| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 12/31/2008 | EP1449032B1 Imaging apparatus |
| 12/31/2008 | CN201174029Y Photolithography thin film evoked by probe |
| 12/31/2008 | CN101336047A Method for printing circuit board and combination thereof |
| 12/31/2008 | CN101335198A Method for forming fine pattern of semiconductor device |
| 12/31/2008 | CN101335187A Substrate treating apparatus |
| 12/31/2008 | CN101334812A Method for cutting CIF format circular into PG3600 format rectangle |
| 12/31/2008 | CN101334811A Method for cutting CIF format polygon into PG3600 format rectangle |
| 12/31/2008 | CN101334591A Levelling focusing mechanism possessing great range control function |
| 12/31/2008 | CN101334590A Exposure device |
| 12/31/2008 | CN101334589A Exposure pattern data detecting device, method and program |
| 12/31/2008 | CN101334588A Chemically amplified positive resist composition |
| 12/31/2008 | CN101334587A Photosensitive resin composition for organic film transistor |
| 12/31/2008 | CN101334504A Method for manufacturing erbium-doped hybrid SiO2 optical waveguides amplifier by ultraviolet light direct-writing |
| 12/31/2008 | CN101334493A Composite lens structure and method for forming same |
| 12/31/2008 | CN101333069A Titania-doped quartz glass for nanoimprint molds |
| 12/31/2008 | CN101332650A Casting die for preparing elastic plastics casting with three dimensional structure |
| 12/31/2008 | CN100447673C Method for aligning exposure mask and method for manufacturing thin film device substrate |
| 12/31/2008 | CN100447672C Minute pattern photoetching method |
| 12/31/2008 | CN100447671C Photoetching projector and reflector assembly for the same |
| 12/31/2008 | CN100447670C Photosensitive glue for high resolution factor cylinder platemaking |
| 12/31/2008 | CN100447669C Aqueous emulsion type cylinder photoresist |
| 12/31/2008 | CN100447645C Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof |
| 12/31/2008 | CN100447643C Thin film transistor substrate and fabricating method thereof |
| 12/31/2008 | CN100447628C Manufacturing method for chromatic filter layer |
| 12/31/2008 | CN100447591C Color filter substrate and manufacture method therefor |
| 12/31/2008 | CN100447127C Single-component hydrogen-capture-type light initiator and its preparing method and use |
| 12/31/2008 | CN100446993C Method for manufacturing support body for lithographic plate and its support body |
| 12/31/2008 | CN100446961C Tool for the production of a microstructured surface |
| 12/30/2008 | US7471469 Device for the low-deformation replaceable mounting of an optical element |
| 12/30/2008 | US7471374 Projection optical system, exposure apparatus, and exposure method |
| 12/30/2008 | US7471373 Lithographic apparatus with patterning device position determination |
| 12/30/2008 | US7471372 Exposure apparatus and production method of device using the same |
| 12/30/2008 | US7471371 Exposure apparatus and device fabrication method |
| 12/30/2008 | US7471309 Image exposing apparatus and image exposing method |
| 12/30/2008 | US7470932 Liquid crystal display panel and fabricating method thereof |
| 12/30/2008 | US7470824 (Monohalogen-substituted methyl) (adamantyl group-containing alkyl)ethers such as (chloromethyl) (2-oxo-1-adamantyl)ether; useful as a modifying agent for a photoresist resin and a dry etching resistance-improving agent in photolithography field, agricultural and medical intermediates |
| 12/30/2008 | US7470803 4-(trifluoromethyl)benzyl-4-(4-(triethoxysilyl)butyloxy)phenylsulfone; 4-methylbenzyl-4-(12-(phosphono)dodecyloxy)phenyl sulfone; capable of undergoing surface alteration by irradiation with relatively low energy wavelength, and of forming an organic thin film on a substrate with good reproducibility |
| 12/30/2008 | US7470611 In situ deposition of a low K dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application |
| 12/30/2008 | US7470544 Sensor array using sail |
| 12/30/2008 | US7470504 exposing a photoresist layer with regions of photosensitivity to an image in a planography process using high numerical aperture imaging tools |
| 12/30/2008 | US7470503 Method for reducing lithography pattern defects |
| 12/30/2008 | US7470502 a curable mixture a cationically polymerizable polyether and an onium salt with a organoboron anion; discharging the mixture onto a recording medium or hydrophilic supports and curing by irradiating with actinic radiation to form hydrophobic images |
| 12/30/2008 | US7470501 Pattern formation method through liquid immersion lithography |
| 12/30/2008 | US7470500 polyurethanes or polyetherurethane copolymers, used in image processing by forming a thin layer between a reflective substrate and a photoresist coating; fabrication of semiconductors by photolithography |
| 12/30/2008 | US7470499 Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition |
| 12/30/2008 | US7470491 Overcoating substrate with color filter having opening; forming photosensitive layer, exposure of photosensitve layer through apertures |
| 12/30/2008 | US7470490 vinyl acetate-vinyl chloride copolymers or polyurethane layers containing carbon black nanoparticles, that is impervious to ultraviolet light and exhibits excellent wear resistance and bonding strength to substrate films, used for preparation of flexographic printing plate |
| 12/25/2008 | US20080318806 Device for chemical and biochemical reactions using photo-generated reagents |
| 12/25/2008 | US20080318424 Photoresist residue remover composition and semiconductor circuit element production process employing the same |
