| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/20/2009 | CN101436001A Exposure apparatus, and method for manufacturing device |
| 05/20/2009 | CN101436000A Exposure apparatus, method for manufacturing device, and method for controlling exposure apparatus |
| 05/20/2009 | CN101435999A Device for automatically regulating illumination intensity of exposure machine |
| 05/20/2009 | CN101435998A Method for reducing photolithography aligning partial difference caused by photoetching machine lens distortion |
| 05/20/2009 | CN101435997A Test pattern of photolithography sleeve engraving accuracy and measuring method thereof |
| 05/20/2009 | CN101435996A Sensitizing type medium powder coating and method for preparing cathode insulation layer by the same |
| 05/20/2009 | CN101435995A Light-sensitive compound and photoresist composition comprising the same |
| 05/20/2009 | CN101435994A Even glue chromium plate optical filter turnover engraving process |
| 05/20/2009 | CN101435993A Colorful optical filter and manufacturing method thereof |
| 05/20/2009 | CN101435992A Photoresist masking method |
| 05/20/2009 | CN101435991A Method for making colorful optical filter |
| 05/20/2009 | CN101435990A Mask plate and manufacturing method thereof |
| 05/20/2009 | CN101435960A Liquid crystal display device array substrate and manufacturing method thereof |
| 05/20/2009 | CN101434894A Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 05/20/2009 | CN101434757A Optical high contrast pigment, and color light sensitive composition and preparation thereof |
| 05/20/2009 | CN101434682A Polymer resin composition |
| 05/20/2009 | CN100490124C Method for manufacturing a display device and method for forming a pattern |
| 05/20/2009 | CN100490109C Level adjustment systems and adjustable pin chuck thereof |
| 05/20/2009 | CN100490068C Plate member, substrate holding device, exposure device and method, and element manufacturing method |
| 05/20/2009 | CN100490067C Substrate processing apparatus, use state ascertaining method, and false use preventing method |
| 05/20/2009 | CN100490065C Support method and support structure for optical member, optical apparatus, exposure apparatus, and device production method |
| 05/20/2009 | CN100490064C Exposing device and exposing method, and device manufacturing method |
| 05/20/2009 | CN100490063C Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment |
| 05/20/2009 | CN100489667C Method for decreasing optical near effect error in photoetching process |
| 05/20/2009 | CN100489666C Immersion lithography systems |
| 05/20/2009 | CN100489665C Method for forming a lithography pattern |
| 05/20/2009 | CN100489664C Optical approach effect compensation process of photoetching technology |
| 05/20/2009 | CN100489663C Method for producing COB-DRAM bit line with nitrogen-oxygen-nitrogen SAC structure |
| 05/20/2009 | CN100489662C Lithographic apparatus and device manufacturing method |
| 05/20/2009 | CN100489661C Lithographic printing plate support and production method thereof |
| 05/20/2009 | CN100489631C TFT LCD array substrate structure and its production method |
| 05/20/2009 | CN100489616C Liquid-crystal device and production thereof |
| 05/19/2009 | US7536660 OPC simulation model using SOCS decomposition of edge fragments |
| 05/19/2009 | US7536023 Hearing aid |
| 05/19/2009 | US7535817 Nanometer scale data storage device and associated positioning system |
| 05/19/2009 | US7535578 Lithographic apparatus and interferometer system |
| 05/19/2009 | US7535552 Moving/guiding apparatus and exposure apparatus using the same |
| 05/19/2009 | US7535550 Exposure apparatus, exposure method, and method for producing device |
| 05/19/2009 | US7535549 System and method for improvement of alignment and overlay for microlithography |
| 05/19/2009 | US7534880 Clear photopolymerizable systems for the preparation of high thickness coatings |
| 05/19/2009 | US7534820 photocurable polyisobutene or polyoxypropylene glycol endcapped with epoxy group-containing silicon compound or copolymerized with polysiloxanes; excellent curability by irradiation of a light energy source within a short time, no need moisture and heating; adhesive, sealant; storage stability |
| 05/19/2009 | US7534752 Post plasma ashing wafer cleaning formulation |
| 05/19/2009 | US7534557 Production method for electroluminescent element |
| 05/19/2009 | US7534555 Plating using copolymer |
| 05/19/2009 | US7534554 Photoacid generator, a quencher and a salt having a buffering function for an acid which is generated by the acid generator, wherein said buffer is a salt of a long chain alkyl(oxy)benzenesulfonic acid with an organic amine; damascene; solves problem of photoresist remaining in the via hole |
| 05/19/2009 | US7534553 preparing substrate defined as active regions and inactive regions and provided with plurality of conductive patterns; forming buffer layer over conductive patterns; forming organic material having fluidity better than photoresist layer on buffer layer; forming photoresist layer over organic material |
| 05/19/2009 | US7534552 Lithographic apparatus and device manufacturing method |
| 05/19/2009 | US7534551 Planographic printing plate material |
| 05/19/2009 | US7534550 improve lithography characteristics, and reduction in defects; increase solubility in developing solution under the action of acid which is generated by acid generator on irradiation; tetra- or tripolymers contains monomers of methacrylic acid, adamantyl methacrylate, butyrolactone acrylate |
