| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/13/2009 | US7477403 Optical position assessment apparatus and method |
| 01/13/2009 | US7477355 Projection exposure apparatus and projection optical system |
| 01/13/2009 | US7477354 Projection exposure apparatus and method for producing a printed circuit board |
| 01/13/2009 | US7477353 Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device |
| 01/13/2009 | US7476523 used to pattern the inside of a tube or rolled over a surface to form a continuous pattern; may be used to deposit self-assembled monolayers, biological materials, metals, polymers, ceramics, or a variety of other materials |
| 01/13/2009 | US7476493 Exposure station for film webs |
| 01/13/2009 | US7476492 Coating the substrate with a radiation sensitive photoresist film comprising terpolymer of 1-ethylcyclooctyl methacrylate, trifluoromethylsulfonamidoethyl methacrylate and lactone substituted methacrylate, imagewise exposing, heating and development; improved resist images in lithography |
| 01/13/2009 | US7476491 Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby |
| 01/13/2009 | US7476489 Low-temperature curable photosensitive compositions |
| 01/13/2009 | US7476488 Photosensitive composition and method for forming pattern using same |
| 01/13/2009 | US7476487 Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices |
| 01/13/2009 | US7476486 Resist composition and patterning process |
| 01/13/2009 | US7476485 Resist lower layer film material and method for forming a pattern |
| 01/13/2009 | US7476484 Coating of a circuit board with a layer of polyurethane obtained from toluene diisocyanat, dimethylolpropionic acid and polyethylene glycol; drying, imagewise exposure, development, heat curing solder mask |
| 01/13/2009 | US7476476 Heat resistant resin; suitable for surface protective film of a semiconductor device, interlayer insulation film, insulation film of an organic electroluminescent element and for protecting wirings of a circuit board; excellent in pattern formation, heat shrinkability, crack resistance, stress resistance |
| 01/13/2009 | US7476473 Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method |
| 01/13/2009 | US7476471 Based on extreme ultraviolet radiation energies; lithography; semiconductors |
| 01/13/2009 | US7476470 Method for manufacturing thin film semiconductor device and method for forming resist pattern thereof |
| 01/13/2009 | US7476412 Method for the metalization of an insulator and/or a dielectric |
| 01/13/2009 | CA2506345C Method and apparatus for producing printing forms |
| 01/08/2009 | WO2009005629A1 Lamination device method for flexographic plate manufacturing |
| 01/08/2009 | WO2009005582A1 Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
| 01/08/2009 | WO2009005581A1 Multi-layer masking film |
| 01/08/2009 | WO2009005576A1 Clear and colorless three-dimensional articles made via stereolithography and method of making said articles |
| 01/08/2009 | WO2009005065A1 Projection optical system |
| 01/08/2009 | WO2009005023A1 Electron beam drawing method |
| 01/08/2009 | WO2009005014A1 Resist stripping composition |
| 01/08/2009 | WO2009004988A1 System for continuously using resist stripper liquid based on nanofiltration |
| 01/08/2009 | WO2009004948A1 Photosensitive lithographic printing plate material |
| 01/08/2009 | WO2009004926A1 Photosensitive dry film resist material, printed wiring board made with the same, and process for producing printed wiring board |
| 01/08/2009 | WO2009004679A1 Stamp base fabricating method |
| 01/08/2009 | WO2009003912A1 Fourier plane analysis and refinement of slm calibration |
| 01/08/2009 | WO2009003348A1 Micro displacement worktable with six degrees of freedom |
| 01/08/2009 | WO2008117308A4 Novel diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof |
| 01/08/2009 | WO2008080521A3 Immersion fluid and method for producing microchips |
| 01/08/2009 | WO2008040650A3 Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type |
| 01/08/2009 | WO2007103082A3 Interferometry systems and methods of using interferometry systems |
| 01/08/2009 | US20090011601 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| 01/08/2009 | US20090011377 Photoresist topcoat for a photolithographic process |
| 01/08/2009 | US20090011376 Exposure system and method for manufacturing device |
| 01/08/2009 | US20090011375 Immersion liquid for liquid immersion lithography process and method for forming resist pattern using the same |
| 01/08/2009 | US20090011374 Method and material for forming high etch resistant double exposure patterns |
| 01/08/2009 | US20090011373 Method of manufacturing mechanical and micromechanical parts |
| 01/08/2009 | US20090011372 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method |
| 01/08/2009 | US20090011371 exposing a photoresist layer with regions of photosensitivity to an image in a lithography process using high numerical aperture imaging tools for improving contrast of the image of a feature projected onto the resist layer |
| 01/08/2009 | US20090011370 Pattern forming method using two layers of resist patterns stacked one on top of the other |
| 01/08/2009 | US20090011368 Exposure Method and Apparatus, and Electronic Device Manufacturing Method |
| 01/08/2009 | US20090011366 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method |
| 01/08/2009 | US20090011365 Alkali soluble resin; immersion lithography |
| 01/08/2009 | US20090011364 Makes pattern with good heat resistance, low water absorption and configuration ; good sensitivity, resolution and adhesion; memory polymers |