| 12/25/2008 | US20080318171 Method of forming patterns |
| 12/25/2008 | US20080318169 Pattern forming method |
| 12/25/2008 | US20080318168 Method and Device for Structuring a Substrate |
| 12/25/2008 | US20080318167 Copolymer and composition for organic and antireflective layer |
| 12/25/2008 | US20080318165 Composition For Forming Antireflective Film And Wiring Forming Method Using Same |
| 12/25/2008 | US20080318164 exposing imaged, negative working, photopolymerizable coating to high pressure stream of heated but otherwise untreated tap water, where water completely removes only less cohesive and adhesive (e.g., partially polymerized) regions, producing printing plate having image pattern of highly cohesive regions |
| 12/25/2008 | US20080318163 exposing imaged negative working photopolymerizable coating to high pressure stream of tap water, whereby water completely removes only less cohesive and adhesive (e.g., partially polymerized) regions of substrate, producing printing plate having image pattern of highly cohesive oleophilic regions |
| 12/25/2008 | US20080318162 Use of highly alkaline developer regenerator composition |
| 12/25/2008 | US20080318160 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| 12/25/2008 | US20080318159 Positive photosensitive composition |
| 12/25/2008 | US20080318158 Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound |
| 12/25/2008 | US20080318157 Attaching radiation sensitive compounds to substrate; exposing to e-beam radiation; complexing metal binding group of radiation sensitive compounds with metal, metal compound, or metal or metal-oxide; attaching ligand, complexing; 4-[N-(3-triethoxysilyl)propyl]-carbamoyl-2-nitrobenzyl isonicotinate |
| 12/25/2008 | US20080318156 Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography |
| 12/25/2008 | US20080318155 Lithographic printing plate precursor and plate making method |
| 12/25/2008 | US20080318154 Ink-Less Printing |
| 12/25/2008 | US20080318153 Photosensitive layer stack |
| 12/25/2008 | US20080318152 Substrate for Exposure, Exposure Method and Device Manufacturing Method |
| 12/25/2008 | US20080317084 Laser Interferometer Mirror Assembly |
| 12/25/2008 | US20080316907 Recording medium, its manufacturing method, mother disc for recording medium, and its manufacturing method |
| 12/25/2008 | US20080316601 Method for Manufacturing a Hybrid Microlens |
| 12/25/2008 | US20080316598 Polarization-modulating optical element |
| 12/25/2008 | US20080316555 Hologram Recording Medium and Method for Manufacturing Same |
| 12/25/2008 | US20080316456 Catadioptric projection objective with geometric beam splitting |
| 12/25/2008 | US20080316453 Exposure apparatus, exposure method, and method for producing device |
| 12/25/2008 | US20080316452 Microlithographic projection exposure apparatus |
| 12/25/2008 | US20080316451 Catoptric objectives and systems using catoptric objectives |
| 12/25/2008 | US20080316449 Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device |
| 12/25/2008 | US20080315756 Organic light emitting display and manufacturing thereof |
| 12/25/2008 | US20080315357 Integrated circuit and method including structuring a material |
| 12/25/2008 | US20080315323 photomask; capable of controlling a line width of an outermost line pattern with different sizes; patterning and transferring the layout on a wafer |
| 12/25/2008 | US20080315126 Laser light source apparatus, exposure method, and exposure apparatus |
| 12/25/2008 | US20080315112 Charged particle beam deflection method with separate stage tracking and stage positional error signals |
| 12/25/2008 | US20080315092 Scanning probe microscopy inspection and modification system |
| 12/25/2008 | US20080314744 Interdigitated Microelectrode and a Process For Producing the Interdigitated Microelectrode |
| 12/24/2008 | WO2008157619A2 Total internal reflection displacement scale |
| 12/24/2008 | WO2008157345A2 Wafer reclamation compositions and methods |
| 12/24/2008 | WO2008156977A2 Methods of fabricating nanostructures by use of thin films of self-assembling of diblock copolymers, and devices resulting from those methods |
| 12/24/2008 | WO2008156557A2 Method using highly alkaline developer regenerator composition |
| 12/24/2008 | WO2008156552A1 On-press developable negative-working imageable elements and methods of use |
| 12/24/2008 | WO2008156366A1 Clamping device and object loading method |
| 12/24/2008 | WO2008156148A1 Pigment dispersion, coloring composition for color filter, color filter, liquid crystal display and organic el display |
| 12/24/2008 | WO2008156137A1 Lithographic printing plate material |
| 12/24/2008 | WO2008156115A1 Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate |
| 12/24/2008 | WO2008154907A2 Method and device for transferring nanostructures by means of contact stamping |
| 12/24/2008 | WO2008106245A3 Method of forming soft lithographic molds with fluorine modified elastomers |
| 12/24/2008 | WO2008099903A3 Fine pattern transfer material |
| 12/24/2008 | EP2006899A2 Stage apparatus, exposure apparatus, stage control method, exposure method and device manufacturing method |
| 12/24/2008 | EP2006885A1 Diffraction optical element, and aligner equipped with that element |
| 12/24/2008 | EP2006884A2 Mobile device, exposure device, exposure method, micro-motion body, and device manufacturing method |
| 12/24/2008 | EP2006846A1 Recording medium, its manufacturing method, mother disc for recording medium, and its manufacturing method |
| 12/24/2008 | EP2006741A2 Maintenance system, substrate processing apparatus, remote operation unit and communication method |