Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2009
03/26/2009US20090081589 Thick film resists
03/26/2009US20090081588 comprising an additive fluoro-copolymer having acrylate monomer and norbornene monomer; good barrier property against water, resist to leaching, minimizing a change of pattern
03/26/2009US20090081587 Photosensitive compound and photoresist composition including the same
03/26/2009US20090081586 Reducing defects in developing photoresists on silicon wafers for semiconductors by purifying the photosensitive polymer by circulation filtration through a polar polyamide filter and a densely packed polyethylene filter; including an acid generator a photoacid generator, solvent, controller
03/26/2009US20090081585 Functionalized carbosilane polymers and photoresist compositions containing the same
03/26/2009US20090081583 Method for making a lithographic printing plate
03/26/2009US20090081582 irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation
03/26/2009US20090081581 Positive photosensitive composition and a pattern-forming method using the same
03/26/2009US20090081580 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern
03/26/2009US20090081564 Exposure mask, pattern formation method, and exposure mask fabrication method
03/26/2009US20090081563 Integrated Circuits and Methods of Design and Manufacture Thereof
03/26/2009US20090081561 Photosensitive composition, optical recording medium and method for manufacturing same, optical recording method, and optical recording apparatus
03/26/2009US20090081476 Uv-liga process for fabricating a multilayer metal structure having adjacent layers that are not entirely superposed, and the structure obtained
03/26/2009US20090081418 Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures
03/26/2009US20090081376 Crosslinkable prepolymer, its production process and its uses
03/26/2009US20090080099 Parallax barrier, multiple display device and parallax barrier manufacturing method
03/26/2009US20090080065 Ultra-broadband UV microscope imaging system with wide range zoom capability
03/26/2009US20090079974 Methods and systems for lithography process control
03/26/2009US20090079953 Use of perfluoroalkanes in vacuum ultraviolet applications
03/26/2009US20090079950 Exposure apparatus, exposure method, and method for producing device
03/26/2009US20090079948 Developing method and developing apparatus
03/26/2009US20090078937 Production methods of pattern thin films, semiconductor element, and circuit substrate, and resist material, semiconductor element, and circuit substrate
03/26/2009US20090078459 Light-transmitting conductive film and process for producing light-transmitting conductive film
03/26/2009US20090077791 Magnetic components
03/26/2009DE112005002263T5 Kalibrierung von optischen Linienverkürzungsmessungen Calibration of optical line shortening measurements
03/26/2009DE102008040819A1 Method for manufacturing optical element, particularly lens for objective or for lighting system for projection illumination system of micro lithography, involves making available pre-product with optical surface
03/26/2009DE102007042672A1 Diffractive optical element for operating wavelength for microelectronics, comprises binary structuring in subarea, and binary structuring comprises different strip densities at two positions of former subarea smaller than certain amount
03/25/2009EP2040284A1 Illuminating optical apparatus, exposure apparatus and device manufacturing method
03/25/2009EP2040283A1 Illuminating optical apparatus, exposure apparatus and device manufacturing method
03/25/2009EP2040125A1 Method of forming microfined resist pattern
03/25/2009EP2040124A1 Method for making lithographic printing plates
03/25/2009EP2040123A1 Projection optical system
03/25/2009EP2040122A2 Positive resist composition and pattern-forming method using the same
03/25/2009EP2040121A1 Composition for forming passivation layer and organic thin film transistor comprising the passivation layer
03/25/2009EP2039727A1 Preparation of epsilon copper phthalocyanine of small primary particle size and narrow particle size distribution
03/25/2009EP2039726A2 Azo pigment and pigment dispersion
03/25/2009EP2039725A2 Azo pigment and pigment dispersion
03/25/2009EP2038705A2 Printing form precursor and process for preparing a stamp from the precursor
03/25/2009EP2038704A1 Color filter composition
03/25/2009EP1866688B1 Method to fabricate a redirecting mirror in optical waveguide devices
03/25/2009EP1824890B1 Process for preparing poly(vinylacetal)s with a low structural viscosity
03/25/2009EP1646913B1 Methods for inspection of wafers and reticles using designer intent data
03/25/2009EP1614004A4 Positive tone bi-layer imprint lithography method and compositions therefor
03/25/2009EP1612850B1 Exposure apparatus and method for manufacturing a device
03/25/2009EP1546812B1 Lithographic method for wiring a side surface of a substrate
03/25/2009CN201212938Y Printing plate roller
03/25/2009CN201212937Y Laser holographic image and text molding device
03/25/2009CN101395537A Photographic developer composition for photosensitive organic film
03/25/2009CN101395536A Heat treatment of multilayer imageable elements
03/25/2009CN101395535A Heat curable composition for protective film, cured product and liquid crystal display device
03/25/2009CN101395534A Heat curable composition for protective film, cured product and liquid crystal display device
03/25/2009CN101395533A Curable compositions for providing a cured composition with enhanced water resistance
03/25/2009CN101395189A Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
03/25/2009CN101393886A Manufacturing method for micro-lens of image sensor
03/25/2009CN101393840A Prime coating method and coating method of photoresist
03/25/2009CN101393401A Developing method of photolithographic process
03/25/2009CN101393400A Photocatalyst solution for removing glue and method for removing glue at surface of liquid light-sensitive resin letterpress
03/25/2009CN101393399A Laser direct imaging apparatus
03/25/2009CN101393398A Compositions and methods for wet lamination of photopolymerizable dry films onto substrates
03/25/2009CN101393397A Method for making liquid light-sensitive resin relief printing plate with groove
03/25/2009CN101393396A Physical development nuclear, preparation method and application thereof
03/25/2009CN101393395A Colored curing resin compound, colored pattern, color filter, method of manufacturing the same
03/25/2009CN101393394A Photo-cured and heat-cured resin composition and pcondensate thereof
03/25/2009CN101393393A Slurry combination for forming electrode of plasma display screen
03/25/2009CN101393392A Vacuum molding device for nanometer stamping
03/25/2009CN101393391A Nanometer stamping device
03/25/2009CN101393390A Method for implementing PMMA three-dimensional fine process for mobile example platform
03/25/2009CN101393389A Method for forming etching mask, control program and program storage medium
03/25/2009CN101393388A Method for manufacturing thin film transistor LCD array substrate
03/25/2009CN101393386A Reticle mask making method by FPD mask making equipment
03/25/2009CN101393385A Transmittance-adjustable half tone mask and method for manufacturing same
03/25/2009CN101393303A Method for making near infrared band three-dimensional photon crystal
03/25/2009CN101393294A Interference filter and method for its production
03/25/2009CN101393009A Large stroke laser interferometer vertical measuring set and method
03/25/2009CN101392101A Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element
03/25/2009CN101392062A Alkali soluble light-sensitive organosilicon preformed polymer and preparation method thereof
03/25/2009CN101391744A Method for preparing micro needle array by means of lithography based on tilting rotary substrate and template
03/25/2009CN100473246C Donor substrate for laser induced thermal imaging and method of fabricating organic light emitting display using the same substrate
03/25/2009CN100472760C Forming a plurality of thin-film devices
03/25/2009CN100472727C Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter
03/25/2009CN100472713C Exposure apparatus and device producing method
03/25/2009CN100472331C Dephotoresist agent
03/25/2009CN100472330C Two-layer film and method of forming pattern with same
03/25/2009CN100472329C Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination
03/25/2009CN100472328C Lithographic apparatus and device manufacturing method
03/25/2009CN100472327C Image recording material supply apparatus and method
03/25/2009CN100472326C Method and device for producing analogue exposure tool imaging performance model and program product
03/25/2009CN100472325C Method and apparatus for forming pattens on workpieces
03/25/2009CN100472324C Emulsion type round screen sensitization glue
03/25/2009CN100472323C Emulsion type cylinder mould sensitization glue
03/25/2009CN100472290C Condenser type contact screen and its manufacture method
03/25/2009CN100471541C Solvent recovery device and method thereof
03/24/2009US7509623 Manufacturing method of semiconductor device
03/24/2009US7508646 Substrate holding technique
03/24/2009US7508581 Catadioptric projection system for 157 nm lithography
03/24/2009US7508580 8-mirror microlithography projection objective
03/24/2009US7508570 Gray level method for slim-based optical lithography
03/24/2009US7508515 System and method for manufacturing printed circuit boards employing non-uniformly modified images
03/24/2009US7508490 Exposure apparatus and device manufacturing method
03/24/2009US7508487 Lithographic apparatus, device manufacturing method, and device manufactured thereby