Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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01/22/2009 | US20090023093 Acid-amplifier having acetal group and photoresist composition including the same |
01/22/2009 | US20090023085 Photosensitive Compositions, Curable Compositions, Novel Compounds, Photopolymerizable Compositions, Color Filters, and Planographic Printing Plate Precursors |
01/22/2009 | US20090023084 Photosensitive resin composition and color filter |
01/22/2009 | US20090023083 fabrication of dual damascene structures using imprint lithographic techniques; fabrication of dual damascene relief structures in imprint lithography molds |
01/22/2009 | US20090023080 Mask and manufacturing method thereof |
01/22/2009 | US20090023079 Photomask and Method of Forming Overlay Vernier of Semiconductor Device Using the Same |
01/22/2009 | US20090023078 Lithography Masks and Methods of Manufacture Thereof |
01/22/2009 | US20090022886 Method for making an interactive information device and product produced thereby |
01/22/2009 | US20090021820 Optical Imaging Device Having At Least One System Diaphragm |
01/22/2009 | US20090021748 Method and system for wavefront measurements of an optical system |
01/22/2009 | US20090021726 Device and method for the optical measurement of an optical system by using an immersion fluid |
01/22/2009 | US20090021711 Method of inspecting exposure system and exposure system |
01/22/2009 | US20090021710 Immersion lithography apparatus and method of forming pattern using the same |
01/22/2009 | US20090021707 Lithographic apparatus and device manufacturing method |
01/22/2009 | US20090020699 Microstructured pattern inspection method |
01/22/2009 | US20090020314 Direct emulsion process for making printed circuits |
01/22/2009 | US20090020257 Method and apparatus for production of a cast component |
01/22/2009 | US20090020137 Cleaning apparatus and method, exposure apparatus having the cleaning apparatus, and device manufacturing method |
01/22/2009 | DE102008040316A1 Detektor zur Aufnahme einer Lichtintensität sowie System mit einem derartigen Detektor Detector for receiving a light intensity and system with such a detector |
01/22/2009 | DE102008040058A1 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus |
01/22/2009 | DE102008033213A1 Kombiblende für katoptrische Projektionsanordnung Combined Hood for catoptrical projection device |
01/22/2009 | DE102008002377A1 Beleuchtungssystem sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einem derartigen Beleuchtungssystem Lighting system and projection exposure system for microlithography with such an illumination system |
01/22/2009 | DE102007033701A1 Verfahren und Anordnung zur Reinigung von optischen Oberflächen in plasmabasierten Strahlungsquellen Method and apparatus for cleaning optical surfaces in plasma-based radiation sources |
01/22/2009 | DE102005047475B4 Verfahren zum Herstellen eines Maskensatzes und Maskensatz zum Definieren eines Musters A method of producing a set of masks and mask set to define a pattern |
01/21/2009 | EP2017833A1 Scanned writing of an exposure pattern on a substrate |
01/21/2009 | EP2017675A1 Exposure apparatus |
01/21/2009 | EP2017674A1 Positive resist composition and pattern forming method |
01/21/2009 | EP2017662A2 Catadioptric optical system for scatterometry |
01/21/2009 | EP2017274A1 Acid-amplifier having acetal group and photoresist composition including the same |
01/21/2009 | EP2016613A2 Template having a varying thickness |
01/21/2009 | EP2016465A1 Optical imaging device with thermal attenuation |
01/21/2009 | EP2016464A2 Negative photoresist compositions |
01/21/2009 | EP2016463A1 Composition for positive type photoresist and positive type photoresist film manufactured thereby |
01/21/2009 | EP2016462A1 Device and method for obtaining a substrate structured on micrometric or nanometric scale |
01/21/2009 | EP1664931B1 Surface triangulation and profiling |
01/21/2009 | EP1651695B1 Photocrosslinkable polyurethanes |
01/21/2009 | EP1502292A4 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
01/21/2009 | EP1399921B1 Method for the production of an optical disk matrix |
01/21/2009 | EP1307513B1 Modified pigment products, dispersions thereof, and compositions comprising the same |
01/21/2009 | CN201185510Y Lens mechanism for full-automatic vision printer |
01/21/2009 | CN101350287A Method for cleaning semiconductor |
01/21/2009 | CN101349877A Method of lifting off and fabricating array substrate for liquid crystal display device using the same |
01/21/2009 | CN101349876A Immersion lithographic apparatus and device manufacturing method |
01/21/2009 | CN101349875A Pellicle frame |
01/21/2009 | CN101349874A Pellicle frame |
01/21/2009 | CN101349873A Lithographic pellicle |
01/21/2009 | CN101349872A Photolithography exposure apparatus, system and photolithography patterning method |
01/21/2009 | CN101349871A Photo-etching illuminating apparatus |
