| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/07/2009 | WO2009058278A1 Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions |
| 05/07/2009 | WO2009058277A1 Novel nitrile and amidoxime compounds and methods of preparation |
| 05/07/2009 | WO2009057822A1 Optical unit, illumination optical apparatus, exposure apparatus, exposure method, and device manufacturing method |
| 05/07/2009 | WO2009057769A1 Novel sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent |
| 05/07/2009 | WO2009057700A1 Transfer method and transfer device |
| 05/07/2009 | WO2009057638A1 Positive photosensitive resin composition, method for forming pattern, electronic component |
| 05/07/2009 | WO2009057632A1 Apparatus for connecting utility medium supply member, stage apparatus, apparatus for supporting projection optical system, and exposure apparatus |
| 05/07/2009 | WO2009057484A1 Radiation sensitive resin composition and polymer |
| 05/07/2009 | WO2009057465A1 Planographic printing plate material and aluminum support |
| 05/07/2009 | WO2009057458A1 Composition for forming resist underlayer film and method of forming resist pattern from the same |
| 05/07/2009 | WO2009057411A1 Negative-working resist for formation of protrusions for liquid crystal alignment |
| 05/07/2009 | WO2009057408A1 Photosensitive material for lithographic printing plate and process for producing lithographic printing plate |
| 05/07/2009 | WO2009056908A1 Apparatus and method for removing coating material from a semiconductor wafer |
| 05/07/2009 | WO2009056440A1 Pad microprinting device and methods, and pad for this device |
| 05/07/2009 | WO2009035129A3 Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
| 05/07/2009 | WO2009014439A3 Debris prevention system and lithographic apparatus |
| 05/07/2009 | WO2008051232A3 Compensation of effects of atmospheric perturbations in optical metrology |
| 05/07/2009 | US20090119069 Method for determining relative swing curve amplitude |
| 05/07/2009 | US20090117499 Cleaning solution for immersion photolithography system and immersion photolithograph process using the cleaning solution |
| 05/07/2009 | US20090117498 forming photoresist layer including photosensitizer with high thermal decomposition temperature on semiconductor substrate, exposing photoresist layer, developing selectively exposed resist layer, decomposing photosensitizer; heat shrinkage |
| 05/07/2009 | US20090117497 Method of forming pattern using fine pitch hard mask |
| 05/07/2009 | US20090117496 Method for treating surface of element |
| 05/07/2009 | US20090117495 Method for forming a pattern in a semiconductor device and method for manufacturing a flash memory device |
| 05/07/2009 | US20090117494 Controller for optical device, exposure method and apparatus, and method for manufacturing device |
| 05/07/2009 | US20090117493 Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound |
| 05/07/2009 | US20090117492 Method for forming fine pattern in semiconductor device |
| 05/07/2009 | US20090117491 Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniques |
| 05/07/2009 | US20090117490 Positive resist composition for immersion lithography and method for forming resist pattern |
| 05/07/2009 | US20090117489 Compositons and processes for immersion lithography |
| 05/07/2009 | US20090117488 Compound, positive resist composition and resist pattern forming method |
| 05/07/2009 | US20090117346 Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same |
| 05/07/2009 | US20090117344 Method of correcting mask pattern, photo mask, method of manufacturing semiconductor device, and semiconductor device |
| 05/07/2009 | US20090116786 Multi-Channel Dispersion Compensator |
| 05/07/2009 | US20090116036 Device and Method for the Optical Measurement of an Optical System, Measurement Structure Support, and Microlithographic Projection Exposure Apparatus |
| 05/07/2009 | US20090115989 Lighting optical system, exposure system, and exposure method |
| 05/07/2009 | US20090115986 Microlithography projection objective |
| 05/07/2009 | US20090115978 Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate |
| 05/07/2009 | US20090115675 Planar antenna |
| 05/07/2009 | US20090114922 Semiconductor device and method for manufacturing the same, liquid crystal television, and el television |
| 05/07/2009 | US20090114816 Advanced Roughness Metrology |
| 05/07/2009 | US20090114618 Method of making hierarchical articles |
| 05/07/2009 | US20090114108 Lithographic printing plate precursor and lithographic printing method |
| 05/07/2009 | US20090114000 Nanoprobe tip for advanced scanning probe microscopy comprising a layered probe material patterned by lithography and/or fib techniques |
| 05/07/2009 | DE102007051671A1 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik The imaging optics and projection exposure system for microlithography with such imaging optics |
| 05/06/2009 | EP2056165A1 Photo plot method and assembly for recording a halftone image stored on a computer on a level photosensitive recording medium |
