| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/28/2009 | EP2019128A1 Photosensitive resin composition and produced therefrom, photosensitive film and stencil for screen printing |
| 01/28/2009 | EP2018598A1 Backside immersion lithography |
| 01/28/2009 | EP2018597A1 Process for immersion exposure of a substrate |
| 01/28/2009 | EP2018596A2 Colored masking for forming transparent structures |
| 01/28/2009 | EP2018365A1 New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| 01/28/2009 | EP1212150B1 Lactam compositions for cleaning organic and plasma etched residues for semiconductor devices |
| 01/28/2009 | CN201188173Y Apparatus for removing glass substrate edge photo resist |
| 01/28/2009 | CN201188172Y Apparatus for storing medical liquid and system for supply medical liquid |
| 01/28/2009 | CN201188171Y Photoresistive supply system |
| 01/28/2009 | CN101356476A Lithographic apparatus including a cleaning device and method for cleaning an optical element |
| 01/28/2009 | CN101356475A Photocurable/thermocurable solder resist composition, and printed circuit board using the same |
| 01/28/2009 | CN101356454A Optical device, method for producing master for use in producing optical device, and photoelectric conversion apparatus |
| 01/28/2009 | CN101356452A Resin composition for optical material, resin film for optical material, and optical waveguide |
| 01/28/2009 | CN101355081A Semiconductor device, wafer and method of designing and manufacturing the same |
| 01/28/2009 | CN101355056A Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate |
| 01/28/2009 | CN101355019A Substrate cleaning device and substrate processing apparatus including the same |
| 01/28/2009 | CN101354543A Liquid for removing filin |
| 01/28/2009 | CN101354542A Method for removing photoresist |
| 01/28/2009 | CN101354541A Integrated post-exposure bake track |
| 01/28/2009 | CN101354540A Exposure apparatus, exposure method, and method for producing device |
| 01/28/2009 | CN101354539A Exposure apparatus and method for producing device |
| 01/28/2009 | CN101354538A Lithographic apparatus and contamination removal or prevention method |
| 01/28/2009 | CN101354537A Workpiece platform for photolithography apparatus |
| 01/28/2009 | CN101354536A Apparatus and method for controlling distribution of photoresist |
| 01/28/2009 | CN101354535A Method for forming and coating multi-layer mask layer |
| 01/28/2009 | CN101354534A Method for coating photoresist and method for forming photolithography pattern |
| 01/28/2009 | CN101354533A 感光性糊剂组合物和图案形成方法 The photosensitive paste composition and a pattern forming method |
| 01/28/2009 | CN101354532A Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device |
| 01/28/2009 | CN101354531A Laser transfer printing device |
| 01/28/2009 | CN101354530A Contraposition scale on mask and method for affirming shield part position using the same |
| 01/28/2009 | CN101354529A Photomask data generation method, photomask generation method, exposure method, and device manufacturing method |
| 01/28/2009 | CN101354528A Mask and related photo-etching method |
| 01/28/2009 | CN101354527A Photomask protective film system and method for manufacturing integrated circuit |
| 01/28/2009 | CN101354500A Liquid crystal display panel and method for producing the same |
| 01/28/2009 | CN101354476A Low thermal effect projection objective |
| 01/28/2009 | CN101354458A Wire grid type polarization element, manufacturing method thereof, liquid crystal device, and projection type display apparatus |
| 01/28/2009 | CN101353319A Salt for acid forming agent and chemical amplifying type positive resist composition containing the same |
| 01/28/2009 | CN101352932A Method for sticking stacked film |
| 01/28/2009 | CN100456429C Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 01/28/2009 | CN100456422C Pattern transfer method |
| 01/28/2009 | CN100456421C Barrier film material and pattern formation method using the same |
| 01/28/2009 | CN100456142C Alignment mark and its producing method |
| 01/28/2009 | CN100456141C Batch silicon wafer exposure method |
| 01/28/2009 | CN100456140C Accurate vibration isolation system in use for step-by-step scanning photo-etching device |
| 01/28/2009 | CN100456139C Method of mfg. lower substrate of LCD device by using three masks |
| 01/28/2009 | CN100456138C Submersible photoetching apparatus soaking liquid flow field maintaining system |
| 01/28/2009 | CN100456137C Photoetching machine synchronous sequential control serial data communication method and system and use |
| 01/28/2009 | CN100456136C Method for controlling multi bus time and sequence synchronization of advanced scanning projecting photoetching machine |
| 01/28/2009 | CN100456135C Photo development apparatus and method for fabricating a color filter substrate using the same |
| 01/28/2009 | CN100456134C Focusing-levelling detection device |
| 01/28/2009 | CN100456133C Method for producing optical etching equipment and devices |
| 01/28/2009 | CN100456096C Liquid crystal display device and method of manufacturing the same |
| 01/28/2009 | CN100456093C Chromatic cholesterol type LCD and method for manufacturing same |
| 01/28/2009 | CN100456089C Pixel structure of LCD array substrate and method for making same |
| 01/28/2009 | CN100456065C Process for producing optical waveguide |
| 01/28/2009 | CN100455449C Method, system and holder for transferring templates during imprint lithography processes |
