comprising a microstructured region |
| 12/24/2008 | EP2005250A1 Microlithography projection optical system, tool and method of production |
| 12/24/2008 | EP2005249A1 Microlithography projection optical system and method for manufacturing a device |
| 12/24/2008 | EP2005248A2 Low thermal distortion silicone composite molds |
| 12/24/2008 | EP2005247A2 Method of forming nanoscale features using soft lithography |
| 12/24/2008 | EP2005246A1 Cationic composition and methods of making and using the same |
| 12/24/2008 | EP2004725A1 Base soluble polymers for photoresist compositions |
| 12/24/2008 | EP1728122B1 Method for determining relative swing curve amplitude |
| 12/24/2008 | EP1652866B1 Acrylic polymers and radiation-sensitive resin compositions |
| 12/24/2008 | EP1540716A4 Replication and transfer of microstructures and nanostructures |
| 12/24/2008 | DE102008028415A1 Optische Baugruppe, Projektionsbelichtungsanlage für die Halbleiterlithographie und Projektionsobjektiv Optical assembly projection exposure apparatus for semiconductor lithography projection lens |
| 12/24/2008 | DE102007047663A1 Verfahren und Vorrichtung zur Herstellung periodischer Muster mittels Interferenz-Lithographie durch schrittweise vorgenommene Ausrichtung Method and apparatus for producing a periodic pattern by means of interference lithography by stepwise made orientation |
| 12/24/2008 | DE102007029445A1 Hierarchically structured films and membranes manufacturing method, involves applying and coating printed fluid structures on substrate with lining fluid, and hardening lining fluid and/or vaporized volatile components |
| 12/24/2008 | DE102007028860A1 Vorrichtung zur Kontaktbelichtung einer Druckschablone Apparatus for contact exposure of a stencil |
| 12/24/2008 | DE102007028859A1 Vorrichtung zur Kontaktbelichtung einer Druckschablone Apparatus for contact exposure of a stencil |
| 12/24/2008 | DE102007027811A1 Optical element has partial components connecting intermediate layer provided area by area between partial components, where intermediate layer is formed as inorganic layer and contains silicon oxide bridges |
| 12/24/2008 | DE102004027347B4 Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich Wavelength for the soft X-ray and extreme ultraviolet region |
| 12/24/2008 | CN201170838Y Return mechanism for exposal base station of exposure machine |
| 12/24/2008 | CN201170837Y Contraposition device for single-side exposure machine |
| 12/24/2008 | CN101331594A Processing device, processing method, and plasma source |
| 12/24/2008 | CN101331433A Method of making a lithographic printing plate |
| 12/24/2008 | CN101331432A Method of making a lithographic printing plate |
| 12/24/2008 | CN101331157A Fluorine-containing polymer, negative photosensitive composition and partition wall |
| 12/24/2008 | CN101331155A Process for preparing stable photoresist compositions |
| 12/24/2008 | CN101329519A Method for removing photoresist and method for manufacturing mosaic structure |
| 12/24/2008 | CN101329518A Developing device and developing method thereof |
| 12/24/2008 | CN101329517A Lithographic apparatus having parts with a coated film adhered thereto |
| 12/24/2008 | CN101329516A Device for controlling photo-etching machine immerge |
| 12/24/2008 | CN101329515A Device and method for measuring and checking step photoetching machine aligning system |
| 12/24/2008 | CN101329514A System and method for aligning photolithography apparatus |
| 12/24/2008 | CN101329513A Double-scanning type silicon chip focusing, leveling and measuring apparatus and system |
| 12/24/2008 | CN101329512A Photo resistance recovery system |
| 12/24/2008 | CN101329511A Chemically amplified positive resist composition |
| 12/24/2008 | CN101329510A Polymer having unsaturated side chain, radiation-sensitive resin composition and spacer for liquid crystal display element |
| 12/24/2008 | CN101329509A Method for manufacturing drag reduction surface |
| 12/24/2008 | CN101329508A Method for preparing micro-nano stamping stencil by femtosecond laser preparing |
| 12/24/2008 | CN101329481A Liquid crystal display panel and method for making the same |
| 12/24/2008 | CN101329465A Color membrane substrates and manufacturing method thereof |
| 12/24/2008 | CN101329419A Diffraction grid component and manufacturing method thereof |
| 12/24/2008 | CN101327904A Micro structre and manufacture method thereof |
| 12/24/2008 | CN101327710A Method for decorating surface of metal |
| 12/24/2008 | CN100446192C Replication and transfer of microstructures and nanostructures |
| 12/24/2008 | CN100446179C Exposure apparatus and device manufacturing method |
| 12/24/2008 | CN100446176C Substrate processing device, substrate processing method and substrate manufacture method |
| 12/24/2008 | CN100446167C Plasma focus light source with impoved pulse power system |
| 12/24/2008 | CN100446137C Manufacturing method of ceramic raw sheet and manufacturing method of electronic member using the ceramic raw sheet |
| 12/24/2008 | CN100446011C Method for generating pattern, method for manufacturing and control semiconductor device, and semiconductor device |