| 05/19/2009 | US7534549 Prevents collapse of patterns when photoresist patterns; for photolithography |
| 05/19/2009 | US7534548 Polymer for immersion lithography and photoresist composition |
| 05/19/2009 | US7534547 Fineness patterns; semiconductors, integrated circuits |
| 05/19/2009 | US7534544 using a donor element in a radiation-induced thermal transfer process, an assemblage is provided that includes a donor element and a receiver element, wherein the donor element has a support layer and a transfer layer |
| 05/19/2009 | US7534533 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 05/19/2009 | US7534531 Full phase shifting mask in damascene process |
| 05/19/2009 | US7534468 Process for obtaining spatially-organised nanostructures on thin films |
| 05/19/2009 | US7534412 Large-volume CaF2 single crystals with reduced scattering and improved laser stability, and uses thereof |
| 05/19/2009 | US7534359 Process for producing structure, structure thereof, and magnetic recording medium |
| 05/19/2009 | CA2285420C Ternary photoinitiator system for curing of epoxy resins |
| 05/14/2009 | WO2009062011A1 Method of forming a locally periodic 3d structure with larger-scale variation in periodic properties and applications thereof |
| 05/14/2009 | WO2009061823A1 Fabrication of silk fibroin photonic structures by nanocontact imprinting |
| 05/14/2009 | WO2009061737A1 Counter-balanced substrate support |
| 05/14/2009 | WO2009061527A1 Method and system for obtaining bounds on process parameters for opc-verification |
| 05/14/2009 | WO2009061280A1 Polymeric microfluidic devices from liquid thermoset precursors |
| 05/14/2009 | WO2009061196A1 Lithographic projection apparatus and method of compensating perturbation factors |
| 05/14/2009 | WO2009061192A1 Radiation system and method, and a spectral purity filter |
| 05/14/2009 | WO2009061188A2 Method and system for determining a suppression factor of a suppression system and a lithographic apparatus |
| 05/14/2009 | WO2009061159A2 Colored dispersion, photoresist composition and black matrix |
| 05/14/2009 | WO2009061001A1 Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
| 05/14/2009 | WO2009061000A1 Movable body apparatus |
| 05/14/2009 | WO2009060999A1 Movable body apparatus |
| 05/14/2009 | WO2009060998A1 Movable body apparatus |
| 05/14/2009 | WO2009060991A1 Spatial light modulation unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 05/14/2009 | WO2009060908A1 Photocurable resin composition, cured product pattern, and printed wiring board |
| 05/14/2009 | WO2009060869A1 Negative resist composition and method for forming pattern using the negative resist composition |
| 05/14/2009 | WO2009060773A1 Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| 05/14/2009 | WO2009060745A1 Control device, exposure method, and exposure device |
| 05/14/2009 | WO2009060744A1 Illumination optical device and exposure device |
| 05/14/2009 | WO2009060585A1 Exposure apparatus, exposure method and device manufacturing method |
| 05/14/2009 | WO2009060125A1 Carbosilane polymer compositions for anti-reflective coatings |
| 05/14/2009 | US20090123880 increasing its solubility in an alkaline developer under action of an acid generator; prevent development defect after development in immersion photolithography; silicon-free resin is a copolymer of trimethylsilanol modified methacrylic acid-methyl methacrylate; semiconductors |
| 05/14/2009 | US20090123879 Surface position detecting apparatus, surface position detecting method, exposure apparatus, and device manufacturing method |
| 05/14/2009 | US20090123878 Patterning method |
| 05/14/2009 | US20090123877 Method for forming an opening of nano-meter scale |
| 05/14/2009 | US20090123876 Optical disc and method of producing the same |
| 05/14/2009 | US20090123875 Method for manufacturing semiconductor device, and method for processing etching-target film |
| 05/14/2009 | US20090123874 Exposure method, exposure apparatus, and method for manufacturing device |
| 05/14/2009 | US20090123873 Lamination for Printed Photomask |
| 05/14/2009 | US20090123872 Inkjet-imageable lithographic printing members and methods of preparing and imaging them |
| 05/14/2009 | US20090123871 Lithographic imaging with printing members having hydrophilic, surfactant-containing top layers |
| 05/14/2009 | US20090123870 Method of and system for electon beam lithography of micro-pattern and disc substrate having micro-pattern to be transferred |
| 05/14/2009 | US20090123869 Compositions and processes for immersion lithography |
| 05/14/2009 | US20090123868 Resist polymer and method for producing the polymer |
| 05/14/2009 | US20090123867 Photosensitive resin composition and adhesion promoter |
| 05/14/2009 | US20090123782 Method for manufacturing magnetic recording media |
| 05/14/2009 | US20090123712 Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
| 05/14/2009 | US20090122293 Stage device, exposure apparatus, and method of manufacturing devices |
| 05/14/2009 | US20090122292 Illumination optical apparatus and projection exposure apparatus |
| 05/14/2009 | US20090122288 Device for the low-deformation replaceable mounting of an optical element |
| 05/14/2009 | US20090122286 Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |