| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/14/2009 | US7517205 Differentially cured materials and process for forming same |
| 04/14/2009 | US7516637 Method and apparatus for texturing a metal sheet or strip |
| 04/09/2009 | WO2009045347A1 Method for reducing pillar structure dimensions of a semiconductor device |
| 04/09/2009 | WO2009044929A1 Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method |
| 04/09/2009 | WO2009044901A1 X method for forming flow passage using rotating tilt exposure method |
| 04/09/2009 | WO2009044742A1 Composition for forming resist underlayer film, process for producing semiconductor device with the same, and additive for composition for forming resist underlayer film |
| 04/09/2009 | WO2009044668A1 Radiation-sensitive composition |
| 04/09/2009 | WO2009044667A1 Radiation-sensitive composition |
| 04/09/2009 | WO2009044666A1 Radiation-sensitive composition |
| 04/09/2009 | WO2009044665A1 Radiation-sensitive composition |
| 04/09/2009 | WO2009044434A1 Method for manufacturing semiconductor device, method for manufacturing exposure mask, and program used for manufacture of the same |
| 04/09/2009 | WO2009043790A2 Projection objective for microlithography |
| 04/09/2009 | WO2009043778A1 Calibration of a position-measuring device of an optical device |
| 04/09/2009 | WO2009043578A1 Illumination system optical element with an electrically conductive region |
| 04/09/2009 | WO2009043573A1 Optical system, in particular projection objective for microlithography |
| 04/09/2009 | WO2009043374A1 Aperiodic multilayer structures |
| 04/09/2009 | WO2008156977A3 Methods of fabricating nanostructures by use of thin films of self-assembling of diblock copolymers, and devices resulting from those methods |
| 04/09/2009 | WO2008123535A3 Exposure method, exposure apparatus and device manufacturing method |
| 04/09/2009 | WO2008051432A3 Patterning of ionic polymers |
| 04/09/2009 | WO2006012062A3 Method and apparatus for gas discharge laser output light coherency reduction |
| 04/09/2009 | WO2005036592A3 Control of overlay registration |
| 04/09/2009 | WO2004090639A3 The method for realizing a structured polymeric semiconductor, and a light-emiting diode. transistor, photodiode or sensor comprising a structured polymeric simiconductor as obtained with the method |
| 04/09/2009 | US20090092934 Gray-tone lithography using optical diffusers |
| 04/09/2009 | US20090092933 Methods of Lithographically Patterning a Substrate |
| 04/09/2009 | US20090092932 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 04/09/2009 | US20090092931 Methods of forming a blocking pattern using a photosensitive composition and methods of manufacturing a semiconductor device |
| 04/09/2009 | US20090092930 Pattern formation method |
| 04/09/2009 | US20090092929 Piezoelectric-actuator driving device and exposure apparatus including the same |
| 04/09/2009 | US20090092927 Image drum and fabricating method thereof |
| 04/09/2009 | US20090092925 Projection optical system, exposure apparatus, and exposure method |
| 04/09/2009 | US20090092924 Method of producing positive resist composition, positive resist composition, and method of forming resist pattern |
| 04/09/2009 | US20090092923 Modified silica particles, and photosensitive composition and photosensitive lithographic printing plate each containing the particles |
| 04/09/2009 | US20090092921 Positive resist composition and resist pattern forming method |
| 04/09/2009 | US20090092907 Sensitized photochemical switching for cholesteric liquid crystal displays |
| 04/09/2009 | US20090092904 Hologram recording medium |
| 04/09/2009 | US20090092802 Curable composition, negative type color filter and method of producing the same |
| 04/09/2009 | US20090091810 Hologram recording material and hologram recording medium |
| 04/09/2009 | US20090091736 Calculation method, generation method, program, exposure method, and mask fabrication method |
| 04/09/2009 | US20090091735 Illumination optical system and exposure apparatus having the same |
| 04/09/2009 | US20090091730 Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method |
| 04/09/2009 | US20090091722 Exposure apparatus and device manufacturing method |
| 04/09/2009 | US20090091720 Force Actuator |
| 04/09/2009 | US20090091719 Exposure system and pattern formation method |
| 04/09/2009 | DE10356699B4 Lithographiesystem für richtungsabhängige Belichtung Lithography system for directional exposure |
| 04/09/2009 | DE102008041991A1 Illuminating system for use in projection exposure system, has curved field generation module with optically active surfaces which are designed such that curved light-bundle is formed by stream deflection of incident light-bundle |
| 04/09/2009 | DE102008016887A1 Verfahren zum Evaluieren eines optischen Abbildungsprozesses A method for evaluating an optical imaging process |
| 04/09/2009 | DE102007047446A1 Optisches Element mit wenigstens einem elektrisch leitenden Bereich und Beleuchtungssystem mit einem solchen Element An optical element with at least one electrically conductive area and illumination system with such an element |
| 04/09/2009 | DE102007047109A1 Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie An optical system, in particular the projection objective of the microlithography |
| 04/09/2009 | DE102007045975A1 Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul Optical device with adjustable force on an optical module |
