Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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03/10/2009 | US7501227 System and method for photolithography in semiconductor manufacturing |
03/10/2009 | US7501226 Removable seal ring covering a predetermined portion of a wafer edge for preventing immersion fluid from leaking through the covered portion; seal ring carrier attached to an arm with a vacuum channel and vacuum ports; prevents the immersion fluid from contact with the particulate contamination areas |
03/10/2009 | US7501224 Compositions for use in forming a pattern and methods of forming a pattern |
03/10/2009 | US7501223 Polymer, resist composition and patterning process using the same |
03/10/2009 | US7501222 Photoresist monomer polymer thereof and photoresist composition including the same |
03/10/2009 | US7501221 Positive type resist composition and resist pattern formation method using same |
03/10/2009 | US7501220 Resist composition |
03/10/2009 | US7501214 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
03/10/2009 | CA2282713C Gel sensors and methods of making thereof |
03/05/2009 | WO2009029826A1 Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniques |
03/05/2009 | WO2009029189A2 Device for laser pulse conditioning by stretching, delaying and modulating |
03/05/2009 | WO2009028698A1 Drive method and drive system for movably body |
03/05/2009 | WO2009028697A1 Drive method and drive system for a movable body |
03/05/2009 | WO2009028696A1 Movable body drive method and movable body drive system |
03/05/2009 | WO2009028695A1 Drive method and drive system for a movable body |
03/05/2009 | WO2009028694A1 Movable body drive system |
03/05/2009 | WO2009028693A1 Method and system for driving a movable body |
03/05/2009 | WO2009028511A1 Composition for resist lower layer film formation for lithography and process for producing semiconductor device |
03/05/2009 | WO2009028494A1 Position detecting apparatus, position detecting method, exposure apparatus and device manufacturing method |
03/05/2009 | WO2009028479A1 Reactive carboxylate compound, curable resin composition using the same, and use of the same |
03/05/2009 | WO2009028360A1 Photosensitive composition, cured film formed therefrom, and device having cured film |
03/05/2009 | WO2009028324A1 Photosensitive lithographic printing plate |
03/05/2009 | WO2009028208A1 Negative photosensitive material and circuit board |
03/05/2009 | WO2009028157A1 Moving body driving method, moving body driving system, pattern forming method, and pattern forming device |
03/05/2009 | WO2009027794A2 Polymers for use in photoresist compositions |
03/05/2009 | WO2009027487A1 Method for image lithography by continuous direct writing |
03/05/2009 | WO2009027272A1 A method for developing a printing plate precursor |
03/05/2009 | WO2009026970A1 Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography |
03/05/2009 | WO2009026947A1 Illumination system for illuminating a mask in a microlithographic projection exposure apparatus |
03/05/2009 | WO2009007928A3 Methods for manufacturing integrated circuits |
03/05/2009 | WO2009000242A3 Contact exposure device for a printing screen |
03/05/2009 | WO2008138934A3 A method for the manufacture of patterned functional monolayer structures and products thereof |
03/05/2009 | WO2008044925A3 Lithographic apparatus, and device manufacturing method |
03/05/2009 | US20090064083 Computer automated method for designing an integrated circuit, a computer automated system for designing an integrated circuit, and a method of manufacturing an integrated circuit |
03/05/2009 | US20090061364 Process for on-press developable lithographic printing plate involving preheat |
03/05/2009 | US20090061363 Method for on-press developing laser sensitive lithographic printing plate |
03/05/2009 | US20090061362 Semiconductor device manufacturing method using double patterning and mask |
03/05/2009 | US20090061361 Integrated Circuit Manufacturing Methods with Patterning Device Position Determination |
03/05/2009 | US20090061360 Material for resist protective film for immersion lithography |
03/05/2009 | US20090061359 Resist composition for immersion exposure and method for manufacturing a semiconductor device using the same |
03/05/2009 | US20090061358 Novel photoacid generator, resist composition, and patterning process |
03/05/2009 | US20090061357 Ionic polymer particles for processless printing plate precursor |
03/05/2009 | US20090061356 Interpolymer of (meth)acrylic acid esters containing acid dissociable, dissolution inhibiting groups, such as 1-ethylcyclohexyl esters and cycloalkyl groups, especially adamantane rings; may also contain lactone rings; positive resists |
03/05/2009 | US20090061355 Process of making a lithographic structure using antireflective materials |
03/05/2009 | US20090061354 Lithographic Printing Plate Support, Method of Manufacturing the Same, and Presensitized Plate |
03/05/2009 | US20090061353 Positive-Type Resist Composition |
03/05/2009 | US20090061331 Exposure method and apparatus, maintenance method, and device manufacturing method |
03/05/2009 | US20090061330 Photomask and pattern formation method using the same |
03/05/2009 | US20090061329 Semiconductor device manufacturing method and hard mask |
03/05/2009 | US20090061328 Photomask and pattern formation method using the same |
