Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2009
02/10/2009US7488957 Pattern generation methods and apparatuses
02/10/2009US7488924 Method for determining the focal position during imaging of a sample using an inclined position receiving device
02/10/2009US7488672 Well photoresist pattern of semiconductor device and method for forming the same
02/10/2009US7488570 Method of forming metal pattern having low resistivity
02/10/2009US7488569 Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device
02/10/2009US7488568 Resist composition, method of forming resist pattern, compound and acid generator
02/10/2009US7488567 Polymer, resist composition and patterning process
02/10/2009US7488566 Positive type radiation-sensitive resin composition
02/10/2009US7488565 Photoresist compositions comprising diamondoid derivatives
02/10/2009US7488507 Capacitor with plasma deposited dielectric
02/10/2009US7488505 Enhancing the inplane uniformity of the thickness of a coating film to improve throughput by applying coating liquid spirally, monitoring to detect uncoated regions, and applying a second coating liquid to fill the uncoated region
02/10/2009US7488127 Resist pattern forming apparatus and method thereof
02/05/2009WO2009018244A1 Method and system for increasing throughput during location specific processing of a plurality of substrates
02/05/2009WO2009018217A2 Non-covalently crosslinkable materials for photolithography processes
02/05/2009WO2009017320A2 Mold film composition for forming pattern and mold film manufactured by using the same
02/05/2009WO2009017111A1 Method for adjusting exposure apparatus, exposure apparatus and device manufacturing method
02/05/2009WO2009017064A1 Alkali-developable photosensitive resin composition and β-diketone compound
02/05/2009WO2009016984A1 Compound and method for producing the same
02/05/2009WO2009016974A1 Flexographic printing plate, process for producing the flexographic printing plate, thin film, and process for producing liquid crystal display element
02/05/2009WO2009016951A1 Method for manufacturing semiconductor device, semiconductor device, and exposure apparatus
02/05/2009WO2009015906A1 Method and device for the production of a grid with chirp
02/05/2009WO2009015845A1 Illumination system of a microlithographic projection exposure apparatus
02/05/2009WO2009015838A1 Lithographic apparatus and device manufacturing method
02/05/2009WO2008142546A3 An antireflective coating composition comprising fused aromatic rings
02/05/2009WO2008135866A3 Method and apparatus for loading and unloading flexographic plates for computer-to-plate imagin including separate loading and unloading areas
02/05/2009WO2008004048A8 Methods and apparatus for applying patterns of non-contiguous features
02/05/2009US20090036344 Removing a photoresist from the substrate having a copper metal layer by using a stripper solution of a copper salt, the chloride or nitate, dimethyl sulfoxide; tetramethylammonium hydroxide and ethanolaminesolubilizer for the copper salt; protection of copper layer; rinsing; compatibility
02/05/2009US20090035880 Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
02/05/2009US20090035859 Method and devices for preventing restenosis in cardiovascular stents
02/05/2009US20090035708 Layer patterning using double exposure processes in a single photoresist layer
02/05/2009US20090035706 Method for Fabricating Micromachine Component of Resin
02/05/2009US20090035705 Method of forming pattern, method of manufacturing semiconductor device, and cleaning apparatus
02/05/2009US20090035703 Regeneratable, structured plate comprising oxidation catalysts
02/05/2009US20090035702 Process for producing compound having acid-labile group
02/05/2009US20090035701 Photoresist and pattern-forming process using the same
02/05/2009US20090035700 Tertiary alcohol derivative, polymer compound and photoresist composition
02/05/2009US20090035699 Fluorinated monomer, fluorinated polymer, resist composition and patterning process
02/05/2009US20090035698 selective exposure of a positive resist film containing a polyacryate e.g. (2-adamantyloxymethyl)methacrylate- gamma -butyrolactone methacrylate copolymer; and a diphenylsulfonium nonafluorobutanesulfonate acid generator, alkali developing the resist film to form a resist pattern; reduces fluctuation
02/05/2009US20090035697 Forming a resist pattern from which a desirable pattern shape can be obtained in spite of thickness of the film; using ansulfonium thiazole or thiophene ring with a perfluorosulfonate anion as acid generator; copolymerizing monomer of fluorinated acrylic ester of a norbornane
02/05/2009US20090035696 Photoresist composition
02/05/2009US20090035695 Positive working lithographic printing plates
02/05/2009US20090035694 Polymeric dyes, overcoat compositions and thermal lithographic printing plates
02/05/2009US20090035693 Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device
02/05/2009US20090035692 Positive resist composition and pattern forming mehtod
02/05/2009US20090035691 base material component in which a portion of, or all of, hydrogen atoms of phenolic hydroxyl group have been substituted with acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under action of acid; an acid generator generates acid upon exposure
02/05/2009US20090035688 Toner, and toner production process
02/05/2009US20090035590 Non-covalently crosslinkable materials for photolithography processes
02/05/2009US20090035584 Methods for device fabrication using pitch reduction and associated structures
02/05/2009US20090035528 Multi-photon reacted articles with inorganic particles and method for fabricating structures
02/05/2009US20090035452 In which sufficient visibility and electromagnetic shielding property can be manufactured with simple steps; including an inorganic powder of glass powder and soft magnetic powder such as ferrites
02/05/2009US20090034150 Substrate holding system and exposure apparatus using the same
02/05/2009US20090034061 Catadioptric projection objective with intermediate images
02/05/2009US20090033948 Method of Measuring Shot Shape and Mask
02/05/2009US20090033905 Lithographic apparatus and device manufacturing method
02/05/2009US20090033898 Developing apparatus, developing method and storage medium
02/05/2009US20090033897 Limiting a Portion of a Patterning Device Used to Pattern A Beam
02/05/2009US20090033893 Methods and Systems to Compensate for a Stitching Disturbance of a Printed Pattern in a Maskless Lithography System Not Utilizing Overlap of the Exposure Zones
02/05/2009US20090033844 Method of producing fine particles of anthraquinone structure-containing pigment, fine particles of anthraquinone structure-containing pigment produced thereby, colored pigment dispersion composition therewith, colored photosensitive resin composition therewith and photosensitive resin transfer material therewith, and color filter and liquid crystal display device using the same
02/05/2009US20090032998 Molding apparatus and molding method
02/05/2009DE102008040742A1 Verfahren und Vorrichtung zur Überwachung von Mehrfachspiegelanordnungen, optische Anordnung mit einer derartigen Vorrichtung sowie mit einer zweiten Mehrfachspiegelanordnung zum Ein- und Ausschalten einer ersten Mehrfachspiegelanordnung sowie Beleuchtungsoptik für eine Projektionsbelichtungsanlage mit einer derartigen Vorrichtung Method and apparatus for monitoring multi-mirror arrays, optical arrangement with such a device and a second multi-mirror arrangement for turning on and off a first multi-mirror array and illumination optics for a projection exposure system with such a device
02/05/2009DE102007049923A1 Photomasken-Layoutmuster Photomask layout pattern
02/04/2009EP2020621A1 Inspection method and apparatus, lithographic apparatus and lithographic processing cell
02/04/2009EP2020620A2 Adjustment method, exposure method, device manufacturing method, and exposure apparatus
02/04/2009EP2020619A1 Exposure apparatus and device manufacturing method
02/04/2009EP2020618A2 Positive resist composition and method of pattern formation with the same
02/04/2009EP2020617A2 Resist composition containing a sulfonium compound, pattern-forming method using the resist composition, and sulfonium compound
02/04/2009EP2020616A2 Resist composition for electron beam, x-ray, or euv, and pattern-forming method using the same
02/04/2009EP2020615A1 Positive resist composition and pattern forming method
02/04/2009EP2019975A1 Radiation curable resin composition and rapid three dimensional imaging process using the same
02/04/2009EP1771772B1 Method of manufacturing photosensitive laminated body and apparatus therefor
02/04/2009CN201191356Y Flat reflection type fly-eye cold light source exposure system
02/04/2009CN101361073A Method and system for line-dimension control of an etch process
02/04/2009CN101361024A Lithographic apparatus
02/04/2009CN101360689A Method for surface structuring of a glass product, glass product with structured surface and uses
02/04/2009CN101359215A Computer generated hologram, exposure apparatus, and device fabrication method
02/04/2009CN101359189A Developing solution for positive photosensitive polyimide photoresist
02/04/2009CN101359188A Exposure apparatus of belt type workpiece and focusing regulation method thereof
02/04/2009CN101359187A Synchronization triggering on-line diagnostic method and system for photoetching machine
02/04/2009CN101359186A Screen-coating thin tube exposure device
02/04/2009CN101359185A Exposure apparatus, exposure method, and method for manufacturing display panel substrate
02/04/2009CN101359184A Reactive force processing device
02/04/2009CN101359183A Reactive force processing device
02/04/2009CN101359182A Lithographic apparatus having encoder type position sensor system
02/04/2009CN101359181A Photolithographic exposure method and exposure system
02/04/2009CN101359180A Method for detecting flatness of edges of electrostatic chuck
02/04/2009CN101359179A Photoresist spin coating method on concave spherical surface of optical device
02/04/2009CN101359178A Optical proximity correction method
02/04/2009CN101359177A Inorganic particle-containing resin composition, pattern forming method and electrode producing method
02/04/2009CN101359176A Curing composition, method for producing photospace material and liquid crystal display device
02/04/2009CN101359175A Photoresist compistion
02/04/2009CN101359174A Radiation-sensitive resin composition, layer insulation film and microlens and manufacture method thereof
02/04/2009CN101359173A Method of manufacturing wiring circuit board
02/04/2009CN101359172A Method of making thin film pattern layer
02/04/2009CN101359171A Genuine-fake identification method for laser holographic plate-making
02/04/2009CN101359168A Methof for producing graytone mask and graytone mask
02/04/2009CN101359132A Interval piece and production method thereof, substrate for liquid crystal display device and liquid crystal display device
02/04/2009CN101359101A Light irradiation apparatus and method, crystallization device and method, device, and light modulation element
02/04/2009CN101359093A Two-dimension optical movable platform apparatus based on SOI substrate and method for manufacturing same
02/04/2009CN100459095C Silicon sheet pre-positioning system based on multiple sensor data fusing
02/04/2009CN100459057C Cleaning method of crystal column surface