| 04/09/2009 | DE102007043958A1 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Illumination device of a microlithography projection exposure apparatus |
| 04/09/2009 | DE102005000734B4 Verfahren zum Einstellen einer Abweichung einer kritischen Abmessung von Mustern Method for adjusting a deviation of a critical dimension of patterns |
| 04/09/2009 | DE10048151B4 Verfahren zum lithographischen Strukturieren einer Photoresistschicht A method of lithographic patterning a photoresist layer |
| 04/08/2009 | EP2045888A1 Optical fiber amplifier, light source device, exposure device, object inspection device, and treatment device |
| 04/08/2009 | EP2045686A2 Lithographic apparatus and device servo control method |
| 04/08/2009 | EP2045664A2 Lithographic apparatus, projection assembly and active damping |
| 04/08/2009 | EP2045663A2 Calculation method, generation method, program, exposure method, and mask fabrication method |
| 04/08/2009 | EP2045662A2 Lithographic printing plate precursor and method of preparing lithographic printing plate |
| 04/08/2009 | EP2045661A1 Positive resist composition and method of forming resist pattern |
| 04/08/2009 | EP2045660A1 Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
| 04/08/2009 | EP2045659A1 Method of nano-patterning using surface plasmon effect and method of manufacturing nano-imprint master and discrete track magnetic recording media using the nano-patterning method |
| 04/08/2009 | EP2045645A1 Micro actuator, optical unit, exposure device, and device manufacturing method |
| 04/08/2009 | EP2045629A1 Resin composition for optical material, resin film for optical material, and optical waveguide |
| 04/08/2009 | EP2045318A1 Cleaning agent for semiconductor device and cleaning method using the same |
| 04/08/2009 | EP2045280A1 Ring-opening metathesis polymers, products of hydrogenation thereof, process for production of the same and uses thereof |
| 04/08/2009 | EP2045275A2 Polycyclic resist compositions with increased etch resistance |
| 04/08/2009 | EP2044488A1 Apparatus and method for conditioning an immersion fluid |
| 04/08/2009 | EP2044487A1 Optical apparatus and method for correction or improvement of the imaging behaviour of an apparatus such as this |
| 04/08/2009 | EP2044486A1 Antireflective coating compositions |
| 04/08/2009 | EP2044485A2 Etching and hole arrays |
| 04/08/2009 | EP2044000A1 Radiation curable amino(meth)acrylates |
| 04/08/2009 | EP1958028A4 Developer solution and process for use |
| 04/08/2009 | EP1817634B1 Process for producing resist pattern and conductor pattern |
| 04/08/2009 | EP1583998B1 Method of forming resist pattern, use of a positive resist composition, and layered product |
| 04/08/2009 | EP1573268A4 Assessment and optimization for metrology instrument |
| 04/08/2009 | EP1426822B1 Composition for forming antireflective film for use in lithography |
| 04/08/2009 | EP1285223B1 Data age adjustments |
| 04/08/2009 | CN201218900Y Humidifier of spin coater |
| 04/08/2009 | CN101406033A Internal-drum imagesetter |
| 04/08/2009 | CN101405840A Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| 04/08/2009 | CN101405839A Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method and decision method |
| 04/08/2009 | CN101405838A Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method and correction method |
| 04/08/2009 | CN101405837A Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| 04/08/2009 | CN101405836A Manufacturing method of semiconductor device |
| 04/08/2009 | CN101405660A Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process |
| 04/08/2009 | CN101405659A Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device |
| 04/08/2009 | CN101405658A Apparatus for cooling |
| 04/08/2009 | CN101405657A Photosensitive composition, photosensitive film, permanent pattern forming method, and printed board |
| 04/08/2009 | CN101405656A Photosensitive resin composition, photosensitive element using the same, anti-corrosion graphic forming method and printed circuit board fabrication method |
| 04/08/2009 | CN101405655A Negative-type photosensitive fluorinated aromatic resin composition |
| 04/08/2009 | CN101405654A Photosensitive composition, and material for formation of light-shield film for display device or photosensitive transfer material using the composition |
| 04/08/2009 | CN101405310A Polymer compound and production method thereof, pigment dispersing agent, pigment dispersion composition, photocurable composition, and color filter and production method thereof |
| 04/08/2009 | CN101405140A Method of applying elongate web |
| 04/08/2009 | CN101405130A Method for producing defect-free light guiding elements of great widths, production device and diffractive light guiding element |
| 04/08/2009 | CN101403868A Constant temperature method and device for mask plate developing solution |
| 04/08/2009 | CN101403867A Dry plate, film developing baths cleaning agent and cleaning method |
| 04/08/2009 | CN101403866A Object position measurement apparatus and method |
| 04/08/2009 | CN101403865A Pre-aligning system for mask of photo-etching machine |
| 04/08/2009 | CN101403864A Method for self-judgment of measurement data reliability of self-adapting focusing and leveling sensor system |
| 04/08/2009 | CN101403863A Double-side exposal device |
| 04/08/2009 | CN101403862A Immersion liquid recovery vibration-damping control device used for photo-etching machine |