| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/15/2009 | WO2009007928A2 Methods for manufacturing integrated circuits |
| 01/15/2009 | WO2009007128A1 Method and apparatus for analyzing a group of photolithographic masks |
| 01/15/2009 | WO2009006783A1 Cleaning composition for removing resist |
| 01/15/2009 | WO2008136666A3 Image sensor for lithography |
| 01/15/2009 | WO2008122626A3 Optical element module with imaging error and position correction |
| 01/15/2009 | WO2006080786A9 Thermally curable resin composition with extended storage stability and good adhesive property |
| 01/15/2009 | US20090019418 Lithography simulation method, mask pattern preparation method, semiconductor device manufacturing method and recording medium |
| 01/15/2009 | US20090018550 Fragmentation and extraction basket |
| 01/15/2009 | US20090017401 Method of forming micropattern |
| 01/15/2009 | US20090017400 Pattern forming method |
| 01/15/2009 | US20090017398 Method for making a lithographic printing plate |
| 01/15/2009 | US20090017397 Photosensitive resin composition and microlens formed with use thereof |
| 01/15/2009 | US20090017387 Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective film |
| 01/15/2009 | US20090017277 Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel |
| 01/15/2009 | US20090017268 Method and apparatus for selectively patterning free standing quantum dot (fsqdt) polymer composites |
| 01/15/2009 | US20090017265 Negative photosensitive fluorinated aromatic resin composition |
| 01/15/2009 | US20090016766 Control Method of Image Forming Apparatus and Image Forming Apparatus |
| 01/15/2009 | US20090015951 Projection objective and method for its manufacture |
| 01/15/2009 | US20090015816 Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| 01/15/2009 | US20090015812 Illumination system particularly for microlithography |
| 01/15/2009 | US20090015808 Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| 01/15/2009 | US20090015807 Exposure apparatus and device manufacturing method |
| 01/15/2009 | US20090014666 Optical system having a clearning arrangement |
| 01/15/2009 | DE102008040218A1 Optical device e.g. illumination system, operating method for use in projection exposure system, involves storing element such that no parasitic adjustments or changes of element develop during or after rotation in imaging characteristics |
| 01/15/2009 | DE102008001909A1 Projection exposure system, has multipolar lighting adjustment of imaging device and compensation unit is provided for compensation of image defect induced by multipolar lighting adjustment |
| 01/15/2009 | DE102007033243A1 Verfahren und Anordnung zur Analyse einer Gruppe von Photolithographiemasken Method and apparatus for analyzing a group of photolithography masks |
| 01/15/2009 | DE102007032958A1 Verfahren zur Ermittlung lithographisch relevanter Maskendefekte Method for determining lithographically relevant mask defects |
| 01/14/2009 | EP2015140A1 Substrates and methods of using those substrates |
| 01/14/2009 | EP2014624A2 Titania-doped quartz glass for nanoimprint molds |
| 01/14/2009 | EP2013663A1 Illumination system for euv lithography as well as a first and second optical element for use in an illumination system of this type |
| 01/14/2009 | EP2013662A1 Article for parallel lithography with two-dimensional pen arrays |
| 01/14/2009 | EP2013659A2 Wet developable bottom antireflective coating composition and method for use thereof |
| 01/14/2009 | EP1924889B1 Illuminator for a photolithography device |
| 01/14/2009 | EP1690139B1 Projection optical system |
| 01/14/2009 | EP1567518B1 Oxime ester photoinitiators with heteroaromatic groups |
| 01/14/2009 | EP1555571B1 Cured material and flexographic plate using the same |
| 01/14/2009 | EP1451642B1 Chemical rinse composition |
| 01/14/2009 | EP1277815B1 Water-based coating composition curable with actinic energy ray, coated metallic material with cured film of the composition, production process, and method of bonding coated metallic material |
| 01/14/2009 | CN201181391Y Unsymmetric phase shift optical grating mark |
| 01/14/2009 | CN201181390Y Light shield guiding means |
| 01/14/2009 | CN201181389Y Photo-etching machine silicon slice bench exchanging set adopting transition connection device |
| 01/14/2009 | CN201181388Y Photo-etching machine silicon slice bench exchanging set adopting conveyor belt structure |
| 01/14/2009 | CN201181387Y Photo-etching machine silicon slice bench exchanging set adopting cross sliding rail |
| 01/14/2009 | CN101347054A Glass substrate having circuit pattern and process for producing the same |
| 01/14/2009 | CN101346669A Writing apparatuses and methods |
| 01/14/2009 | CN101346668A Writing apparatuses and methods |
| 01/14/2009 | CN101346667A Blended sensor system and method |
| 01/14/2009 | CN101346666A Pattern-forming material, pattern-forming apparatus and pattern-forming method |
