Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2009
01/22/2009US20090023093 Acid-amplifier having acetal group and photoresist composition including the same
01/22/2009US20090023085 Photosensitive Compositions, Curable Compositions, Novel Compounds, Photopolymerizable Compositions, Color Filters, and Planographic Printing Plate Precursors
01/22/2009US20090023084 Photosensitive resin composition and color filter
01/22/2009US20090023083 fabrication of dual damascene structures using imprint lithographic techniques; fabrication of dual damascene relief structures in imprint lithography molds
01/22/2009US20090023080 Mask and manufacturing method thereof
01/22/2009US20090023079 Photomask and Method of Forming Overlay Vernier of Semiconductor Device Using the Same
01/22/2009US20090023078 Lithography Masks and Methods of Manufacture Thereof
01/22/2009US20090022886 Method for making an interactive information device and product produced thereby
01/22/2009US20090021820 Optical Imaging Device Having At Least One System Diaphragm
01/22/2009US20090021748 Method and system for wavefront measurements of an optical system
01/22/2009US20090021726 Device and method for the optical measurement of an optical system by using an immersion fluid
01/22/2009US20090021711 Method of inspecting exposure system and exposure system
01/22/2009US20090021710 Immersion lithography apparatus and method of forming pattern using the same
01/22/2009US20090021707 Lithographic apparatus and device manufacturing method
01/22/2009US20090020699 Microstructured pattern inspection method
01/22/2009US20090020314 Direct emulsion process for making printed circuits
01/22/2009US20090020257 Method and apparatus for production of a cast component
01/22/2009US20090020137 Cleaning apparatus and method, exposure apparatus having the cleaning apparatus, and device manufacturing method
01/22/2009DE102008040316A1 Detektor zur Aufnahme einer Lichtintensität sowie System mit einem derartigen Detektor Detector for receiving a light intensity and system with such a detector
01/22/2009DE102008040058A1 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus
01/22/2009DE102008033213A1 Kombiblende für katoptrische Projektionsanordnung Combined Hood for catoptrical projection device
01/22/2009DE102008002377A1 Beleuchtungssystem sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einem derartigen Beleuchtungssystem Lighting system and projection exposure system for microlithography with such an illumination system
01/22/2009DE102007033701A1 Verfahren und Anordnung zur Reinigung von optischen Oberflächen in plasmabasierten Strahlungsquellen Method and apparatus for cleaning optical surfaces in plasma-based radiation sources
01/22/2009DE102005047475B4 Verfahren zum Herstellen eines Maskensatzes und Maskensatz zum Definieren eines Musters A method of producing a set of masks and mask set to define a pattern
01/21/2009EP2017833A1 Scanned writing of an exposure pattern on a substrate
01/21/2009EP2017675A1 Exposure apparatus
01/21/2009EP2017674A1 Positive resist composition and pattern forming method
01/21/2009EP2017662A2 Catadioptric optical system for scatterometry
01/21/2009EP2017274A1 Acid-amplifier having acetal group and photoresist composition including the same
01/21/2009EP2016613A2 Template having a varying thickness
01/21/2009EP2016465A1 Optical imaging device with thermal attenuation
01/21/2009EP2016464A2 Negative photoresist compositions
01/21/2009EP2016463A1 Composition for positive type photoresist and positive type photoresist film manufactured thereby
01/21/2009EP2016462A1 Device and method for obtaining a substrate structured on micrometric or nanometric scale
01/21/2009EP1664931B1 Surface triangulation and profiling
01/21/2009EP1651695B1 Photocrosslinkable polyurethanes
01/21/2009EP1502292A4 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
01/21/2009EP1399921B1 Method for the production of an optical disk matrix
01/21/2009EP1307513B1 Modified pigment products, dispersions thereof, and compositions comprising the same
01/21/2009CN201185510Y Lens mechanism for full-automatic vision printer
01/21/2009CN101350287A Method for cleaning semiconductor
01/21/2009CN101349877A Method of lifting off and fabricating array substrate for liquid crystal display device using the same
01/21/2009CN101349876A Immersion lithographic apparatus and device manufacturing method
01/21/2009CN101349875A Pellicle frame
01/21/2009CN101349874A Pellicle frame
01/21/2009CN101349873A Lithographic pellicle
01/21/2009CN101349872A Photolithography exposure apparatus, system and photolithography patterning method
01/21/2009CN101349871A Photo-etching illuminating apparatus
