| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/18/2009 | EP2024791A1 Large-field unit-magnification projection optical system |
| 02/18/2009 | EP2024790A2 Nanoparticle patterning process |
| 02/18/2009 | EP1519964B1 Polymeric photoinitiators |
| 02/18/2009 | EP1502154B1 Patterning of solid state features by direct write nanolithographic printing |
| 02/18/2009 | CN201196950Y Inflation equipment and air inlet apparatus |
| 02/18/2009 | CN101371199A Photoresist stripper composition for semiconductor manufacturing |
| 02/18/2009 | CN101371198A Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the same |
| 02/18/2009 | CN101371197A Photosensitive dry film resist, printed wiring board making use of the same, and process for producing printed wiring board |
| 02/18/2009 | CN101371196A Antireflective coating material |
| 02/18/2009 | CN101371195A Photosensitive composition, display member, and process for producing the same |
| 02/18/2009 | CN101371194A High resistivity compositions |
| 02/18/2009 | CN101371181A Optical beam steering and sampling apparatus and method |
| 02/18/2009 | CN101370837A Active energy ray-curable resin composition and use thereof |
| 02/18/2009 | CN101370797A Adamantane derivative, resin composition containing same, and optoelectronic member and sealing agent for electronic circuit using those |
| 02/18/2009 | CN101369524A Manufacturing method for semiconductor device |
| 02/18/2009 | CN101369105A Automatic spraying development apparatus and method after exposure of large-face optical resist glass plate |
| 02/18/2009 | CN101369104A Micro-adjusting device of optical element |
| 02/18/2009 | CN101369103A Optical illumination system, exposure apparatus and device fabrication method |
| 02/18/2009 | CN101369102A Lithographic apparatus and device manufacturing method |
| 02/18/2009 | CN101369101A Control method for overlay accuracy in photo-etching process |
| 02/18/2009 | CN101369100A Production method of PS plate |
| 02/18/2009 | CN101369099A Production method of pre-coating light sensitive plate for printing |
| 02/18/2009 | CN101369098A Curing resin composition, sealing material for liquid crystal display device and liquid crystal display device |
| 02/18/2009 | CN101369097A Production method of colorful color filter |
| 02/18/2009 | CN101369096A Plug-pull type vibration amplitude mask plate for producing arbitrary refractive index modulation optical fiber optical grating |
| 02/18/2009 | CN101369095A Exposure manufacture process, production method of image element structure and semi-modulation type photomask using the same |
| 02/18/2009 | CN101369077A LCD array substrates and manufacturing method thereof |
| 02/18/2009 | CN101369056A Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method |
| 02/18/2009 | CN101369054A Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method |
| 02/18/2009 | CN101369053A Complete refraction type projection optical system |
| 02/18/2009 | CN101367982A Curing resin composition, sealing material for liquid crystal display device and liquid crystal display device |
| 02/18/2009 | CN100463587C Method for forming bump on electrode pad with use of double-layered film |
| 02/18/2009 | CN100463117C Composition for cleaning semiconductor element, semiconductor element and manufacturing method thereof |
| 02/18/2009 | CN100462871C Light-limiting polyimide film for surface to be knurled |
| 02/18/2009 | CN100462848C Liquid supply and recovery seal controller in immersion type photoetching system |
| 02/18/2009 | CN100462847C Method for manufacturing printing plate |
| 02/18/2009 | CN100462846C Thin film pattern layer producing method |
| 02/18/2009 | CN100462845C Improved infiltrating type micro-image system with wafer sealing structure and method thereof |
| 02/18/2009 | CN100462844C Projection optical system, micro-image method, exposure apparatus and method for using same |
| 02/18/2009 | CN100462843C Infrared sensitive lithographic printing plate |
| 02/18/2009 | CN100462825C Array base board structure of thin film transistor liquid crystal display and its producing method |
| 02/18/2009 | CN100462806C Colorful filter and its making method and LCD device |
| 02/18/2009 | CN100462762C Holding device, exposing device and device manufacturing method |
| 02/18/2009 | CN100462667C 原版 Original edition |
| 02/18/2009 | CN100462377C Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern |
| 02/18/2009 | CN100462239C Novel technique of producing laser paper |
| 02/18/2009 | CN100462226C Arrangement for clamping and fixing printing block on exposure drum |
| 02/17/2009 | US7492509 Projection optical system |
| 02/17/2009 | US7492465 Method for determining optimal resist thickness |
| 02/17/2009 | US7492443 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 02/17/2009 | US7492435 Color filter substrate having a granular light-blocking spacer comprising an elastic material |
