| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/04/2009 | CN100466151C An extractor for an microcolumn, an alignment method for an extractor aperture and an electon emitter |
| 03/04/2009 | CN100465798C Method for reducing pattern dimension in photoresist layer |
| 03/04/2009 | CN100465797C Development apparatus with the function of macroscopic detection |
| 03/04/2009 | CN100465796C method for calculating the pixel value of the angle formed by the first and the second edge of a polygon |
| 03/04/2009 | CN100465795C Edge exposure apparatus, coating and developing apparatus and edge exposure method |
| 03/04/2009 | CN100465794C Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus |
| 03/04/2009 | CN100465793C Proximity type exposure apparatus |
| 03/04/2009 | CN100465792C Laser drawing device, Laser drawing method and method for preparing optical mask |
| 03/04/2009 | CN100465791C Exposure apparatus and method |
| 03/04/2009 | CN100465790C Imemersion photolithographic system used on composition workpiece |
| 03/04/2009 | CN100465789C A method and an apparatus thereof for performing placing models of phase-balanced scattering bars by sub-wavelength optical lithography |
| 03/04/2009 | CN100465788C Lithography equipment |
| 03/04/2009 | CN100465787C A forming method of graphic diaphragm layers and barriers |
| 03/04/2009 | CN100465786C An optical micro-electromechanical component and a manufacturing method thereof |
| 03/04/2009 | CN100465785C A lithographic apparatus and a manufacturing method of devices |
| 03/04/2009 | CN100465784C A photosensitive ray composition, a pattern forming method and a manufacturing method of semiconductor devices |
| 03/04/2009 | CN100465720C A field emission backlight device, a driving method of the backlight unit and a method of manufacturing lower panels |
| 03/04/2009 | CN100465715C A method for forming pad electrodes and a method for manufacturing liquid crystal display devices |
| 03/04/2009 | CN100465704C A contact structure and a manufacturing method, a thin film transistor array panel and a manufacturing Method |
| 03/04/2009 | CN100465666C A manufacturing method of microcomponents |
| 03/04/2009 | CN100464982C A liquid discharge head, a method thereof, chip elements and a printing apparatus |
| 03/03/2009 | US7500217 Handling of flat data for phase processing including growing shapes within bins to identify clusters |
| 03/03/2009 | US7499600 Method for characterizing a digital imaging system |
| 03/03/2009 | US7499180 Alignment stage, exposure apparatus, and semiconductor device manufacturing method |
| 03/03/2009 | US7499149 Holographic mask for lithographic apparatus and device manufacturing method |
| 03/03/2009 | US7499148 Polarizer, projection lens system, exposure apparatus and exposing method |
| 03/03/2009 | US7499145 Illumination optical system and exposure apparatus having the same |
| 03/03/2009 | US7498126 Comprises arylsulfonyloxime; for integrated circuits; suited for deep UV lithography; improved in pattern profile shape particularly when the thickness of resist film is reduced |
| 03/03/2009 | US7498124 Sacrificial surfactanated pre-wet for defect reduction in a semiconductor photolithography developing process |
| 03/03/2009 | US7498120 Using the UV-curable photoresist and photolithography to define high frequency electromagnetic wave source components, such as an output cavity, a waveguide and an alignment feature on the substrate |
| 03/03/2009 | US7498119 Process for forming a feature by undercutting a printed mask |
| 03/03/2009 | US7498118 Immersing substrate coated with photoresist in a liquid having a refractive index greater than or equal to 1.4;exposing substrate; removing the liquid from the substrate by rotating the stage and/or substrate at high speed; developing the photoresist |
| 03/03/2009 | US7498117 System and method for radiation imaging by in-situ particle formation |
| 03/03/2009 | US7498116 Resist composition and pattern formation method using the same |
| 03/03/2009 | US7498106 Method and apparatus for controlling etch processes during fabrication of semiconductor devices |
| 03/03/2009 | US7497959 Methods and structures for protecting one area while processing another area on a chip |
| 03/03/2009 | US7497908 Film coating unit and film coating method |
| 02/26/2009 | WO2009026520A1 Automatic geometric calibration using laser scanning reflectometry |
| 02/26/2009 | WO2009025498A2 Alkali developable photosensitive resin composition and dry film manufactured by the same |
| 02/26/2009 | WO2009025335A1 Radiation-sensitive composition and compound |
| 02/26/2009 | WO2009025319A1 Polyimide composition, flexible wiring board, and process for producing flexible wiring board |
| 02/26/2009 | WO2009025297A1 Resin black matrix, light blocking photosensitive resin composition, tft element substrate and liquid crystal display device |
| 02/26/2009 | WO2009025283A1 Novel polyimide resin and photosensitive polyimide resin composition |
| 02/26/2009 | WO2009025255A1 Lithographic printing plate material |
| 02/26/2009 | WO2009025228A1 Plate supply and discharge device and printing plate forming device using same |
| 02/26/2009 | WO2009025190A1 Reactive carboxylate compound, active-energy-ray-curable resin composition utilizing the same, and use of the same |
| 02/26/2009 | WO2009024592A1 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer |
| 02/26/2009 | WO2009024438A1 Microlithographic projection exposure method |
