| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/01/2009 | CN101398634A Lithographic apparatus and device manufacturing method, and measurement systems |
| 04/01/2009 | CN101398633A Lithographic apparatus and device manufacturing method, and measurement systems |
| 04/01/2009 | CN101398632A Lithographic apparatus and method of cleaning a lithographic apparatus |
| 04/01/2009 | CN101398631A Maskless exposure device |
| 04/01/2009 | CN101398630A Aligning and stacking marker, mask structure and using method thereof |
| 04/01/2009 | CN101398629A Exposal correcting method |
| 04/01/2009 | CN101398628A Liquid resin supply method and device |
| 04/01/2009 | CN101398627A Coating treatment method, coating treatment apparatus, and computer-readable storage medium |
| 04/01/2009 | CN101398626A Photo resist supply device |
| 04/01/2009 | CN101398625A Photo-sensitive composition, method for manufacturing optical separator and liquid crystal display element |
| 04/01/2009 | CN101398624A Photo acid generator, chemical amplified photoresist combination comprising the same and relative method |
| 04/01/2009 | CN101398623A Photosensitive composition, phososensitive film, photosensitive laminated body, permanent pattern forming method and printed substrate |
| 04/01/2009 | CN101398622A Method of producing a negative planographic printing plate |
| 04/01/2009 | CN101398621A Colored curable composition, colored pattern and color filter using the same |
| 04/01/2009 | CN101398620A Photosensitive composition, photosensitive film, photosensitive laminated body, permanent pattern forming method and printed circuit board |
| 04/01/2009 | CN101398619A Stamping apparatus |
| 04/01/2009 | CN101398618A Method for producing antireflection film of subwavelength structure |
| 04/01/2009 | CN101398617A Replication and transfer of microstructures and nanostructures |
| 04/01/2009 | CN101398616A Resin relief and manufacturing method thereof |
| 04/01/2009 | CN101398615A Resin composition for laser engraving and resin printing plate precursor for laser engraving |
| 04/01/2009 | CN101398614A Method for making three-dimensional needlepoint electrode array based on parylene |
| 04/01/2009 | CN101398612A Photomask, manufacturing method thereof and pattern transfer printing method |
| 04/01/2009 | CN101398611A Graytone mask plate and and graytone mask, and methof for producing the same and pattern copying method |
| 04/01/2009 | CN101398579A Method for making micro reflector layer and silicon based LCD |
| 04/01/2009 | CN101398562A Colorful film substrate and method for manufacturing same |
| 04/01/2009 | CN101398561A Colourful optical filter substrates, method for manufacturing same and liquid crystal display panel using the same |
| 04/01/2009 | CN101398558A Reflection-permeation array substrate and method for manufacturing same |
| 04/01/2009 | CN101398497A Color filter and manufacure method |
| 04/01/2009 | CN101398315A Method for producing cylinder grid pitch changing grating |
| 04/01/2009 | CN101397429A Pigment dispersion composition, photocurable composition and color filter |
| 04/01/2009 | CN101397428A Pigment dispersion composition, photocurable composition, color filter and manufacture method thereof, liquid crystal display element and solid imaging element |
| 04/01/2009 | CN100474507C Heat treatment unit |
| 04/01/2009 | CN100474491C Plasma display device |
| 04/01/2009 | CN100474125C Method of controlling photoresist stripping process and regenerating photoresist stripper composition based on near infrared spectrometer |
| 04/01/2009 | CN100474124C Multi-platform photolithographic machine silicon chip horizontal control and automatic focusing system and implement method thereof |
| 04/01/2009 | CN100474123C Self-adapting technique changing method for self-adapting focusing and leveling adjustment sensor system |
| 04/01/2009 | CN100474122C Space scanning based alignment signals sampling synchronous control method |
| 04/01/2009 | CN100474121C Substrate processing system and substrate processing method |
| 04/01/2009 | CN100474120C Method for computing values related to parts of multi-value picture element of the polygon brims |
| 04/01/2009 | CN100474119C Resist pattern forming method and semiconductor device manufacturing method |
| 04/01/2009 | CN100474118C Method for improving silicon scraps contamination when back grinding |
| 04/01/2009 | CN100474117C Photo-etching machine off-axis level and focusing detection control system and implement method thereof |
| 04/01/2009 | CN100474116C Method for keeping optical etcher high speed synchronous control time sequence signal completeness |
| 04/01/2009 | CN100474115C Aberration field measuring method for imaging optical system of photoetching apparatus |
| 04/01/2009 | CN100474114C Supporting rack |
| 04/01/2009 | CN100474113C Method of through hole etching for RF device products |
| 04/01/2009 | CN100474112C Method and device for producing exposed structures |
| 04/01/2009 | CN100474111C Method for designing phase grating pattern, and method for producing photomask system |
| 04/01/2009 | CN100474110C Selected acid generating agents and use thereof in processes for imaging radiation-sensitive elements |
| 04/01/2009 | CN100474109C Cation photopolymerization evocator and composition with cation photopolymerization |
| 04/01/2009 | CN100474108C Critical dimension control using full phase and trim masks |
| 04/01/2009 | CN100474107C Flat printing method using o-quino lino-bismethane |
| 04/01/2009 | CN100474106C Printed board material |
