| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/29/2009 | EP2053462A1 Electronic circuit device and method for fabricating the same |
| 04/29/2009 | EP2053461A2 Lithographic apparatus having an active damping subassembly. |
| 04/29/2009 | EP2053460A2 Multivariable solver for optical proximity correction |
| 04/29/2009 | EP2053349A2 Method and apparatus for determining properties of a lithographic pattern on a substrate |
| 04/29/2009 | EP2053146A1 Method for manufacturing electroformed mold, electroformed mold, and method for manufacturing electroformed parts |
| 04/29/2009 | EP2052845A2 Device for manufacturing parts |
| 04/29/2009 | EP2052693A1 Process and freeform fabrication system for producing a three-dimensional object |
| 04/29/2009 | EP2052407A2 Methods and devices for forming nanostructure monolayers and devices including such monolayers |
| 04/29/2009 | EP2052295A1 Catadioptric projection objective with pupil mirror. projection exposure apparatus and method |
| 04/29/2009 | EP2052293A2 Antireflective composition for photoresists |
| 04/29/2009 | EP2052292A2 Method of preparing a patterned film with a developing solvent |
| 04/29/2009 | EP1946331B1 Mirror for high power euv lamp system |
| 04/29/2009 | EP1842100A4 Exposure method, method for forming projecting and recessed pattern, and method for manufacturing optical element |
| 04/29/2009 | EP1730225A4 High performance water-based primer |
| 04/29/2009 | EP1639391A4 Using isotopically specified fluids as optical elements |
| 04/29/2009 | EP1423757B1 Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators |
| 04/29/2009 | EP1232517A4 Plasma focus light source with improved pulse power system |
| 04/29/2009 | EP1099982B1 Stable photosensitive resin composition |
| 04/29/2009 | CN201229932Y Pressure stabilizing valve group construction |
| 04/29/2009 | CN201229467Y Draining device for glue evening machine |
| 04/29/2009 | CN101421823A Aberration evaluation pattern,aberration evaluation method,aberration correction method,electron beam drawing apparatus,electron microscope,master,stamper |
| 04/29/2009 | CN101421675A Double exposure photolithographic process |
| 04/29/2009 | CN101421674A Microlithographic illumination system, projection exposure apparatus comprising an illumination system of this type |
| 04/29/2009 | CN101421673A Material of the resist-protecting membrane for immersion lithography |
| 04/29/2009 | CN101421672A Alkali developable solder resist, cured product of the same and printed wiring board obtained using the same |
| 04/29/2009 | CN101421671A Photosensitive element, method for formation of resist pattern, and method for production of print circuit board |
| 04/29/2009 | CN101421311A Resin composition containing catalystic precursor for electroless plating in preparing electro-magentic shielding layer, forming method of metallic patten using the same and metallic pattern formed th |
| 04/29/2009 | CN101419910A Apparatus for fabricating semiconductor device and method thereof |
| 04/29/2009 | CN101419906A Method of forming micro pattern of semiconductor device |
| 04/29/2009 | CN101419411A System and method for lithography simulation |
| 04/29/2009 | CN101419410A Direct image exposure device |
| 04/29/2009 | CN101419409A Exposure device and rectification device of baseal plate |
| 04/29/2009 | CN101419408A Exposal system and control method thereof |
| 04/29/2009 | CN101419407A Stacked photolithography alignment mark |
| 04/29/2009 | CN101419406A Photolithography method for enhancing etching performance |
| 04/29/2009 | CN101419405A Slit coater with medicine treating device |
| 04/29/2009 | CN101419404A Radiation-sensitive composition for blue color filter, color filter and liquid crystal display device |
| 04/29/2009 | CN101419403A Diazo sheet for processing printed circuit board and method for producing the same |
| 04/29/2009 | CN101419402A Method for making cemented carbide punching mold |
| 04/29/2009 | CN101419401A Multiple image concealing false proof process |
| 04/29/2009 | CN101419400A Dry method etching method by chrome metal mask |
| 04/29/2009 | CN101419398A Method for manufacturing mask blank and mehtod for manufacturing photomask |
| 04/29/2009 | CN101419397A Method of fabricating halftone phase shift mask |
| 04/29/2009 | CN101419358A Polymers dispersed liquid crystal light valve and method for making same |
| 04/29/2009 | CN101419309A Optical waveguide for touch screen and touch screen using the same |
| 04/29/2009 | CN101419064A Small gapping place relatively rotating measuring and rotating positioning system and method |
| 04/29/2009 | CN101418051A Photoinitiator contaning asymmetic hexaaryl bis imidazole and preparation method thereof |
| 04/29/2009 | CN101417747A Conveyer table mechanism |
| 04/29/2009 | CN100483672C Fabrication method |
| 04/29/2009 | CN100483638C Method of forming bank, method of forming film pattern, device, and electronic apparatus |
| 04/29/2009 | CN100483625C Exposure apparatus, exposure method and device manufacturing method |
| 04/29/2009 | CN100483624C Coater/developer and coating/developing method |
| 04/29/2009 | CN100483618C Base plate processing device |
| 04/29/2009 | CN100483334C Method for executing model-based optical proximity correction |
