Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2009
03/12/2009US20090068413 Negative-working photosensitive resin composition and photosensitive resin plate using the same
03/12/2009US20090068342 Positive photoresist composition, thick film photoresist laminate, method for producing thick film resist pattern, and method for producing connecting terminal
03/12/2009US20090068341 Positive photoresist composition, thick film photoresist laminate, method for producing thick film resist pattern, and method for producing connecting terminal
03/12/2009US20090067076 Photosensitive resin composition and color filter
03/12/2009US20090066926 Image forming method and apparatus
03/12/2009US20090065764 Methods and devices for forming nanostructure monolayers and devices including such monolayers
03/12/2009DE102004041679B4 Verfahren zur lithgraphischen Herstellung einer Struktur in einer strahlungsempfindlichen Schicht und ein strukturiertes Halbleitersubstrat mit Oberflächenstruktur A process for producing a structure lithgraphischen in a radiation sensitive layer and a patterned semiconductor substrate having a surface structure
03/11/2009EP2034515A1 Maintenance method, exposure method and apparatus, and device manufacturing method
03/11/2009EP2034514A1 Exposure method and apparatus, maintenance method, and device manufacturing method
03/11/2009EP2034513A1 Holding device and exposure device
03/11/2009EP2034490A1 High efficiency collector for laser plasma EUV source
03/11/2009EP2034365A2 Microelectronic cleaning compositions containing oxidizers and organic solvents
03/11/2009EP2034364A1 Method of forming pattern and composition for forming of organic thin-film for use therein
03/11/2009EP2034363A2 Optical component, projection assembly for semiconductor lithography and projection lens
03/11/2009EP2034362A1 Image recording device
03/11/2009EP2034361A2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
03/11/2009EP2033966A2 Movel photoacid generators, resist compositons, and patterning processes
03/11/2009EP2033051A2 Negative-working radiation-sensitive compositions and imageable element
03/11/2009EP2033050A1 Manufacturing a replication tool
03/11/2009EP2032362A1 Positive-working imageable members with branched hydroxystyrene polymers
03/11/2009EP1940968B1 Pigment preparations based on diketopyrrolopyrroles
03/11/2009EP1874524B1 Apparatus and method for making microreplicated article
03/11/2009EP1708023B1 Negative photosensitive composition and negative photosensitive lithographic printing plate
03/11/2009EP1328404B1 Aqueous developer for lithographic printing plates
03/11/2009CN101385125A Exposure method and apparatus, maintenance method, and device manufacturing method
03/11/2009CN101385124A Maintenance method, exposure method and apparatus, and device manufacturing method
03/11/2009CN101385121A Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method
03/11/2009CN101385120A Measuring device and method, processing device and method, pattern forming device and method, exposing device and method, and device fabricating method
03/11/2009CN101384969A Processing liquid for resist substrate and method of processing resist substrate using the same
03/11/2009CN101384968A Scanning exposure apparatus, micro device manufacturing method, mask, projection optical apparatus and mask manufacturing method
03/11/2009CN101384967A Optical integrator for an illumination system of a microlithographic projection exposure apparatus
03/11/2009CN101384966A Illumination system for a microlithographic projection exposure apparatus
03/11/2009CN101384965A Slm direct writer
03/11/2009CN101384964A Laminated resin body and method for manufacturing same, display device material, display device and liquid crystal display device
03/11/2009CN101384963A A method of patterning a thin film
03/11/2009CN101384962A 辐射敏感性组合物和可成像材料 Radiation-sensitive composition and imaging materials
03/11/2009CN101384961A Photosensitive resin composition, method for forming resist pattern, method for manufacturing printed wiring board, and method for producing substrate for plasma display panel
03/11/2009CN101384960A Multilayer material, method of forming resin pattern, substrate, display apparatus and liquid crystal display apparatus
03/11/2009CN101384959A Radiation curable resin composition and rapid three dimensional imaging process using the same
03/11/2009CN101384958A Cationic compositions and methods of making and using the same
03/11/2009CN101384694A Stabilized, non-aqueous cleaning compositions for microelectronics substrates
03/11/2009CN101384672A Blue colour filters with enhanced contrast
03/11/2009CN101383327A LCD device, pixel array substrate, manufacturing of pixel array substrate
