| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/16/2009 | US20090096980 Methods and systems for interferometric analysis of surfaces and related applications |
| 04/16/2009 | US20090096090 Photolithography Process and Photomask Structure Implemented in a Photolithography Process |
| 04/16/2009 | US20090095320 Composition for Removing Photresist Layer and Method for Using it |
| 04/16/2009 | US20090095184 Negative working, heat-sensitive lithographic printing plate precursor |
| 04/16/2009 | DE10260689B4 Verfahren zur optimalen Fokusbestimmung Method for determination of optimum focus |
| 04/16/2009 | DE102008041593A1 Beleuchtungsoptik für die Mikrolithographie Illumination optics for microlithography |
| 04/16/2009 | DE102007048749A1 Thermal generator for direct conversion of thermal energy into electrical energy, has linear structures integrated into substrates and made from thermoelectric material e.g. germanium, with high electrical and thermal conductivity |
| 04/15/2009 | EP2048720A2 Piezoelectic-actuator driving device and exposure apparatus including the same |
| 04/15/2009 | EP2048700A2 Antireflective coatings |
| 04/15/2009 | EP2048543A2 An optical focus sensor, an inspection apparatus and a lithographic apparatus |
| 04/15/2009 | EP2048541A1 Method of forming pattern, composition for forming upper-layer film, and composition for forming lower-layer film |
| 04/15/2009 | EP2048540A1 Microlithographic projection exposure apparatus |
| 04/15/2009 | EP2048539A1 Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element |
| 04/15/2009 | EP2048196A1 Curable resin composition and method for forming cured coating film |
| 04/15/2009 | EP2048128A1 Polymerizable compound having adamantane structure, process for production of the same, and resin composition |
| 04/15/2009 | EP2048000A2 Plate making method of lithographic printing plate precursor |
| 04/15/2009 | EP2047470A2 Device and method for patterning a surface of a polymer layer |
| 04/15/2009 | EP2047334A1 Multi-reflection optical systems and their fabrication |
| 04/15/2009 | EP2047332A2 Resists for photolithography |
| 04/15/2009 | EP2047209A1 Device for characterizing unique objects |
| 04/15/2009 | EP2046676A2 Production of microfluidic polymeric devices by photo-assisted and/ or thermally assisted printing |
| 04/15/2009 | EP2003520A9 Photosensitive composition, optical recording medium and method for manufacturing same, optical recording method, and optical recording apparatus |
| 04/15/2009 | EP2003506A9 Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device |
| 04/15/2009 | EP1825328B1 Photosensitive resin composition and photosensitive dry film by the use thereof |
| 04/15/2009 | EP1655765B1 Exposure method |
| 04/15/2009 | EP1642170A4 Systems for magnification and distortion correction for imprint lithography processes |
| 04/15/2009 | EP1503403B1 Reticle and optical characteristic measuring method |
| 04/15/2009 | EP1447712B1 Methods of producing photosensitive ceramic composition and multi-layer substrate using it |
| 04/15/2009 | EP1393138B1 Enhanced fieldbus device alerts in a process control system |
| 04/15/2009 | CN201222168Y Aluminum-based photosensitive material plate |
| 04/15/2009 | CN201222167Y Aluminum plate for light sensation |
| 04/15/2009 | CN101410948A Exposure method and apparatus, maintenance method and device manufacturing method |
| 04/15/2009 | CN101410946A Lighting optical system, exposure system, and device production method |
| 04/15/2009 | CN101410945A Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| 04/15/2009 | CN101410761A Exposing apparatus |
| 04/15/2009 | CN101410760A Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| 04/15/2009 | CN101410759A Substrate for display panel, display panel provided with such substrate, method for manufacturing substrate for display panel and method for manufacturing display panel |
| 04/15/2009 | CN101410758A Photosensitive resin composition, photosensitive transfer material, partition wall and method for forming same, optical device and method for manufacturing same, and display |
| 04/15/2009 | CN101410757A Photocurable/thermosetting resin composition, cured product thereof and printed wiring board obtained by using same |
| 04/15/2009 | CN101410756A Negative photoresist compositions |
| 04/15/2009 | CN101410755A Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing printed wiring board |
| 04/15/2009 | CN101410754A A method of applying a pattern of metal, metal oxide and/or semiconductor material on a substrate |
| 04/15/2009 | CN101410753A Method of forming nanoscale features using soft lithography |
| 04/15/2009 | CN101410503A Improved alkaline solutions for post CMP cleaning processes |
| 04/15/2009 | CN101410421A Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board |
| 04/15/2009 | CN101409735A Metal sticker for keypad of mobile phone and method for manufacturing the same |
| 04/15/2009 | CN101408738A Split vertical type hot plate system in photolithography guide rail equipment |
| 04/15/2009 | CN101408737A Platform-type exposure image detection device and detection method thereof |
| 04/15/2009 | CN101408736A Probe-induced surface plasma resonance lithographic device and method |
| 04/15/2009 | CN101408735A Lithographic apparatus having a Lorentz actuator with a composite carrier |
| 04/15/2009 | CN101408734A Exposure apparatus and device manufacturing method |
| 04/15/2009 | CN101408733A Methods relating to immersion lithography and an immersion lithographic apparatus |