01/21/2009CN101349870A Two-freedom degree electric machine actuating mechanism and corresponding six-freedom degree micromotion platform
01/21/2009CN101349869A System and method for aligning silicon chip by signal processing method
01/21/2009CN101349868A Method for reducing photoresist coating flow
01/21/2009CN101349867A Organic-inorganic compound sensitization resin composition and LCD element using sclerotium thereof
01/21/2009CN101349866A Positive type light sensitive imaging composition, preparation method and uses thereof
01/21/2009CN101349865A Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
01/21/2009CN101349864A Photomask, manufacturing method thereof and pattern transfer printing method
01/21/2009CN101349862A Method for calibrating optical approach correcting model based on multi-photoresist active diffusion length
01/21/2009CN101349849A Display panel and manufacturing method thereof
01/21/2009CN101349844A Array substrate for liquid crystal display device and method of fabricating the same
01/21/2009CN101349838A Semi-permeation type FFS type liquid crystal display device and its manufacture method
01/21/2009CN101349825A Method for manufacturing transflective liquid crystal display panel
01/21/2009CN101349814A Plane reflection type compound eye cold light source exposure system and photo-etching machine
01/21/2009CN101349804A Catadioptric optical system for scatterometry
01/21/2009CN100454482C Heat treatment unit, heat treatiment method, control program and computer-readable recording medium
01/21/2009CN100454391C Magnetic recording medium and manufacture method, magnetic recording and reproducing apparatus, stamper, and method of manufacturing stamper
01/21/2009CN100454147C Pattern writing apparatus and block number determining method
01/21/2009CN100454146C Exposure apparatus
01/21/2009CN100454145C Method of charged particle beam lithography and equipment for charged particle beam lithography
01/21/2009CN100454144C Method for double-face etching of wafer
01/21/2009CN100454143C 正型抗蚀剂组合物 The positive resist composition
01/21/2009CN100454142C Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with same
01/21/2009CN100454141C Device for transferring a pattern to an object
01/21/2009CN100454138C Image recorder
01/21/2009CN100454070C Micro-lens and method for manufacturing the same
01/21/2009CN100453602C Polymerisable diketopyrrolopyrroles, use of such compounds in colour filters and polymers prepared from these compounds
01/21/2009CN100453539C 5-methylene-1,3,-dioxolane-4-one inducer, doubling body, chemical amplification type anti-corrosion composition and forming method
01/21/2009CN100453444C Method for producing nano-stamped template by laminated sided-wall technology
01/20/2009US7480030 Method and device for lithography by extreme ultraviolet radiation
01/20/2009US7480029 Exposure apparatus and method for manufacturing device
01/20/2009US7480028 Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program
01/20/2009US7479694 Membrane 3D IC fabrication
01/20/2009US7479633 Methodology for critical dimension metrology using stepper focus monitor information
01/20/2009US7479510 Compositions and methods for use in three dimensional model printing
01/20/2009US7479366 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching
01/20/2009US7479365 Semiconductor device manufacturing method
01/20/2009US7479364 lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm.
01/20/2009US7479362 UV decomposable molecules and a photopatternable monomolecular film formed therefrom
01/20/2009US7479361 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process
01/20/2009US7479318 Fibrillar microstructure and processes for the production thereof
01/20/2009US7479307 Toners and processes thereof
01/20/2009US7478454 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks
01/20/2009CA2448029C Image-forming composition and photosensitive lithographic plate using same
01/20/2009CA2387606C Laser imaged printing plates comprising a multi-layer slip film
01/20/2009CA2357001C Production of photoresist coatings
01/15/2009WO2009009095A1 Spacer lithography
01/15/2009WO2009009066A1 Coating composition for forming laser-markable material having heat and humidity stability
01/15/2009WO2009008961A1 Imageable elements with low ph developer solubility
01/15/2009WO2009008446A1 Resist underlayer film forming composition, and method for resist pattern formation using the composition
01/15/2009WO2009008265A1 Composition for forming micropattern and method for forming micropattern using the same
01/15/2009WO2009007931A1 Wafer, reticle and method for manufacturing integrated circuits on a wafer
01/15/2009WO2009007929A2 Integrated circuits on a wafer and methods for manufacturing integrated circuits