Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2009
03/24/2009US7508220 Detection assembly and lithographic projection apparatus provided with such a detection assembly
03/24/2009US7508051 Wafer with optical control modules in dicing paths
03/24/2009US7507526 Adding mixture of aqueous solution of solvent, dispensing agent and base to developer; developing imaged printing plate using developer; adding aqueous regenerator to maintain the activity of the aqueous developer
03/24/2009US7507525 Oligosaccharide or a polysaccharide, a binder polymer, a compound having an addition polymerizable ethylenic unsaturated bond and a polymerization initiator
03/24/2009US7507522 Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers
03/24/2009US7507521 Sacrificial light-absorbing material of a Si-O branched network polymer with a backbone including a first chromophore sensitive to one or more wavelengths of light and a second chromophore sensitive to a different one or more wavelengths; anthracene chromophore linked to Si through a carbonyl group
03/24/2009US7507520 poly{(1-bromoethyl)-1,4-phenylene} and a photobase generator; not only can a pattern of the conjugated polymer be formed with ease, but the pattern produced thereby can be used advantageously in organo-electric devices
03/24/2009US7507519 Thin film substrate with photothermal conversion material; light radiation zones
03/24/2009US7507518 Photosensitive resin precursor composition
03/24/2009US7507505 Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography
03/24/2009US7507264 Transport apparatus
03/24/2009US7507039 Dynamic pressure bearing manufacturing method, dynamic pressure bearing and dynamic pressure bearing manufacturing device
03/19/2009WO2009036133A1 Fracture shot count reduction
03/19/2009WO2009035328A1 Lithographic apparatus with rotation filter device
03/19/2009WO2009035189A1 Pigment dispersion composition, resist composition for color filter including the same, and color filter using the same
03/19/2009WO2009035129A2 Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
03/19/2009WO2009035087A1 Composition for forming silicon-containing fine pattern and method for forming fine pattern using the same
03/19/2009WO2009035066A1 Thin resin film and production method thereof, and color filter for liquid crystal display and production method thereof
03/19/2009WO2009035045A1 Positive-working photosensitive composition, method for pattern formation using the composition, and resin for use in the composition
03/19/2009WO2009035044A1 Photosensitive composition and method for pattern formation using the photosensitive composition
03/19/2009WO2009034998A1 Composition containing polymer having nitrogenous silyl group for forming resist underlayer film
03/19/2009WO2009034770A1 Contact exposure method and device thereof
03/19/2009WO2009034109A2 Illumination system of a microlithographic projection exposure apparatus
03/19/2009WO2009033709A1 Imaging microoptics for measuring the position of an aerial image
03/19/2009WO2009033639A2 Method for cleaning vacuum chambers for extreme uv lithography devices
03/19/2009WO2009017320A3 Mold film composition for forming pattern and mold film manufactured by using the same
03/19/2009WO2008154907A3 Method and device for transferring nanostructures by means of contact stamping
03/19/2009WO2008118340A3 Method to form a pattern of functional material on a substrate including the treatment of a surface of a stamp
03/19/2009WO2008104573A3 Hydrophilic coating
03/19/2009WO2008095801A3 Blue phthalocyanine pigment composition and its preparation
03/19/2009WO2008052080A3 Method of data encoding, compression, and transmission enabling maskless lithography
03/19/2009WO2008009803A4 Production of microfluidic polymeric devices by photo-assisted and/ or thermally assisted printing
03/19/2009WO2005114330A3 Image device with belt type processing member
03/19/2009US20090076291 Photoactive adhesion promoter
03/19/2009US20090076200 Letter with continuation application
03/19/2009US20090075482 Process for forming a pattern including on a semiconductor device
03/19/2009US20090075452 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby
03/19/2009US20090075217 Tapered edge bead removal process for immersion lithography
03/19/2009US20090075216 Storage medium storing exposure condition determination program, exposure condition determination method, exposure method, and device manufacturing method
03/19/2009US20090075214 Manufacturing method of light emitting device, and evaporation donor substrate
03/19/2009US20090075212 Immersion lithography fluid control system
03/19/2009US20090075211 Immersion lithography fluid control system
03/19/2009US20090075210 Exposure apparatus and method of manufacturing device
03/19/2009US20090075209 Device manufacturing apparatus and device manufacturing method
03/19/2009US20090075208 Plate making method of lithographic printing plate precursor
03/19/2009US20090075207 forming a pattern using a photosensitive resin by applying a photoresist composition on top of a substrate; fabricating a liquid crystal display which comprises an insulating film formed from a photoresist composition comprising a norbornene copolymer, an acid generator, and a solvent