| 02/17/2009 | US7491959 Defect inspection apparatus |
| 02/17/2009 | US7491951 Lithographic apparatus, system and device manufacturing method |
| 02/17/2009 | US7491945 Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device |
| 02/17/2009 | US7491913 Bake apparatus for use in spin-coating equipment |
| 02/17/2009 | US7491908 Plasma processing device and ashing method |
| 02/17/2009 | US7491680 Device for chemical and biochemical reactions using photo-generated reagents |
| 02/17/2009 | US7491648 Method of patterning a photoresist film using a lithographic |
| 02/17/2009 | US7491637 Formation of conductive templates employing indium tin oxide |
| 02/17/2009 | US7491487 Polymerizable composition and lithographic printing plate precursor |
| 02/17/2009 | US7491485 Resist composition and method of forming resist pattern |
| 02/17/2009 | US7491484 Including photoacid generator having positively charged sulfonium ion and negatively charged sulfonate ion with hydrophilic carboxylic group; uniform distribution in photoresist film |
| 02/17/2009 | US7491483 Polymers, positive resist compositions and patterning process |
| 02/17/2009 | US7491482 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity |
| 02/17/2009 | US7491475 Photomask substrate made of synthetic quartz glass and photomask |
| 02/17/2009 | US7491422 Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrate |
| 02/17/2009 | US7491286 Spin or immersion coating; semiconductors, insulators, and superconductors; optics, magnetism |
| 02/17/2009 | US7491107 Plasma display panel producing method, and plasma display panel |
| 02/17/2009 | US7491003 Method and apparatus for thermal development with vapor treatment |
| 02/12/2009 | WO2009020979A1 A double exposure semiconductor process for improved process margin |
| 02/12/2009 | WO2009020658A1 Independently-addressable, self-correcting inking for cantilever arrays |
| 02/12/2009 | WO2009020223A1 Illumination optical system, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 02/12/2009 | WO2009020222A1 Illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 02/12/2009 | WO2009020196A1 Imprint method and processing method of substrate using the imprint method |
| 02/12/2009 | WO2009020193A2 Imprint method and processing method of substrate |
| 02/12/2009 | WO2009020089A1 Aromatic sulfonium salt compound |
| 02/12/2009 | WO2009020052A1 Coating method |
| 02/12/2009 | WO2009020035A1 Radiation-sensitive composition and compound |
| 02/12/2009 | WO2009020029A1 Radiosensitive resin composition |
| 02/12/2009 | WO2009019793A1 Method of forming pattern and, for use therein, radiation-sensitive resin composition and resin having radiation-sensitive acid generating group |
| 02/12/2009 | WO2009019575A2 Underlayer coating composition based on a crosslinkable polymer |
| 02/12/2009 | WO2009019574A1 Photoresist composition for deep uv and process thereof |
| 02/12/2009 | WO2009019173A1 Oxime ester photoinitiators |
| 02/12/2009 | WO2009018911A1 Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
| 02/12/2009 | WO2009018846A1 Method of structuring a photosensitive material |
| 02/12/2009 | WO2009002502A3 Heated water spray processor |
| 02/12/2009 | WO2008114148A3 Device for sorting and concentrating electromagnetic energy and apparatus comprising at least one such device |
| 02/12/2009 | WO2008099795A3 Imprint method and imprint apparatus |
| 02/12/2009 | WO2005078776A8 Pattern forming process |
| 02/12/2009 | US20090042394 Manufacturing method for wiring |
| 02/12/2009 | US20090042149 Rinsing method and developing method |
| 02/12/2009 | US20090042147 Method of forming patterns |
| 02/12/2009 | US20090042146 Method of forming fine patterns using a block copolymer |
| 02/12/2009 | US20090042145 Method for Detecting Light Intensity Distribution for Gradient Filter and Method for Improving Line Width Consistency |
| 02/12/2009 | US20090042144 providing conductive circuit on surface of insulating layer, conductive surface having connection terminal, coating resist on insulating layer and conductive circuit, patterning resist into desired pattern, forming a projection portion; enhanced connection strength between connection terminals |
| 02/12/2009 | US20090042143 Thin-film magnetic head structure, method of manufacturing the same, and thin-film magnetic head |
| 02/12/2009 | US20090042142 Organic triodes with novel grid structures and method of production |
| 02/12/2009 | US20090042141 Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same |
| 02/12/2009 | US20090042140 composition with a base resin capable of absorbing light, a thermal acid generator, and an organic solvent; high refractive index; photoresist pattern by an ArF immersion lithography process in manufacturing a semiconductor device; poly(3,3,-dithioethylpropene) polymer from polyacrolein and ethanethiol |
| 02/12/2009 | US20090042139 Exposure method and electronic device manufacturing method |