| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/14/2009 | US20090121383 Fibrillar Microstructure and Processes for the Production Thereof |
| 05/14/2009 | US20090121325 Method for producing a thin film transistor and a device of the same |
| 05/14/2009 | US20090120903 Method of multi-stage substrate etching and terahertz oscillator manufactured using the same method |
| 05/14/2009 | US20090120457 Compositions and method for removing coatings and preparation of surfaces for use in metal finishing, and manufacturing of electronic and microelectronic devices |
| 05/14/2009 | DE112007001551T5 Verfahren und Vorrichtung zum Aufbringen von Mustern aus nicht zusammenhängenden Merkmalen Method and device for applying patterns of non-contiguous features |
| 05/14/2009 | DE10355599B4 Verfahren zur Durchführung einer lithographischen Belichtung mithilfe polarisierter elektromagnetischer Strahlung in einer lithographischen Belichtungseinrichtung A method for performing lithographic exposure by using polarized electromagnetic radiation in a lithographic exposure means |
| 05/14/2009 | DE102007052052A1 Defects e.g. crystal growth defect, detecting method for photo-lithography mask i.e. reticle, to produce microstructure e.g. integrated circuit, involves inspecting defect on set of images to evaluate presence of repeating defects in images |
| 05/14/2009 | DE102007051459A1 Reinigung eines optischen Systems mittels Strahlungsenergie Cleaning an optical system by radiation energy |
| 05/14/2009 | DE102007009334B4 Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauelemente mit einer derartigen Projektionsbelichtungsanlage Projection exposure system for microlithography and processes for microlithography production of microstructured components having such a projection exposure apparatus |
| 05/14/2009 | CA2742844A1 Fabrication of silk fibroin photonic structures by nanocontact imprinting |
| 05/13/2009 | EP2058703A1 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus |
| 05/13/2009 | EP2058702A1 Photosensitive composition comprising organic-zirconia composite microparticle |
| 05/13/2009 | EP2058108A2 Patterned roll for casting a patterned surface onto an opaque web |
| 05/13/2009 | EP2058107A1 Device for uniformly structuring substrates |
| 05/13/2009 | EP2057629A1 Drawing method, drawing device, and information recording medium |
| 05/13/2009 | EP2057507A1 Method of imaging and developing negative-working elements |
| 05/13/2009 | EP2057506A1 A method and a system for reducing overlay errors within exposure fields by apc control strategies |
| 05/13/2009 | EP2057446A2 Optical filter and method for the production of the same, and device for the examination of electromagnetic radiation |
| 05/13/2009 | EP1681594B1 Composition for forming underlying film containing dextrin ester compound |
| 05/13/2009 | EP1668417B1 Photopolymerizable composition. |
| 05/13/2009 | EP1586005A4 High sensitivity resist compositions for electron-based lithography |
| 05/13/2009 | EP1429185B1 Etching method and use of a composition for forming etching protective layer |
| 05/13/2009 | EP1063684B1 Method for producing a projection optical system |
| 05/13/2009 | CN201237696Y Mask positioning affirmation apparatus |
| 05/13/2009 | CN201237662Y Movable lens apparatus |
| 05/13/2009 | CN201236018Y Light shield box and limitation member thereof |
| 05/13/2009 | CN101432839A Photocurable conductive paste and photocurable black paste used for forming bus electrode having two-layer structure, and plasma display panel |
| 05/13/2009 | CN101432661A Photosensitive resin laminate |
| 05/13/2009 | CN101432660A Curable composition, cured product, color filter, and liquid crystal display device |
| 05/13/2009 | CN101432659A 感光性树脂组合物及感光性薄膜 The photosensitive resin composition and a photosensitive film |
| 05/13/2009 | CN101432139A Bakeable radiation-sensitive elements with a high resistance to chemicals |
| 05/13/2009 | CN101431015A Plasma surface treatment to prevent pattern collapse in immersion lithography |
| 05/13/2009 | CN101431008A Substrate treatment device, coating device and coating method |
| 05/13/2009 | CN101430566A Method for controlling etching deviation |
| 05/13/2009 | CN101430510A Stripping liquid used for removing colorful photoresist and protection layer in colorful filter production |
| 05/13/2009 | CN101430509A Immersion lithography fluids |
| 05/13/2009 | CN101430508A Device and method for supplying fluid for immersion lithography |
| 05/13/2009 | CN101430507A Wet lamination of photopolymerizable dry films onto substrates and compositions relating thereto |
| 05/13/2009 | CN101430506A Photo-curing resin composition, design of cured composition and printed circuit board |
| 05/13/2009 | CN101430505A Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
| 05/13/2009 | CN101430504A Element surface processing method |
| 05/13/2009 | CN101430503A Double-layer glue removing method used for electron beam lithography stripping |
| 05/13/2009 | CN101430499A Storage container for photomask-forming synthetic quartz glass substrate |
| 05/13/2009 | CN101430464A LCD and manufacturing method thereof |
| 05/13/2009 | CN101430424A Contaminant removing method, and exposure method |
| 05/13/2009 | CN101430423A Contaminant removing method, and exposure method |
| 05/13/2009 | CN101430395A Real-time monitoring device for light exposure in holographic grating production |
| 05/13/2009 | CN101430385A Improved spring leaf production technology |
| 05/13/2009 | CN100487884C Gantry positioning system |
| 05/13/2009 | CN100487867C Device manufacturing method and substrate |
