| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/18/2009 | CN101389476A Method for making a lithographic printing plate |
| 03/18/2009 | CN101388356A Stage apparatus |
| 03/18/2009 | CN101388327A Substrate processing device and processing method thereof |
| 03/18/2009 | CN101387835A Substrate processing device and processing method thereof |
| 03/18/2009 | CN101387834A Exposure system and method of manufacturing a semiconductor device |
| 03/18/2009 | CN101387833A Projection objective magnification error and distortion detection device and method |
| 03/18/2009 | CN101387832A Shot auto-correcting method for semiconductor wire width measuring and scanning electron microscope |
| 03/18/2009 | CN101387831A Chemically amplified negative resist composition and patterning process |
| 03/18/2009 | CN101387830A Radiation-sensitive resin composition for forming a colored layer and color filter |
| 03/18/2009 | CN101387829A Radiation-sensitive resin composition |
| 03/18/2009 | CN101387828A Method for making precoating sensitization etching printing plate |
| 03/18/2009 | CN101387827A Half-tone mask plate and method for manufacturing same |
| 03/18/2009 | CN101387826A Half-tone mask plate and method for manufacturing same |
| 03/18/2009 | CN101387825A Compensation gray level mask plate structure |
| 03/18/2009 | CN101387792A Method for manufacturing light alignment film and alignment liquid |
| 03/18/2009 | CN101387761A Center aligning assembling and regulating apparatus and method for optical system |
| 03/18/2009 | CN101387754A Projection exposure apparatus, exposure method, and element producing method |
| 03/18/2009 | CN101387713A Method for producing resin thin film |
| 03/18/2009 | CN101386984A Double-frequency tunable magnetic resonance artificial compound material based on asymmetric metal grating structure |
| 03/18/2009 | CN100470734C Method of making semiconductor device |
| 03/18/2009 | CN100470723C Exposure apparatus and method for manufacturing device |
| 03/18/2009 | CN100470722C Exposure apparatus, exposure method and device manufacturing method |
| 03/18/2009 | CN100470721C Orientation dependent on screen by adopting dipole illumination technigue |
| 03/18/2009 | CN100470720C Decompression drying processing device |
| 03/18/2009 | CN100470719C Substrate processing method, substrate processing system and substrate processing apparatus |
| 03/18/2009 | CN100470380C Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same |
| 03/18/2009 | CN100470379C Photo-etching machine silicon chip platform double-platform switching system |
| 03/18/2009 | CN100470378C Ultrathin triple-freedom inching work table |
| 03/18/2009 | CN100470377C Photo-etching machine projecting objective coma aberration original position detecting system and method thereof |
| 03/18/2009 | CN100470376C High resolution ratio micro optical device parallel direct-writing producing method |
| 03/18/2009 | CN100470375C Lithographic apparatus and device manufacturing method |
| 03/18/2009 | CN100470374C Method for photolithography in semiconductor manufacture |
| 03/18/2009 | CN100470373C Mask and forming and manufacturing method for mask distribution |
| 03/18/2009 | CN100470372C System and method for calculating aerial image of a spatial light modulator |
| 03/18/2009 | CN100470371C Exposure apparatus and device manufacturing method |
| 03/18/2009 | CN100470370C Method for forming corrosion-resisting pattern, method for manufacturing master information carrier, and magnetic recording medium |
| 03/18/2009 | CN100470369C Lithographic apparatus and a method of compensating thermal deformation in a lithographic apparatus |
| 03/18/2009 | CN100470368C Lithographic projection apparatus with lollector including concave mirror and convex mirror |
| 03/18/2009 | CN100470367C Lithographic apparatus and device manufacturing method |
| 03/18/2009 | CN100470366C Polymeric composition and planographic plate original edition using same |
| 03/18/2009 | CN100470365C Positive imaging material |
| 03/18/2009 | CN100470345C Etching composition of thin-film transistor LCD |
| 03/18/2009 | CN100470340C Film crystal tube printing manufacturing method |
| 03/18/2009 | CN100470298C Continuous direct-write optical lithography technology |
| 03/18/2009 | CN100469843C Liquid photosensitive anti-welding ink and applied in printing circuit board |
| 03/18/2009 | CN100469807C Anhydride modified alkyd resin and photoresist composition obtained thereby |
| 03/18/2009 | CN100469806C Epoxy modified novolac resin and photoresist composition obtained thereby |
| 03/18/2009 | CN100469580C Method of manufacturing liquid discharge head, and liquid discharge head |
| 03/17/2009 | US7505204 Crystallization apparatus, crystallization method, and phase shifter |
| 03/17/2009 | US7505116 Lithographic apparatus and device manufacturing method |
| 03/17/2009 | US7505115 Exposure apparatus, method for producing device, and method for controlling exposure apparatus |
| 03/17/2009 | US7505112 Multiple exposure method |
| 03/17/2009 | US7505111 Exposure apparatus and device manufacturing method |
| 03/17/2009 | US7504643 Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
| 03/17/2009 | US7504342 Photolithography method for fabricating thin film |
| 03/17/2009 | US7504341 Method of manufacturing a semiconductor apparatus using a substrate processing agent |