| 05/06/2009 | EP2056164A1 Cleaning apparatus and immersion lithographic apparatus |
| 05/06/2009 | EP2056163A1 Positive photosensitive resin composition |
| 05/06/2009 | EP2056162A1 Compositions and processes for immersion lithography |
| 05/06/2009 | EP2056129A1 Optical element, method for manufacturing master for manufacturing optical element, and photoelectric conversion device |
| 05/06/2009 | EP2055726A1 Thiourethane compound and photosensitive resin composition |
| 05/06/2009 | EP2054772A2 Exposure apparatus |
| 05/06/2009 | EP2054771A2 Lithography system, method of heat dissipation and frame |
| 05/06/2009 | EP2054770A2 Sensitizer dyes for photoacid generating systems using short visible wavelengths |
| 05/06/2009 | EP2054769A1 Uv-dosis indicators |
| 05/06/2009 | EP2003161A9 Multifunctional oxetanyl group-containing ultraviolet-curable resin composition |
| 05/06/2009 | EP1789849B1 Use of methanofullerene derivatives as resist materials and method for forming a resist layer |
| 05/06/2009 | EP1633545A4 Method to reduce adhesion between a conformable region and a pattern of a mold |
| 05/06/2009 | EP1574528B1 Novel photosensitive resin based on saponified polyvinyl acetate, photosensitive resin composition, method of forming aqueous gel from the same, and compound |
| 05/06/2009 | EP1567915A4 Pattern forming materials and pattern formation method using the materials |
| 05/06/2009 | CN201233505Y Immersion control device used for photo-etching machine |
| 05/06/2009 | CN101427184A 光刻系统和投影方法 Projection lithography system and method |
| 05/06/2009 | CN101427183A Composition for forming lower layer film and pattern forming method |
| 05/06/2009 | CN101427182A Composite patterning devices for soft lithography |
| 05/06/2009 | CN101426957A Substrate support system and method |
| 05/06/2009 | CN101426659A 印刷版材料 Printing plate material |
| 05/06/2009 | CN101424889A Method for regenerating stripping solution from stripping waste liquid and regeneration device |
| 05/06/2009 | CN101424888A Combination for tripping photoresist, tripping method and making method of display divice |
| 05/06/2009 | CN101424887A Semiconductor wafer metal substrate web corrosion prevention liquid and its use method |
| 05/06/2009 | CN101424886A Developing method and developer coating apparatus |
| 05/06/2009 | CN101424885A Mask alignment system and method thereof |
| 05/06/2009 | CN101424884A Lithographic apparatus immersion damage control |
| 05/06/2009 | CN101424883A Exposure system and device producing method |
| 05/06/2009 | CN101424882A Exposing device, methods for forming pattern, channel, and hole by using the same, and liquid crystal display device therewith and method for fabricating the same |
| 05/06/2009 | CN101424881A Lithography protection apparatus |
| 05/06/2009 | CN101424880A Straight writing photolithography method by utilizing micro-nano fiber |
| 05/06/2009 | CN101424879A Resistance straining reaction type closed-loop two-dimension flexible hinge work bench |
| 05/06/2009 | CN101424878A Method for making high W/N ratio T-shaped gate by once electron beam exposure |
| 05/06/2009 | CN101424877A Photoresists comprising novolak resin blends |
| 05/06/2009 | CN101424876A Pattern formation method |
| 05/06/2009 | CN101424846A TFT-LCD array substrate, liquid crystal display panel and method for producing same |
| 05/06/2009 | CN101424844A Method for manufacturing LCD array substrate |
| 05/06/2009 | CN101424837A Method for manufacturing LCD array substrate |
| 05/06/2009 | CN101424836A Method for manufacturing LCD array substrate |
| 05/06/2009 | CN101424835A Method for manufacturing LCD array substrate |
| 05/06/2009 | CN101424814A PDLC grating of lcd equipment and making method |
| 05/06/2009 | CN101424760A Color filter and method for manufacturing the same |
| 05/06/2009 | CN101424758A Negative refraction artificial material based on iron-clad |
| 05/06/2009 | CN101424751A Optical element and method for manufacturing master for producing optical element |
| 05/06/2009 | CN101424513A Position measurement system and lithographic apparatus |
| 05/06/2009 | CN101423682A Co-extruded compositions for high aspect ratio structures |
| 05/06/2009 | CN100485953C Substrate for organic EL and method for manufacturing the same |
| 05/06/2009 | CN100485883C Plasma ashing method |
| 05/06/2009 | CN100485865C Exposure device and device manufacturing method |
| 05/06/2009 | CN100485864C EUV light source, EUV exposure equipment and semiconductor device manufacturing method |
| 05/06/2009 | CN100485863C Substrate processing method and substrate processing apparatus |
| 05/06/2009 | CN100485862C Exposure apparatus, exposure method, and method for producing device |
| 05/06/2009 | CN100485535C Step scan projection photoetching machine synchronous controller |
| 05/06/2009 | CN100485534C Step scan projection photoetching machine synchronous control system |
| 05/06/2009 | CN100485533C Substrate processing system and method |
| 05/06/2009 | CN100485532C Antireflective film and exposure method |