Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2009
04/02/2009US20090087800 Method and apparatus for producing conductive material
04/02/2009US20090087799 Antireflective coating composition, antireflective coating, and patterning process
04/02/2009US20090087798 illuminating with first wavelength in form of standing illumination waveform a region of a reversible contrast-enhancement material located on photoresist material, illuminating with second wavelength regions of minimum intensity provided by first illumination waveform to produce image in photoresist
04/02/2009US20090087797 photoresists; reversible contrast-enhancement material
04/02/2009US20090087795 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system
04/02/2009US20090087794 Method for manufacturing diffractive optical element
04/02/2009US20090087793 Method of nano-patterning using surface plasmon effect and method of manufacturing nano-imprint master and discrete track magnetic recording media using the nano-patterning method
04/02/2009US20090087792 Method for manufacturing electroluminescence element
04/02/2009US20090087791 Lithographic printing plate surface protective agent and platemaking method for lithographing printing plate
04/02/2009US20090087790 Method of producing a negative planographic printing plate
04/02/2009US20090087789 Resist composition and pattern-forming method using the same
04/02/2009US20090087788 Curable composition, image forming material, and planographic printing plate precursor
04/02/2009US20090087787 Planographic printing plate precursor and method of producing a copolymer used therein
04/02/2009US20090087786 Patterning process and resist composition used therein
04/02/2009US20090087785 Polymerizable composition and planographic printing plate precursor using the same, alkali-soluble polyurethane resin, and process for producing diol compound
04/02/2009US20090087784 Positive resist composition and pattern forming method using the same
04/02/2009US20090087783 Original plate for lithography, and resin composition for photosensitive layer in original plate for lithography
04/02/2009US20090087782 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity
04/02/2009US20090087781 Image-forming method and lithographic printing plate precursor
04/02/2009US20090087779 Printing plate material
04/02/2009US20090087778 Method for manufacturing original plate of planographic printing plate and original plate of planographic printing plate
04/02/2009US20090087776 solubility in alkali developer increases under action of acid; high sensitivity, resolution; generation of standing wave is suppressed
04/02/2009US20090087775 Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same
04/02/2009US20090087774 Compositions and methods for wet lamination of photopolymerizable dry films onto substrates
04/02/2009US20090087759 Oxime Ester Photoinitiators
04/02/2009US20090087758 Methods, apparatus and computer program products for fabricating masks and semiconductor devices using model-based optical proximity effect correction and lithography-friendly layout
04/02/2009US20090087757 Method for feature prediction, method for manufacturing photomask, method for manufacturing electronic component, and program for feature prediction
04/02/2009US20090087754 System and method for making photomasks
04/02/2009US20090087753 Volume phase hologram recording material, production process therefor, and recorded material
04/02/2009US20090087712 Fabrication method of thin film solid oxide fuel cells
04/02/2009US20090087663 Free-standing metallic micromechanical structure, method of manufacturing the same, resonator structure using the same, and method of manufacturing a resonator structure using the same
04/02/2009US20090087622 Directed Assembly of Carbon Nanotubes and Nanoparticles Using Nanotemplates With Nanotrenches
04/02/2009US20090087619 System and method for making photomasks
04/02/2009US20090086307 Gray level method for slm-based optical lithography
04/02/2009US20090086182 Apparatus for slm-based optical lithography with gray level capability
04/02/2009US20090086176 Method of operation for slm-based optical lithography tool
04/02/2009US20090085459 Protective layer for corrosion prevention during lithography and etch
04/02/2009US20090084685 Design of an ic-processed polymer nano-liquid chromatography system on-a-chip and method of making it
04/02/2009US20090084492 Microscale patterning and articles formed thereby
04/02/2009DE202008016307U1 Retikel mit einer abzubildenden Struktur, Projektionsoptik zur Abbildung der Struktur sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik Reticle with a structure to be imaged, projection optics for imaging the structure as well as the projection exposure apparatus with such a projection optical system
04/02/2009DE112007000405T5 Lacksubstrat-Behandlungslösung und Verfahren zur Behandlung von Lacksubstrat unter Verwendung derselben Resist substrate-treating solution and method for the treatment of paint substrate using the same
04/02/2009DE102008041301A1 Arrangement, particularly for microlithography, has component of optical device, and manipulation element that is formed to produce counter force against operating force by elastic restoring force
04/02/2009DE102008041288A1 Illumination system for microlithographic projection exposure system, has gray filter arranged in plane directly before entry surface of integrator, where filter reduces intensity of projection light at edge of integrator in x-direction
04/02/2009DE102008038443A1 Maskless exposure device for substrate to form wiring pattern on printed circuit board, has projection lens producing image in plane, which is positioned at substrate surfaces, when distance between wedge-shaped surfaces is held constant
04/02/2009DE102007046927A1 Kalibrierung einer Positionsmesseinrichtung einer optischen Einrichtung Calibrating a position measuring device of an optical device
04/02/2009DE102007043896A1 Mikrooptik zur Messung der Position eines Luftbildes Micro-optics for measuring the position of an aerial image
04/02/2009DE102004037949B4 Verfahren zur Herstellung von Photonischen Kristallen A process for producing photonic crystals
04/01/2009EP2043134A1 Maintenance method, exposure method and apparatus and device manufacturing method
04/01/2009EP2043133A1 Exposing method, exposing device, and device manufacturing method
04/01/2009EP2042930A2 Methods relating to immersion lithography
04/01/2009EP2042929A1 Lithographic apparatus having a Lorentz actuator with a composite carrier
04/01/2009EP2042928A2 Negative-working photosensitive material and negative-working planographic printing plate precursor
04/01/2009EP2042927A1 Composition containing hydroxylated condensation resin for forming film under resist
04/01/2009EP2042926A2 Method for manufacturing original plate of planographic printing plate and original plate of planographic printing plate
04/01/2009EP2042925A2 Resist composition and pattern-forming method using the same
04/01/2009EP2042924A2 Method for preparing lithographic printing plate
04/01/2009EP2042923A2 Image-forming method and lithographic printing plate precursor
04/01/2009EP2042922A2 Cyclopentene as a precursor for carbon-based films
04/01/2009EP2042921A2 Pigment dispersion composition, photocurable composition and color filter
04/01/2009EP2042547A1 Benzocyclobutene based polymer formulations
04/01/2009EP2042532A2 Polymerizable composition and planographic printing plate precursor using the same, alkalisoluble polyrethane resin, an process for producing diol compound
04/01/2009EP2042522A1 Curable composition, image forming material, and planographic printing plate precursor
04/01/2009EP2042466A2 A method for fabricating a structure for a microelectromechanical systems (MEMS) device
04/01/2009EP2042337A1 Lithographic printing plate precursor and method of preparing lithographic printing plate
04/01/2009EP2042336A1 Photocurable coating composition, and overprint and process for producing same
04/01/2009EP2042312A2 Processing method of lithographic printing plate precursor
04/01/2009EP2042311A1 Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method
04/01/2009EP2042309A2 Method of producing a negative planographic printing plate
04/01/2009EP2042304A1 Method of plate making and lithographic printing plate
04/01/2009EP2041626A2 A process for enhancing the resolution of a thermally transferred pattern
04/01/2009EP2041625A1 Illumination system of a microlithographic projection exposure apparatus
04/01/2009EP2041624A2 Correction of spatial instability of an euv source by laser beam steering
04/01/2009EP2041623A2 Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
04/01/2009EP2041622A1 Precise positioning system for dual stage switching exposure
04/01/2009EP2041621A2 Photosensitive conductive paste for electrode formation and electrode
04/01/2009EP2001602A4 Lithography imprinting system
04/01/2009EP1627259A4 Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
04/01/2009EP1606834A4 Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
04/01/2009EP1552344A4 A method for the removal of an imaging layer from a semiconductor substrate stack
04/01/2009EP1549475A4 Imprint lithography processes and systems
04/01/2009EP1378036B1 Injection seeded laser with precise timing control
04/01/2009EP1324135B1 Ultraviolet-curable resin composition and photosolder resist ink containing the composition
04/01/2009CN201214503Y Light shield box and support member thereof
04/01/2009CN101401039A Photosensitive composition, photosensitive film, method for permanent pattern formation using said photosensitive composition, and printed board
04/01/2009CN101401038A Photosensitive composition, photosensitive film, photosensitive layered product, method of forming permanent pattern, and printed wiring board
04/01/2009CN101401037A Photosensitive composition, photosensitive film, photosensitive layered product, method of forming permanent pattern, and printed wiring board
04/01/2009CN101401036A Photosensitive-resin layered product
04/01/2009CN101401035A Photosensitive resin composition, photosensitive transfer film, and method for pattern formation
04/01/2009CN101400775A Cleaning treatment liquid
04/01/2009CN101400723A Base soluble polymers for photoresist compositions
04/01/2009CN101400706A Photocurable/thermosetting resin composition, cured product and printed wiring board
04/01/2009CN101399192A Method for making grid and NMOS transistor
04/01/2009CN101399187A Method for forming film layer
04/01/2009CN101399171A Method of forming alignment mark
04/01/2009CN101398859A Method for introducing light shield partial increment magnification coefficient into optical proximity effect model building
04/01/2009CN101398639A Composition for stripping and stripping method
04/01/2009CN101398638A Detergent for photo resist
04/01/2009CN101398637A Method for removing photo resist
04/01/2009CN101398636A Precision vibration damping assembly and vibration damping platform composed of the assembly
04/01/2009CN101398635A Auto gain link closed-loop feedback control method in self-adapting focusing and leveling sensor system