| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/26/2009 | US7537883 forming masking layers having aperture patterns on nanostructure semiconductor layers, then depositing a metal on the semiconductor layer and exposing through the apertures, to form terminals |
| 05/26/2009 | US7537882 Anti-reflective coating composition and production method for pattern using the same |
| 05/26/2009 | US7537880 alkali-soluble acrylate copolymer for use in photoresists, having a weight average molecular weight of 1,000 to 500,000; prevents water penetration during immersion lithography; fluoropolymers; photolithography for the microfabrication of semiconductor devices |
| 05/26/2009 | US7537879 Photoresist composition for deep UV and process thereof |
| 05/26/2009 | US7537878 Method of fabricating organic light emitting display |
| 05/26/2009 | US7537869 Avoiding image macro-flare by determining the variations of lengths of parallel lines of transparency of two patterns adjacent or overlapping the photoresist film; the second has a larger transparent region than the first which has parallel lines of transparent regions of the same length |
| 05/26/2009 | US7537864 Hole pattern design method and photomask |
| 05/26/2009 | US7537810 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel |
| 05/26/2009 | US7537802 Particles of (meth)acrylonitrile and/or (meth)acrylamide copolymers with nonionic and (optionally) anionic comonomer; unsaturated fatty ester; paints for masonry, wood, paper, paving; floor polishes |
| 05/26/2009 | US7537327 Internal die filters with multiple passageways which are fluidically in parallel |
| 05/26/2009 | CA2430101C Improved photosensitive resin for flexographic printing developable with an aqueous developer solution |
| 05/22/2009 | WO2009063955A1 Radiation-sensitive resin composition for forming spacer, spacer, method for forming spacer, and liquid crystal display device |
| 05/22/2009 | WO2009063887A1 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist |
| 05/22/2009 | WO2009063808A1 Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device |
| 05/22/2009 | WO2009063736A1 Exposure method and exposure apparatus |
| 05/22/2009 | WO2009063726A1 Process for production of photoresist resins |
| 05/22/2009 | WO2009063024A1 Method of making a lithographic printing plate |
| 05/22/2009 | WO2009063022A1 Optical system and method for characterising an optical system |
| 05/22/2009 | WO2009063002A1 Illumination system of a microlithographic projection exposure apparatus |
| 05/22/2009 | WO2009062995A2 Preparation of epsilon copper phthalocyanine of small primary particle size and narrow particle size distribution by kneading |
| 05/22/2009 | WO2009062867A1 A method for producing an optically variable image carrying shim |
| 05/22/2009 | WO2009062857A1 Method for making a lithographic printing plate |
| 05/22/2009 | WO2009062606A1 Lithographic apparatus |
| 05/22/2009 | WO2009062397A1 Corrosion inhibitor for semiconductor chip metal substrate and use method thereof |
| 05/22/2009 | WO2009040011A3 High aperture catadioptric projection objective |
| 05/22/2009 | WO2009010904A3 A process for writing on photosensitive material., using a resist of organic-inorganic hybrid sol- gel materials |
| 05/22/2009 | WO2008146869A3 Pattern forming method, pattern or mold formed thereby |
| 05/22/2009 | WO2008133080A9 Color filter, liquid crystal display device and hardening composition to be used in the production of the same |
| 05/22/2009 | WO2008114117A3 Method for manufacturing floor panels by performing a photographic art |
| 05/22/2009 | WO2008025508A8 Process for preparing a polymeric relief structure |
| 05/21/2009 | US20090131905 Microneedle devices and methods of manufacture and use thereof |
| 05/21/2009 | US20090131295 Compositions for Removal of Metal Hard Mask Etching Residues from a Semiconductor Substrate |
| 05/21/2009 | US20090130837 In situ deposition of a low k dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application |
| 05/21/2009 | US20090130614 Development device and development method |
| 05/21/2009 | US20090130611 Lithographic Method |
| 05/21/2009 | US20090130610 Integrated color mask |
| 05/21/2009 | US20090130608 Photopatternable deposition inhibitor containing siloxane |
| 05/21/2009 | US20090130607 Roll-to-roll patterning of transparent and metallic layers |
| 05/21/2009 | US20090130606 Photoresist developer and method for fabricating substrate by using the developer thereof |
| 05/21/2009 | US20090130605 Resist composition |
| 05/21/2009 | US20090130604 Solution for immersion exposure and immersion exposure method |
| 05/21/2009 | US20090130603 Method for manufacturing semiconductor device |
| 05/21/2009 | US20090130602 Method for manufacturing image sensor |
| 05/21/2009 | US20090130601 Method for fabricating semiconductor device |
| 05/21/2009 | US20090130600 Multicolored mask process for making display circuitry |
| 05/21/2009 | US20090130599 Method for forming an electrical structure comprising multiple photosensitive materials |
| 05/21/2009 | US20090130598 Method of Creating a Template Employing a Lift-Off Process |
| 05/21/2009 | US20090130597 Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 05/21/2009 | US20090130596 Lithographic printing plate comprising alkaline soluble and alkaline insoluble polymeric binders |
