| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/25/2009 | CN101375210A Method of making a lithographic printing plate |
| 02/25/2009 | CN101375209A Contact lithography apparatus, system and method |
| 02/25/2009 | CN101374886A Curable composition containing thiol compound |
| 02/25/2009 | CN101374880A Epoxy formulations for use in lithography techniques |
| 02/25/2009 | CN101374878A Positive photosensitive resin composition and cured film obtained therefrom |
| 02/25/2009 | CN101374675A Method for manufacturing aluminum support for lithographic printing plate material, aluminum support for lithographic printing plate material, lithographic printing plate material, and method for imag |
| 02/25/2009 | CN101373707A Processing device |
| 02/25/2009 | CN101373343A Colour photoresistive agent stripping solution composition for thin film transistor LCD |
| 02/25/2009 | CN101373342A Acidic stripping liquid and preparing method thereof |
| 02/25/2009 | CN101373341A Photoresist apparatus for removing edge |
| 02/25/2009 | CN101373340A Cleaning agent of photoresist |
| 02/25/2009 | CN101373339A Cleaning agent of thick film photoresist |
| 02/25/2009 | CN101373338A A method of performing model-based scanner tuning |
| 02/25/2009 | CN101373337A Exposure method, device manufacturing method, substrate and manufacturing method thereof |
| 02/25/2009 | CN101373336A Method for optimizing exposure device monitoring |
| 02/25/2009 | CN101373335A Method for optimizing scan exposure |
| 02/25/2009 | CN101373334A Method for manually shivering materials of grating net semi-etching connection point |
| 02/25/2009 | CN101373333A Planographic plate for laser digital scanning and manufacture method thereof |
| 02/25/2009 | CN101373332A Planographic plate material for CTP, preparing method thereof and planographic plate made thereby |
| 02/25/2009 | CN101373331A Column spacer, liquid crystal display element and curable resin composition for column spacer |
| 02/25/2009 | CN101373330A Diazo naphthoquinone overturn imaging photosensitive composition |
| 02/25/2009 | CN101373329A Colored cured composition |
| 02/25/2009 | CN101373327A Mask for semiconductor device and patterning method using the same |
| 02/25/2009 | CN101373325A Half-tone mask plate structure and manufacturing method thereof |
| 02/25/2009 | CN101373323A Optical mask and manufacturing method thereof |
| 02/25/2009 | CN101373301A FFS type TFT-LCD array substrate structure and manufacturing method thereof |
| 02/25/2009 | CN101373300A TFT LCD color film substrate structure and manufacturing method thereof |
| 02/25/2009 | CN101373291A Liquid crystal display element |
| 02/25/2009 | CN101373282A Method for manufacturing position phase array machine capable of adjusting two-dimensional photon microstructure |
| 02/25/2009 | CN100464433C A crossed combined dual cycle grating for quanta trap infrared detector |
| 02/25/2009 | CN100464224C Color filter and manufacture method therefor |
| 02/25/2009 | CN100464198C Optical structure for changing light direction and back lighting chock |
| 02/25/2009 | CN100463911C Acyl- and bisacylphosphine derivatives |
| 02/24/2009 | US7495840 Very high-aperture projection objective |
| 02/24/2009 | US7495782 Method and system for measuring patterned structures |
| 02/24/2009 | US7495744 Exposure method, exposure apparatus, and method for producing device |
| 02/24/2009 | US7495742 Measuring method and apparatus, exposure method and apparatus using the same, and device manufacturing method |
| 02/24/2009 | US7495243 Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium |
| 02/24/2009 | US7495239 Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
| 02/24/2009 | US7495035 Photo-curable resin composition and sealing agent for flat panel display using the same |
| 02/24/2009 | US7494766 performing an overlapping partitioned exposure process in one or two processes selected from a mask process of forming a gate line, a mask process of forming an active layer, a mask process of forming a source/drain electrode and a mask process of forming a contact hole on a passivation layer |
| 02/24/2009 | US7494765 plurality of transmitting nonprinting windows transmitting light in a first phase; a transmitting area transmitting light in a second phase, each transmitting window substantially entirely surrounded by and in contact with the transmitting area with no blocking material intervening |
| 02/24/2009 | US7494764 Negative photosensitive resin composition |
| 02/24/2009 | US7494763 Polyhydric phenol compound and chemically amplified resist composition containing the same |
| 02/24/2009 | US7494762 Positive resist composition for immersion lithography and method for forming resist pattern |
| 02/24/2009 | US7494761 Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition |
| 02/24/2009 | US7494760 Comprises arylsulfonyloxime; for integrated circuits |
| 02/24/2009 | US7494759 Positive resist compositions and process for the formation of resist patterns with the same |
| 02/24/2009 | US7494749 Photolithography using interdependent binary masks |
| 02/24/2009 | US7494555 Microfabricated elastomeric valve and pump systems |
| 02/19/2009 | WO2009023489A1 Nanoscale imaging via absorption modulation |
| 02/19/2009 | WO2009023479A1 Masks for microlithography and methods of making and using such masks |
| 02/19/2009 | WO2009023112A1 Negative-working imageable elements and methods of use |