01/21/2009 | CN101349870A Two-freedom degree electric machine actuating mechanism and corresponding six-freedom degree micromotion platform |
01/21/2009 | CN101349869A System and method for aligning silicon chip by signal processing method |
01/21/2009 | CN101349868A Method for reducing photoresist coating flow |
01/21/2009 | CN101349867A Organic-inorganic compound sensitization resin composition and LCD element using sclerotium thereof |
01/21/2009 | CN101349866A Positive type light sensitive imaging composition, preparation method and uses thereof |
01/21/2009 | CN101349865A Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors |
01/21/2009 | CN101349864A Photomask, manufacturing method thereof and pattern transfer printing method |
01/21/2009 | CN101349862A Method for calibrating optical approach correcting model based on multi-photoresist active diffusion length |
01/21/2009 | CN101349849A Display panel and manufacturing method thereof |
01/21/2009 | CN101349844A Array substrate for liquid crystal display device and method of fabricating the same |
01/21/2009 | CN101349838A Semi-permeation type FFS type liquid crystal display device and its manufacture method |
01/21/2009 | CN101349825A Method for manufacturing transflective liquid crystal display panel |
01/21/2009 | CN101349814A Plane reflection type compound eye cold light source exposure system and photo-etching machine |
01/21/2009 | CN101349804A Catadioptric optical system for scatterometry |
01/21/2009 | CN100454482C Heat treatment unit, heat treatiment method, control program and computer-readable recording medium |
01/21/2009 | CN100454391C Magnetic recording medium and manufacture method, magnetic recording and reproducing apparatus, stamper, and method of manufacturing stamper |
01/21/2009 | CN100454147C Pattern writing apparatus and block number determining method |
01/21/2009 | CN100454146C Exposure apparatus |
01/21/2009 | CN100454145C Method of charged particle beam lithography and equipment for charged particle beam lithography |
01/21/2009 | CN100454144C Method for double-face etching of wafer |
01/21/2009 | CN100454143C 正型抗蚀剂组合物 The positive resist composition |
01/21/2009 | CN100454142C Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with same |
01/21/2009 | CN100454141C Device for transferring a pattern to an object |
01/21/2009 | CN100454138C Image recorder |
01/21/2009 | CN100454070C Micro-lens and method for manufacturing the same |
01/21/2009 | CN100453602C Polymerisable diketopyrrolopyrroles, use of such compounds in colour filters and polymers prepared from these compounds |
01/21/2009 | CN100453539C 5-methylene-1,3,-dioxolane-4-one inducer, doubling body, chemical amplification type anti-corrosion composition and forming method |
01/21/2009 | CN100453444C Method for producing nano-stamped template by laminated sided-wall technology |
01/20/2009 | US7480030 Method and device for lithography by extreme ultraviolet radiation |
01/20/2009 | US7480029 Exposure apparatus and method for manufacturing device |
01/20/2009 | US7480028 Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program |
01/20/2009 | US7479694 Membrane 3D IC fabrication |
01/20/2009 | US7479633 Methodology for critical dimension metrology using stepper focus monitor information |
01/20/2009 | US7479510 Compositions and methods for use in three dimensional model printing |
01/20/2009 | US7479366 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
01/20/2009 | US7479365 Semiconductor device manufacturing method |
01/20/2009 | US7479364 lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm. |
01/20/2009 | US7479362 UV decomposable molecules and a photopatternable monomolecular film formed therefrom |
01/20/2009 | US7479361 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process |
01/20/2009 | US7479318 Fibrillar microstructure and processes for the production thereof |
01/20/2009 | US7479307 Toners and processes thereof |
01/20/2009 | US7478454 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks |
01/20/2009 | CA2448029C Image-forming composition and photosensitive lithographic plate using same |
01/20/2009 | CA2387606C Laser imaged printing plates comprising a multi-layer slip film |
01/20/2009 | CA2357001C Production of photoresist coatings |
01/15/2009 | WO2009009095A1 Spacer lithography |
01/15/2009 | WO2009009066A1 Coating composition for forming laser-markable material having heat and humidity stability |
01/15/2009 | WO2009008961A1 Imageable elements with low ph developer solubility |
01/15/2009 | WO2009008446A1 Resist underlayer film forming composition, and method for resist pattern formation using the composition |
01/15/2009 | WO2009008265A1 Composition for forming micropattern and method for forming micropattern using the same |
01/15/2009 | WO2009007931A1 Wafer, reticle and method for manufacturing integrated circuits on a wafer |
01/15/2009 | WO2009007929A2 Integrated circuits on a wafer and methods for manufacturing integrated circuits |