03/05/2009 | US20090061152 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography |
03/05/2009 | US20090061115 Capacitive touch screen and manufacturing method thereof |
03/05/2009 | DE102008041310A1 Optical element e.g. lens, for projection illumination system, has damping unit with sensor element detecting movement of element, and actuator element damping element by producing force or moment based on movement of element |
03/05/2009 | DE102008041144A1 Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front |
03/05/2009 | DE102008002193A1 Optical element i.e. plane-convex lens, for use in projection exposure system for immersion lithography, has water-repellent surface formed in element body, where surface is formed by micro structuring uncoated regions of element body |
03/05/2009 | DE102007041004A1 Illumination lens for use in scanner-type projection illumination system e.g. stepper, for extreme ultraviolet microlithography, has correction element arranged in optical path of ultraviolet radiation between radiation source and location |
03/05/2009 | DE102007040593A1 Optical system i.e. lens, for use in digital camera module, has deflection unit and lens groups, where one group includes lenses arranged in direction of imaging unit such that no optical unit is arranged between one of lenses and object |
03/04/2009 | EP2031640A1 Variable slit device, illuminating device, exposure device, exposure method, and method of manufacturing device |
03/04/2009 | EP2031448A1 An aqueous alkaline developing solution |
03/04/2009 | EP2031447A2 Optical element and exposure apparatus |
03/04/2009 | EP2031446A1 Resist composition for immersion exposure and method for manufacturing a semiconductor device using the same |
03/04/2009 | EP2031445A2 Chemical amplification resist composition and pattern-forming method using the same |
03/04/2009 | EP2031444A2 Microcontact printing stamps |
03/04/2009 | EP2031007A2 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions |
03/04/2009 | EP2031006A1 Process for producing epoxy compound, epoxy resin composition and use thereof, ultraviolet-curable can coating composition, and process for producing coated metal can§ |
03/04/2009 | EP2030084A1 Maskless photopolymer exposure process and apparatus |
03/04/2009 | EP2030083A1 Method of controlling contamination of a surface |
03/04/2009 | EP2030082A2 Method and unit for micro-structuring a moving substrate |
03/04/2009 | EP2030081A2 Oxime sulfonates and the use therof as latent acids |
03/04/2009 | EP2030070A1 Projection objective of a microlithographic projection exposure apparatus |
03/04/2009 | EP2029963A1 Gap measuring method, imprint method, and imprint apparatus |
03/04/2009 | EP1210651B1 Antireflective coating for photoresist compositions |
03/04/2009 | CN201203788Y Monitoring control system for micro-flux spraying |
03/04/2009 | CN101379608A Copper interconnection for fabricating flat-panel display |
03/04/2009 | CN101379435A System and method for improvement of alignment and overlay for microlithography |
03/04/2009 | CN101379434A Photosensitive resin composition and photoresist film using the same |
03/04/2009 | CN101379433A UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer |
03/04/2009 | CN101379432A Photopolymer composition suitable for lithographic printing plates |
03/04/2009 | CN101379132A Curable composition, color filter, and liquid crystal display device |
03/04/2009 | CN101378010A Coating and developing apparatus, coating and developing method, and storage medium |
03/04/2009 | CN101377626A Method of developing a substrate and apparatus for performing the same |
03/04/2009 | CN101377625A Apparatus and method for mounting pellicle |
03/04/2009 | CN101377624A Exposure device and exposure process |
03/04/2009 | CN101377623A Approximate connecting type exposure method and method for making patterned electrode layer by the same |
03/04/2009 | CN101377622A Method for detecting photolithography equipment exhaust system and judging product CPK |
03/04/2009 | CN101377621A Photosensitive resin composition for flexible wiring circuit board and flexible wiring circuit board obtained by using the same |
03/04/2009 | CN101377620A Photosensitive resin composition for flexible wiring circuit board and flexible wiring circuit board obtained by using the same |
03/04/2009 | CN101377619A Production process of Planetary gear sheet etching method |
03/04/2009 | CN101377618A Dual-side imprinting lithography system |
03/04/2009 | CN101377617A Surface treating method of cutting tool |
03/04/2009 | CN101377581A LCD and making method thereof |
03/04/2009 | CN101377555A Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof |
03/04/2009 | CN101376750A Method for preparing organic pigment nanoparticle, power, dispersion, composition, ink, transfer print material, color filter and display device |
03/04/2009 | CN101376316A Method for making high-temperature enamel firing porcelain printing making or oil painting |
03/04/2009 | CN100466216C Carrying processing device |
03/04/2009 | CN100466204C A prodcution method for nano coulomb structure |
03/04/2009 | CN100466193C Plasma processing device and ashing method |
03/04/2009 | CN100466171C High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film |
03/04/2009 | CN100466170C Mask and the production method for producing compound semiconductor device with the mask |
03/04/2009 | CN100466159C High-performance and non-contact support platforms |