| 05/13/2009 | CN100487866C Method for forming a mask pattern for ion-implantation |
| 05/13/2009 | CN100487861C Plasma etching method and apparatus |
| 05/13/2009 | CN100487860C Stage system, exposure apparatus and exposure method |
| 05/13/2009 | CN100487587C Substrate type developing device |
| 05/13/2009 | CN100487586C Method of manufacturing semiconductor device |
| 05/13/2009 | CN100487585C Exposure worktable and exposure device |
| 05/13/2009 | CN100487584C Nano photoetching optical apparatus based on plasma ion wave |
| 05/13/2009 | CN100487583C Method and system for lithographic process window optimization |
| 05/13/2009 | CN100487582C Lithographic apparatus and device manufacturing method |
| 05/13/2009 | CN100487581C Lithographic apparatus and device manufacturing method |
| 05/13/2009 | CN100487580C Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/13/2009 | CN100487579C Lithographic apparatus, method of calibrating, and device manufacturing method |
| 05/13/2009 | CN100487578C Lighographic processing method and device made therefrom |
| 05/13/2009 | CN100487577C Position correction in y of mask object shift due to Z offset and non-perpendicular illumination |
| 05/13/2009 | CN100487576C Transferring equipment used for transferring matter and its use method and photoetching projection equipment containing said transferring equipment |
| 05/13/2009 | CN100487575C Photoetching apparatus and device manufacturing method |
| 05/13/2009 | CN100487574C Method for making optical projection apparatus and device |
| 05/13/2009 | CN100487573C Method for detemining photoetching projection parameter, device producing method and device |
| 05/13/2009 | CN100487572C Photoetching projector with multi-suppressing silk screen and method for manufacturing the integrated structure |
| 05/13/2009 | CN100487571C Negative photosensitive resin composition containing expoxy compound |
| 05/13/2009 | CN100487569C A photosensitive-thermosensitive microcapsule and photosensitive-thermosensitive recording material containing same |
| 05/13/2009 | CN100487534C Liquid crystal display device and method of manufacture thereof |
| 05/13/2009 | CN100487520C Apparatus for providing a pattern of polarization |
| 05/13/2009 | CN100487500C Black composition and its production method |
| 05/13/2009 | CN100486963C 锍盐化合物 Sulfonium salt compound |
| 05/13/2009 | CN100486809C Method and device for imaging a printing form |
| 05/12/2009 | US7532306 Microlithographic projection exposure apparatus |
| 05/12/2009 | US7532304 Lithographic apparatus and device manufacturing method |
| 05/12/2009 | US7531492 Aqueous solution of sulfuric acid, hydrogen peroxide, H2SiF6, HBF4; clean residual polymers from aluminium or aluminium-containing surfaces, during the production of semiconductor elements |
| 05/12/2009 | US7531297 Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern |
| 05/12/2009 | US7531296 Method of forming high etch resistant resist patterns |
| 05/12/2009 | US7531295 Positioning a reticle relative to a substrate; directing electromagnetic radiation onto the reticle, the electromagnetic radiation having a first portion propagating onto reticle in first direction and being incident on the reticle at a first angle and a second portion propagating in a second direction |
| 05/12/2009 | US7531294 Forming film pattern over a substrate, forming a second film pattern which is curved on the surface of first film pattern or substrate, and forming film pattern by irradiating the first film pattern with light with second film pattern and modifying part of the second film pattern; cost efficiency |
| 05/12/2009 | US7531293 Radiation sensitive self-assembled monolayers and uses thereof |
| 05/12/2009 | US7531291 Laser-decomposable resin composition and laser-decomposable pattern-forming material and flexographic printing plate precursor of laser engraving type using the same |
| 05/12/2009 | US7531290 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| 05/12/2009 | US7531289 4,4-difluoro-5-hydroxy-3-methyl-5-trifluoromethyloxolane-3-yl methacrylate; useful as raw materials for the synthesis of functional materials, pharmaceutical and agricultural chemicals, to produce polymers for the manufacture of radiation-sensitive resist having high transparency |
| 05/12/2009 | US7531288 Negative-working excellent in preservation stability and exhibits high sensitivity and good printing durability; hydrophilic support; and a photosensitive layer containing a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder |
| 05/12/2009 | US7531287 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| 05/12/2009 | US7531286 Radiation-sensitive resin composition |
| 05/12/2009 | US7531275 A molecular sieve that prevents airborne molecular contaminants generated during a lithography process from contaminating the photomask is associated with the pellicle frame. |
| 05/12/2009 | US7531104 Micro-optic elements and method for making the same |
| 05/12/2009 | US7531103 Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium |
| 05/12/2009 | US7531025 Method of creating a turbulent flow of fluid between a mold and a substrate |
| 05/12/2009 | US7530778 High-Performance non-contact support platforms |
| 05/12/2009 | US7530749 Coater/developer and coating/developing method |
| 05/12/2009 | US7530241 Method for knitting denim |
| 05/07/2009 | WO2009059089A1 Method for replicating master molds |
| 05/07/2009 | WO2009059031A2 Photoimageable branched polymer |
| 05/07/2009 | WO2009058288A1 Amidoxime compounds as chelating agents in semiconductor processes |