| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/07/2009 | CN101339324A Processing equipment and its control method |
| 01/07/2009 | CN101339264A Fused silica transmission 1*3 polarization irrelevant beam-splitting grating for 785 nanometer waveband |
| 01/07/2009 | CN101338416A Shading member, manufacturing method thereof, film and photo mask using the member |
| 01/07/2009 | CN100450330C Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device |
| 01/07/2009 | CN100449830C Fuel cell electric equipment electronic board manufacturing method of electric board connector for fuel cell wiring member and mounting method of fuel cell |
| 01/07/2009 | CN100449698C Exhaust control apparatus for gumming machine |
| 01/07/2009 | CN100449690C Multilayer mirror, method for manufacturing the same, and exposure equipment |
| 01/07/2009 | CN100449686C Manufacturing method of power semi-conductor discrete device first floor photolithography para-position making |
| 01/07/2009 | CN100449408C Substrate processing apparatus and substrate positioning device |
| 01/07/2009 | CN100449407C Optimized modules' proximity correction |
| 01/07/2009 | CN100449406C Resistance measuring system and measuring method using same |
| 01/07/2009 | CN100449405C Electronic beam exposure method |
| 01/07/2009 | CN100449404C Exposure unit and method for fabricating color light filter thereof |
| 01/07/2009 | CN100449403C Screen print lattice-point printing process |
| 01/07/2009 | CN100449392C Thin-film transistor LCD pixel structure and manufacturing method therefor |
| 01/07/2009 | CN100449391C Thin-film transistor LCD pixel structure and manufacturing method therefor |
| 01/07/2009 | CN100449365C Manufacturing method for reflection mirror of silicon-based LCD device |
| 01/07/2009 | CN100449336C Optical element and method of manufacturing optical element |
| 01/07/2009 | CN100448688C Lithographic printing original plate and lithographic printing plate |
| 01/06/2009 | US7474733 Optical element such as multilayer film reflection mirror, production method therefor and device using it |
| 01/06/2009 | US7474469 Arrangement of optical elements in a microlithographic projection exposure apparatus |
| 01/06/2009 | US7474409 Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof |
| 01/06/2009 | US7474383 Mask making method, mask making device, and mask drawing device |
| 01/06/2009 | US7474382 Method for determining focus deviation amount in pattern exposure and pattern exposure method |
| 01/06/2009 | US7474378 Assembly, a lithographic apparatus, and a device manufacturing method |
| 01/06/2009 | US7473915 System and method to pattern an object through control of a radiation source |
| 01/06/2009 | US7473910 Electron beam lithography apparatus |
| 01/06/2009 | US7473907 Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination |
| 01/06/2009 | US7473795 Blends of quinone alkide and nitroxyl compounds as polymerization inhibitors |
| 01/06/2009 | US7473523 A photomasks having sub-resolutions determine the amount of exposure dose to which various parts of the reticle field is exposed; different features within the same reticle field can exhibit different dimensions even though exposed to the same dose. |
| 01/06/2009 | US7473518 Method of manufacturing a device using a near-field photomask and near-field light |
| 01/06/2009 | US7473517 Supercritical developing for a lithographic process |
| 01/06/2009 | US7473516 Inducing coalescence of the thermoplastic polymer particles at exposed areas of the coating; developing the precursor by applying a gum solution to the coating, and thereby removing non-exposed areas from the support; developed and gummed in a single step |
| 01/06/2009 | US7473515 From vinyl acetate-vinyl alcohol copolymer and an aldehyde linked to a segment with a strong absorption peak at 700-1100 nm., e.g., 2-[2-[2-(4-formylbenzothio)-3-(1,3-dihydro-1,3,3-trimethyl-2H-benz[e]indol-2-ylidene)-ethylidene]-1-cyclohexen-1-yl]-ethenyl]-1,3,3-trimethyl-1H-benz[e]indolium perchlorate |
| 01/06/2009 | US7473513 Photosensitive metal nanoparticle and method of forming conductive pattern using the same |
| 01/06/2009 | US7473512 alkali soluble, water insoluble barrier against removal in immersion microlithography; alkyl alcohol solvent and a polynorbornene with an ionizable ring group (acidic fluoroalkylalcohol) to prevent amine contamination; pKa less than 9; poly(1,1,2,3,3-pentafluoro-4-fluoroalkyl-4-hydroxy-1,6-heptadiene) |
| 01/06/2009 | US7473500 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 01/06/2009 | US7473494 Exposure mask and mask pattern production method |
| 01/06/2009 | US7472579 Liquid flow proximity sensor for use in immersion lithography |
| 01/02/2009 | DE102008017888A1 Optical arrangement for extreme UV lithography device, has reflective optical elements including particular operating temperature, where optical characteristics of arrangement are optimized for operation |
| 01/01/2009 | US20090004731 Cell culture apparatus and a fabricating method of the same |
| 01/01/2009 | US20090004609 Lithography process |
| 01/01/2009 | US20090004608 Detergent For Lithography And Method Of Forming Resist Pattern With The Same |
| 01/01/2009 | US20090004607 Substrate Processing Method |
| 01/01/2009 | US20090004606 Radiation Sensitive Silicone Resin Composition |
| 01/01/2009 | US20090004605 Semiconductor Processing Methods of Transferring Patterns from Patterned Photoresists to Materials |
| 01/01/2009 | US20090004604 Method for forming fine pattern of semiconductor device |
| 01/01/2009 | US20090004603 Method for Forming Fine Pattern of Semiconductor Device |
| 01/01/2009 | US20090004602 Fabricating method of nano-ring structure by nano-lithography |
