| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/28/2009 | US7524378 Maintenance system, substrate processing device, remote operation device, and communication method |
| 04/28/2009 | US7524072 Optical component, comprising a material with a predetermined homogeneity of thermal expansion |
| 04/28/2009 | CA2383059C Photoinitiator formulations |
| 04/23/2009 | WO2009052120A1 Lithography of nanoparticle based inks |
| 04/23/2009 | WO2009051966A1 Peeling imaged media from a substrate |
| 04/23/2009 | WO2009051920A1 Radiation-sensitive, wet developable bottom antireflective coating compositions and their applications in semiconductor manufacturing |
| 04/23/2009 | WO2009051237A1 Remover liquid composition and method for removing resin layer by using the same |
| 04/23/2009 | WO2009051199A1 Optical member cooling apparatus, lens barrel, exposure apparatus and device manufacturing method |
| 04/23/2009 | WO2009051088A1 Sulfone compound, sulfonic acid salt, and radiation-sensitive resin composition |
| 04/23/2009 | WO2009050977A1 Illumination optical system, exposure apparatus, and device manufacturing method |
| 04/23/2009 | WO2009050976A1 Illumination optical system, exposure apparatus, and device manufacturing method |
| 04/23/2009 | WO2009050947A1 Positive lithographic printing plate precursor and method for producing the same |
| 04/23/2009 | WO2009050857A1 Concave portion forming method, concave-convex product manufacturing method, light-emitting element manufacturing method, and optical element manufacturing method |
| 04/23/2009 | WO2009050675A2 Displacement device with precision position measurement |
| 04/23/2009 | WO2009050141A1 High-resolution lithography mask, apparatus and process for manufacture thereof, and lithography apparatus and process using such a mask |
| 04/23/2009 | WO2009049826A1 Measuring system and measuring method |
| 04/23/2009 | WO2009027794A3 Polymers for use in photoresist compositions |
| 04/23/2009 | WO2009027625A3 Patterning method |
| 04/23/2009 | WO2008123601A3 Pigment-dispersed composition, curable composition, and color filter and production method thereof |
| 04/23/2009 | WO2008096211A4 Measurement of critical dimensions of semiconductor wafers |
| 04/23/2009 | WO2008047217A8 Antireflective coating compositions |
| 04/23/2009 | WO2008015576A3 Enhancement of inkjet-printed elements using photolithographic techniques |
| 04/23/2009 | US20090105363 Compositions and methods for use in three dimensional model printing |
| 04/23/2009 | US20090104571 Method for air gap formation using UV-decomposable materials |
| 04/23/2009 | US20090104570 Apertured media embellishing template and system and method using same |
| 04/23/2009 | US20090104569 Plane waves to control critical dimension |
| 04/23/2009 | US20090104568 Exposure method, exposure apparatus, and method for producing device |
| 04/23/2009 | US20090104567 Apparatus for fabricating semiconductor device and method thereof |
| 04/23/2009 | US20090104566 Process of multiple exposures with spin castable film |
| 04/23/2009 | US20090104565 Method for forming photoelectric composite board |
| 04/23/2009 | US20090104563 sulfonium compound containing sulfonate anions as an acid generator (tri(4-methylphenyl)sulfonium trifluoromethanesulfonate); exhibits changed solubility in an alkali developing solution under action of acid; a methacrylate resin containing an acid dissociable, dissolution inhibiting group |
| 04/23/2009 | US20090104562 Photopolymerizable composition |
| 04/23/2009 | US20090104561 High performance, crosslinked polymeric material for holographic data storage |
| 04/23/2009 | US20090104560 Barrier film material and pattern formation method |
| 04/23/2009 | US20090104559 Bottom Antireflective Coating Compositions |
| 04/23/2009 | US20090104558 Solution for a Treatment of a Resist, a Modified Resist, a Process for the Treatment of a Resist and an Intermediate Product |
| 04/23/2009 | US20090104550 Nanoscale electric lithography |
| 04/23/2009 | US20090104549 Method for error reduction in lithography |
| 04/23/2009 | US20090104548 Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program |
| 04/23/2009 | US20090104412 External Light Blocking Film For Display Device, Filter For Display Device Having The Same, And Method Of Fabricating The Same |
| 04/23/2009 | US20090103232 Substrate Holding System and Exposure Apparatus Using the Same |
| 04/23/2009 | US20090103199 High positioning reproducible low torque mirror - actuator interface |
| 04/23/2009 | US20090103196 Optical Delay Module for Lengthening the Propagation Path of a Light Beam and Pulse Multiplication or Elongation Module |
| 04/23/2009 | US20090103180 Structures and methods for reducing aberration in optical systems |
| 04/23/2009 | US20090103071 Driving apparatus and exposure apparatus, and device fabrication method |
| 04/23/2009 | US20090103070 Optical element and exposure apparatus |
| 04/23/2009 | US20090103065 Exposure apparatus and method of manufacturing device |
| 04/23/2009 | US20090102018 Localized masking for semiconductor structure development |
| 04/23/2009 | US20090101983 Method of Achieving Dense-Pitch Interconnect Patterning in Integrated Circuits |