| 02/19/2009 | WO2009023103A1 Multi-layer imageable element with improved properties |
| 02/19/2009 | WO2009022732A1 Positive photosensitive resin composition, cured film, protective film, insulating film and semiconductor device |
| 02/19/2009 | WO2009022724A1 Photosensitive resin composition and laminate thereof |
| 02/19/2009 | WO2009022681A1 Positive resist composition, pattern forming method using the composition, and compound used in the composition |
| 02/19/2009 | WO2009022644A1 Negative photosensitive resin composition, spacer and liquid crystal display |
| 02/19/2009 | WO2009022576A1 Image-forming layer coating liquid for positive lithographic printing plate member, method for producing positive lithographic printing plate member, and positive lithographic printing plate member |
| 02/19/2009 | WO2009022561A1 Positive working resist composition and method for pattern formation using the positive working resist composition |
| 02/19/2009 | WO2009022540A1 Compound and radiation-sensitive composition |
| 02/19/2009 | WO2009022506A1 Lighting optical apparatus, photolithography equipment and device manufacturing method |
| 02/19/2009 | WO2009022504A1 Fine pattern forming method and coat film forming material |
| 02/19/2009 | WO2009022405A1 Photosensitive polyimide precursor composition and electronic part made with the same |
| 02/19/2009 | WO2009022224A2 Antireflective coating composition |
| 02/19/2009 | WO2009021670A1 Method and apparatus for measuring scattered light on an optical system |
| 02/19/2009 | WO2009021400A1 Cleaning composition for removing resist |
| 02/19/2009 | WO2009002644A3 Methods of making hierarchical articles |
| 02/19/2009 | WO2009000241A3 Contact exposure device for a printing screen |
| 02/19/2009 | WO2008102259A8 Antireflective coating composition based on a silicon polymer |
| 02/19/2009 | WO2008096211A3 Measurement of critical dimensions of semiconductor wafers |
| 02/19/2009 | WO2008060266A3 Nanotemplate arbitrary-imprint lithography |
| 02/19/2009 | WO2008031576A8 Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same |
| 02/19/2009 | WO2005067514A3 Method and system for reconstructing aberrated image profiles through simulation |
| 02/19/2009 | US20090047608 Apparatus and method for transferring features to an edge of a wafer |
| 02/19/2009 | US20090047607 Exposure method, exposure apparatus and device fabricating methods |
| 02/19/2009 | US20090047605 Method of manufacturing photosensitive epoxy structure using photolithography process and method of manufacturing inkjet printhead using the method of manufacturing photosensitive epoxy structure |
| 02/19/2009 | US20090047603 Method of making a lithographic printing plate |
| 02/19/2009 | US20090047602 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern |
| 02/19/2009 | US20090047601 Planographic printing plate precursor and printing method using the same |
| 02/19/2009 | US20090047600 high resolution pattern with reduced line edge roughness; increased alkali solubility under action of acid generator |
| 02/19/2009 | US20090047599 Initiator having iodonium cation and b anion; infrared radiation absorber compound; polymeric binder and spirolactone or spirolactam colorant |
| 02/19/2009 | US20090047598 Resist composition for electron beam, x-ray, or euv, and pattern-forming method using the same |
| 02/19/2009 | US20090047586 Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program |
| 02/19/2009 | US20090047485 Direct incident beam lithography for patterning nanoparticles, and the articles formed thereby |
| 02/19/2009 | US20090045552 Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same |
| 02/19/2009 | US20090045396 Composition for forming passivation layer and organic thin film transistor comprising the passivation layer |
| 02/19/2009 | US20090045357 Contamination barrier and lithographic apparatus comprising same |
| 02/19/2009 | US20090044971 Printed Wiring Board, Process for Producing the Same and Usage of the Same |
| 02/19/2009 | US20090044900 Method of and apparatus for laminated substrate assembly |
| 02/19/2009 | US20090044837 Substrate processing apparatus |
| 02/19/2009 | DE19753596B4 Vorrichtung zum Aufbringen einer dünnen Schicht auf ein Substrat A device for applying a thin layer on a substrate |
| 02/19/2009 | DE102008040938A1 Panel facet's optical surface producing method for microlithography projector, involves adjusting tilting angle at longitudinal axis or tilting angle at transverse axis at facet base bodies in predetermined range |
| 02/19/2009 | DE102007038999A1 Verfahren zur Steigerung des Durchsatzes und zur Reduzierung der Bewegungsunschärfe A method for increasing the throughput and to reduce the motion blur |
| 02/19/2009 | DE102007037942A1 Optical arrangement for use in projection exposure system for microlithography, has processing device determining thickness of contamination layer at point by processing output signal of optical sensor element |
| 02/18/2009 | EP2026132A2 Process for making a cylindrically-shaped photosensitive element for use as a printing form |
| 02/18/2009 | EP2026131A2 Lithography meandering order |
| 02/18/2009 | EP2025777A2 Low transit thermal stress turbine engine components |
| 02/18/2009 | EP2025698A1 Crosslinkable prepolymer, process for production thereof, and use thereof |
| 02/18/2009 | EP2024998A1 Electronic package and method of preparing same |