Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2009
03/10/2009US7501227 System and method for photolithography in semiconductor manufacturing
03/10/2009US7501226 Removable seal ring covering a predetermined portion of a wafer edge for preventing immersion fluid from leaking through the covered portion; seal ring carrier attached to an arm with a vacuum channel and vacuum ports; prevents the immersion fluid from contact with the particulate contamination areas
03/10/2009US7501224 Compositions for use in forming a pattern and methods of forming a pattern
03/10/2009US7501223 Polymer, resist composition and patterning process using the same
03/10/2009US7501222 Photoresist monomer polymer thereof and photoresist composition including the same
03/10/2009US7501221 Positive type resist composition and resist pattern formation method using same
03/10/2009US7501220 Resist composition
03/10/2009US7501214 Semiconductor device fabrication method and fabrication apparatus using a stencil mask
03/10/2009CA2282713C Gel sensors and methods of making thereof
03/05/2009WO2009029826A1 Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniques
03/05/2009WO2009029189A2 Device for laser pulse conditioning by stretching, delaying and modulating
03/05/2009WO2009028698A1 Drive method and drive system for movably body
03/05/2009WO2009028697A1 Drive method and drive system for a movable body
03/05/2009WO2009028696A1 Movable body drive method and movable body drive system
03/05/2009WO2009028695A1 Drive method and drive system for a movable body
03/05/2009WO2009028694A1 Movable body drive system
03/05/2009WO2009028693A1 Method and system for driving a movable body
03/05/2009WO2009028511A1 Composition for resist lower layer film formation for lithography and process for producing semiconductor device
03/05/2009WO2009028494A1 Position detecting apparatus, position detecting method, exposure apparatus and device manufacturing method
03/05/2009WO2009028479A1 Reactive carboxylate compound, curable resin composition using the same, and use of the same
03/05/2009WO2009028360A1 Photosensitive composition, cured film formed therefrom, and device having cured film
03/05/2009WO2009028324A1 Photosensitive lithographic printing plate
03/05/2009WO2009028208A1 Negative photosensitive material and circuit board
03/05/2009WO2009028157A1 Moving body driving method, moving body driving system, pattern forming method, and pattern forming device
03/05/2009WO2009027794A2 Polymers for use in photoresist compositions
03/05/2009WO2009027487A1 Method for image lithography by continuous direct writing
03/05/2009WO2009027272A1 A method for developing a printing plate precursor
03/05/2009WO2009026970A1 Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
03/05/2009WO2009026947A1 Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
03/05/2009WO2009007928A3 Methods for manufacturing integrated circuits
03/05/2009WO2009000242A3 Contact exposure device for a printing screen
03/05/2009WO2008138934A3 A method for the manufacture of patterned functional monolayer structures and products thereof
03/05/2009WO2008044925A3 Lithographic apparatus, and device manufacturing method
03/05/2009US20090064083 Computer automated method for designing an integrated circuit, a computer automated system for designing an integrated circuit, and a method of manufacturing an integrated circuit
03/05/2009US20090061364 Process for on-press developable lithographic printing plate involving preheat
03/05/2009US20090061363 Method for on-press developing laser sensitive lithographic printing plate
03/05/2009US20090061362 Semiconductor device manufacturing method using double patterning and mask
03/05/2009US20090061361 Integrated Circuit Manufacturing Methods with Patterning Device Position Determination
03/05/2009US20090061360 Material for resist protective film for immersion lithography
03/05/2009US20090061359 Resist composition for immersion exposure and method for manufacturing a semiconductor device using the same
03/05/2009US20090061358 Novel photoacid generator, resist composition, and patterning process
03/05/2009US20090061357 Ionic polymer particles for processless printing plate precursor
03/05/2009US20090061356 Interpolymer of (meth)acrylic acid esters containing acid dissociable, dissolution inhibiting groups, such as 1-ethylcyclohexyl esters and cycloalkyl groups, especially adamantane rings; may also contain lactone rings; positive resists
03/05/2009US20090061355 Process of making a lithographic structure using antireflective materials
03/05/2009US20090061354 Lithographic Printing Plate Support, Method of Manufacturing the Same, and Presensitized Plate
03/05/2009US20090061353 Positive-Type Resist Composition
03/05/2009US20090061331 Exposure method and apparatus, maintenance method, and device manufacturing method
03/05/2009US20090061330 Photomask and pattern formation method using the same
03/05/2009US20090061329 Semiconductor device manufacturing method and hard mask
03/05/2009US20090061328 Photomask and pattern formation method using the same
03/05/2009US20090061152 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
