Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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02/12/2009 | US20090042138 Photosensitivity; flexography |
02/12/2009 | US20090042137 Method for translating a structured beam of energetic particles across a substrate in template mask lithography |
02/12/2009 | US20090042136 Carbon Nanotube-Silicon Composite Structures and Methods for Making Same |
02/12/2009 | US20090042135 polymeric binder provides the post-development bakeability of imaged elements while increasing imaging sensitivity (speed) and maintaining resistance to press chemicals; solvent resistance; lithographic printing plates |
02/12/2009 | US20090042134 Photosensitive composition, photosensitive planographic printing plate material, and image forming method of photosensitive planographic printing plate material |
02/12/2009 | US20090042132 Resist composition for immersion lithography and method for forming resist pattern |
02/12/2009 | US20090042131 Positive resist composition, method of forming resist pattern, polymeric compound, and compound |
02/12/2009 | US20090042130 Positive resist composition for immersion exposure and method of forming resist pattern |
02/12/2009 | US20090042129 contains acid generator; post exposure baking |
02/12/2009 | US20090042128 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
02/12/2009 | US20090042127 Photoresist composition and method of forming a photoresist pattern using the same |
02/12/2009 | US20090042126 Photosensitive resin composition and cured article thereof |
02/12/2009 | US20090042124 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound |
02/12/2009 | US20090042123 Calixresorcinarene compound, photoresist base comprising the same, and composition thereof |
02/12/2009 | US20090042114 Halogenated oxime derivatives and the use therof as latent acids |
02/12/2009 | US20090042113 Manufacturing method of filter and color filter |
02/12/2009 | US20090042111 producing a microelectronic device by modulating an intensity and a phase of the zero diffraction order of a radiation with a device including subwavelength features having a pitch dimension smaller than one wavelength of the radiation |
02/12/2009 | US20090042110 Reflection type photomask blank, manufacturing method thereof, reflection type photomask, and manufacturing method of semiconductor device |
02/12/2009 | US20090042108 Pattern forming method and mask |
02/12/2009 | US20090042106 Photomask, and method and apparatus for producing the same |
02/12/2009 | US20090042105 Sensitizer dyes for photoacid generating systems |
02/12/2009 | US20090041948 Method of forming fine patterns |
02/12/2009 | US20090041883 Apparatus for fabricating flat panel display |
02/12/2009 | US20090040578 Hologram and Its Method of Manufacture |
02/12/2009 | US20090040496 Microlithographic exposure method as well as a projection exposure system for carrying out the method |
02/12/2009 | US20090040489 Position sensor |
02/12/2009 | US20090040487 Imaging device in a projection exposure facility |
02/12/2009 | US20090039275 Processing method, manufacturing method of semiconductor device, and processing apparatus |
02/12/2009 | US20090038834 Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same |
02/12/2009 | DE102008040874A1 Projection exposure system for use in semiconductor lithography, has optical component with optical and carrier elements, and surface elements of joining surface lying opposite to each other on outer surface of connecting element |
02/12/2009 | CA2693228A1 A double exposure semiconductor process for improved process margin |
02/12/2009 | CA2690723A1 Independently-addressable, self-correcting inking for cantilever arrays |
02/11/2009 | EP2023379A1 Exposure apparatus and exposure method |
02/11/2009 | EP2023378A1 Exposure apparatus and device manufacturing method |
02/11/2009 | EP2023216A2 Computer generated hologram, exposure apparatus, and hologram fabrication method |
02/11/2009 | EP2023207A1 Exposure apparatus and device manufacturing method |
02/11/2009 | EP2023206A1 Exposure apparatus and device manufacturing method |
02/11/2009 | EP2023205A2 Apparatus for forming nano pattern and method for forming the nano pattern using the same |
02/11/2009 | EP2023204A2 Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head |
02/11/2009 | EP2023203A1 Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device |
02/11/2009 | EP2023080A2 Liquid flow proximity sensor for use in immersion lithography |
02/11/2009 | EP2021874A1 Chucks for reticles and other planar bodies |
02/11/2009 | EP2021873A1 Negative-working radiation-sensitive compositions and imageable materials |
02/11/2009 | EP2021854A2 Symmetrical objective having four lens groups for microlithography |
02/11/2009 | EP1634122A4 Method for evaluating the effects of multiple exposure processes in lithography |
02/11/2009 | EP1565787B1 Stamp, method of its fabrication and use of it |
02/11/2009 | CN201194222Y Container having idiot-proof device |
02/11/2009 | CN201194068Y Photo-etching machine exposure system |
02/11/2009 | CN201194067Y Exposure control system for direct-writing photo-etching machine |
02/11/2009 | CN101366107A Oxidizing aqueous cleaner for the removal of post-etch residues |
02/11/2009 | CN101365758A Method of producing fine particles of anthraquinone structure-containing pigment, fine particles of anthraquinone structure-containing pigment produced thereby |
02/11/2009 | CN101365594A Bragg diffracting security markers |
02/11/2009 | CN101364702A Organic-inorganic composite erbium doping flat optical waveguide amplifier and preparing method thereof |
02/11/2009 | CN101364559A Structure of photo masked inflating cabinet |
02/11/2009 | CN101364558A Cycling airflow structure of load moving container |
02/11/2009 | CN101364557A Load moving container and bearing structure applicable to the same |
02/11/2009 | CN101364556A Containing chamber structure for transfer container |
02/11/2009 | CN101364555A Load moving container and conductive structure applicable to the load moving container |
02/11/2009 | CN101364116A Thermostatic control device |
02/11/2009 | CN101364092A Bottle body locking device, liquid management system and method thereof |
02/11/2009 | CN101364056A Detergent for photo resist |
02/11/2009 | CN101364055A Neutral developer solution for positive light-sensitive polyimides photo resist |
02/11/2009 | CN101364054A Auto focusing device for controlling exposal image-forming quality of CTP system |
02/11/2009 | CN101364053A Exposure system of photo-etching machine and control method thereof |
02/11/2009 | CN101364052A Active vibration damping system and forecast control method thereof |
02/11/2009 | CN101364051A Exposure equipment, exposure method, and manufacturing method for a semiconductor device |
02/11/2009 | CN101364050A Photolithography system |
02/11/2009 | CN101364049A Control system, lithographic projection apparatus, control method, and computer program product |
02/11/2009 | CN101364048A Photolithography illuminating apparatus and illuminating method |
02/11/2009 | CN101364047A Method for detecting light intensity distribution of gradient filter and method for enhancing consistency of line width |
02/11/2009 | CN101364046A Detecting and early-warning system for liquid and liquid level and method |
02/11/2009 | CN101364045A Method for producing water-soluble colorful photoresistive agent |
02/11/2009 | CN101364044A Minuteness processing method for upper substrate of glass |
02/11/2009 | CN101364043A Template design of nanostructure registration photoetching and implementing method |
02/11/2009 | CN101364041A Method and equipment for wiping and cleaning light shield |
02/11/2009 | CN101364016A Thin-film transistor LCD pixel structure and its making method |
02/11/2009 | CN101364014A Liquid crystal display panel and method for manufacturing same |
02/11/2009 | CN101362822A Positive photosensitive polyimide containing silazane chain structure and preparation method thereof |
02/11/2009 | CN101362812A Anti-reflective polymer, anti-reflective composition, and method for forming pattern using the same |
02/11/2009 | CN101362809A Anti-reflective polymer, anti-reflective composition, and method for forming pattern using the same |
02/11/2009 | CN100461337C Method for forming pattern, thin film transistor, display device and method for manufacturing the same and application |
02/11/2009 | CN100461336C Exposure apparatus and device producing method |
02/11/2009 | CN100461005C Process for preventing development defect and composition for use in the same |
02/11/2009 | CN100461004C Immersion lithography method and disposal method thereof |
02/11/2009 | CN100461003C Hemi-spherical structure and method for fabricating the same |
02/11/2009 | CN100461002C Method and apparatus for printing with identifying code of laser beam |
02/11/2009 | CN100461001C An assembly, a lithographic apparatus, and a device manufacturing method |
02/11/2009 | CN100461000C Method for forming metal pattern with low resistivity |
02/11/2009 | CN100460999C 193nm far-ultraviolet photoetching rubber and preparation method thereof |
02/11/2009 | CN100460998C Adhesive label, adhesive label roll, photosensitive web unit, and apparatus and method for manufacturing photosensitive laminated body |
02/11/2009 | CN100460966C Liquid crystal display device and fabrication method thereof |
02/11/2009 | CN100460946C Method of manufacturing liquid crystal display device |
02/11/2009 | CN100460932C Stability controlling system of one-dimensional interference optical field |
02/11/2009 | CN100460921C Catadioptric optical system and exposure device having this system |
02/11/2009 | CN100460805C Application of scatterometry alignment in imprint lithography |
02/11/2009 | CN100460432C Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element |
02/10/2009 | US7489389 Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane |
02/10/2009 | US7489388 Lithographic apparatus and device manufacturing method |
02/10/2009 | US7489385 Lithographic projection apparatus with collector including concave and convex mirrors |
02/10/2009 | US7489020 Semiconductor wafer assemblies |