| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/06/2009 | CN100485531C Pixel structure and manufacturing method therefor |
| 05/06/2009 | CN100485530C Integrated optical metrology and lithographic process system for dynamic critical dimension control |
| 05/06/2009 | CN100485529C A system for positioning a product |
| 05/06/2009 | CN100485528C System and method for reducing disturbances induced by movement in immersion photolithography |
| 05/06/2009 | CN100485527C Method for detecting imaging quality of photoetching machine |
| 05/06/2009 | CN100485526C Corrosion-resisting pattern-thickening material and process for forming the same, and semiconductor device and process for manufacturing the same |
| 05/06/2009 | CN100485525C Manufacturing process of MEMS impression template based on wet etching |
| 05/06/2009 | CN100485524C Method for producing quartz/AZ photoresist ultraviolet photoetched mask |
| 05/06/2009 | CN100485522C Image exposure apparatus |
| 05/06/2009 | CN100485476C Manufacturing method of liquid crystal display |
| 05/06/2009 | CN100485470C Liquid crystal display device and method for manufacturing the same |
| 05/06/2009 | CN100485350C Method and system for determining characteristics of substrates employing fluid geometries |
| 05/06/2009 | CN100485257C Light source device |
| 05/06/2009 | CN100484767C Imaging device for a printing form |
| 05/05/2009 | US7529595 Method of controlling substrate processing apparatus and substrate processing apparatus |
| 05/05/2009 | US7529158 Optical near-field generator and recording apparatus using the optical near-field generator |
| 05/05/2009 | US7529046 Optical element |
| 05/05/2009 | US7528935 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/05/2009 | US7528930 Exposure apparatus and device manufacturing method |
| 05/05/2009 | US7528929 Lithographic apparatus and device manufacturing method |
| 05/05/2009 | US7528536 Protective layer for corrosion prevention during lithography and etch |
| 05/05/2009 | US7528395 Radiation source, lithographic apparatus and device manufacturing method |
| 05/05/2009 | US7528188 Resin solution and method of forming a protection layer |
| 05/05/2009 | US7528098 Semiconductor process residue removal composition and process |
| 05/05/2009 | US7527920 Active hardmask for lithographic patterning |
| 05/05/2009 | US7527918 Pattern forming method and method for manufacturing a semiconductor device |
| 05/05/2009 | US7527917 Exposure method and exposure apparatus |
| 05/05/2009 | US7527916 Photopolymerizable composition |
| 05/05/2009 | US7527915 Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto |
| 05/05/2009 | US7527913 (Phenyl or naphthyl)carbonylethyl tetramethylenesulfonium, phenyl tetramethylenesulfonium or triphenylsulfonium salts of an adamantyl, 4-10 carbon carbocyclic, or 7-oxabyicyclo[2.2.2]octan-1-yl-substituted 1-(carbonyloxy)-1,1-difluoroalkylsulfonic acid; uniform profile |
| 05/05/2009 | US7527912 chemically amplified resists; generates a sulfonic acid upon exposure to high energy radiation; ArF immersion microlithography; line edge roughness; sulfonium or iodonium salts, oximes and imides of1,1,3,3,3-pentafluoro-2-acyloxypropane-1-sulfonates having a carbonyl or carboxyl group |
| 05/05/2009 | US7527911 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition |
| 05/05/2009 | US7527910 Salt suitable for an acid generator and a chemically amplified resist composition containing the same |
| 05/05/2009 | US7527909 Resist composition |
| 04/30/2009 | WO2009055628A1 Process and materials for making contained layers and devices made with same |
| 04/30/2009 | WO2009054705A2 Film type transfer material |
| 04/30/2009 | WO2009054541A2 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 04/30/2009 | WO2009054520A1 Exposure apparatus and exposure method |
| 04/30/2009 | WO2009054487A1 Polyimide precursor and photosensitive resin composition containing polyimide precursor |
| 04/30/2009 | WO2009054413A1 Semiconductor device manufacturing method |
| 04/30/2009 | WO2009054238A1 Lithographic printing plate material |
| 04/30/2009 | WO2009054173A1 Exposure apparatus and exposure method |
| 04/30/2009 | WO2009053832A2 Bottom antireflective coating compositions |
| 04/30/2009 | WO2009053586A2 Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method. |
| 04/30/2009 | WO2009053476A1 Cleaning of an optical system using radiation energy |
| 04/30/2009 | WO2009053100A1 Process and freeform fabrication system for producing a three-dimensional object |
| 04/30/2009 | WO2009053099A1 Process and freeform fabrication system for producing a three-dimensional object |
| 04/30/2009 | WO2009053023A2 Imaging optical system and projection exposure apparatus for microlithography comprising an imaging optical system of this type |
| 04/30/2009 | WO2009053001A1 Optical device with improved imaging behaviour and method therefor |
| 04/30/2009 | WO2009052962A1 Imaging optical system and projection exposure installation |
| 04/30/2009 | WO2009052932A1 Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type |
| 04/30/2009 | WO2009052925A1 Imaging optical system, projection exposure installation for micro-lithography comprising an imaging optical system of this type, and method for producing a microstructured component with a projection exposure installation of this type |
| 04/30/2009 | WO2009052706A1 A rinse solution for removal of plasm etching residues |