| 01/14/2009 | CN101346665A Surface-protective film |
| 01/14/2009 | CN101346664A Mask blank and photomask |
| 01/14/2009 | CN101345191A Re-working method and patterning technique for photoresist layer |
| 01/14/2009 | CN101345188A Plate, apparatus for adjusting temperature of substrate having the plate and apparatus for processing substrate having the plate |
| 01/14/2009 | CN101344734A Silicon slice focusing and leveling measurement device |
| 01/14/2009 | CN101344733A Photoresist coating and developing apparatus |
| 01/14/2009 | CN101344732A Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 01/14/2009 | CN101344731A Device and method for transmission image sensing |
| 01/14/2009 | CN101344730A Position control method and device based on H type structure two-sided driving system |
| 01/14/2009 | CN101344729A Method for measuring rotation degree of mask bench relative to workpiece bench |
| 01/14/2009 | CN101344728A On-line measurement apparatus and method for wave aberration of photo-etching machine projection objective |
| 01/14/2009 | CN101344727A Focusing and leveling detection device and method |
| 01/14/2009 | CN101344726A Stepping arrangement type interference microlithography and device thereof |
| 01/14/2009 | CN101344725A Coating apparatus, substrate exchanging method and coating method |
| 01/14/2009 | CN101344724A Sensitive imaging composition, its preparation method and uses |
| 01/14/2009 | CN101344723A Layer-by-layer automatic forming method and device for micro photo-curing thick film |
| 01/14/2009 | CN101344722A Process for manufacturing Colorful filtering substrates |
| 01/14/2009 | CN101344721A Photo-etching method |
| 01/14/2009 | CN101344720A Gray level mask, defect correcting method, manufacturing method and design transfer method |
| 01/14/2009 | CN101344662A Production method of display substrates |
| 01/14/2009 | CN101344604A Reflection type quartz polarization beam splitting optical grating based on metal layer reflection |
| 01/14/2009 | CN101344511A Screening method for photoresist recovery, reclaiming method and equipment for photoresist recovery |
| 01/14/2009 | CN101344375A High resolution heterodyne laser interference system and method for improving definition |
| 01/14/2009 | CN101343422A Pigment dispersion liquid, curable composition, color filter produced using the same, and solid state imaging device |
| 01/14/2009 | CN101343343A Novolac resin, preparation method and photoresist composition containing the resin |
| 01/14/2009 | CN101342840A Method for manufacturing integrated molding module directly with paper card design diagram |
| 01/14/2009 | CN100452296C Substrate heating equipment and substrate heating method |
| 01/14/2009 | CN100452294C Substrate treatment device control method and substrate treatment device |
| 01/14/2009 | CN100452293C Exposure apparatus, method for producing device, and method for controlling exposure apparatus |
| 01/14/2009 | CN100451843C Liquid sprayer |
| 01/14/2009 | CN100451842C Exposure device and exposure method |
| 01/14/2009 | CN100451841C Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
| 01/14/2009 | CN100451840C Method for constructing micrometre, submicrometre structural surface |
| 01/14/2009 | CN100451839C Alignment method of exposure mask and manufacturing method of thin film element substrate |
| 01/14/2009 | CN100451838C Aligning system and aligning method |
| 01/14/2009 | CN100451837C Pattern writing apparatus and pattern writing method |
| 01/14/2009 | CN100451836C Lithographic apparatus and device manufacturing method |
| 01/14/2009 | CN100451835C Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/14/2009 | CN100451834C Substrates carrier and method of mfg. same |
| 01/14/2009 | CN100451833C Device and method for wafer alignment with reduced tilt sensitivity |
| 01/14/2009 | CN100451832C Lithographic apparatus and device manufacturing method |
| 01/14/2009 | CN100451831C Method of reducing size of pattern interval of opening |
| 01/14/2009 | CN100451830C Organic polymeric antireflective coatings deposited by chemical vapor deposition |
| 01/14/2009 | CN100451781C Liquid crystal display device including polycrystalline silicon thin film transistor and method of fabricating the same |
| 01/14/2009 | CN100451778C Liquid crystal display and method for fabricating the same |
| 01/14/2009 | CN100451734C Human eyes high order optical aberration orthopraxy method |
| 01/14/2009 | CN100451723C Method and device for correcting SLM stamp image imperfections |
| 01/14/2009 | CN100451705C Design and manufacture technology of optical switch |
| 01/14/2009 | CN100450703C Molding process |
| 01/14/2009 | CN100450556C Method for immobilizing hydrogel-bonding polymers on polymer substrate surfaces |
| 01/13/2009 | US7477959 Photoresist system |
| 01/13/2009 | US7477405 Method and system for measuring patterned structures |