03/05/2009US20090061115 Capacitive touch screen and manufacturing method thereof
03/05/2009DE102008041310A1 Optical element e.g. lens, for projection illumination system, has damping unit with sensor element detecting movement of element, and actuator element damping element by producing force or moment based on movement of element
03/05/2009DE102008041144A1 Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front
03/05/2009DE102008002193A1 Optical element i.e. plane-convex lens, for use in projection exposure system for immersion lithography, has water-repellent surface formed in element body, where surface is formed by micro structuring uncoated regions of element body
03/05/2009DE102007041004A1 Illumination lens for use in scanner-type projection illumination system e.g. stepper, for extreme ultraviolet microlithography, has correction element arranged in optical path of ultraviolet radiation between radiation source and location
03/05/2009DE102007040593A1 Optical system i.e. lens, for use in digital camera module, has deflection unit and lens groups, where one group includes lenses arranged in direction of imaging unit such that no optical unit is arranged between one of lenses and object
03/04/2009EP2031640A1 Variable slit device, illuminating device, exposure device, exposure method, and method of manufacturing device
03/04/2009EP2031448A1 An aqueous alkaline developing solution
03/04/2009EP2031447A2 Optical element and exposure apparatus
03/04/2009EP2031446A1 Resist composition for immersion exposure and method for manufacturing a semiconductor device using the same
03/04/2009EP2031445A2 Chemical amplification resist composition and pattern-forming method using the same
03/04/2009EP2031444A2 Microcontact printing stamps
03/04/2009EP2031007A2 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions
03/04/2009EP2031006A1 Process for producing epoxy compound, epoxy resin composition and use thereof, ultraviolet-curable can coating composition, and process for producing coated metal can§
03/04/2009EP2030084A1 Maskless photopolymer exposure process and apparatus
03/04/2009EP2030083A1 Method of controlling contamination of a surface
03/04/2009EP2030082A2 Method and unit for micro-structuring a moving substrate
03/04/2009EP2030081A2 Oxime sulfonates and the use therof as latent acids
03/04/2009EP2030070A1 Projection objective of a microlithographic projection exposure apparatus
03/04/2009EP2029963A1 Gap measuring method, imprint method, and imprint apparatus
03/04/2009EP1210651B1 Antireflective coating for photoresist compositions
03/04/2009CN201203788Y Monitoring control system for micro-flux spraying
03/04/2009CN101379608A Copper interconnection for fabricating flat-panel display
03/04/2009CN101379435A System and method for improvement of alignment and overlay for microlithography
03/04/2009CN101379434A Photosensitive resin composition and photoresist film using the same
03/04/2009CN101379433A UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer
03/04/2009CN101379432A Photopolymer composition suitable for lithographic printing plates
03/04/2009CN101379132A Curable composition, color filter, and liquid crystal display device
03/04/2009CN101378010A Coating and developing apparatus, coating and developing method, and storage medium
03/04/2009CN101377626A Method of developing a substrate and apparatus for performing the same
03/04/2009CN101377625A Apparatus and method for mounting pellicle
03/04/2009CN101377624A Exposure device and exposure process
03/04/2009CN101377623A Approximate connecting type exposure method and method for making patterned electrode layer by the same
03/04/2009CN101377622A Method for detecting photolithography equipment exhaust system and judging product CPK
03/04/2009CN101377621A Photosensitive resin composition for flexible wiring circuit board and flexible wiring circuit board obtained by using the same
03/04/2009CN101377620A Photosensitive resin composition for flexible wiring circuit board and flexible wiring circuit board obtained by using the same
03/04/2009CN101377619A Production process of Planetary gear sheet etching method
03/04/2009CN101377618A Dual-side imprinting lithography system
03/04/2009CN101377617A Surface treating method of cutting tool
03/04/2009CN101377581A LCD and making method thereof
03/04/2009CN101377555A Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof
03/04/2009CN101376750A Method for preparing organic pigment nanoparticle, power, dispersion, composition, ink, transfer print material, color filter and display device
03/04/2009CN101376316A Method for making high-temperature enamel firing porcelain printing making or oil painting
03/04/2009CN100466216C Carrying processing device
03/04/2009CN100466204C A prodcution method for nano coulomb structure
03/04/2009CN100466193C Plasma processing device and ashing method
03/04/2009CN100466171C High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film
03/04/2009CN100466170C Mask and the production method for producing compound semiconductor device with the mask
03/04/2009CN100466159C High-performance and non-contact support platforms