| 04/30/2009 | WO2009033639A3 Method for cleaning vacuum chambers for extreme uv lithography devices |
| 04/30/2009 | WO2009022224A3 Antireflective coating composition |
| 04/30/2009 | WO2008156557A3 Method using highly alkaline developer regenerator composition |
| 04/30/2009 | WO2008146946A3 Exposure method and apparatus, and method for producing device |
| 04/30/2009 | WO2008070087A3 Method for patterning a surface |
| 04/30/2009 | WO2007053363A3 Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| 04/30/2009 | WO2007012023A3 Method and apparatus for processing flexographic printing plates |
| 04/30/2009 | WO2006116032A3 Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor |
| 04/30/2009 | WO2006091523A3 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions |
| 04/30/2009 | WO2005097883A3 Method of producing a crosslinked coating in the manufacture of integrated circuits |
| 04/30/2009 | US20090111726 Compounds for Photoresist Stripping |
| 04/30/2009 | US20090111062 Pattern Formation Method |
| 04/30/2009 | US20090111061 Methods of Minimizing Etch Undercut and Providing Clean Metal Liftoff |
| 04/30/2009 | US20090111060 Exposure method |
| 04/30/2009 | US20090111059 Patterning Method of Semiconductor Device |
| 04/30/2009 | US20090111058 Method of Forming Micro Pattern of Semiconductor Device |
| 04/30/2009 | US20090111057 Photoimageable branched polymer |
| 04/30/2009 | US20090111056 Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniques |
| 04/30/2009 | US20090111054 Negative resist composition and method of forming resist pattern |
| 04/30/2009 | US20090111053 Positive resist composition and pattern forming method using the same |
| 04/30/2009 | US20090111052 flexographic, lithographic printing plate precursors; polythiol compounds; hardness |
| 04/30/2009 | US20090111051 Radically polymerizable component,an initiator, a radiation absorbing compound,a polymeric binder |
| 04/30/2009 | US20090111050 Novel Photosensitive Resin Compositions |
| 04/30/2009 | US20090111049 Lithographic printing plate precursor |
| 04/30/2009 | US20090111048 Alkali-developable black photosensitive resin composition for forming light-shielding barrier wall |
| 04/30/2009 | US20090111047 acid generators; semiconductors; aging resistance |
| 04/30/2009 | US20090111046 Direct laser and ultraviolet lithography of porous silicon photonic crystal devices |
| 04/30/2009 | US20090111035 Binary mask, method for fabricating the binary mask, and method for fabricating fine pattern of semiconductor device using binary mask |
| 04/30/2009 | US20090111032 EUVL Mask, Method of Fabricating the EUVL Mask, and Wafer Exposure Method Using the EUVL Mask |
| 04/30/2009 | US20090110917 Electronic Package and Method of Preparing Same |
| 04/30/2009 | US20090110891 Transparent thin film, optical device and method for manufacturing the same |
| 04/30/2009 | US20090110887 Lithographic Printing Plate Precursor |
| 04/30/2009 | US20090110832 Planographic printing plate material, planographic printing plate, planographic printing plate preparing process and printing process employing planographic printing plate |
| 04/30/2009 | US20090109569 Apparatus, system, and method for guided growth of patterned media using monodisperse nanospheres |
| 04/30/2009 | US20090109419 Supporting plate, stage device, exposure apparatus, and exposure method |
| 04/30/2009 | US20090109418 Wafer table for immersion lithography |
| 04/30/2009 | US20090109364 Exposing device, methods for forming pattern, channel, and hole by using the same, and liquid crystal display device therewith and method for fabricating the same |
| 04/30/2009 | DE102008050547A1 Direct image exposure device, has exposure table to which exposure object is assigned, where specific section of exposure object is defined by moving device and is exposed by exposed light by illuminating body |
| 04/30/2009 | DE102008043162A1 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik The imaging optics and projection exposure system for microlithography with such imaging optics |
| 04/30/2009 | DE102008042917A1 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik The imaging optics and projection exposure system for microlithography with such imaging optics |
| 04/30/2009 | DE102008041262A1 Arrangement of optical element in mount using adhesive, comprises connecting the optical element and part of the mount, and heating component provided in the element/mount for hardening, modifying, drying and/or aging the adhesive |
| 04/30/2009 | DE102008038837A1 Laserdirektabbildungsvorrichtung Laser direct imaging device |
| 04/30/2009 | DE102007051669A1 Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage The imaging optics, projection exposure system for microlithography with such an imaging optical system and method for producing a micro-structured component with such a projection exposure apparatus |
| 04/30/2009 | DE102007051145A1 Device for machining surface of substrate for manufacturing microstructure on surface, has carrier moving relative to substrate which is formed for arranging tool on carrier |
| 04/29/2009 | EP2053465A1 Positive resist processing liquid composition and liquid developer |
| 04/29/2009 | EP2053464A1 Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufacturing thereby |
| 04/29/2009 | EP2053463A1 Detection of contamination in EUV systems |