| 01/01/2009 | US20090004599 Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
| 01/01/2009 | US20090004598 Resin exhibits changed alkali solubility under action of acid, oxime sulfonate-based acid generator, amine, and organic acid, all dissolved in solvent comprising methyl n-amyl ketone; heat treatment; semiconductors |
| 01/01/2009 | US20090004597 Photosensitive Composition, Display Member, and Process for Producing The Same |
| 01/01/2009 | US20090004595 include an infrared radiation absorbing chromophore, a diaryliodonium cation and a alkyltriphenylborate anion, and metallocene; making lithographic printing plates that have desired imaging speed, excellent run length, and shelf life |
| 01/01/2009 | US20090004581 Exposure apparatus, exposure method and optical proximity correction method |
| 01/01/2009 | US20090004578 Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device |
| 01/01/2009 | US20090004576 Photomask and method for forming a resist pattern |
| 01/01/2009 | US20090004575 Exposure mask with double patterning technology and method for fabricating semiconductor device using the same |
| 01/01/2009 | US20090004573 System and method for making photomasks |
| 01/01/2009 | US20090004571 Optically Variable Security Device |
| 01/01/2009 | US20090004444 Novel Photosensitive Resin Compositions |
| 01/01/2009 | US20090004321 Molding apparatus and molding method |
| 01/01/2009 | US20090002722 Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus |
| 01/01/2009 | US20090002676 Lithographic apparatus |
| 01/01/2009 | US20090002675 Polarization-modulating optical element |
| 01/01/2009 | US20090002661 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus |
| 01/01/2009 | US20090002660 Exposure apparatus and device manufacturing method |
| 01/01/2009 | US20090002655 Exposure apparatus, exposure method, and method for producing device |
| 01/01/2009 | US20090002652 Lithographic apparatus and device manufacturing method |
| 01/01/2009 | US20090001314 aqueous acidic solution for cleaning the surface of a semiconductor wafer to remove photoresist material and dielectric trimethylsilane or dimethylsilane material to render an oxide-free substrate; comprising hydrofluoric acid, ammonium fluoride and citric acid, acetic acid; without leave gummy residues |
| 01/01/2009 | US20090001288 Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method |
| 01/01/2009 | US20090001217 Pre-fabricated article for eme protection of an aircraft |
| 01/01/2009 | US20090001049 Methods of etching articles via microcontact printing |
| 12/31/2008 | WO2009002644A2 Methods of making hierarchical articles |
| 12/31/2008 | WO2009002502A2 Heated water spray processor |
| 12/31/2008 | WO2009002272A1 A method of making a secondary imprint on an imprinted polymer |
| 12/31/2008 | WO2009002161A1 Method for protecting an optical element in a radiation source for electromagnetic radiation with a wavelength in the extreme ultraviolet (xuv) wavelength range, and radiation source |
| 12/31/2008 | WO2009001927A1 Method for production of cyclic compound having substituent introduced therein, and photoresist substrate |
| 12/31/2008 | WO2009001885A1 Photosensitive composition, method, cured product, and liquid crystal display device |
| 12/31/2008 | WO2009001835A1 Optical characteristic measuring method, optical characteristic adjusting method, exposing device, exposing method, and exposing device manufacturing method |
| 12/31/2008 | WO2009001834A1 Optical characteristic measurement method, optical characteristic adjusting method, exposure device, exposure method, and exposure device manufacturing method |
| 12/31/2008 | WO2009001654A1 Photosensitive lithographic printing plate material and method for producing lithographic printing plate |
| 12/31/2008 | WO2009001420A1 Optical three-dimensional molding polymerizable resin composition |
| 12/31/2008 | WO2009000241A2 Contact exposure device for a printing screen |
| 12/31/2008 | WO2008009803A3 Production of microfluidic polymeric devices by photo-assisted and/ or thermally assisted printing |
| 12/31/2008 | EP2009705A2 Radiation detector, method of manufacturing the radiation detector and lithographic apparatus comprising the radiation detector |
| 12/31/2008 | EP2009678A1 Illuminating optical apparatus, exposure apparatus and device manufacturing method |
| 12/31/2008 | EP2009676A2 A Semiconductor Materials Inspection System |
| 12/31/2008 | EP2009502A2 Method for making a relief printing form |
| 12/31/2008 | EP2009501A2 Method and apparatus for controlling a plurality of actuators and imaging device for lithography |
| 12/31/2008 | EP2009500A2 Measurement apparatus, exposure apparatus, and device manufacturing method |
| 12/31/2008 | EP2009499A1 Material of the resist-protecting membrane for immersion lithography |
| 12/31/2008 | EP2009498A1 Pattern forming method |
| 12/31/2008 | EP2009497A1 Photosensitive element, method for formation of resist pattern, and method for production of print circuit board |
| 12/31/2008 | EP2008157A2 Method for making an improved thin film solar cell interconnect using etch and deposition processes |
| 12/31/2008 | EP2007570A2 Embossing device, such as a cylinder or a sleeve |
| 12/31/2008 | EP2007566A2 Chucking system comprising an array of fluid chambers |
| 12/31/2008 | EP1953117A4 Scanning jet nanolithograph and the operation method thereof |
| 12/31/2008 | EP1556737B1 Methods for fabrication of nanometer-scale engineered structures for mask repair application |
| 12/31/2008 | EP1485758B1 A method for fabricating a structure for a microelectromechanical systems (mems) device |
| 12/31/2008 | EP1481973B1 Heterocycle-bearing onium salts |