| 03/17/2009 | US7504268 Adaptive shape substrate support method |
| 03/17/2009 | US7504199 Multilayer wiring pattern of low resistivity metal formed in simple manner at low cost; metals constituting respective layers can be freely selected according to intended application; forming photocatalytic film layer, water-soluble polymer layer, exposing layers to light to form latent image; plating |
| 03/17/2009 | US7504198 Film comprising photoacid generator and polymer having functional groups bonded to protecting moieties deposited on substrate, exposed to patterned radiation resulting in protonation of functional groups and formation of latent image, bonds between protonated groups and protecting moieties cleaved |
| 03/17/2009 | US7504196 Positive resist composition, method for resist pattern formation and compound |
| 03/17/2009 | US7504195 UV sensitive addition copolymer contains monomer of hydroxystyrene, acrylate cyclohexanonoxime compound; line pattern stability, reducing line edge roughness |
| 03/17/2009 | US7504194 Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent |
| 03/17/2009 | US7504193 Positive resist composition and pattern forming method using the same |
| 03/17/2009 | US7504192 Soft pellicle for 157 and 193 nm and method of making same |
| 03/17/2009 | US7504191 Photosensitive resin composition and method for the formation of a resin pattern using the composition |
| 03/17/2009 | US7503258 Method and apparatus for thermal development with development medium remover |
| 03/12/2009 | WO2009032890A1 Multi-tone resist compositions |
| 03/12/2009 | WO2009032609A1 Automated x-ray optic alignment with four-sector sensor |
| 03/12/2009 | WO2009032448A2 Zwitterionic block copolymers and methods |
| 03/12/2009 | WO2009032197A1 Glass-ceramic and glass-ceramic/ceramic composite semiconductor manufacturing article support devices |
| 03/12/2009 | WO2009031732A1 Photosensitive resin composition for color filter and color filter of using same |
| 03/12/2009 | WO2009031656A1 Suspending apparatus and exposure apparatus |
| 03/12/2009 | WO2009031654A1 Drive control method, drive control apparatus, stage control method, stage control apparatus, exposure method, exposure apparatus and measuring apparatus |
| 03/12/2009 | WO2009031602A1 Method for producing polyamide and resin composition |
| 03/12/2009 | WO2009031462A1 Method for processing substrate, program, computer storage medium, and substrate processing system |
| 03/12/2009 | WO2009031174A1 Photosensitive compositions container polyvinyl alchool and their use in printing processes |
| 03/12/2009 | WO2009030444A2 Chromatically corrected catadioptric objective and projection exposure apparatus including the same |
| 03/12/2009 | WO2008140180A3 In-line virtual-masking method for maskless lithography |
| 03/12/2009 | WO2008101656A3 Method for producing facet mirrors and projection exposure apparatus |
| 03/12/2009 | US20090069458 Polymers, Methods Of Use Thereof, And Methods Of Decomposition Thereof |
| 03/12/2009 | US20090069193 Method of providing a pattern of biological-binding areas for biological testing |
| 03/12/2009 | US20090068600 Method for enhancing optical stability of three-dimensional micromolded product |
| 03/12/2009 | US20090068599 Method of manufacturing image sensor |
| 03/12/2009 | US20090068598 Laser processing apparatus and laser processing method, debris collection mechanism and debris collection method, and method for producing display panel |
| 03/12/2009 | US20090068597 Exposure method and apparatus, and electronic device manufacturing method |
| 03/12/2009 | US20090068596 Negative-tone,Ultraviolet Photoresists for Fabricating High Aspect Ratio Microstructures |
| 03/12/2009 | US20090068595 Photosensitive resin composition, composition for solder resist, and photosensitive dry film |
| 03/12/2009 | US20090068594 Positive resist composition and method for forming resist pattern |
| 03/12/2009 | US20090068593 Photosensitive Resin Composition |
| 03/12/2009 | US20090068592 Positive resist composition and method of forming resist pattern |
| 03/12/2009 | US20090068591 Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator |
| 03/12/2009 | US20090068590 Polymer compound, positive resist composition, and method of forming resist pattern |
| 03/12/2009 | US20090068589 Multi-tone resist compositions |
| 03/12/2009 | US20090068588 resin comprises (2-adamantyloxymethyl)methacrylate monomers which exhibit increased alkali solubility under action of acid, and acid generator such as diphenyliodonium trifluoromethanesulfonate; reduced line edge roughness, improved shape and depth of focus |
| 03/12/2009 | US20090068587 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method |
| 03/12/2009 | US20090068586 Silsesquioxane resin, positive resist composition, resist laminate, and method of forming resist pattern |
| 03/12/2009 | US20090068585 Dissolution promoter and photoresist composition including the same |
| 03/12/2009 | US20090068584 Positive photosensitive resin composition, cured layer, protecting layer, insulating layer and semiconductor device and display therewith |
| 03/12/2009 | US20090068583 Positive resist composition and method for forming resist pattern |
| 03/12/2009 | US20090068569 Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium |