Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2014
08/21/2014US20140234778 Method for recycling plate-making processing waste solution
08/21/2014US20140234777 Photosensitive composition, cured film and production process thereof, and electronic part
08/21/2014US20140234776 Photosensitive resin composition and method of forming pattern using the same
08/21/2014US20140234775 Positive-type photosensitive resin composition, and insulating film and oled formed using the same
08/21/2014US20140234774 Photoactive compound and light-sensitive resin composition comprising same
08/21/2014US20140234773 Method of coating resist and resist coating apparatus
08/21/2014US20140234772 Photo resist (pr) profile control
08/21/2014US20140234762 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device
08/21/2014US20140234761 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device
08/21/2014US20140234760 Translucent electromagnetic shield film, producing method therefor and emulsifier
08/21/2014US20140234759 Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern
08/21/2014US20140234758 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same
08/21/2014US20140234589 Methods of patterning block copolymer layers and patterned structures
08/21/2014US20140233031 Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method
08/21/2014US20140233009 Shear-Layer Chuck for Lithographic Apparatus
08/21/2014US20140233008 Illumination optical system, exposure apparatus, device production method, and light polarization unit
08/21/2014US20140233007 Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating device
08/21/2014US20140233006 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
08/21/2014US20140233004 Lithographic apparatus and device manufacturing method
08/21/2014US20140233003 Immersion photolithography system and method using microchannel nozzles
08/21/2014US20140233002 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
08/21/2014US20140233001 Apparatus and method for performing multi-beam based lithography
08/21/2014US20140233000 Method for producing optical orientation film method for producing retardation film, system for producing optical orientation film, optical orientation film and retardation film
08/21/2014US20140232999 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
08/21/2014US20140232997 Index matched grating inscription
08/21/2014US20140231970 Method for processing a carrier, a carrier, an electronic device and a lithographic mask
08/21/2014US20140231729 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device
08/21/2014US20140231388 Guide pattern data correcting method, pattern forming method, and computer readable record medium
08/21/2014US20140231380 Pattern forming method
08/21/2014DE102014209830A1 DUV - Absorberschicht für EUV - SPIEGEL DUV - absorber layer for EUV - SPIEGEL
08/20/2014EP2768016A1 Exposure apparatus and method
08/20/2014EP2767870A2 Method for manufacturing a one-piece micromechanical part comprising at least two separate functional levels
08/20/2014EP2767869A1 Method for manufacturing a one-piece micromechanical part comprising at least two separate levels
08/20/2014EP2767377A1 Method and device for the recovery of the starting material of a multilayer composite with at least one layer with an adhesive surface
08/20/2014EP2766903A1 Chain transfer reagents in polyurethane-based photopolymer formulations
08/20/2014EP2766902A1 Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations
08/19/2014US8811714 Method, apparatus and medium for determining the intensity distribution formed on a pupil plane of an illumination optical system
08/19/2014US8811665 Processing system
08/19/2014US8810915 Optical arrangement of autofocus elements for use with immersion lithography
08/19/2014US8810903 Imaging optical system
08/19/2014US8810784 Method and apparatus for determining a thickness profile of an ophthalmic lens using a single point thickness and refractive index measurements
08/19/2014US8810777 Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system
08/19/2014US8810775 EUV mirror module with a nickel electroformed curved mirror
08/19/2014US8810773 Lithographic method and apparatus
08/19/2014US8810771 Lithographic apparatus and device manufacturing method
08/19/2014US8810768 Environmental system including vacuum scavenge for an immersion lithography apparatus
08/19/2014US8810767 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
08/19/2014US8810766 Method and device for producing contact copies
08/19/2014US8809476 Polymer
08/19/2014US8809411 Hydrophilic coating
08/19/2014US8808976 Photoresist developer and method for fabricating substrate by using the developer thereof