| 04/15/2009 | CN101408732A Embedded type common basal plane two-dimension balance double-drive double-workpiece platform positioning system |
| 04/15/2009 | CN101408731A Immerge control device for immersed photoetching machine |
| 04/15/2009 | CN101408730A Method for manufacturing original plate of planographic printing plate and original plate of planographic printing plate |
| 04/15/2009 | CN101408729A Positive-working photoimageable bottom antireflective coating |
| 04/15/2009 | CN101408728A Resist composition, method of forming resist pattern, novel compound and method of producing the same |
| 04/15/2009 | CN101408727A Full image type recording medium and composition for recording material thereof |
| 04/15/2009 | CN101408726A Compositions and methods for storing holographic data |
| 04/15/2009 | CN101408725A Method for manufacturing grey mask, grey mask and pattern transfer print method |
| 04/15/2009 | CN101408724A Half-tone mask plate and manufacture method thereof |
| 04/15/2009 | CN101408661A Photoetching objective lens |
| 04/15/2009 | CN101408285A Illuminating apparatus generating continuous variable pupil |
| 04/15/2009 | CN101407641A Processing pigment, pigment dispersed composition and coloring photosensitive composition |
| 04/15/2009 | CN100479118C Method for removing photoresist, and method for fabricating semiconductor component |
| 04/15/2009 | CN100479095C Method for controlling formula in silicon chip etching technology |
| 04/15/2009 | CN100478790C Method for improving semiconductor alignment precision and its opening forming method |
| 04/15/2009 | CN100478789C Four-quadrant aligning device of mask transmission system |
| 04/15/2009 | CN100478788C High-temperature stripping agent of curing membrane for printed nickel net, its preparation and use |
| 04/15/2009 | CN100478787C Objective with pupil obscuration |
| 04/15/2009 | CN100478786C Washing apparatus, coating and developing apparatus and washing method |
| 04/15/2009 | CN100478785C Pattern forming method |
| 04/15/2009 | CN100478784C Method of realizing 100nm patterns with transparent no-chromium phase shift mask |
| 04/15/2009 | CN100478783C Thermal transfer imaging process |
| 04/15/2009 | CN100478781C Etching method and composition for forming etching protective layer |
| 04/15/2009 | CN100478780C Resist pattern thickening material, resist pattern and its forming process, semiconductor device and its producing process |
| 04/15/2009 | CN100478754C Conductive substrate of liquid crystal display and its manufacturing method |
| 04/15/2009 | CN100478293C Method for manufacturing a transparent element with invisible electrodes |
| 04/15/2009 | CN100478083C Device and method for forming single coating membrane |
| 04/14/2009 | US7518789 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 04/14/2009 | US7518717 Exposure apparatus and a device manufacturing method using the same |
| 04/14/2009 | US7518128 Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned |
| 04/14/2009 | US7517808 Method for forming and removing a patterned silicone film |
| 04/14/2009 | US7517642 Plane waves to control critical dimension |
| 04/14/2009 | US7517641 High performance curable polymers and processes for the preparation thereof |
| 04/14/2009 | US7517640 Method for removing photoresist using a thermal bake in the presence of hydrogen and a semiconductor device manufactured using the same |
| 04/14/2009 | US7517638 Method of manufacturing a semiconductor apparatus with a tapered aperture pattern to form a predetermined line width |
| 04/14/2009 | US7517637 Forming self-aligned patterned layer on pre-patterned film formed by solution of masking material in carrier; removing portion of carrier to form coating; exposing to radiation in conjunction with blocking mask to transmit and reflect back; exposed and unexposed regions of spacial intensity distribution |
| 04/14/2009 | US7517636 Can shorten developing time and has high stripping property and tent reliability |
| 04/14/2009 | US7517635 condensation polymers prepared from bicyclo[2.2.2]octane-2,3:5,6-tetracarboxylic acid and derivatives, and alcohols-2+, having excellent etching resistance, high solubility in solvents and good adhesion to substrates, suitable for use in photoresist materials and for patterning; lithography |
| 04/14/2009 | US7517634 methacrylic esters terpolymers, prepared by a living free radical process, in the presence of a chain transfer agents, used as coatings; sterically bulky acrylic ester monomers |
| 04/14/2009 | US7517633 Composition for forming gap-filling material for lithography |
| 04/14/2009 | US7517632 Silver paste composition, method of forming conductive pattern by using the same, and the conductive pattern formed |
| 04/14/2009 | US7517621 first point and the second point being symmetric with respect to the center of the illumination, and to a straight line extending through the center of the illumination in a second direction perpendicular to the first direction; patterning the semiconductor |
| 04/14/2009 | US7517620 Method for fabricating array substrate having color filter on thin film transistor structure for liquid crystal display device |
| 04/14/2009 | US7517619 Dye-containing resist composition and color filter using same |
| 04/14/2009 | US7517618 Mask, exposure method and production method of semiconductor device |
| 04/14/2009 | US7517617 Mask blank for use in EUV lithography and method for its production |
| 04/14/2009 | US7517560 Method of manufacturing substrate having resist film |
| 04/14/2009 | US7517217 Method and apparatus for heat processing of substrate |