03/19/2009US20090075205 Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions
03/19/2009US20090075204 Positive resist composition and method of forming resist pattern
03/19/2009US20090075203 Photoresist compositions comprising diamondoid derivatives
03/19/2009US20090075202 Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
03/19/2009US20090075200 Negative-working photosensitive resin composition and photosensitive resin plate using the same
03/19/2009US20090075199 Photosensitive element having reinforcing particles and method for preparing a printing form from the element
03/19/2009US20090075198 Photosensitive Polyimide Resin Composition
03/19/2009US20090075197 Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
03/19/2009US20090075188 Azo compound, curable composition, color filter, and method of producing the same
03/19/2009US20090075187 Pattern forming method, semiconductor device manufacturing method and exposure mask set
03/19/2009US20090075182 Photomask and pattern formation method using the same
03/19/2009US20090075177 Positive resist composition and resist pattern forming method
03/19/2009US20090074287 Mask data generation method, mask fabrication method, exposure method, device fabrication method, and storage medium
03/19/2009US20090073441 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
03/19/2009US20090073427 Parts manipulation, inspection, and replacement system and method
03/19/2009US20090073414 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
03/19/2009US20090073411 Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
03/19/2009US20090073410 Illumination system particularly for microlithography
03/19/2009US20090073406 Marker structure, mask pattern, alignment method, and lithographic method and apparatus
03/19/2009US20090073404 Variable slit device, illumination device, exposure apparatus, exposure method, and device manufacturing method
03/19/2009US20090073400 Device and method for manufacturing a particulate filter with regularly spaced micropores
03/19/2009US20090073349 Three-dimensional microfabrication method using photosensitive nanocrystals and display device
03/19/2009US20090072222 Method for forming catalyst nanoparticles for growing elongated nanostructures
03/19/2009US20090071693 Negative photosensitive material and circuit board
03/18/2009EP2037489A2 Exposure apparatus and device producing method
03/18/2009EP2037488A1 Pattern formation method, pattern formation device, exposure method, exposure device, and device manufacturing method
03/18/2009EP2037487A1 Apparatus with mobile body, exposure apparatus, exposure method and device manufacturing method
03/18/2009EP2037486A1 Exposure method and apparatus, maintenance method and device manufacturing method
03/18/2009EP2037453A1 Imprint mold structure, imprinting method using the same, and magnetic recording medium
03/18/2009EP2037324A2 Lithographic apparatus and method
03/18/2009EP2037323A2 Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
03/18/2009EP2037137A2 Stage device
03/18/2009EP2036957A2 Pigment dispersion liquid, curable composition, color filter, produced using the same, and solid state imaging device
03/18/2009EP2036954A2 Azo compound, curable composition, color filter, and method of producing the same
03/18/2009EP2035897A1 Method for revising/repairing a lithographic projection objective
03/18/2009EP2035896A1 Exposure apparatus that includes a phase change circulation system for movers
03/18/2009EP2035895A1 Photopolymerisable layered composite for producing flexo printing elements
03/18/2009EP2035502A1 High silicon-content thin film thermosets
03/18/2009EP2035496A1 Water based concentrated product forms of photoinitiators made by a heterophase polymerization technique
03/18/2009EP2035320A2 System for purging reticle storage
03/18/2009EP2001042A9 Lighting optical system, exposure system, and device production method
03/18/2009EP2000840A9 Projection optical system, exposure apparatus and device manufacturing method
03/18/2009EP1849181A4 Replication tools and related fabrication methods and apparatus
03/18/2009EP1516228B1 Patterning method
03/18/2009EP1442005B1 Novel difunctional photoinitiators
03/18/2009EP1297021B1 Multiphoton photosensitization system
03/18/2009EP1189994B1 Oil soluble radiation curable metal-containing compounds and compositions
03/18/2009CN201210223Y Cooling device for baking apparatus
03/18/2009CN101390453A Method and device for generating in particular EUV radiation and/or soft X-ray radiation
03/18/2009CN101390194A Maintenance method, exposure method and apparatus and device manufacturing method
03/18/2009CN101390018A Process for the production of lithographic printing plates
03/18/2009CN101390017A Heat curable composition for protective film, cured product, and liquid crystal display device
03/18/2009CN101390016A Photopolymerizable composition
03/18/2009CN101390015A Adamantane based molecular glass photoresists for sub-200 nm lithography
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