| 01/28/2009 | CN100455445C Apparatus for measuring the physical properties of a surface and a pattern generating apparatus |
| 01/27/2009 | US7483764 Exposure apparatus and device manufacturing method |
| 01/27/2009 | US7483196 Apparatus for multiple beam deflection and intensity stabilization |
| 01/27/2009 | US7483155 Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus |
| 01/27/2009 | US7483123 Substrate conveyor apparatus, substrate conveyance method and exposure apparatus |
| 01/27/2009 | US7483121 Microlithograph system |
| 01/27/2009 | US7483119 Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| 01/27/2009 | US7483118 Lithographic projection apparatus and device manufacturing method |
| 01/27/2009 | US7483117 Exposure method, exposure apparatus, and method for producing device |
| 01/27/2009 | US7482661 Pattern forming method and semiconductor device manufactured by using said pattern forming method |
| 01/27/2009 | US7482611 Lithographic apparatus and device manufacturing method |
| 01/27/2009 | US7482392 2-Hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-phenoxy]-phenyl}-2-methyl-propan-1-one; prepared by reacting diphenylether with an acylating agent by means of a Friedel-Crafts reaction catalyzed by a Lewis acid to produce a reaction product; and reacting the reaction product with a hydrated base |
| 01/27/2009 | US7482280 Method for forming a lithography pattern |
| 01/27/2009 | US7482112 increasing its solubility in an alkaline developer under action of an acid generator; prevent development defect after development in immersion photolithography; silicon-free resin is a copolymer of trimethylsilanol modified methacrylic acid-methyl methacrylate; making the semiconductors |
| 01/27/2009 | US7482111 forming a barrier metal layer on a wafer; producing a plated shaped article, highly precisely forming a high bump having a height of 20 to 200 mu m on a chip base; amide or ester monomers increases affinity of a resist for a plating solution; wettability; photolithography |
| 01/27/2009 | US7482110 Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer |
| 01/27/2009 | US7482107 Photoresist composition |
| 01/27/2009 | US7482102 Monitoring pattern configured to obtain information required for adjusting optical system; asymmetrical diffraction grating generates positive first order diffracted light and negative first order diffracted light; probing phase shifters |
| 01/27/2009 | US7482057 Microscale patterning and articles formed thereby |
| 01/27/2009 | US7481867 Vacuum system for immersion photolithography |
| 01/27/2009 | CA2380570C Positive acting photoresist composition and imageable element |
| 01/22/2009 | WO2009011579A1 Debris prevention system, radiation system, and lithographic apparatus |
| 01/22/2009 | WO2009011578A1 Scanned writing of an exposure pattern on a substrate |
| 01/22/2009 | WO2009011574A1 Lithography system, method of clamping and wafer table |
| 01/22/2009 | WO2009011381A1 Novel polymer |
| 01/22/2009 | WO2009011364A1 Resist composition used for lithography process using electron beam, x ray or euv light. |
| 01/22/2009 | WO2009011356A1 Measurement method, stage apparatus, and exposure apparatus |
| 01/22/2009 | WO2009011289A1 Positive-working resist composition and method for pattern formation using the positive-working resist composition |
| 01/22/2009 | WO2009011176A1 Photosensitive lithographic printing plate material and method of developing the same |
| 01/22/2009 | WO2009011119A1 Pattern formation method and device, exposure method and device, and device manufacturing method and device |
| 01/22/2009 | WO2009010904A2 A process for writing on photosensitive material., using a resist of organic-inorganic hybrid sol- gel materials |
| 01/22/2009 | WO2009010214A1 Method for determining lithographically relevant mask defects |
| 01/22/2009 | WO2009010213A1 Projection objective |
| 01/22/2009 | WO2009010141A2 Fine-particle epsilon copper phthalocyanine pigment preparation |
| 01/22/2009 | WO2009010140A2 Pigment preparations based on c.i. pigment blue 15,6 |
| 01/22/2009 | WO2009009947A1 A dual-stage switching system for a lithographic machine |
| 01/22/2009 | US20090023878 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it |
| 01/22/2009 | US20090023102 Positive resist composition for forming thick-film resist, thick-film resist laminate, and method of forming resist pattern |
| 01/22/2009 | US20090023101 Lithography track systems and methods for electronic device manufacturing |
| 01/22/2009 | US20090023098 Method for fabricating dual damascene profiles using sub pixel-voting lithography and devices made by same |
| 01/22/2009 | US20090023097 poly(meth) acrylate copolymer containing an acid dissociable, dissolution inhibiting group; e.g. sulfonium acid generator and a nitrogen-containing organic compound e.g.triphenylamine, piperazine etc.; resist pattern able to form a contact hole (C/H) pattern with hole diameter of excellent uniformity |
| 01/22/2009 | US20090023096 Positive resist composition and pattern forming method |
| 01/22/2009 | US20090023095 Exhibits increased solubility in an alkali developing solution under action of acid from acid generator; polyacrylic ester as photoresists;sulfonium sulfonates as acid generators; photolithography |
| 01/22/2009 | US20090023094 Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate |