Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2009
02/12/2009US20090042138 Photosensitivity; flexography
02/12/2009US20090042137 Method for translating a structured beam of energetic particles across a substrate in template mask lithography
02/12/2009US20090042136 Carbon Nanotube-Silicon Composite Structures and Methods for Making Same
02/12/2009US20090042135 polymeric binder provides the post-development bakeability of imaged elements while increasing imaging sensitivity (speed) and maintaining resistance to press chemicals; solvent resistance; lithographic printing plates
02/12/2009US20090042134 Photosensitive composition, photosensitive planographic printing plate material, and image forming method of photosensitive planographic printing plate material
02/12/2009US20090042132 Resist composition for immersion lithography and method for forming resist pattern
02/12/2009US20090042131 Positive resist composition, method of forming resist pattern, polymeric compound, and compound
02/12/2009US20090042130 Positive resist composition for immersion exposure and method of forming resist pattern
02/12/2009US20090042129 contains acid generator; post exposure baking
02/12/2009US20090042128 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
02/12/2009US20090042127 Photoresist composition and method of forming a photoresist pattern using the same
02/12/2009US20090042126 Photosensitive resin composition and cured article thereof
02/12/2009US20090042124 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound
02/12/2009US20090042123 Calixresorcinarene compound, photoresist base comprising the same, and composition thereof
02/12/2009US20090042114 Halogenated oxime derivatives and the use therof as latent acids
02/12/2009US20090042113 Manufacturing method of filter and color filter
02/12/2009US20090042111 producing a microelectronic device by modulating an intensity and a phase of the zero diffraction order of a radiation with a device including subwavelength features having a pitch dimension smaller than one wavelength of the radiation
02/12/2009US20090042110 Reflection type photomask blank, manufacturing method thereof, reflection type photomask, and manufacturing method of semiconductor device
02/12/2009US20090042108 Pattern forming method and mask
02/12/2009US20090042106 Photomask, and method and apparatus for producing the same
02/12/2009US20090042105 Sensitizer dyes for photoacid generating systems
02/12/2009US20090041948 Method of forming fine patterns
02/12/2009US20090041883 Apparatus for fabricating flat panel display
02/12/2009US20090040578 Hologram and Its Method of Manufacture
02/12/2009US20090040496 Microlithographic exposure method as well as a projection exposure system for carrying out the method
02/12/2009US20090040489 Position sensor
02/12/2009US20090040487 Imaging device in a projection exposure facility
02/12/2009US20090039275 Processing method, manufacturing method of semiconductor device, and processing apparatus
02/12/2009US20090038834 Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same
02/12/2009DE102008040874A1 Projection exposure system for use in semiconductor lithography, has optical component with optical and carrier elements, and surface elements of joining surface lying opposite to each other on outer surface of connecting element
02/12/2009CA2693228A1 A double exposure semiconductor process for improved process margin
02/12/2009CA2690723A1 Independently-addressable, self-correcting inking for cantilever arrays
02/11/2009EP2023379A1 Exposure apparatus and exposure method
02/11/2009EP2023378A1 Exposure apparatus and device manufacturing method
02/11/2009EP2023216A2 Computer generated hologram, exposure apparatus, and hologram fabrication method
02/11/2009EP2023207A1 Exposure apparatus and device manufacturing method
02/11/2009EP2023206A1 Exposure apparatus and device manufacturing method
02/11/2009EP2023205A2 Apparatus for forming nano pattern and method for forming the nano pattern using the same
02/11/2009EP2023204A2 Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
02/11/2009EP2023203A1 Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device
02/11/2009EP2023080A2 Liquid flow proximity sensor for use in immersion lithography
02/11/2009EP2021874A1 Chucks for reticles and other planar bodies
02/11/2009EP2021873A1 Negative-working radiation-sensitive compositions and imageable materials
02/11/2009EP2021854A2 Symmetrical objective having four lens groups for microlithography
02/11/2009EP1634122A4 Method for evaluating the effects of multiple exposure processes in lithography
02/11/2009EP1565787B1 Stamp, method of its fabrication and use of it
02/11/2009CN201194222Y Container having idiot-proof device
02/11/2009CN201194068Y Photo-etching machine exposure system
02/11/2009CN201194067Y Exposure control system for direct-writing photo-etching machine
02/11/2009CN101366107A Oxidizing aqueous cleaner for the removal of post-etch residues
02/11/2009CN101365758A Method of producing fine particles of anthraquinone structure-containing pigment, fine particles of anthraquinone structure-containing pigment produced thereby
02/11/2009CN101365594A Bragg diffracting security markers
02/11/2009CN101364702A Organic-inorganic composite erbium doping flat optical waveguide amplifier and preparing method thereof
02/11/2009CN101364559A Structure of photo masked inflating cabinet
02/11/2009CN101364558A Cycling airflow structure of load moving container
02/11/2009CN101364557A Load moving container and bearing structure applicable to the same
02/11/2009CN101364556A Containing chamber structure for transfer container
02/11/2009CN101364555A Load moving container and conductive structure applicable to the load moving container
02/11/2009CN101364116A Thermostatic control device
02/11/2009CN101364092A Bottle body locking device, liquid management system and method thereof
02/11/2009CN101364056A Detergent for photo resist
02/11/2009CN101364055A Neutral developer solution for positive light-sensitive polyimides photo resist
02/11/2009CN101364054A Auto focusing device for controlling exposal image-forming quality of CTP system
02/11/2009CN101364053A Exposure system of photo-etching machine and control method thereof
02/11/2009CN101364052A Active vibration damping system and forecast control method thereof
02/11/2009CN101364051A Exposure equipment, exposure method, and manufacturing method for a semiconductor device
02/11/2009CN101364050A Photolithography system
02/11/2009CN101364049A Control system, lithographic projection apparatus, control method, and computer program product
02/11/2009CN101364048A Photolithography illuminating apparatus and illuminating method
02/11/2009CN101364047A Method for detecting light intensity distribution of gradient filter and method for enhancing consistency of line width
02/11/2009CN101364046A Detecting and early-warning system for liquid and liquid level and method
02/11/2009CN101364045A Method for producing water-soluble colorful photoresistive agent
02/11/2009CN101364044A Minuteness processing method for upper substrate of glass
02/11/2009CN101364043A Template design of nanostructure registration photoetching and implementing method
02/11/2009CN101364041A Method and equipment for wiping and cleaning light shield
02/11/2009CN101364016A Thin-film transistor LCD pixel structure and its making method
02/11/2009CN101364014A Liquid crystal display panel and method for manufacturing same
02/11/2009CN101362822A Positive photosensitive polyimide containing silazane chain structure and preparation method thereof
02/11/2009CN101362812A Anti-reflective polymer, anti-reflective composition, and method for forming pattern using the same
02/11/2009CN101362809A Anti-reflective polymer, anti-reflective composition, and method for forming pattern using the same
02/11/2009CN100461337C Method for forming pattern, thin film transistor, display device and method for manufacturing the same and application
02/11/2009CN100461336C Exposure apparatus and device producing method
02/11/2009CN100461005C Process for preventing development defect and composition for use in the same
02/11/2009CN100461004C Immersion lithography method and disposal method thereof
02/11/2009CN100461003C Hemi-spherical structure and method for fabricating the same
02/11/2009CN100461002C Method and apparatus for printing with identifying code of laser beam
02/11/2009CN100461001C An assembly, a lithographic apparatus, and a device manufacturing method
02/11/2009CN100461000C Method for forming metal pattern with low resistivity
02/11/2009CN100460999C 193nm far-ultraviolet photoetching rubber and preparation method thereof
02/11/2009CN100460998C Adhesive label, adhesive label roll, photosensitive web unit, and apparatus and method for manufacturing photosensitive laminated body
02/11/2009CN100460966C Liquid crystal display device and fabrication method thereof
02/11/2009CN100460946C Method of manufacturing liquid crystal display device
02/11/2009CN100460932C Stability controlling system of one-dimensional interference optical field
02/11/2009CN100460921C Catadioptric optical system and exposure device having this system
02/11/2009CN100460805C Application of scatterometry alignment in imprint lithography
02/11/2009CN100460432C Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element
02/10/2009US7489389 Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane
02/10/2009US7489388 Lithographic apparatus and device manufacturing method
02/10/2009US7489385 Lithographic projection apparatus with collector including concave and convex mirrors
02/10/2009US7489020 Semiconductor wafer assemblies