| 02/26/2009 | WO2009024192A1 Optical element module with minimized parasitic loads |
| 02/26/2009 | WO2009024164A1 Projection objective having mirror elements with reflective coatings |
| 02/26/2009 | WO2009002531A3 Hydrocarbon getter for lithographic exposure tools |
| 02/26/2009 | WO2008157619A3 Total internal reflection displacement scale |
| 02/26/2009 | US20090053657 Patterning process and pattern surface coating composition |
| 02/26/2009 | US20090053656 Process to form a mold of nanoimprint technique for making diffraction grating for DFB-LD |
| 02/26/2009 | US20090053655 Methods for forming patterned structures |
| 02/26/2009 | US20090053653 Polymerizable composition and lithographic printing plate precursor |
| 02/26/2009 | US20090053651 Patterning process |
| 02/26/2009 | US20090053650 Resist composition for immersion exposure and method of forming resist pattern |
| 02/26/2009 | US20090053649 Lactone copolymer and radiation-sensitive resin composition |
| 02/26/2009 | US20090053648 Light sensitive planographic printing plate material |
| 02/26/2009 | US20090053647 Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative |
| 02/26/2009 | US20090053646 Material for protective film formation and method of forming resist pattern therewith |
| 02/26/2009 | US20090053629 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| 02/26/2009 | US20090053628 Method of performing model-based scanner tuning |
| 02/26/2009 | US20090053626 Colored photosensitive composition, color filter, and method for manufacturing color filter |
| 02/26/2009 | US20090053621 Source and Mask Optimization by Changing Intensity and Shape of the Illumination Source |
| 02/26/2009 | US20090053619 (1S,4S)-2-(5-(4-methoxyphenoxy)-3-pyridyl)-2,5-diazabicyclo[2.2.1]heptane, capable of modulating nicotinic receptors, neurotransmitter secretion and exhibiting neuroprotective effects, with no appreciable adverse side effects |
| 02/26/2009 | US20090053618 Projection exposure method and projection exposure system therefor |
| 02/26/2009 | US20090053617 Holographic recording medium |
| 02/26/2009 | US20090053616 Holographic recording medium |
| 02/26/2009 | US20090053615 Photosensitive Resin Composition for Volume Phase Hologram Recording and Optical Information Recording Medium Using the Same |
| 02/26/2009 | US20090053487 Ceramic circuit board and manufacturing method thereof |
| 02/26/2009 | US20090053471 Micro and nano structures in an elastomeric material |
| 02/26/2009 | US20090051987 Method and arrangement for producing a hologram |
| 02/26/2009 | US20090051893 Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method |
| 02/26/2009 | US20090051888 Liquid jet and recovery system for immersion lithography |
| 02/26/2009 | US20090050776 Apparatus for manipulation of an optical element |
| 02/26/2009 | US20090050490 Support For Lithographic Printing Plate and Presensitized Plate |
| 02/26/2009 | US20090049624 Dye-containing curable composition, color filter and method for producing the same |
| 02/26/2009 | DE19964580B4 Verfahren zum Überprüfen eines Objektbelichtungsmusters A method for checking an object exposure pattern |
| 02/26/2009 | DE102008041287A1 Actuator arrangement for deforming e.g. lens, of optical arrangement of microlithography device, has actuator devices exerting actuator forces on body until reaching maximum force values, where one value is smaller than other value |
| 02/26/2009 | DE102008002575A1 Mikrolithographisches Projektionsbelichtungsverfahren Microlithographic projection exposure method |
| 02/26/2009 | DE102007038056A1 Method for determining polarization-optical characteristic of micro lithographic projection exposure system, involves determining transmission factor of projection lens for both orthogonal polarization directions |
| 02/26/2009 | CA2696076A1 Plate supply and discharge device, printing plate forming device using same, plate supply table, and plate discharge table |
| 02/25/2009 | EP2028681A1 Reflective mask blank for euv lithography |
| 02/25/2009 | EP2028654A1 Holographic recording medium and holographic recording apparatus |
| 02/25/2009 | EP2028578A2 Cooling system, exposure apparatus having the same, and device manufacturing method |
| 02/25/2009 | EP2028548A1 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer |
| 02/25/2009 | EP2028547A1 Lithographic apparatus and device manufacturing method |
| 02/25/2009 | EP2028546A2 A method of performing model-based scanner tuning, a computer program and a lithographic apparatus |
| 02/25/2009 | EP2028545A1 Lens replacing method and manufacturing method for alternative lens |
| 02/25/2009 | EP2028544A2 Colored photosensitive composition, color filter, and method for manufacturing color filter |
| 02/25/2009 | EP2028543A2 Method of fabricating an integrated circuit using two mask layers |
| 02/25/2009 | EP2028262A2 Improved alkaline chemistry for post-cmp cleaning |
| 02/25/2009 | EP2027509A1 Immersion flow field maintenance system for immersion lithography machine |
| 02/25/2009 | EP2026741A2 Pharmaceutical tablets with diffractive microstructure and compression tools for producing such tablets |
| 02/25/2009 | EP1573730B1 Liquid removal in a method and device for irradiating spots on a layer |
| 02/25/2009 | EP1384234B1 Euvl multilayer structures |
| 02/25/2009 | CN101375372A Exposure method, exposure apparatus, photomask and photomask manufacturing method |
| 02/25/2009 | CN101375211A Photosensitive resin composition |