| 12/24/2008 | CN100445875C Method for correcting layering optical proximity effect |
| 12/24/2008 | CN100445874C Thin film pattern layer producing method |
| 12/24/2008 | CN100445873C Method for making surface acoustic wave element of matching and mixing nano impression and optical photo etching |
| 12/24/2008 | CN100445872C Liquid delivering and airtight device in submersible photoetching system |
| 12/24/2008 | CN100445871C Wafer bonding method |
| 12/24/2008 | CN100445870C System and method for processing masks with oblique features |
| 12/24/2008 | CN100445869C Scribing groove structure for registration photo etching |
| 12/24/2008 | CN100445852C Method for making organic thin film transistor and method for making liquid crystal display using same |
| 12/24/2008 | CN100445846C Photosensitive resin composition for photoresist |
| 12/24/2008 | CN100445836C Liquid crystal display panel and array base plate and method for manufacturing same |
| 12/24/2008 | CN100445832C Liquid crystal display device and method of manufacturing the same |
| 12/24/2008 | CN100445778C Photosensitive resin composition for color filter and method for mfg. LCD color filter by same |
| 12/24/2008 | CN100444973C Coated device and method |
| 12/23/2008 | US7469057 System and method for inspecting errors on a wafer |
| 12/23/2008 | US7468784 Method and device for forming optical or magnetic memory media or a template for the same |
| 12/23/2008 | US7468781 Exposure apparatus |
| 12/23/2008 | US7468780 Exposure apparatus and method |
| 12/23/2008 | US7468534 Localized masking for semiconductor structure development |
| 12/23/2008 | US7468239 Photomask for semi-transmission film is formed in one step process; large-scale |
| 12/23/2008 | US7468238 For creating two and three dimensional patterns in a rapid prototyping environment; patterned light generator uses a micromirror array to direct pattern light on a target; photochemical vapor deposition |
| 12/23/2008 | US7468235 Solution in an organic solvent of a polymer having units from maleic anhydride, vinyl fluoroalkanoate (especially vinyl trifluoroacetate) and optionally 5-norbornene-2-methanol; for use in immersion photolithography; can easily form fines pattern having a good profiles |
| 12/23/2008 | US7468234 Planographic printing plate precursor |
| 12/23/2008 | US7468227 Method of reducing the average process bias during production of a reticle |
| 12/23/2008 | US7468141 Method for decorating die surface as well as die |
| 12/23/2008 | US7467901 Substrate heat treatment apparatus |
| 12/23/2008 | US7467632 spraying a cleaning solution containing water and an ionic surfactant (polyvinylpyrrolidone or copolyme of acrylic acid or ester and vinylpyrrolidone) over the photoresist film before or after the exposing with radiation for preventing undesired photoresist pattern formation caused by ghost images |
| 12/23/2008 | US7467587 Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material |
| 12/23/2008 | CA2421343C Imaging of printing forms using a laser diode bar which also includes non-activatable laser diodes |
| 12/23/2008 | CA2342232C Method for producing etched circuits |
| 12/23/2008 | CA2307235C Fabricating optical waveguide gratings and/or characterising optical waveguides |
| 12/18/2008 | WO2008154473A1 Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure |
| 12/18/2008 | WO2008153850A1 Mask film to form relief images and method of use |
| 12/18/2008 | WO2008153389A1 Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device |
| 12/18/2008 | WO2008153155A1 Surface treatment agent for forming pattern and pattern forming method using the treatment agent |
| 12/18/2008 | WO2008153154A1 Cyclic compound, photoresist base material and photoresist composition |
| 12/18/2008 | WO2008153110A1 Resist composition for negative working-type development, and method for pattern formation using the resist composition |
| 12/18/2008 | WO2008153109A1 Resist composition for negative development and method of forming pattern therewith |
| 12/18/2008 | WO2008153066A1 Polymer compound, positive resist composition, and method for forming resist pattern |
| 12/18/2008 | WO2008153017A1 Photoengraving apparatus for liquid type photosensitive resin letterpress, photoengraving method using the apparatus, and drying device, post-exposing device, letterpress holding member, and resin recovering device constituting the photoengraving apparatus |
| 12/18/2008 | WO2008153000A1 Photosensitive color resin composition for color filter, color filter, liquid crystal display, and organic el display |
| 12/18/2008 | WO2008152926A1 Euv light source, euv exposure apparatus and semiconductor device manufacturing method |
| 12/18/2008 | WO2008152907A1 Agent for stripping resist film on electroconductive polymer, method for stripping resist film, and substrate with patterned electroconductive polymer |
| 12/18/2008 | WO2008152899A1 Process for producing lithographic plate |
| 12/18/2008 | WO2008152898A1 Lithographic plate material |
| 12/18/2008 | WO2008152454A1 Optical device and method of in situ treating an euv optical component to enhance a reduced reflectivity |
| 12/18/2008 | WO2008152087A1 Projection exposure system for microlithography |