| 05/21/2009 | US20090130595 Thermoacid Generator for Antireflection Film Formation, Composition for Antireflection Film Formation, and Antireflection Film Made Therefrom |
| 05/21/2009 | US20090130594 Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating |
| 05/21/2009 | US20090130592 Compositions and processes for immersion lithography |
| 05/21/2009 | US20090130590 dispensing positive photoresist comprising casting solvent, adamantane-containing acrylic ester comonomers dissolved therein, and photoacid generator over substrate or fabrication layer, removing casting solvent by pre-exposure baking, exposing to actinic radiation, developing, baking; photolithography |
| 05/21/2009 | US20090130581 Developer composition and method for preparing the same, and method for forming resist pattern |
| 05/21/2009 | US20090130571 Masking process using photoresist |
| 05/21/2009 | US20090130568 Photosensitive Resin Composition for Volume Phase Hologram Recording and Optical Information Recording Medium Using the Same |
| 05/21/2009 | US20090130398 Gradient colored mask |
| 05/21/2009 | US20090130397 Multicolor mask |
| 05/21/2009 | US20090130384 Chip Provided with film Having Hole Pattern with the Use of Thermoresponsive Polymer and Method of Producing the Same |
| 05/21/2009 | US20090130334 Fabrication method and apparatus |
| 05/21/2009 | US20090129252 Record medium, its manufacturing method, mother disc for record medium, and its manufacturing method |
| 05/21/2009 | US20090128796 Illumination optics apparatus, exposure method, exposure apparatus, and method of manufacturing electronic device |
| 05/21/2009 | US20090128793 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method |
| 05/21/2009 | US20090127723 AIM-Compatible Targets for Use with Methods of Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices |
| 05/21/2009 | US20090127670 Semiconductor device, method for manufacturing the same and mask pattern for manufacturing the same |
| 05/21/2009 | US20090127477 Laser irradiation apparatus and laser irradiation method |
| 05/21/2009 | US20090126855 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| 05/21/2009 | US20090126588 Method and apparatus for manufacturing relief material for seamless printing |
| 05/20/2009 | EP2061068A1 System for processing an object |
| 05/20/2009 | EP2060950A1 Method for producing original plate, method for producing microneedle patch, microneedle patch, and exposure apparatus |
| 05/20/2009 | EP2060949A1 Radiation-sensitive composition and process for producing low-molecular compound for use therein |
| 05/20/2009 | EP2060608A1 Preparation of epsilon copper phthalocyanine of small primary particle size and narrow particle size distribution by kneading |
| 05/20/2009 | EP2060600A1 Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 05/20/2009 | EP2060558A1 Phenyl acrylate derivatives and their use for producing optical films by means of photopolymerisation |
| 05/20/2009 | EP2060405A1 Photosensitive resin composition |
| 05/20/2009 | EP2059855A1 Process for preparing a polymeric relief structure |
| 05/20/2009 | EP2059854A1 Liquid supramolecular nanostamping (lisuns) |
| 05/20/2009 | EP1677699A4 Novel photopolymers and use in dental restorative materials |
| 05/20/2009 | EP1577114B1 Device for positioning a curing radiation source on an engraving cylinder or an engraving plate holder |
| 05/20/2009 | EP1146967A4 Flow controller |
| 05/20/2009 | CN201242661Y Treatment equipment for etching sheet material |
| 05/20/2009 | CN201242660Y Treatment equipment for etching sheet material |
| 05/20/2009 | CN201242659Y Acceptance cabinet body structure |
| 05/20/2009 | CN201242658Y Dye feeding device for coating CD-disc dye |
| 05/20/2009 | CN201242599Y Reflexion type rock quartz polarization beam-splitting grating based on metallic layer reflection |
| 05/20/2009 | CN201242598Y 1*3 polarization irrelevant beam-splitting grating for 785 nanometer waveband fused silica transmission |
| 05/20/2009 | CN101438631A Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 05/20/2009 | CN101438430A Device patterning using irradiation |
| 05/20/2009 | CN101438385A Exposure apparatus and device manufacturing method |
| 05/20/2009 | CN101438210A Photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board |
| 05/20/2009 | CN101438209A Photosensitive surface printing plate material |
| 05/20/2009 | CN101438208A Photosensitive resin composition |
| 05/20/2009 | CN101438207A Method for making an improved thin film solar cell interconnect using etch and deposition processes |
| 05/20/2009 | CN101438196A Symmetrical objective having four lens groups for microlithography |
| 05/20/2009 | CN101436564A Substrate processing apparatus |
| 05/20/2009 | CN101436006A Double-surface position alignment apparatus and method |
| 05/20/2009 | CN101436005A Subsection making and aligning signal processing method |
| 05/20/2009 | CN101436004A Method for pre-aligning silicon chip |
| 05/20/2009 | CN101436003A Exposure apparatus and device manufacturing method |
| 05/20/2009 | CN101436002A Exposure apparatus, method for manufacturing device, and method for controlling exposure apparatus |