| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/22/2009 | CN101414117A Method for cleaning photo mask by wet method |
| 04/22/2009 | CN101414085A Liquid crystal display device and method of fabricating the same |
| 04/22/2009 | CN101413138A Method for improving accuracy of size of micro-electroforming cast layer |
| 04/22/2009 | CN101412949A Cleaning liquid for plasma etching residue |
| 04/22/2009 | CN100482038C Exposure unit |
| 04/22/2009 | CN100481438C Wafer with optical control modules in dicing paths |
| 04/22/2009 | CN100481434C Semiconductor integrated circuit and method for manufacturing the same, and mask |
| 04/22/2009 | CN100481418C ARC layer for semiconductor device and manufacturing method thereof |
| 04/22/2009 | CN100481371C Substrate placing stage |
| 04/22/2009 | CN100481370C Device for transfer of flat display panel |
| 04/22/2009 | CN100481343C Plasma ashing process |
| 04/22/2009 | CN100481325C Projection exposure apparatus, exposure method, and element producing method |
| 04/22/2009 | CN100480867C Aligning system and aligning method based on image technique |
| 04/22/2009 | CN100480866C Testing tag and method for testing imaging quality of photoetching machine using the same |
| 04/22/2009 | CN100480865C Method for adjusting the geometric pictures in the grating images |
| 04/22/2009 | CN100480864C Lithographic apparatus and device manufacturing method |
| 04/22/2009 | CN100480863C Method for manufacturing a microstructure, exposure device, and electronic apparatus |
| 04/22/2009 | CN100480862C Method of measurement, method for providing alignment marks, and device manufacturing method |
| 04/22/2009 | CN100480861C Photoetching apparatus |
| 04/22/2009 | CN100480860C Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 04/22/2009 | CN100480859C A method of calibrating a lithographic apparatus |
| 04/22/2009 | CN100480858C Photoetching apparatus, device manufacturing method and angular encoder |
| 04/22/2009 | CN100480857C Photoetching apparatus, device manufacturing method and device thereby |
| 04/22/2009 | CN100480856C Water base developing organic silicon modified light-sensitive polyimide material and preparation method thereof |
| 04/22/2009 | CN100480855C Photosensitive resin composition and method for preparing heat-resistant resin film |
| 04/22/2009 | CN100480854C Acid and alkali resistant cylinder photoresist for printmaking |
| 04/22/2009 | CN100480853C Polymeric material containing a latent acid |
| 04/22/2009 | CN100480822C Array substrate for ips-mode LCD device and method of fabricating the same |
| 04/22/2009 | CN100480754C Method of forming optical devices |
| 04/22/2009 | CN100480752C Production of differential silica waveguide with high refractive index by ultraviolet laser written in |
| 04/22/2009 | CN100480745C Colored photosensitive resin composition and coating film thereof, photosensitive resin transfer material |
| 04/22/2009 | CN100480620C System and method for manufacturing printed circuit boards employing non-uniformly modified images |
| 04/22/2009 | CN100480336C Pigmentary copper phthalocyanine solid solution and transparent dispersion comprising the same |
| 04/21/2009 | US7523438 Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM |
| 04/21/2009 | US7523437 Pattern-producing method for semiconductor device |
| 04/21/2009 | US7523027 Visual inspection and verification system |
| 04/21/2009 | US7522335 Broad-angle multilayer mirror design |
| 04/21/2009 | US7522266 Lithographic apparatus and device manufacturing method |
| 04/21/2009 | US7522264 Projection exposure apparatus, device manufacturing method, and sensor unit |
| 04/21/2009 | US7522259 Cleanup method for optics in immersion lithography |
| 04/21/2009 | US7521702 Extreme ultraviolet light source and extreme ultraviolet light source target |
| 04/21/2009 | US7521700 Raster frame beam system for electron beam lithography |
| 04/21/2009 | US7521697 Method for fabricating semiconductor device and equipment for fabricating the same |
| 04/21/2009 | US7521692 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus |
| 04/21/2009 | US7521406 Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
| 04/21/2009 | US7521405 exposing the substrate comprising photoresist coatings to radiation source, to form patterns, then applying developer solutions, rinsing with water and contacting with a mixture of aqueous, nonaqueous solvents and surfactants, to stabilize the patterns and reduce surface roughness ; surface tension |
| 04/21/2009 | US7521373 Compositions for dissolution of low-k dielectric films, and methods of use |
| 04/21/2009 | US7521172 Photoresist polymer, photoacid generator and solvent; exposing to actinic radiation through patterned photomask; development; immersion lithography; 1,1,1,3,3,3-hexafluoroisopropyl methacrylate-1-ethyl-cyclopentyl methacrylate copolymer; semiconductors; highly soluble in developer |
| 04/21/2009 | US7521171 Such as polymer obtained by reacting p-hydroxystyrene tert-butyl acrylate and 3,5-dioxa-1,7-heptanedithiol; acid-labile protecting group which is dissociatable by the action of an acid to allow the resin to have higher solubility in an alkaline developing solution; semiconductor lithography; sensitivity |