| 01/08/2009 | US20090011363 Photopolymer Composition Usable for Lithographic Plates |
| 01/08/2009 | US20090011362 Pattern forming method |
| 01/08/2009 | US20090011361 Amine-arresting additives for materials used in photolithographic processes |
| 01/08/2009 | US20090011360 Photo-resist Material Structure and Method of Producing the Same |
| 01/08/2009 | US20090011346 Focus blur measurement and control method |
| 01/08/2009 | US20090011345 Lithographic Apparatus and Device Manufacturing Method Utilizing Data Filtering |
| 01/08/2009 | US20090011342 Determining minimum resolvable pitch of spaced, adjacent line elements, wherein each of the line elements are separately resolvable when projected by the lithographic imaging system, and selecting a process monitor grating period; designing a process monitor grating pattern; sensitivity to dose and focus |
| 01/08/2009 | US20090011199 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same |
| 01/08/2009 | US20090011139 Method for Concurrently Employing Differing Materials to Form a Layer on a Substrate |
| 01/08/2009 | US20090010683 for detecting an in vivo blood pool; contrast agents, antitumor agents |
| 01/08/2009 | US20090009892 Adjustment Arrangement of an Optical Element |
| 01/08/2009 | US20090009775 Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle |
| 01/08/2009 | US20090009745 Exposure method, exposure apparatus, and method for producing device |
| 01/08/2009 | US20090009744 Illumination system for a microlithographic projection exposure apparatus |
| 01/08/2009 | US20090009740 Measurement apparatus, exposure apparatus, and device manufacturing method |
| 01/08/2009 | US20090009736 Apparatus for and Method of Forming Optical Images |
| 01/08/2009 | US20090009735 Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device |
| 01/08/2009 | US20090009701 Light Diffusing Plate and Display Apparatus |
| 01/08/2009 | US20090008366 Etching composition and method for etching a substrate |
| 01/08/2009 | US20090007952 Structure of Peltier Element or Seebeck Element and Its Manufacturing Method |
| 01/08/2009 | US20090007419 Iron core, iron core manufacturing method, alignment apparatus, and exposure apparatus |
| 01/08/2009 | DE102008001448A1 Aberration measuring method for optical imaging system, involves illuminating object structure, producing image output in image plane, and carrying out sequential wavelength-selective measuring of wave front of image output |
| 01/08/2009 | DE102007031691A1 Method for operating micro-lithographic projection lighting system, involves illuminating alternating phase shift mask with projection light, which has approximately coherent lighting angle distribution with coherence parameter |
| 01/08/2009 | DE102007031314A1 Verfahren und Vorrichtung zum Trocknen einer Oberfläche eines Substrats Method and apparatus for drying a surface of a substrate |
| 01/08/2009 | DE102004063529B4 Transflektiv-Flüssigkristallanzeigevorrichtung und Herstellungsverfahren derselben Transflective liquid crystal display device and production method thereof |
| 01/07/2009 | EP2012348A1 Exposure apparatus |
| 01/07/2009 | EP2012183A2 Optical illumination system, exposure apparatus and device fabrication method |
| 01/07/2009 | EP2012182A2 Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device |
| 01/07/2009 | EP2011830A1 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method |
| 01/07/2009 | EP2011829A1 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method |
| 01/07/2009 | EP2010966A2 Alignment method, imprint method, alignment apparatus, and position measurement method |
| 01/07/2009 | EP2010965A1 Registration method and apparatus therefor |
| 01/07/2009 | EP2010964A1 Projection exposure system and use thereof |
| 01/07/2009 | EP2010963A1 Reflective mask blank for euv lithography |
| 01/07/2009 | EP1954472A4 Technique for separating a mold from solidified imprinting material |
| 01/07/2009 | EP1493061A4 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 01/07/2009 | EP1152435B1 Optical element such as multilayer film reflection mirror, production method therefor and device using it |
| 01/07/2009 | EP0979525B1 Use of sacrificial masking layer and backside exposure in forming openings that typically receive light-emissive material, and associated light-emitting structure |
| 01/07/2009 | CN101341759A Speckle reduction by angular scanning for laser projection displays |
| 01/07/2009 | CN101341444A Photosensitive sheets and method and apparatus for manufacturing the same |
| 01/07/2009 | CN101341443A Photosensitive transfer material, member for display device, process for producing the member, black matrix, color filter, process for producing the color filter, substrate for display device, and dis |
| 01/07/2009 | CN101341172A Oxime ester photoinitiators |
| 01/07/2009 | CN101339962A Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector |
| 01/07/2009 | CN101339369A PS plate retouching paste |
| 01/07/2009 | CN101339368A Photoresist cleaning agent |
| 01/07/2009 | CN101339367A Projection exposure device and method and device for calibrating illumination light beam dynamic positional error |
| 01/07/2009 | CN101339366A Substrate processing method and device manufacture method |
| 01/07/2009 | CN101339365A Radiation linear combination, colorful filter and colorful liquid crystal display unit |
| 01/07/2009 | CN101339364A Method for manufacturing microlens array by soft mode impressing |
| 01/07/2009 | CN101339362A Fault correcting method for gray tone mask, gray tone mask and manufacturing method thereof |