| 04/29/2009 | CN100483261C Method of forming photoresist pattern |
| 04/29/2009 | CN100483260C Mixed type optical approximate correcting method based on regular |
| 04/29/2009 | CN100483259C 激光投影系统 Laser projection system |
| 04/29/2009 | CN100483258C Exposure pattern forming method |
| 04/29/2009 | CN100483257C Method and system for imaging interference photoetching adopting white laser |
| 04/29/2009 | CN100483256C Image interference photoetching method using end acousto-optical deflector and its system |
| 04/29/2009 | CN100483255C Infrared light source based on microelectronic mechanical system technique and its preparing method |
| 04/29/2009 | CN100483254C Method for correcting exposure metering device by exposure critical energy value |
| 04/29/2009 | CN100483253C Bi-directional butt jointed exposure method for grating ruler |
| 04/29/2009 | CN100483252C Device and method for producing flexographic plates using digital imaging, for newspaper printing |
| 04/29/2009 | CN100483251C Optical component keeper of exposure equipment |
| 04/29/2009 | CN100483237C Array substrate for ips-mode LCD device and method of fabricating the same |
| 04/29/2009 | CN100483232C TFT LCD array substrate structure and its production method |
| 04/29/2009 | CN100483174C Catadioptric projection objective with intermediate images |
| 04/29/2009 | CN100483172C Projection optical system, explosure device and making process of equipment |
| 04/29/2009 | CN100483161C Slit arrangement and its preparing process |
| 04/29/2009 | CN100483158C Micro-lens forming method by means of wet method side guide |
| 04/29/2009 | CN100482752C Light sensitive anti-solder ink composition, application and circuit board containing the same |
| 04/29/2009 | CN100482358C Substrate processing system, coating apparatus, and coating method |
| 04/29/2009 | CN100482307C Single phase fluid imprint lithography method |
| 04/28/2009 | US7526352 Semiconductor production system |
| 04/28/2009 | US7526158 System and method for high resolution optical imaging, data storage, lithography, and inspection |
| 04/28/2009 | US7525651 Inspection apparatus and inspection method for pattern profile, and exposure apparatus |
| 04/28/2009 | US7525650 Substrate processing apparatus for performing photolithography |
| 04/28/2009 | US7525637 Assembly |
| 04/28/2009 | US7525634 Monitoring apparatus and method particularly useful in photolithographically |
| 04/28/2009 | US7525562 Graphic-arts laser imaging with reduced-length laser cavities and improved performance |
| 04/28/2009 | US7525111 High repetition rate laser produced plasma EUV light source |
| 04/28/2009 | US7524772 Pattern formation method |
| 04/28/2009 | US7524620 For forming a fine pattern in fabrication of semiconductor integrated circuit devices |
| 04/28/2009 | US7524618 Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof |
| 04/28/2009 | US7524617 Polyamic acid, amine (meth)acrylates, amine methacrylamides, non-amine-containing (meth)acrylate compound; photo initiator; sensitizer; developable in aqueous carbonate; electronic circuitry applications, for use in flexible circuits, low curl, low temperature curing, good adhesion |
| 04/28/2009 | US7524616 semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists |
| 04/28/2009 | US7524615 High speed violet or ultraviolet laser sensitive; exposed plate is preferably developed on a processor with an alkaline developer coupled with a replenisher having higher pH |
| 04/28/2009 | US7524614 Negative-working radiation-sensitive compositions and imageable materials |
| 04/28/2009 | US7524613 Interface containing phosphono substituted siloxane |
| 04/28/2009 | US7524611 Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout |
| 04/28/2009 | US7524610 photopolymerizable mixture of oxetane-containing monomers, photoinitiators and solvents, used to form enclosure or nozzle layers for printers or micromechanical system switches; layers having durability, heat and chemical resistance |
| 04/28/2009 | US7524609 showing good pattern profile and pattern collapse resistance, and improved in sensitivity and dissolution contrast in EUV ray exposure |
| 04/28/2009 | US7524607 Water soluble negative tone photoresist |
| 04/28/2009 | US7524606 suitable for image-wise exposure and development as a positive photoresist comprising a positive photoresist composition and an inorganic particle material |
| 04/28/2009 | US7524605 Support and an image recording layer contains an acid generator and a spirooxazine compound; aging stability of colored image formed by exposure and capable of plate detection before development; visibility |
| 04/28/2009 | US7524604 Positive resist composition and method of formation of resist patterns |
| 04/28/2009 | US7524594 norbornene-type polymers; electrical, electronic and optoelectronic devices, that encompass such films |
| 04/28/2009 | US7524534 coating microscope tips with patterning compounds and using the coated tip to apply the compounds to substrate so as to produce a desired patterns; nanolithography |
| 04/28/2009 | US7524441 Color filter composition, method and apparatus for manufacturing a color filter having the same |