03/11/2009CN101383196A Modularized 6 freedom degree active vibration isolation platform
03/11/2009CN101382744A Positioning confirmation apparatus for mask plate and operation method of the apparatus
03/11/2009CN101382743A Coaxial double face position aligning system and position aligning method
03/11/2009CN101382742A Developing method for mask plate
03/11/2009CN101382741A Method for exactly controlling exposure time by pulse laser
03/11/2009CN101382740A Laser direct writing device and portrayal method
03/11/2009CN101382739A Mini platform device
03/11/2009CN101382738A Lithographic projection apparatus
03/11/2009CN101382737A Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
03/11/2009CN101382736A Photo mask verification system and program
03/11/2009CN101382735A Photolithographic method and mask devices
03/11/2009CN101382734A Method for making nano lens array
03/11/2009CN101382733A Method for making graphics of nanometer dimension
03/11/2009CN101382732A Method for making pattern material layer
03/11/2009CN101382715A Method for manufacturing pixel structure, display panel and optoelectronic device
03/11/2009CN101382712A Method for manufacturing LCD array substrate
03/11/2009CN101382690A Colourful optical filter substrate, liquid crystal display panel and method for manufacturing the colourful optical filter substrate
03/11/2009CN101382614A Optical filter copy process
03/11/2009CN101382613A Color filter manufacturing method
03/11/2009CN101382612A Method for producing large area holographic grating based on single exposure of reference grating
03/11/2009CN101382611A Method for producing large area holographic grating based on second exposure of reference grating
03/11/2009CN101380161A Technique of applying temperature-sensing discolored ink in noble metal coin (badge)
03/11/2009CN100468624C Exposure method and exposure apparatus, stage unit, and device manufacturing method
03/11/2009CN100468623C Aligning method, alignment checking method and photomask
03/11/2009CN100468620C Substrate treatment apparatus
03/11/2009CN100468213C Alignment system for photoetching device and stage jointing grating system
03/11/2009CN100468212C Two-sets location switching system
03/11/2009CN100468211C Method for reducing pattern dimension in photoresist layer
03/11/2009CN100468210C Method for manufacturing semiconductor device using immersion lithography process
03/11/2009CN100468209C Method for improving light intensity detector measuring accuracy
03/11/2009CN100468208C Overload buffer protection device
03/11/2009CN100468207C Method for removing etching residue
03/11/2009CN100468206C Composite vibration damping type photolithography device
03/11/2009CN100468205C Method for manufacturing achromatic light variation image
03/11/2009CN100468204C Method and apparatus for simulating lithographic process
03/11/2009CN100468203C Aligning position determination method by higher off-axis aligning signal
03/11/2009CN100468202C Accurate adjustable positioning device
03/11/2009CN100468201C Adaptive lithographic critical dimension enhancement
03/11/2009CN100468200C Lithographic apparatus and device manufacturing method
03/11/2009CN100468199C Double-sided projection exposure device of belt-shape workpieces
03/11/2009CN100468198C Method for cutting film workpiece
03/11/2009CN100468197C lightscribing device and apparatus manufacturing method
03/11/2009CN100468196C Method and apparatus for providing optical proximity correction features to a reticle pattern for optical lithography
03/11/2009CN100468195C Positively photosensitive resin composition and method of pattern formation
03/11/2009CN100468194C 193nm far-ultraviolet photoetching rubber and its preparation method
03/11/2009CN100468095C Colour filter and its manufacturing method
03/11/2009CN100468094C Method for producing colour optical filter
03/11/2009CN100468093C Color separation filtering array forming method
03/11/2009CN100468085C Multilayer-optical film production method
03/10/2009US7502510 Vector-graphic data processing method and drawing apparatus
03/10/2009US7502177 Broad band DUV, VUV long-working distance catadioptric imaging system
03/10/2009US7502127 Sensor device and stage device
03/10/2009US7502082 Substrate for liquid crystal display and method of fabricating the same
03/10/2009US7501641 Dual hemispherical collectors
03/10/2009US7501315 Methods and devices for forming nanostructure monolayers and devices including such monolayers
03/10/2009US7501230 To help reduce semiconductor procedure effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer
03/10/2009US7501229 Anti-reflective coating containing sulfur atom
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