| 04/21/2009 | US7521170 Photoactive compounds |
| 04/21/2009 | US7521169 Radiation-sensitive resin composition |
| 04/21/2009 | US7521168 Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. |
| 04/21/2009 | US7521167 Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition |
| 04/21/2009 | US7521158 High sensitivity without residues in a unexposed portion, capable of forming a rectangular fine pattern and excellent in heat fastness and light fastness; high cost performance, for solid photographing element; alkali-soluble binder, solvent-soluble dye, photopolymerization initiator |
| 04/21/2009 | US7521156 Photo mask and method of correcting the transmissivity of a photo mask |
| 04/21/2009 | US7520938 Method for high-pressure processing |
| 04/21/2009 | US7520742 Nanoprint equipment and method of making fine structure |
| 04/21/2009 | US7520284 Apparatus for developing photoresist and method for operating the same |
| 04/16/2009 | WO2009048896A1 Gray-tone lithography using optical diffusers |
| 04/16/2009 | WO2009048262A2 Polymer for forming organic anti-reflective coating layer and composition including the same |
| 04/16/2009 | WO2009048170A1 Illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 04/16/2009 | WO2009048051A1 Illuminating optical apparatus, and exposure method and apparatus |
| 04/16/2009 | WO2009047960A1 Coating/developing apparatus, coating/developing method and storage medium |
| 04/16/2009 | WO2009047949A1 Photosensitive graft polymer, and photosensitive resin composition comprising the same |
| 04/16/2009 | WO2009047152A1 Sulphonium salt initiators |
| 04/16/2009 | WO2009047151A1 Sulphonium salt initiators |
| 04/16/2009 | WO2009047105A1 Sulphonium salt initiators |
| 04/16/2009 | WO2009046920A1 Device for creating a multipole illumination in a working plane, particularly for lithographic applications |
| 04/16/2009 | WO2009046895A1 Microlithographic projection exposure apparatus |
| 04/16/2009 | WO2009046816A1 Holding apparatus for holding an object |
| 04/16/2009 | WO2009046637A1 Cleaning composition for removing resist |
| 04/16/2009 | WO2009025498A3 Alkali developable photosensitive resin composition and dry film manufactured by the same |
| 04/16/2009 | WO2009020193A3 Imprint method and processing method of substrate |
| 04/16/2009 | WO2008157345A3 Wafer reclamation compositions and methods |
| 04/16/2009 | WO2008151107A3 High-resolution flexural stage for in-plane position and out-of-plane pitch/roll alignment |
| 04/16/2009 | WO2008070060A3 Device manufacturing process utilizing a double pattering process |
| 04/16/2009 | WO2008041123A8 Photoactive compounds |
| 04/16/2009 | WO2006138587A3 Three-dimensional direct-write lithography |
| 04/16/2009 | US20090099537 Process for making microneedles, microneedle arrays, masters, and replication tools |
| 04/16/2009 | US20090099051 Aqueous fluoride compositions for cleaning semiconductor devices |
| 04/16/2009 | US20090098491 Method and apparatus for thermal development |
| 04/16/2009 | US20090098489 Method for forming resist pattern |
| 04/16/2009 | US20090098488 Thick Film Layers and Methods relating thereto |
| 04/16/2009 | US20090098487 Method of Forming Variable Patterns Using a Reticle |
| 04/16/2009 | US20090098486 naphthalene containing monomers; photoresists; integrated circuits; lithography |
| 04/16/2009 | US20090098485 photoresist films suitable for immersion exposure, comprising non-aromatic olefin polymers, acid generators, solvents and acrylic polymers or vinyl ether polymers, having good followability for water, improved profile and pattern collapse |
| 04/16/2009 | US20090098484 Resist composition and method of forming resist pattern |
| 04/16/2009 | US20090098483 Positive resist composition and method for forming resist pattern |
| 04/16/2009 | US20090098482 diaryliodonium borate initiators; lithographic printing plates; post exposure baking; without use of toxic developers, environmentally friendly |
| 04/16/2009 | US20090098481 Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same |
| 04/16/2009 | US20090098480 Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same |
| 04/16/2009 | US20090098479 Exposure method and tool |
| 04/16/2009 | US20090098473 Photomask, method of lithography, and method for manufacturing the photomask |
| 04/16/2009 | US20090098472 Pattern Evaluation Method |
| 04/16/2009 | US20090098467 Holographic Sensor Based on a Volume Hologram in a Porous Medium |
| 04/16/2009 | US20090098413 Dot-patterned structure magnetic recording medium and method for production thereof |
| 04/16/2009 | US20090098347 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures |
| 04/16/2009 | US20090097142 Faceted mirror apparatus |
| 04/16/2009 | US20090097104 Multilayer mirror, method for manufacturing the same, and exposure equipment |
| 04/16/2009 | US20090097007 Illumination optical system, exposure apparatus, and device manufacturing method |