Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2014
08/13/2014EP2764763A1 Nanoplasmonic device with nanoscale cooling
08/13/2014EP2764590A1 System and method for generating extreme ultraviolet light
08/13/2014EP2764408A1 Chuck, lithography apparatus and method of using a chuck
08/13/2014EP2764407A1 Reflective optical element for the euv wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens
08/13/2014CN203773226U 一种显影液在线回收循环利用装置 One kind of the developer online recycling recycling equipment
08/13/2014CN203773225U 一种温度控制装置 A temperature control apparatus
08/13/2014CN203773224U 滚对平面光刻压印中紫外灯光源结构 Roll imprint lithography plane ultraviolet light source structure
08/13/2014CN203773223U 压印设备 Embossing equipment
08/13/2014CN203773149U 筒长无限的显微物镜光学系统 Infinite tube length microscope objective optical system
08/13/2014CN103988128A I线光刻胶组合物以及使用该组合物形成精细图案的方法 I-line photoresist compositions and methods of using the composition for forming a fine pattern
08/13/2014CN103988127A 感光性树脂组合物、固化浮雕图案的制造方法、半导体装置及显示体装置 The photosensitive resin composition, method of producing the cured relief pattern, a semiconductor device and a display device body
08/13/2014CN103987794A 用于滤色器应用的盐、制造该盐的方法、以及含该盐的着色剂 A method for application of the salt filter, and the manufacturing of the salt, and the salt-containing colorant
08/13/2014CN103985500A 磁预紧系统中低发热的永磁部件 Magnetic preload system low heat permanent member
08/13/2014CN103984213A 一种具有均压流道的均匀出流显影喷嘴 Pressure flow channel having a uniform outflow developing nozzle
08/13/2014CN103984212A 改善光阻曝光形貌的方法、图案化半导体衬底的方法 Method for improving the morphology of the exposed resist, a method of patterning a semiconductor substrate
08/13/2014CN103984211A 一种基于双光束聚合引发以及抑制的高分辨成像光刻方法 Based on dual-beam polymerization initiator and suppression of high-resolution imaging lithography method
08/13/2014CN103984210A 一种在GaAs圆片上实现异机匹配套刻的方法 A different machine-implemented method of matching overlay on a GaAs wafer
08/13/2014CN103984209A 折反射式光刻照明中继镜组 Catadioptric lithography illumination relay lens group
08/13/2014CN103984208A 掩模版传输系统 Reticle transmission system
08/13/2014CN103984207A 感光性聚合物、光取向性相位差剂、相位差膜、光学膜、显示元件及叠层体 Photosensitive polymer, a photo-alignment retardation agent, a retardation film, an optical film, a display element, and laminate
08/13/2014CN103984206A 一种嵌段共聚物制剂及其相关方法 A block copolymer formulations and related methods
08/13/2014CN103984205A 薄膜图案的制作方法及基板结构 The method of making a thin film pattern and the substrate structure
08/13/2014CN103984204A 一种润滑薄膜的制备方法 Method for preparing a lubricating film
08/13/2014CN103984200A 辅助图形的设计方法、测试版图的制作方法、光刻方法 Production methods assisted graphic design methods, test layout, lithography method
08/13/2014CN103984056A 一种采样光纤光栅的刻写方法 A fiber grating inscribed sampling method
08/13/2014CN103984052A 彩色滤光片及其制造方法 A color filter and manufacturing method thereof
08/13/2014CN103982587A 光刻机的柔性支撑装置及柔性支撑件 Flexible support device lithography and flexible supports
08/13/2014CN103980417A 新型树枝状聚合物类正性光刻胶树脂及其制备方法与应用 The new class of dendrimers positive photoresist resin and preparation method and application
08/13/2014CN103980416A 碱可溶性树脂、感光树脂组合物及它们的制备方法 Alkali-soluble resin, a photosensitive resin composition and a method for their preparation
08/13/2014CN103977947A 高粘度光刻胶的涂布方法、光刻方法 High viscosity photoresist coating method, a photolithography method
08/13/2014CN103217870B 激光束引导的液滴靶控制系统 Guiding a laser beam control system of a droplet target
08/13/2014CN103091981B 利用自组装小球制作用于光刻版的金属网格模板的方法 Making use of the self-assembly of small ball for a lithographic printing plate of metal mesh template method
08/13/2014CN103048883B 一种含有可聚合光引发剂的感光性组合物 Containing a polymerizable photoinitiator photosensitive composition
08/13/2014CN102880003B 激光直写有机热刻蚀材料及其制备方法 Laser Direct Writing thermal etching of organic material and preparation method
08/13/2014CN102866590B 用于对波前像差具有定制的响应的图案设计的方法和系统 Method for the wavefront aberration of the pattern having a custom design and system response
08/13/2014CN102866574B 相移光掩模制作方法 Phase-shift photomask manufacturing method
08/13/2014CN102830595B 一种显影液监控方法及设备 One kind of developer is monitoring method and apparatus
08/13/2014CN102778822B 一种调焦调平装置 One kind focusing leveling device
08/13/2014CN102778821B 一种Array板光刻胶的剥离方法 One kind of photoresist lift-off method Array plates
08/13/2014CN102681355B 描画数据修正装置及描画装置 The drawing device and drawing data correction means
08/13/2014CN102651316B 过孔的刻蚀方法、阵列基板、液晶面板及显示设备 Etching vias, the array substrate, a liquid crystal panel and a display device
08/13/2014CN102650826B 一种含有特定粘合剂及增塑剂的干膜光阻剂 Containing a specific binder and a plasticizer, the dry film photoresist
08/13/2014CN102575127B 抗反射光致抗蚀剂组合物 Antireflective photoresist composition
08/13/2014CN102565903B 随机达曼光栅的制备方法 Dammann grating random Preparation
08/13/2014CN102482508B 着色可固化组合物及其制备方法,彩色滤光片及其制造方法,以及固态摄像装置 Colored curable composition and preparation method, a color filter manufacturing method thereof, and solid-state imaging device
08/13/2014CN102472965B 光固化性树脂组合物 The photocurable resin composition
08/13/2014CN102375327B 嵌入衰减式相位移光罩及其制作方法 Embedded attenuated phase shift mask and manufacturing method thereof