| 04/23/2009 | US20090101394 Photosensitive resin composition and flexible printed wiring circut board having insulative cover layer formed of photosensitive resin composition |
| 04/23/2009 | US20090100764 Composition for removing photoresist layer and method for using it |
| 04/23/2009 | DE102008042926A1 Optische Vorrichtung mit verbessertem Abbildungsverhalten sowie Verfahren zum Verbessern des Abbildungsverhaltens einer optischen Vorrichtung An optical device with improved imaging performance and method for improving the imaging performance of an optical device |
| 04/23/2009 | DE102008031020A1 Substrate e.g. glass substrate, exposure system for e.g. plasma display, has optic module components for radiating exposure samples, and arranged such that components permit adjustment of intermediate distance path between components |
| 04/23/2009 | DE102007047681A1 Monolithic mirror for e.g. polarization-based filter, has middle layer including periodic structure made of base material, where structure has effective refractive index less than refractive index of base material |
| 04/23/2009 | DE102007045396A1 Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle Leading bundle of optical collector for detecting the emission of a radiation source |
| 04/23/2009 | DE10142651C5 Verfahren zur Herstellung von hoch homogenen strahlenbeständigen streufreien Einkristallen, eines damit erhaltenen Ingots sowie deren Verwendung Process for the preparation of highly homogeneous radiation resistant scattering-free single crystals of an ingot thus obtained and their use |
| 04/23/2009 | CA2701889A1 Lithography of nanoparticle based inks |
| 04/22/2009 | EP2051141A1 Driving apparatus and exposure apparatus, and device fabrication method |
| 04/22/2009 | EP2051140A1 An extreme ultraviolet light source device and a method for generating extreme ultraviolet radiation |
| 04/22/2009 | EP2050577A1 Production method and production device of cylindrical print substrate |
| 04/22/2009 | EP2049950A2 Photolithography |
| 04/22/2009 | EP2049949A1 Composite composition for micropatterned layers |
| 04/22/2009 | EP2003478A9 Projection optical system, aligner, and method for fabricating device |
| 04/22/2009 | EP2003148A9 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition |
| 04/22/2009 | EP1812825B1 Dynamic development process with de-ionized water puddle |
| 04/22/2009 | EP1667778A4 Single phase fluid imprint lithography method |
| 04/22/2009 | CN201226082Y Glue-spreading developing apparatus with star-shaped lattice structure |
| 04/22/2009 | CN201226081Y Glue-spreading developing apparatus with star-shaped structure |
| 04/22/2009 | CN201226080Y Glue-spreading developing apparatus with novel structure |
| 04/22/2009 | CN201226079Y Technique wall frame for glue-spreading developing apparatus |
| 04/22/2009 | CN201226078Y Combined printing formwork |
| 04/22/2009 | CN101416118A Device substrate washing method |
| 04/22/2009 | CN101416117A Microlithography projection optical system, method for manufacturing a device and method to design an optical surface |
| 04/22/2009 | CN101416116A Method for forming surface unevenness |
| 04/22/2009 | CN101416115A Exposure apparatus |
| 04/22/2009 | CN101416114A Device and method for microstructuring a storage medium and storage medium comprising a microstructured region |
| 04/22/2009 | CN101416113A Dynamic compensation system for maskless lithography |
| 04/22/2009 | CN101416112A Photosenstive resist composition for color filters for use in electronic paper display devices |
| 04/22/2009 | CN101416111A Photosensitive composition, photosensitive film, method of forming permanent pattern, and printed wiring board |
| 04/22/2009 | CN101416110A Photosensitive resin composition for flexographic printing |
| 04/22/2009 | CN101416109A Method of forming nanopattern and substrate having pattern formed using the method |
| 04/22/2009 | CN101414536A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414535A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414534A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414533A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414235A In-mold moulding touch control module group and producing method thereof |
| 04/22/2009 | CN101414132A Developing apparatus |
| 04/22/2009 | CN101414131A Exposure apparatus and method for photolithography process |
| 04/22/2009 | CN101414130A Exposure device |
| 04/22/2009 | CN101414129A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414128A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414127A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414126A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414125A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414124A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414123A Photoresist coating method of infrared focal plane deep micro-table plane array machining |
| 04/22/2009 | CN101414122A Photosensitive type polyimides |
| 04/22/2009 | CN101414121A Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device |
| 04/22/2009 | CN101414120A Film for gap layer of holograph recording medium and holograph recording medium |
| 04/22/2009 | CN101414119A Method for building sub-micron or nano-scale formwork by micrometre scale formwork |