Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2009
02/04/2009CN100459040C Method for fabricating semiconductor device
02/04/2009CN100459039C Shot shape measuring method and mask
02/04/2009CN100459038C Flexible tank and a chemical liquid supply apparatus using the same
02/04/2009CN100459037C Method of processing substrate and chemical used in the same
02/04/2009CN100459036C Exposure apparatus, and device manufacturing method
02/04/2009CN100459016C Pattern forming method and pattern forming apparatus
02/04/2009CN100458571C Semiconductor image sensors and method of forming microlens
02/04/2009CN100458570C Stage control apparatus and method, stage apparatus and exposure apparatus
02/04/2009CN100458569C Method for forming dent on the surface of photoresist layer
02/04/2009CN100458568C Method and apparatus for patterning a workpiece and methods of manufacturing the same
02/04/2009CN100458567C Lithographic apparatus, device manufacturing method, and device manufactured thereby
02/04/2009CN100458566C beamsplitter optical design without inverting image and holding catadioptric photoetching system
02/04/2009CN100458565C Acoustooptic frequency modulation single exposure imaging interference photo-etching method and system thereof
02/04/2009CN100458533C 薄膜晶体管阵列面板及其制造方法 The thin film transistor array panel and a manufacturing method
02/04/2009CN100457725C Novel acid-generator and film composition comprising same
02/04/2009CN100457211C I-shaped structured three-dimensional micro solid/hollow silicon needle and silicon knife
02/03/2009US7486814 Local bias map using line width measurements
02/03/2009US7486707 Optical delay module for lenghtening the propagation path of a light beam and pulse multiplication or elongation module
02/03/2009US7486439 Projection optical system, exposure apparatus and device fabricating method
02/03/2009US7486420 Flexographic printing
02/03/2009US7486385 Exposure apparatus, and device manufacturing method
02/03/2009US7486384 Lithographic support structure
02/03/2009US7486382 Imaging device in a projection exposure machine
02/03/2009US7486381 Lithographic apparatus and device manufacturing method
02/03/2009US7486380 Wafer table for immersion lithography
02/03/2009US7486377 Developing method and developing apparatus
02/03/2009US7485856 Scanning probe microscopy inspection and modification system
02/03/2009US7485690 Sacrificial film-forming composition, patterning process, sacrificial film and removal method
02/03/2009US7485611 Including alcohol; solubilizing inorganic salts and polar organic compounds; damage-free, residue-free cleaning
02/03/2009US7485571 Method of making an integrated circuit
02/03/2009US7485413 Photosensitive composition and method for forming pattern using same
02/03/2009US7485410 Method of manufacturing thick dielectric pattern and method of manufacturing image displaying apparatus
02/03/2009US7485409 Planographic printing plate precursor
02/03/2009US7485408 Optionally 1-substituted-2-hydroxy-2,2-bis(trifluoromethyl)ethoxy- group-containing silicon compounds, especially containing norbornane ring; their polymers are base resins in photoresists for use in photolithography using deep-ultraviolet, x-ray or electron beam; reduced collapse due to swelling
02/03/2009US7485407 Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition
02/03/2009US7485406 Photostorage solid drawing medium
02/03/2009US7485405 Soluble polyimide having one or more primary alcoholic groups; formaldehyde condensate of melamine, urea or a phenol as a curing agent; and a photoacid generator (generates acid at a wavelength of 240-500 nm); heat and chemical resistance, dielectric, flexibility
02/03/2009US7485404 1-(Chloro-), 2-((1,3,3-(trimethyl-)-3H-indolium-2-yl)-vin-1,2-ylene-),6-((1,3,3-(trimethyl-)-2,3-dihydroindolin-2-ylidene)-ethanediylidene-cyclonex-1-ene;storage stability, highly sensitive to beams emitted by general-purpose semiconductor lasers
02/03/2009US7485403 Laser-markable compositions
02/03/2009US7485397 Reusable printing plate, printing press and printing unit having the printing plate, process for imaging the printing plate and process for preparation of a fluorinated organic phosphonic acid
02/03/2009US7485396 Optical proximity correction; modifying mask layout to include scattering bars
02/03/2009US7485341 Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same
02/03/2009US7485190 Apparatus for heating a substrate in a variable temperature process using a fixed temperature chuck
02/03/2009US7484677 Edge remover having a gas sprayer to prevent a chemical solvent from splashing
01/2009
01/29/2009WO2009015084A2 Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer
01/29/2009WO2009014717A1 Contact printing method using an elastomeric stamp having a variable surface area and variable shape
01/29/2009WO2009014698A1 Methods and apparatus for measuring thickness of etching residues on a substrate
01/29/2009WO2009014501A1 Two-photon stereolithography using photocurable compositions
01/29/2009WO2009014439A2 Debris prevention system and lithographic apparatus
01/29/2009WO2009014252A1 Movable body drive method and movable body drive system
01/29/2009WO2009014251A2 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
01/29/2009WO2009014113A1 Positive photosensitive resin composition for spray coating, method for forming cured film using the same, cured film and semiconductor device
01/29/2009WO2009014044A1 Color composition and color filter using the same
01/29/2009WO2009013905A1 Position measuring system, exposure device, position measuring method, exposure method, device manufacturing method, tool, and measuring method
01/29/2009WO2009013903A1 Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method
01/29/2009WO2009013278A1 Device for setting the temperature of an optical element
01/29/2009WO2009013230A1 Optical system of a microlithographic projection exposure apparatus
01/29/2009WO2009013028A1 Production of stamps, masks or templates for semiconductor device manufacturing
01/29/2009WO2009012919A1 Method for examining a wafer with regard to a contamination limit and euv projection exposure system
01/29/2009WO2009012738A1 Method and device for producing structured optical materials
01/29/2009WO2008145364A3 Method for the production of an optical element by means of a molding process, optical element produced according to said method, collector, and lighting system
01/29/2009WO2008139910A3 Method for processing pattern data and method for manufacturing electronic device
01/29/2009WO2008135865A3 Exposing printing plates using light emitting diodes
01/29/2009WO2008122410A3 Optical correction element and method for the correction of temperature-induced imaging aberrations in optical systems, projection objective and projection exposure apparatus for semiconductor lithography
01/29/2009US20090029894 Method for washing device substrate
01/29/2009US20090029893 Cleaning Liquid For Lithography and Cleaning Method Using Same
01/29/2009US20090029297 Method of forming fine patterns
01/29/2009US20090029296 Image recording method and device
01/29/2009US20090029295 Micromachined imaging transducer
01/29/2009US20090029294 Method for manufacturing semiconductor device
01/29/2009US20090029293 Manufacturing method of silicon carbide semiconductor apparatus
01/29/2009US20090029292 Engraving with amplifier having multiple exit ports
01/29/2009US20090029291 Positive resist composition for thin-film implantation process and method for forming resist pattern
01/29/2009US20090029289 Photosensitive Resin Composition, Photosensitive Element, Method for Forming Resist Pattern and Method for Producing Printed Wiring Board
01/29/2009US20090029287 Photosensitive resin composition
01/29/2009US20090029286 Method for Fabricating Photoresist Pattern
01/29/2009US20090029285 Method for producing photosensitive laminate original printing plate for letterpress printing, photosensitive laminate original printing plate for letterpress printing, and method for producing letterpress printing plate
01/29/2009US20090029284 Pattern coating material and pattern forming method
01/29/2009US20090029270 Projection exposure device and method of separate exposure
01/29/2009US20090029222 Fuel cell with structured gas diffusion layer and manufacturing method of gas diffusion layer
01/29/2009US20090029125 Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same
01/29/2009US20090028910 Methods for Fabrication Isolated Micro-and Nano-Structures Using Soft or Imprint Lithography
01/29/2009US20090027608 Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device
01/29/2009US20090027605 Method for manufacturing substrate, liquid crystal display apparatus and method for manufacturing the same, and electronic device
01/29/2009US20090025584 Method for Developing Printing Plates in an Offset Printing Press and Printing Press for Carrying out the Method
01/29/2009US20090025246 Remote Center Compliant Flexure Device
01/29/2009DE10260615B4 Technik zum Verringern der Lackvergiftung bei der Herstellung einer Metallisierungsschicht mit einem Dielektrikum mit kleinem ε Technique for reducing the poisoning lacquer in the manufacture of a metallization layer with a dielectric with small ε
01/29/2009DE10237325B4 Gerät zur Belichtung eines Objektes mit Licht Apparatus for exposing an object with light
01/29/2009DE102008040613A1 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage The optical system of a microlithography projection exposure apparatus
01/29/2009DE102008040181A1 Illumination system for microlithographic projection exposure system, has astigmatic refractive optical element astigmatically changing intensity distribution in pupil surface by arrangement on different positions along optical axis
01/29/2009DE102008033341A1 Projektionsobjektiv Projection lens
01/29/2009DE102008002622A1 Optical system i.e. illuminating device, for projection exposure apparatus utilized in semiconductor lithography, has measuring structure exhibiting continuous plain reference surface extending along optical modules
01/29/2009DE102007061800A1 Lighting system for projection exposure system, has screen positioned towards optical axis by one of optical elements and arranged in region of pupil level of optical system and formed as part of polarizer
01/29/2009DE102007035387A1 Verfahren und Vorrichtung zur Herstellung von strukturierten optischen Materialien Method and apparatus for the production of structured optical materials
01/29/2009DE102007034652A1 Vorrichtung zur Temperatureinstellung eines optischen Elements Device for adjusting the temperature of an optical element
01/29/2009DE102007030051A1 Scheibenlayoutoptimierungsverfahren und System Disk layout optimization method and system
01/28/2009EP2019336A1 Process for preparing a polymeric relief structure
01/28/2009EP2019335A1 Lithographic apparatus and contamination removal or prevention method
01/28/2009EP2019334A2 Positive resist composition and method of pattern formation with the same
01/28/2009EP2019333A1 Production of stamps, masks or templates for semiconductor device manufacturing