08/13/2014CN102365585B 耐溶剂性优异的柔性版印刷用光敏性树脂组合物 Excellent solvent resistance of the flexographic printing photosensitive resin composition
08/13/2014CN102333797B 化合物、含氟原子聚合物和放射线敏感性树脂组合物 Compound, a fluorine atom-containing polymer and a radiation-sensitive resin composition
08/13/2014CN102323724B 液浸曝光装置及其制造方法、曝光装置、器件制造方法 A liquid immersion exposure apparatus and a manufacturing method, an exposure apparatus, device manufacturing method
08/13/2014CN102193337B 光刻设备、照射系统、投影系统以及使用光刻设备制造器件的方法 Lithographic apparatus, the illumination system, the projection system and the use of lithographic apparatus in the method of manufacturing a device
08/13/2014CN102180822B 磺酰光酸产生剂和包含该磺酰光酸产生剂的光刻胶 Sulfonyl photoacid generating agent and a photoresist comprising a photoacid generator of the sulfonamide of
08/13/2014CN102169826B 基板处理方法 The substrate processing method
08/13/2014CN101987880B 新型共聚物和含有该共聚物的光刻胶组合物 The novel copolymers and photoresist composition containing the copolymer
08/13/2014CN101807003B 新型全息介质和光聚合物 The new holographic media and photopolymer
08/13/2014CN101784962B 用于使印版前体显影的方法 For causing the printing plate precursor of the developing method
08/13/2014CN101539723B 着色层形成用放射线敏感性组合物、滤色器和彩色液晶显示元件 Forming a colored layer with a radiation sensitive composition, a color filter and a color liquid crystal display element
08/12/2014US8806388 Extraction of imaging parameters for computational lithography using a data weighting algorithm
08/12/2014US8805642 Positioning apparatus, positioning method, and storage medium
08/12/2014US8804902 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus
08/12/2014US8804099 Magnetic supporting mechanism having a movable magnet with a varying width, exposure apparatus with the magnetic supporting mechanism, and device manufacturing method thereof
08/12/2014US8804097 Lithographic apparatus and device manufacturing method
08/12/2014US8804095 Exposure apparatus and device fabrication method
08/12/2014US8803542 Method and apparatus for verifying stitching accuracy of stitched chips on a wafer
08/12/2014US8802798 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
08/12/2014US8802783 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
08/12/2014US8802566 Method for producing semiconductor components on a substrate, and substrate comprising semiconductor components
08/12/2014US8802360 Reticles for use in forming implant masking layers and methods of forming implant masking layers
08/12/2014US8802359 UV glass production method
08/12/2014US8802358 Method of forming alignment film
08/12/2014US8802357 Method for using a topcoat composition
08/12/2014US8802356 Photosensitive film pattern and method for manufacturing a photosensitive film pattern
08/12/2014US8802355 Lithographic printing plate precursor and plate making method thereof
08/12/2014US8802354 Water mark defect prevention for immersion lithography
08/12/2014US8802353 Compound for resist and radiation-sensitive composition specification
08/12/2014US8802352 Salt, photoresist composition and method for producing photoresist pattern
08/12/2014US8802351 Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithography
08/12/2014US8802350 Photoresist composition, resist-pattern forming method, polymer, and compound
08/12/2014US8802349 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition
08/12/2014US8802348 Radiation-sensitive resin composition
08/12/2014US8802347 Silicon containing coating compositions and methods of use
08/12/2014US8802346 Metal compositions and methods of making same
08/12/2014US8801891 Substrate warpage removal apparatus and substrate processing apparatus
08/07/2014WO2014120985A1 Euv light source using cryogenic droplet targets in mask inspection
08/07/2014WO2014119698A1 Pattern forming method, compound used therein, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
08/07/2014WO2014117937A1 Microfluidic device and method of manufacturing thereof
08/07/2014WO2014117791A1 Microlithographic projection exposure apparatus and method of operating same
08/07/2014WO2014082813A3 Method and apparatus for determining lithographic quality of a structure
08/07/2014WO2014067754A3 Sensor and lithographic apparatus
08/07/2014US20140221649 Novel compound
08/07/2014US20140221591 Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates
08/07/2014US20140221589 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
08/07/2014US20140220497 Methods for manufacturing resin structure and micro-structure
08/07/2014US20140220496 Method of forming photoresist structure
08/07/2014US20140220495 Resist Performance for the Negative Tone Develop Organic Development Process
08/07/2014US20140220494 Pattern Generator for a Lithography System
08/07/2014US20140220493 Self Aligned Patterning With Multiple Resist Layers
08/07/2014US20140220492 Resist composition, polymeric compound, compound and method of forming resist pattern
08/07/2014US20140220491 Photoactive compound and photosensitive resin composition comprising the same
08/07/2014US20140220490 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
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