Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2009
04/08/2009CN101403861A Immersion self-adapting seal control device used for photo-etching machine
04/08/2009CN101403860A Apparatus and method of sensing leakage of chemical liquid
04/08/2009CN101403859A Photosensitive resin composition and curing article thereof
04/08/2009CN101403858A Radiation-sensitive composition for forming colored layer, color filter and color liquid crystal display device
04/08/2009CN101403857A Curing composition for pigmentation pixel, color filtering device and liquid crystal display apparatus
04/08/2009CN101403856A Composition, dry film, curing article and printed circuit board
04/08/2009CN101403855A Ultraviolet/hot pressing curing type nano-printing method and stamping press
04/08/2009CN101403854A Nano-patterning method and method of manufacturing master plate and discrete track magnetic recording media
04/08/2009CN101403853A Method and system for nanostructure placement using imprint lithography
04/08/2009CN101402809A Uv-curing anti-etching printing ink for printed circuit board
04/08/2009CN101402775A Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same
04/08/2009CN100477319C Material with pattern surface for use as template and process for producing the same
04/08/2009CN100477204C Wafer with optical control modules in IC fields
04/08/2009CN100477111C Processing method
04/08/2009CN100477084C Photoresist coating liquid supplying apparatus, and photoresist coating liquid supplying method and photoresist coating apparatus using the photoresist coating liquid supplying apparatus
04/08/2009CN100477083C Exposing device, exposing method, and assembly manufacturing method
04/08/2009CN100477081C Method for manufacturing semiconductor device
04/08/2009CN100477080C Method for manufacturing semiconductor device
04/08/2009CN100477074C High-Pressure processing method and high-pressure processing device
04/08/2009CN100477058C Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device
04/08/2009CN100476599C Photoetching mark structure, photoetching projection device comprising the photoetching mark structure, and method for aligning with the photoetching mark structure
04/08/2009CN100476598C Composition for antireflection coating and method for forming pattern
04/08/2009CN100476597C Low-foam developer for radioactivity-sensitive composition
04/08/2009CN100476596C Autofocus system, autofocus method, and exposure apparatus using the autofocus system
04/08/2009CN100476595C Method for ascertaining radiation power and exposure equipment
04/08/2009CN100476594C Pattern forming method
04/08/2009CN100476593C Lithographic apparatus and device manufacturing method
04/08/2009CN100476592C Method and device for immersion lithography using high ph immersion fluid
04/08/2009CN100476591C Interference patterning
04/08/2009CN100476590C Lithographic apparatus, device manufacturing method, and device manufactured thereby
04/08/2009CN100476589C Method of and apparatus for supplying a dynamic protective layer to a reflector
04/08/2009CN100476588C Lithographic apparatus and device manufacturing method, and measurement systems
04/08/2009CN100476587C Control system, lithographic apparatus, device manufacturing method and device manufactured thereby
04/08/2009CN100476586C Transmission shear grating in checkerboard configuration for EUV wavefront sensor
04/08/2009CN100476585C Impurity shielding with extendable slice
04/08/2009CN100476584C Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
04/08/2009CN100476583C Ring sulfonium and sulfonium oxide and photoacid generator and photoetching glue containing ring sulfonium and sulfonium oxide
04/08/2009CN100476582C Nozzle assembly for applying a liquid to a substrate
04/08/2009CN100476529C Method of fabricating array substrate for in-plane switching liquid crystal display device
04/08/2009CN100476460C Variable focal length X-ray compound lens and manufacturing method thereof
04/08/2009CN100475942C Aqueous alkaline photoresist cleaning composition and method of use
04/08/2009CN100475859C Photo-crosslinkable multi-coating system having improved gas-barrier properties
04/08/2009CN100475855C Arylsulfinate salts in initiator systems for polymeric reactions
04/08/2009CN100475803C Heterocycle-bearing onium salts
04/08/2009CN100475798C Sulfonate derivatives and the use therof as latent acids
04/07/2009US7515363 Replacement apparatus for an optical element
04/07/2009US7515359 Support device for positioning an optical element
04/07/2009US7515250 In-situ interferometer arrangement
04/07/2009US7515249 Substrate carrying apparatus, exposure apparatus, and device manufacturing method
04/07/2009US7515248 Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment
04/07/2009US7515247 Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device
04/07/2009US7515246 Exposure apparatus, exposure method, and method for producing device
04/07/2009US7515245 Lithographic apparatus and device manufacturing method
04/07/2009US7515233 Liquid crystal display having dual pattern protrusions formed on an electrode
04/07/2009US7514699 Method and device for irradiating spots on a layer
04/07/2009US7514477 Low-viscosity radiation-curable composition for making an earpiece
04/07/2009US7514205 Copolymer of an unsaturated sulfonic acid, particularly vinylsulfonic acid, allylsulfonic acid, or 2-acrylamido-2-methylpropanesulfonic acid and a 3-perfluoroalkyl-2-hydroxypropyl or 2-perfluroalkyl-1-methylolethyl (alk or F)acrylate, e.g., 3-(perfluoro-n-butyl)-2-hydroxypropyl acrylate
04/07/2009US7514204 a polycyclic acrylate or methacrylate polymer, a copolymer of recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive; increases its alkali solubility under the action of an acid as a base resin
04/07/2009US7514203 Positive photoresist composition
04/07/2009US7514202 Thermal acid generator, resist undercoat material and patterning process
04/07/2009US7514201 Positive photosensitive composition
04/07/2009US7514200 Hard mask composition for lithography process
04/07/2009US7514199 Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same
04/07/2009US7514198 Color forming composition containing a plurality of antenna dyes
04/07/2009US7514197 High resolution so that the pattern of 10 nm or less can be formed; for nano-technology such as making a hyperfine structure semiconductor devices and researching of the quantum effect; producing biochips; of5,11,17,23-tetrachloromethyl-25,26,27,28-tetramethoxycalixarene, solvent such as ethyl lactate
04/07/2009US7514188 Process for providing marking on security papers
04/07/2009US7514187 Color filter and manufacturing method therefor
04/07/2009US7514183 Generating a mask for use in a photolithography process; tuning the transmittance of features in a target mask pattern
04/07/2009US7514015 Method for surface cleaning
04/07/2009US7513265 High pressure processing method and apparatus
04/07/2009CA2359225C Method and device for vibration control
04/02/2009WO2009041987A1 Improving process model accuracy by modeling mask corner rounding effects
04/02/2009WO2009041916A1 A method of generating a pattern on a substrate
04/02/2009WO2009041818A1 Spectral filter, lithographic apparatus including such a spectral filter, device manufacturing method, and device manufactured thereby
04/02/2009WO2009041620A1 Photosensitive resin composition, pattern-forming method using the composition, and electronic device
04/02/2009WO2009041619A1 Positive-type photosensitive resin composition, and method for formation of cured film using the same
04/02/2009WO2009041593A1 Positive-type photosensitive polyimide resin composition
04/02/2009WO2009041556A1 Radiation-sensitive composition
04/02/2009WO2009041510A1 Process for producing resin molded product, resin molded product produced by the process, optical device, microlens, microlens array, and microfluid device
04/02/2009WO2009041407A1 Resin composition for formation of fine pattern, and method for formation of fine pattern
04/02/2009WO2009041400A1 Negative resist composition and resist pattern-forming method using the same
04/02/2009WO2009041357A1 Photosensitive composition and method of forming pattern from the same
04/02/2009WO2009041306A1 Method and apparatus for manufacturing semiconductor device and resist material
04/02/2009WO2009041270A1 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern
04/02/2009WO2009041253A1 Novel photopolymerization initiator, pigment dispersion composition containing the same, coloring photocurable composition, and color filter
04/02/2009WO2009040661A2 Thick film resists
04/02/2009WO2009040592A2 Bidirectional imaging with varying intensities
04/02/2009WO2009040498A1 Method of making a colour filter array
04/02/2009WO2009040479A1 Novel particles and method of producing the same
04/02/2009WO2009040120A2 Optical unit having adjustable force action on an optical module
04/02/2009WO2009040104A1 Method for making lithographic printing plates
04/02/2009WO2009040011A2 High aperture catadioptric projection objective
04/02/2009WO2009039883A1 Optical imaging device with thermal stabilization
04/02/2009WO2009039551A1 Method of removing photoresist
04/02/2009WO2009019575A3 Underlayer coating composition based on a crosslinkable polymer
04/02/2009WO2009003646A3 Method and apparatus for drying a substrate surface
04/02/2009WO2005118914A3 Substrate support system and method
04/02/2009WO2005104756A3 Composite patterning devices for soft lithography
04/02/2009WO2005088395A3 Systems and methods for sub-wavelength imaging
04/02/2009WO2005077100A3 High aspect ratio c-mems architecture