| 04/01/2009 | CN100474086C Transmission type liquid crystal display and manufacturing method thereof |
| 04/01/2009 | CN100474004C A process for the fabrication of optical microstructures |
| 04/01/2009 | CN100473667C Photoinitiator, novel compound and photocurable composition |
| 03/31/2009 | US7512229 Key unit, method for marking key top, and method for manufacturing key unit using the same |
| 03/31/2009 | US7511888 Projection optical system, exposure apparatus, device manufacturing method, and device manufactured by using the same |
| 03/31/2009 | US7511885 Methods for reducing polarization aberration in optical systems |
| 03/31/2009 | US7511884 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
| 03/31/2009 | US7511179 Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer |
| 03/31/2009 | US7511169 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| 03/31/2009 | US7511084 Photoinitiators; phosphine oxide structure with hydroxylamino, alkoxylamino, or hydrazido groups on the central phosphorus atom; simple synthesis; high tolerance to functional groups, very low tendency to migrate; photographic materials, radiation curing of photopolymerizable coatings, inks, dispersions |
| 03/31/2009 | US7510979 Method for forming a pattern on a semiconductor device and semiconductor device resulting from the same |
| 03/31/2009 | US7510962 Method for producing an anisotropic conductive film on a substrate |
| 03/31/2009 | US7510822 Aroylmethylsulfonium compounds that are activated by heat or actinic radiation to generate acid |
| 03/31/2009 | US7510820 A copolymer of a hydroxy-containing vinylnaphthalene with hydroxy-free olefins such as acenaphthalene is useful in forming a resist undercoat with a high transparency, that functions as an antireflective coating during short-wavelength exposure, and high etch resistance; dry etching with oxygen or H2 |
| 03/31/2009 | US7510818 Reversible contrast enhancement layer (R-CEL) in optical lithography, lithography mask inspection and writing and optical storage |
| 03/31/2009 | US7510817 Photoacid generator, and a polymer with units of 2-alkyladamantyl (meth)acrylate, 3-hydroxyadamantyl (meth)acrylate, 1-alkylcyclopentyl (meth)acrylate or 7-oxo-3,8-methano-6-oxabicyclo(3.2.1)octan-4-yl (meth)acrylate, made with a chain transfer agent; e.g. RAFT polymer; narrow polydispersity |
| 03/31/2009 | US7510816 Silicon-containing resist composition and patterning process |
| 03/31/2009 | US7510341 Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus |
| 03/26/2009 | WO2009038992A1 Electroformed stencils for solar cell front side metallization |
| 03/26/2009 | WO2009038460A1 Lithographic apparatus and device manufacturing method |
| 03/26/2009 | WO2009038290A1 Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition |
| 03/26/2009 | WO2009038148A1 Photosensitive composition, pattern-forming method using the photosensitive composition, and compound used in the photosensitive composition |
| 03/26/2009 | WO2009038126A1 Resist underlayer film forming composition containing branched polyhydroxystyrene |
| 03/26/2009 | WO2009038082A1 Photosensitive resin composition and laminate thereof |
| 03/26/2009 | WO2009037965A1 Liquid crystal display panel manufacturing method and photomask |
| 03/26/2009 | WO2009037960A1 Lithographic printing plate material, and phenolic resin having cyclic ureide compound residue |
| 03/26/2009 | WO2009037908A1 Process for producing lithographic printing plate material, and lithographic printing plate material |
| 03/26/2009 | WO2009037233A2 Preparation of epsilon copper phthalocyanine of small primary particle size and narrow particle size distribution |
| 03/26/2009 | WO2009037032A1 Method for the lithographic production of nanostructures and/or microstructures, stamp and substrate |
| 03/26/2009 | WO2009036975A1 Projection objective with obscurated pupil for microlithography |
| 03/26/2009 | WO2009036957A1 Bundle-guiding optical collector for collecting the emission of a radiation source |
| 03/26/2009 | WO2009018217A3 Non-covalently crosslinkable materials for photolithography processes |
| 03/26/2009 | WO2009014251A3 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method |
| 03/26/2009 | WO2008107304A3 Surface-modified nanoparticles comprising a cationic colorant for use in color filters |
| 03/26/2009 | WO2005069077A3 Method and system of coating polymer solution on surface of a substrate |
| 03/26/2009 | US20090082240 Stripping liquid for semiconductor device, and stripping method |
| 03/26/2009 | US20090081882 Method for manufacturing semiconductor device and method for designing photomask pattern |
| 03/26/2009 | US20090081823 Electroformed stencils for solar cell front side metallization |
| 03/26/2009 | US20090081819 Method and apparatus for managing manufacturing equipment, method for manufacturing device thereby |
| 03/26/2009 | US20090081597 generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography |
| 03/26/2009 | US20090081596 Metal photoetching product and production method thereof |
| 03/26/2009 | US20090081595 Patterning process |
| 03/26/2009 | US20090081594 semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists |
| 03/26/2009 | US20090081593 Method for forming resist pattern and method for manufacturing a semiconductor device |
| 03/26/2009 | US20090081592 Fountain solution composition for lithographic printing and heat-set offset rotary printing process |
| 03/26/2009 | US20090081591 Method for patterning a photosensitive layer |
| 03/26/2009 | US20090081590 Negative resist composition and process for forming resist patterns |