| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 05/28/2009 | US20090136877 Method for organic material layer formation |
| 05/28/2009 | US20090136876 System and method for photolithography in semiconductor manufacturing |
| 05/28/2009 | US20090136875 Manufacturing method of liquid ejection head |
| 05/28/2009 | US20090136874 Method for manufacturing printed circuit board |
| 05/28/2009 | US20090136873 System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules |
| 05/28/2009 | US20090136872 Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same |
| 05/28/2009 | US20090136871 Topcoat composition |
| 05/28/2009 | US20090136870 Positive resist composition and pattern making method using the same |
| 05/28/2009 | US20090136869 Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method |
| 05/28/2009 | US20090136868 cationic lactone containing perfluorinated sulfonate or sulfonimides with iodonium or sulfonium anions as photoacid generator, a polyhydroxystyrene homo or copolymer and a solvent (propylene glycol/1,2-/, monoalkyl ether, ethyl lactone ); semiconductor, heat exposure, pattern forming; development |
| 05/28/2009 | US20090136867 Si-polymers and photoresists comprising same |
| 05/28/2009 | US20090136856 Photo-mask and thin-film transistor substrate |
| 05/28/2009 | US20090136721 Multi-Layer Body and Method for Producing the Same |
| 05/28/2009 | US20090135491 Optical element and method for manufacturing master for producing optical element |
| 05/28/2009 | US20090135481 Polarizer, projection lens system, exposure apparatus and exposing method |
| 05/28/2009 | US20090135416 Parametric Profiling Using Optical Spectroscopic Systems |
| 05/28/2009 | US20090135399 Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method |
| 05/28/2009 | US20090135397 Illumination system of a microlithographic projection exposure apparatus |
| 05/28/2009 | US20090135391 Method of forming a locally periodic 3d structure with larger-scale variation in periodic properties and applicaitons thereof |
| 05/28/2009 | US20090135387 Laser Irradiation |
| 05/28/2009 | US20090135347 Display device and manufacturing method thereof |
| 05/28/2009 | US20090134488 Immersion Liquid, Exposure Apparatus, and Exposure Process |
| 05/28/2009 | US20090133800 Stereolithography method |
| 05/28/2009 | US20090133752 Organic Photovoltaic Device With Improved Power Conversion Efficiency And Method Of Manufacturing Same |
| 05/28/2009 | DE102007055567A1 Optisches System Optical system |
| 05/28/2009 | DE102007055063A1 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Illumination device of a microlithography projection exposure apparatus |
| 05/28/2009 | DE102007055062A1 Optisches System, sowie Verfahren zur Charakterisierung eines optischen Systems Optical system, and to methods of characterizing an optical system |
| 05/28/2009 | DE102007054683A1 Illumination optics for guiding a radiation bundle of a radiation source in microlithography comprises an optical bundle guiding component arranged between an emission volume and the object field |
| 05/28/2009 | DE102007025600B4 Interferenzfilter und Verfahren zu dessen Herstellung Interference filter and process for its preparation |
| 05/27/2009 | EP2063321A2 Method of measuring focus of a lithographic projection apparatus |
| 05/27/2009 | EP2063320A2 Method and apparatus for fabricating vertical deposition mask |
| 05/27/2009 | EP2063319A1 Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method |
| 05/27/2009 | EP2063318A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board |
| 05/27/2009 | EP2063002A2 Method for depositing and patterning carbon nanotubes using chemical self-assembly process |
| 05/27/2009 | EP2062950A2 Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same |
| 05/27/2009 | EP2062737A1 Processing of lithographic printing plates with hydrophilic polymer in finisher solution |
| 05/27/2009 | EP2062728A1 Method for making a lithographic printing plate |
| 05/27/2009 | EP2062098A1 Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same |
| 05/27/2009 | EP1359172B1 Ultraviolet-curable resin composition and photosolder resist ink containing the composition |
| 05/27/2009 | EP1323684B1 Low thermal expansion ceramic and member for exposure system |
| 05/27/2009 | CN201247383Y PS edition powder-spraying device |
| 05/27/2009 | CN201247339Y Adjustable reflective cover |
| 05/27/2009 | CN201245277Y Photomask box |
| 05/27/2009 | CN101443705A Positive photosensitive resin composition containing siloxane compound |
| 05/27/2009 | CN101443704A Positive photosensitive resin composition and porous film obtained therefrom |
| 05/27/2009 | CN101443195A Method for making a lithographic printing plate |
| 05/27/2009 | CN101442017A Detection device and method for silicon chip balance for semiconductor device preparation technique |
| 05/27/2009 | CN101441431A Method for real time monitoring exposure amount in holographic grating manufacture |
| 05/27/2009 | CN101441422A Developing solution for heat-sensitive positive picture CTP plate |
| 05/27/2009 | CN101441421A Apparatus for implementing non-mask surface plasma interference photolithography by using Lloyd lens |
| 05/27/2009 | CN101441420A Lithographic apparatus and device manufacturing method |
| 05/27/2009 | CN101441419A Substrate transfeering method and system and photolithography projector equipment |
| 05/27/2009 | CN101441418A Pattern formation method and semiconductor device manufacturing method |
| 05/27/2009 | CN101441417A Polarized light source apparatus based on liquid crystal in photolithography lens imaging system |
| 05/27/2009 | CN101441416A Dry film photoresist and preparing method thereof |
| 05/27/2009 | CN101441415A Antireflective coatings |
| 05/27/2009 | CN101441414A Production process of flexible photosensitive resin plate |
| 05/27/2009 | CN101441413A Green coloring composition for filter and filter |
| 05/27/2009 | CN101441412A Resin composition |
| 05/27/2009 | CN101441411A Surface plasma resonance exposure photolithography method |
| 05/27/2009 | CN101441410A Method for manufacturing nano-scale pattern |
| 05/27/2009 | CN101441409A Mesh screen adjusting printing and plate making process |
| 05/27/2009 | CN101441408A Photomask, manufacturing method thereof, and pattern transfer print method |
| 05/27/2009 | CN101441406A Exposure method and attenuated phase shift mask |
| 05/27/2009 | CN101441405A Protective film component, accommodating container for accommodating protective film component and accommodating method |
| 05/27/2009 | CN101441402A Method for detecting best focus of exposure machine |
| 05/27/2009 | CN101441381A Method for preparing solvent resistance agent electronic paper micro-cup and material for preparing solvent resistance agent electric paper micro-cup |
| 05/27/2009 | CN101441372A Electrostatic discharge protection device of LCD device and manufacturing method thereof |
| 05/27/2009 | CN101441367A Platen for printing distribution film |
| 05/27/2009 | CN101441287A Real time supervisory circuit of holographic grating development process |
| 05/27/2009 | CN101439582A Method for manufacturing light conducting plate |
| 05/27/2009 | CN100492714C Substrate and organic electroluminescent device using the same |
| 05/27/2009 | CN100492684C Ultraviolet radiator, ultraviolet radiation condition setting method and ultraviolet radiation method |
| 05/27/2009 | CN100492588C Liquid for immersion exposure and immersion exposure method |
| 05/27/2009 | CN100492498C System and method for patterning a master disk for nanoimprinting patterned magnetic recording disks |
| 05/27/2009 | CN100492181C All-refraction immersion type projection and optical system, device and its uses |
| 05/27/2009 | CN100492180C Projection objective detecting method |
| 05/27/2009 | CN100492179C Interferometer |
| 05/27/2009 | CN100492178C Light spot energy barycenter rectification module and its measurement method and device |
| 05/27/2009 | CN100492177C System for balancing and positioning work table of photoetching device |
| 05/27/2009 | CN100492176C Phase control and compensation process of digital optical lithography |
| 05/27/2009 | CN100492175C Projection optic system |
| 05/27/2009 | CN100492174C Supporting structure used for photoetching equipment |
| 05/27/2009 | CN100492173C Coating composition of positive type photosensitive polyimide |
| 05/27/2009 | CN100492172C Chuck, photoetching apparatus and components producing method |
| 05/27/2009 | CN100492171C Method for manufacturing liquid crystal display device |
| 05/27/2009 | CN100492144C Transflective liquid crystal display device and method of fabricating the same |
| 05/27/2009 | CN100492094C Graphics engine for high precision lithography |
| 05/27/2009 | CN100492067C Method for producing color filter sheet |
| 05/27/2009 | CN100491480C Colored image-forming composition containing phthalocyanine compound, inks, inkjet inks, inkjet recording method and method of improving tolerance to decolorization due to ozone gas |
| 05/27/2009 | CN100490989C Nozzle device and nozzle cleaning device thereof |
| 05/26/2009 | US7538875 Lithographic apparatus and methods for use thereof |
| 05/26/2009 | US7538853 Exposure process and apparatus using glass photomasks |
| 05/26/2009 | US7538852 Exposure apparatus and device manufacturing method |
| 05/26/2009 | US7538444 Wafer with optical control modules in exposure fields |
| 05/26/2009 | US7538344 Overlay and CD process window structure |
| 05/26/2009 | US7538104 Photoactivable nitrogen bases |
| 05/26/2009 | US7538042 Method of manufacturing a structure having a projection |
| 05/26/2009 | US7538038 Method of removing resist, semiconductor device thereby and method of manufacturing a semiconductor device |
| 05/26/2009 | US7537939 System and method for characterizing lithography effects on a wafer |