Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2014
08/07/2014US20140220489 Method for processing sample and sample processing apparatus
08/07/2014US20140220483 Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part
08/07/2014US20140220353 Underlay film composition for imprints and method of forming pattern and pattern formation method using the same
08/07/2014US20140218713 Extreme Ultraviolet Lithography Process
08/07/2014US20140218712 Exposure apparatus and device fabrication method
08/07/2014US20140218711 Electrostatic Clamp, Lithographic Apparatus, and Device Manufacturing Method
08/07/2014US20140218709 Field facet mirror for an illumination optics of a projection exposure apparatus for euv microlithography
08/07/2014US20140218708 Light modulator and illumination system of a microlithographic projection exposure apparatus
08/07/2014US20140218707 Exposure method and exposure apparatus, and device manufacturing method
08/07/2014US20140218706 Radiation source and lithographic apparatus
08/07/2014US20140218705 Illumination device
08/07/2014US20140218703 Illumination method, illumination optical device, and exposure device
08/07/2014US20140217646 Mask manufacturing apparatus and method of manufacturing mask using laser beam
08/07/2014US20140217449 Substrate for optics and semiconductor light emitting device
08/07/2014US20140217305 Systems and methods providing electron beam writing to a medium
08/07/2014DE112012004718T5 Hybride Photoresistzusammensetzung sowie musterbildendes Verfahren unter Verwendung derselben Hybrid photoresist composition and pattern forming method using the same
08/07/2014DE102014210383A1 Mit filter optimiertes monitoring von kippbaren spiegeln Mirror with filters optimized monitoring of tiltable
08/07/2014DE102014209905A1 Lithographisches Verfahren zur Herstellung eines optischen Bauteils sowie entsprechend hergestelltes optisches Bauteil für eine Projektionsbelichtungsanlage A lithographic process for producing an optical component, as well as correspondingly produced optical member for a projection exposure apparatus
08/07/2014DE102013215091A1 Optisches modul Optical module
08/07/2014DE102013214746A1 Optisches System sowie Verfahren zum Herstellen derselben An optical system as well as methods for manufacturing the same
08/06/2014EP2763157A1 Mask blank for reflection-type exposure, and mask for reflection-type exposure
08/06/2014EP2762977A1 Method for recycling plate-making processing waste solution
08/06/2014EP2762976A1 Use of immersion liquids
08/06/2014EP2762975A1 Lithographic printing plate precursor and process for producing lithographic printing plate
08/06/2014EP2762974A1 Method for producing lithographic printing plate
08/06/2014EP2762973A1 Method for producing lithographic printing plate
08/06/2014EP2762513A1 Resin having fluorene structure and underlayer film-forming material for lithography
08/06/2014EP2762326A1 Printing method using on press development lithograph printing plate precursor
08/06/2014EP2762312A1 Method for producing lithographic printing plate
08/06/2014EP2762231A1 Microfluidic device and method of manufacturing thereof
08/06/2014EP2761375A1 Process for removing substances from substrates
08/06/2014EP2761374A1 Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device
08/06/2014EP2761373A1 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
08/06/2014EP2761372A1 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