08/19/2014US8808975 Positive resist composition for immersion exposure and pattern-forming method using the same
08/19/2014US8808974 Method for forming pattern
08/19/2014US8808973 Method of forming pattern
08/19/2014US8808971 Method for forming fine patterns of semiconductor device
08/19/2014US8808970 Manufacturing method of semiconductor device
08/19/2014US8808969 Method of making radiation-sensitive sol-gel materials
08/19/2014US8808968 Method of improving surface cure in digital flexographic printing plates
08/19/2014US8808967 Compositions and processes for photolithography
08/19/2014US8808966 Positive resist composition and patterning process
08/19/2014US8808965 Pattern forming method, pattern, chemical amplification resist composition and resist film
08/19/2014US8808964 Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process
08/19/2014US8808961 Composition, resist film, pattern forming method, and inkjet recording method
08/19/2014US8808960 Compound and chemically amplified positive resist composition
08/19/2014US8808959 Resist composition, method of forming resist pattern, novel compound, and acid generator
08/19/2014US8808949 Dye dispersion liquid, photosensitive resin composition for color filters, color filter, liquid crystal display device and organic light emitting display device
08/19/2014US8808798 Coating method
08/19/2014US8808446 Composition for resist underlayer film and process for producing same
08/14/2014WO2014124052A1 Chemical coating for a laser-markable material
08/14/2014WO2014123764A1 Method of forming printed patterns
08/14/2014WO2014123582A1 Block co-polymer photoresist
08/14/2014WO2014123318A1 Thinner composition and use thereof
08/14/2014WO2014122223A1 Lithographic apparatus and device manufacturing method
08/14/2014WO2014122151A2 Lithographic apparatus and method
08/14/2014WO2014122055A1 Masking method for semiconductor devices with high surface topography
08/14/2014WO2014121873A1 Radiation source for an euv optical lithographic apparatus, and lithographic apparatus comprising such a power source
08/14/2014US20140229903 Optical proximity correction for topographically non-uniform substrates
08/14/2014US20140227644 Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
08/14/2014US20140227643 Pattern forming process
08/14/2014US20140227642 Negative resist composition and pattern forming method using the same
08/14/2014US20140227641 Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
08/14/2014US20140227637 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device
08/14/2014US20140227636 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
08/14/2014US20140227538 Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof
08/14/2014US20140226144 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate
08/14/2014US20140226143 Lithography System and Method For Mask Inspection
08/14/2014US20140226142 Mirror system comprising at least one mirror for use for guiding illumination and imaging light in euv projection lithography
08/14/2014US20140226141 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
08/14/2014US20140226139 Novel Lithographic Method with the Capability of Spectrum Engineering to Create Complex Microstructures
08/14/2014US20140226137 Pattern forming method and manufacturing method of semiconductor device
08/14/2014US20140224173 Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
08/14/2014DE19758244B4 Photoresist-Copolymer auf der Basis von Bicycloalkenen, Verfahren zu dessen Herstellung und dessen Verwendung Photoresist-based copolymer of bicycloalkenes, process for its preparation and its use
08/14/2014DE102013214989A1 Variabel einstellbare Spiegelanordnung mit Magnetaktuatoren Variably adjustable mirror assembly with magnetic actuators
08/14/2014DE102013214242A1 Spiegelanordnung für ein Beleuchtungssystem einer Lithographie-Belichtungsanlage sowie Verfahren zum Betreiben der Spiegelanordnung Mirror assembly for a lighting system of a lithographic exposure apparatus and method for operating the mirror assembly
08/14/2014DE102013212367A1 Optisches modul Optical module
08/14/2014DE102013101445A1 Verfahren zur Ermittlung von Verzeichnungseigenschaften eines optischen Systems in einer Messvorrichtung für die Mikrolithographie Procedure for the determination of distortion characteristics of an optical system in a measuring device for microlithography
08/13/2014EP2765595A1 Exposure apparatus, exposure method, and method for producing a device
08/13/2014EP2765458A2 Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
08/13/2014EP2765457A1 Composition for forming silicon-containing euv resist underlayer film
08/13/2014EP2765456A1 Masking method for semiconductor devices with high surface topography
1 ... 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 ... 1272