08/06/2014EP2761371A1 Nanostructured stamp, embossing roller, and device and method for the continuous embossing of nanostructures
08/06/2014EP2761355A1 Imaging catoptric euv projection optical unit
08/06/2014CN203759425U 一种台框开闭结构 One kind of sets the frame opening and closure
08/06/2014CN203759424U 网板曝光机台 Stencil exposure machine
08/06/2014CN203759423U 一种灯箱移动装置 One kind of mobile device portfolio
08/06/2014CN103975276A 旋转显影方法及装置 Rotary developing method and apparatus
08/06/2014CN103975275A 激光热转印用聚酰亚胺光敏性组合物 Laser thermal transfer photosensitive polyimide composition
08/06/2014CN103975274A 黑色感光性树脂组合物及其利用 Black photosensitive resin composition and use
08/06/2014CN103975038A 形成抗静电膜的组合物及低聚物化合物 Antistatic film forming composition and oligomer compounds
08/06/2014CN103972324A 基于纳米压印的硅薄膜太阳电池表面陷光结构制备方法 Preparation light trapping structure based on silicon thin film solar cell surface nanoimprint
08/06/2014CN103972163A 通过二次曝光解决连接孔钨栓粘合层剥落缺陷的方法 By double-exposure method to solve the tungsten plug connection hole peeling the adhesive layer defects
08/06/2014CN103972135A 一种硅片精确定位传输装置及定位方法 Silicon wafers pinpoint transmission device and positioning method
08/06/2014CN103969966A 一种光刻胶的去除方法 A resist removal method
08/06/2014CN103969965A 精确控制浸没式光刻机浸液温度的装置及其温控方法 Precise control of temperature immersion immersion lithography apparatus and method for temperature control
08/06/2014CN103969964A 用于浸没式光刻机的气密封和微孔密封装置 Hermetically sealed immersion lithography machines and apparatus for sealing porous
08/06/2014CN103969963A 用于光刻系统的图案生成器 The pattern generator for a lithographic system
08/06/2014CN103969962A 远紫外线光刻处理方法 Far-ultraviolet lithography approach
08/06/2014CN103969961A 一种调焦调平系统 One kind focusing leveling system
08/06/2014CN103969960A 一种套刻测量的装置和方法 An apparatus and method engraved sleeve measurement
08/06/2014CN103969959A 立式线缆支撑装置 Vertical cable support device
08/06/2014CN103969958A 一种多曝光视场拼接系统和方法 A multi-field exposure system and method for splicing
08/06/2014CN103969957A 一种光刻机垂向距离测量装置及测量方法 A lithographic machine vertical distance measuring device and measurement method
08/06/2014CN103969956A 曝光装置 Exposure device
08/06/2014CN103969955A 玻璃基片涂胶装置及其固定座 Gumming means and the glass substrate holder
08/06/2014CN103969954A 适用于柱状间隔器和黑底的着色光敏树脂组合物 Applies to the columnar spacer and the black matrix of the colored photosensitive resin composition
08/06/2014CN103969953A 着色感光性树脂组合物 The colored photosensitive resin composition
08/06/2014CN103969952A 新型化合物及其制造方法、产酸剂、抗蚀剂组合物以及抗蚀剂图案形成方法 Novel compound and its manufacturing method, an acid generator, a resist composition and a resist pattern forming method
08/06/2014CN103969951A 导电性树脂组合物及导电电路 Conductive resin composition and the conductive circuit
08/06/2014CN103969950A 着色感光性树脂组合物 The colored photosensitive resin composition
08/06/2014CN103969949A 着色感光性树脂组合物 The colored photosensitive resin composition
08/06/2014CN103969948A 触控面板用黑色感光性组合物和触控面板 Touch panel with black photosensitive composition and touch panel
08/06/2014CN103969947A 碱显影型感光性树脂组合物、其干膜及其固化物以及使用其而形成的印刷电路板 Alkali developable photosensitive resin composition, and the use of dry film and cured product which is formed of a printed circuit board
08/06/2014CN103969946A 一种采用喷印技术做光阻层制作印刷网版的方法 One kind of the photoresist layer using printing technology to do screen printing production methods
08/06/2014CN103969945A 刮伤掩模修补装置及方法 Scratch mask repair apparatus and method
08/06/2014CN103969943A 一种对基板进行标记的方法 One kind of labeled substrate method
08/06/2014CN103969843A 一种增强表面等离子体光场激发强度的方法 A method of surface plasmon excitation light field intensity enhancement
08/06/2014CN103969840A 基于金属纳米光栅的微偏振片阵列及其制备方法 Polarizer arrays based on micro and nano-grating metal preparation
08/06/2014CN103969741A 一种正交错位光纤光栅的刻写装置和刻写方法 An orthogonal dislocation inscribing apparatus and method for fiber gratings inscribed
08/06/2014CN103969724A 一种衍射光学元件的制作方法 A method of manufacturing the diffractive optical element
08/06/2014CN103969709A 光学装置、固体拍摄装置及光学装置的制造方法 Optical device manufacturing method, solid-state imaging device and an optical device
08/06/2014CN103966654A 一种在铝合金基底上实现水滴定向运输的方法 A directional transport of droplets method implemented on aluminum substrate
08/06/2014CN103965680A 一种具有干涉条纹的微结构颗粒的制备方法 A process for producing interference fringes of the micro-structure particles having
08/06/2014CN103964698A 正型光阻组成物的用途 Uses positive resist composition
08/06/2014CN102944978B 曝光系统、校准系统、光学引擎、曝光方法和制造方法 The exposure system, the calibration system, the optical engine, the exposure method and the manufacturing method
08/06/2014CN102914950B 金属层光刻的干法去胶返工方法 Metal layer lithography dry ashing method rework
08/06/2014CN102707570B 感光性树脂组成物、间隙体及含彼的液晶显示元件 The photosensitive resin composition, and the spaces and the liquid crystal display element containing Piguet
08/06/2014CN102629074B 光酸产生剂、其制备方法及包含光酸产生剂的抗蚀剂组合物 Photoacid generator, its preparation method and a resist composition comprising a photoacid generator of
08/06/2014CN102566317B 曝光方法、曝光装置及元件制造方法 Exposure method, exposure apparatus and device manufacturing method
08/06/2014CN102540760B 光刻设备和修正光刻设备内的辐射束的方法 The method of lithographic apparatus and modifications within the lithographic apparatus radiation beam
08/06/2014CN102460301B 含有带硫醚键的硅的抗蚀剂下层膜形成用组合物 Resist underlayer film containing silicon with a thioether bond forming composition
08/06/2014CN102443136B 感光性树脂、固化性树脂组合物、干膜以及印刷电路板 Photosensitive resin, the curable resin composition, and a printed circuit board dry film
08/06/2014CN102341755B 光刻设备 Lithography equipment
08/06/2014CN102246100B 凸起状图案形成方法、曝光装置和光掩模 Projection-like pattern forming method, the exposure apparatus and the photomask
08/06/2014CN102243446B 衬底台、光刻设备、衬底边缘平坦化方法及器件制造方法 A substrate table of the lithographic apparatus, method and substrate edge flattening device manufacturing method
08/06/2014CN102221781B 正型放射线敏感性组合物、层间绝缘膜及其形成方法 Positive-tone radiation-sensitive composition, the interlayer insulating film and method of forming
08/06/2014CN102193346B Led自动曝光机基板非接触式快速预定位方法 Led automatic exposure machine substrate quick pre-positioning of non-contact method
08/06/2014CN102177570B 利用平版印刷术及间隔物形成图案的方法 The use of lithography and a method for forming a pattern spacers
08/06/2014CN102135732B 光照射装置 Light irradiation device
08/06/2014CN102015633B 酮肟酯类化合物及其应用 Oxime ester compounds and uses thereof
08/06/2014CN101666976B 化学增幅型正型光阻组合物及图案形成方法 Chemically amplified positive resist composition and pattern forming method
08/06/2014CN101473270B 含有具有羟基的缩合系树脂的形成抗蚀剂下层膜的组合物 Composition comprising forming a resist underlayer film having a hydroxyl group of the condensation resin
08/06/2014CN101071263B 制造显示面板的设备和方法 And a method of manufacturing a display apparatus panel
08/05/2014US8799832 Optical proximity correction for topographically non-uniform substrates
08/05/2014US8797554 Determining a structural parameter and correcting an asymmetry property
08/05/2014US8797508 Exposure apparatus, exposure method, and device manufacturing method
08/05/2014US8797506 Exposure apparatus, exposure method, and device fabrication method
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